CA2706702A1 - Inorganic particles hydrophobized with fluoroalkyl silanes - Google Patents
Inorganic particles hydrophobized with fluoroalkyl silanes Download PDFInfo
- Publication number
- CA2706702A1 CA2706702A1 CA2706702A CA2706702A CA2706702A1 CA 2706702 A1 CA2706702 A1 CA 2706702A1 CA 2706702 A CA2706702 A CA 2706702A CA 2706702 A CA2706702 A CA 2706702A CA 2706702 A1 CA2706702 A1 CA 2706702A1
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- Prior art keywords
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- fluorosilane
- particles
- perfluoroalkyl
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- 239000010954 inorganic particle Substances 0.000 title abstract description 43
- -1 fluoroalkyl silanes Chemical class 0.000 title description 2
- 239000002245 particle Substances 0.000 claims abstract description 134
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 claims abstract description 85
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims abstract description 32
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 27
- 229910052809 inorganic oxide Inorganic materials 0.000 claims description 58
- 229910052731 fluorine Inorganic materials 0.000 claims description 26
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 23
- 229910052739 hydrogen Inorganic materials 0.000 claims description 20
- 239000001257 hydrogen Substances 0.000 claims description 18
- 125000000962 organic group Chemical group 0.000 claims description 18
- 229910052760 oxygen Inorganic materials 0.000 claims description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 14
- 150000002431 hydrogen Chemical class 0.000 claims description 14
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 claims description 14
- 239000001301 oxygen Substances 0.000 claims description 14
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 12
- 239000005977 Ethylene Substances 0.000 claims description 12
- 125000001153 fluoro group Chemical group F* 0.000 claims description 12
- QWCOSMBXZZJARK-UHFFFAOYSA-N fluorosilane thiourea Chemical group F[SiH3].NC(N)=S QWCOSMBXZZJARK-UHFFFAOYSA-N 0.000 claims description 12
- 239000004202 carbamide Substances 0.000 claims description 11
- RNLWPKPXXVJKNI-UHFFFAOYSA-N F[SiH3].C(N)(O)=O Chemical group F[SiH3].C(N)(O)=O RNLWPKPXXVJKNI-UHFFFAOYSA-N 0.000 claims description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 6
- BFIQGHWJERJARE-UHFFFAOYSA-N F[SiH3].NC(N)=O Chemical group F[SiH3].NC(N)=O BFIQGHWJERJARE-UHFFFAOYSA-N 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 150000003568 thioethers Chemical group 0.000 claims description 4
- JBONTXQZKUTFRB-UHFFFAOYSA-N F[SiH3].C(CCC(=O)N)(=O)O Chemical group F[SiH3].C(CCC(=O)N)(=O)O JBONTXQZKUTFRB-UHFFFAOYSA-N 0.000 claims description 3
- IANKFTPPKZJKNC-UHFFFAOYSA-N N-carbamoylformamide fluorosilane Chemical group [SiH3]F.NC(=O)NC=O IANKFTPPKZJKNC-UHFFFAOYSA-N 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- JOWMUPQBELRFRZ-UHFFFAOYSA-N n-carbamoylformamide Chemical group NC(=O)NC=O JOWMUPQBELRFRZ-UHFFFAOYSA-N 0.000 claims description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 claims description 2
- 229910052748 manganese Inorganic materials 0.000 claims description 2
- 125000001302 tertiary amino group Chemical group 0.000 claims description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 115
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 28
- 239000000377 silicon dioxide Substances 0.000 abstract description 15
- 125000005647 linker group Chemical group 0.000 abstract description 10
- 230000002209 hydrophobic effect Effects 0.000 abstract description 7
- 238000010348 incorporation Methods 0.000 abstract description 5
- 239000010408 film Substances 0.000 description 50
- 238000005259 measurement Methods 0.000 description 47
- 229910001868 water Inorganic materials 0.000 description 37
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 34
- 238000005266 casting Methods 0.000 description 29
- 239000010409 thin film Substances 0.000 description 28
- 238000007306 functionalization reaction Methods 0.000 description 24
- 239000003921 oil Substances 0.000 description 22
- 239000003795 chemical substances by application Substances 0.000 description 19
- 239000002243 precursor Substances 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 14
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 13
- 238000000034 method Methods 0.000 description 11
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 10
- 238000001228 spectrum Methods 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 8
- 239000011737 fluorine Substances 0.000 description 8
- 239000012299 nitrogen atmosphere Substances 0.000 description 8
- 239000011541 reaction mixture Substances 0.000 description 8
- 239000012258 stirred mixture Substances 0.000 description 8
- 238000012360 testing method Methods 0.000 description 8
- 238000009736 wetting Methods 0.000 description 8
- 229910002016 Aerosil® 200 Inorganic materials 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- 239000012530 fluid Substances 0.000 description 6
- 239000012948 isocyanate Substances 0.000 description 6
- 150000002513 isocyanates Chemical group 0.000 description 6
- 239000011164 primary particle Substances 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 239000011787 zinc oxide Substances 0.000 description 6
- 238000005384 cross polarization magic-angle spinning Methods 0.000 description 5
- 239000006185 dispersion Substances 0.000 description 5
- GRVDJDISBSALJP-UHFFFAOYSA-N methyloxidanyl Chemical compound [O]C GRVDJDISBSALJP-UHFFFAOYSA-N 0.000 description 5
- 239000004215 Carbon black (E152) Substances 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- 238000013459 approach Methods 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000007970 homogeneous dispersion Substances 0.000 description 4
- 229930195733 hydrocarbon Natural products 0.000 description 4
- 150000002430 hydrocarbons Chemical class 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 230000035484 reaction time Effects 0.000 description 4
- 238000005133 29Si NMR spectroscopy Methods 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 150000002540 isothiocyanates Chemical class 0.000 description 3
- 125000004430 oxygen atom Chemical group O* 0.000 description 3
- 150000004756 silanes Chemical class 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- KXDHJXZQYSOELW-UHFFFAOYSA-M Carbamate Chemical compound NC([O-])=O KXDHJXZQYSOELW-UHFFFAOYSA-M 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- DCAYPVUWAIABOU-UHFFFAOYSA-N hexadecane Chemical compound CCCCCCCCCCCCCCCC DCAYPVUWAIABOU-UHFFFAOYSA-N 0.000 description 2
- 239000012454 non-polar solvent Substances 0.000 description 2
- 229940124530 sulfonamide Drugs 0.000 description 2
- 150000003456 sulfonamides Chemical class 0.000 description 2
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 2
- 230000003075 superhydrophobic effect Effects 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- 229910002018 Aerosil® 300 Inorganic materials 0.000 description 1
- 229910002013 Aerosil® 90 Inorganic materials 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- JDVPQXZIJDEHAN-UHFFFAOYSA-N succinamic acid Chemical compound NC(=O)CCC(O)=O JDVPQXZIJDEHAN-UHFFFAOYSA-N 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
- C09C3/12—Treatment with organosilicon compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/04—Compounds of zinc
- C09C1/043—Zinc oxide
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3081—Treatment with organo-silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/36—Compounds of titanium
- C09C1/3607—Titanium dioxide
- C09C1/3684—Treatment with organo-silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/40—Compounds of aluminium
- C09C1/407—Aluminium oxides or hydroxides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/86—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by NMR- or ESR-data
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
Abstract
Inorganic particles hydrophobized with fluorosilanes have been used to impart hydrophobic as well as oleophobic properties as exemplified by U.S. Patent Application, US2006/0222815, filed by Oles et al. which teaches making such hydrophobized particles by the covalent bonding (i.e. grafting) of fluorosilanes upon the surface of inorganic particles (e.g. silica). The fluorosilanes employed by Oles et al. consist of a silicon atom having four bonds, three of which are direct bonds to hydrolysable groups which can react with the surface of an inorganic particle thereby covalently bonding the fluorosilane to particle. The remaining bond is a direct bond from the silicon atom to a perfluoroalkyl group. In contrast, the hydrophobized inorganic particles of the present invention comprise residues from fluorosilanes wherein the silicon atom is first bonded to a divalent organic linking group which in turn is bonded to a perfluoroalkyl group. It has been discovered that incorporation of the aforementioned divalent organic linking group can improve the ability of resulting hydrophobized inorganic particles to impart hydrophobic as well as oleophobic properties.
Description
C _ WO ___ TITLE OF INVENTION
INORGANIC PARTICLES HYDROPHOBIZED WITH
FLUOROALKYL SILANES
BACKGROUND OF THE INVENTION
Inorganic particles hydrophobized with fluorosilanes have been used to impart hydrophobic as well as oleophobic properties as exemplified by U.S. Patent Application, US200610222815, filed by Oles et al. which teaches making such hydrophobized particles by the covalent bonding (i.e. grafting) of fluorosilanes upon the surface of inorganic particles (e.g. silica). The fluorosilanes employed by Oles et al. consist of a silicon atom having four bonds, three of which are direct bonds to hydrolysable groups which can react with the surface of an inorganic particle thereby covalently bonding the fluorosilane to particle. The remaining bond is a direct bond from the silicon atom to a perfluoroalkyl group.
Despite the advances of Oles et al., it would be desirable to discover hydrophobized inorganic particles having improved ability to impart hydrophobic as well as oleophobic properties.
BRIEF DESCRIPTION OF THE DRAWINGS
Figure 1 is a simplified depiction of a hydrophobized particle made from silica particles (AEROSIL 200) obtained in accordance with the invention.
Figure 2 are spectra obtained by solid-state 29Si NMR cross-polarization magic angle spinning analysis (CPMAS) of: 1) hydrophobized particle made from silica particles (AEROSIL 200) obtained in accordance with the invention; and 2) untreated silica particles (AEROSIL 200).
BRIEF SUMMARY OF THE INVENTION
Whereas previously known hydrophobized inorganic particles comprise residues from fluorosilanes wherein the silicon atom is directly bonded to a perfluoroalkyl group, the hydrophobized inorganic particles of the present invention comprise residues from fluorosilanes wherein the silicon atom is first bonded to a divalent organic linking group which in turn is bonded to a perfluoroalkyl group. It has been discovered that incorporation of the aforementioned divalent organic linking group can improve the ability of resulting hydrophobized inorganic particles to impart hydrophobic as well as oleophobic properties.
The present invention relates to surface modified inorganic particles (also known as hydrophobized inorganic particles) made by the method of covalently grafting fluorosilanes to their surface thereby imparting to the particles hydrophobic and/or oleophobic properties. The fluorosilanes used in the present invention have a divalent organic linking group which bonds the silicon atom thereof to a fluorine rich group such as a perfluoroalkyl group. The fluorosilanes useful in the aforementioned method of covalent grafting are described in U.S. Patent Application 12/323,593 filed November 26, 2008 hereby incorporated by reference.
Specifically, the surface modified inorganic oxide particles comprise an oxide of M wherein M is independently selected from the group consisting of Si, Ti, Zn, Zr, Mn, Al, and combinations thereof; at least one of said particles having a surface covalently bonded to at least one fluorosilane group represented by Formula (1):
(L1)d(L2)cSi-(CH2)n (Z1)a[C(X1)]X (Z2)i-Q1-Rf wherein:
L' represents an oxygen covalently bonded to an M; and each L2 independently selected from the group consisting of H, a Cl-C2 alkyl, and OH; d and c are integers such that: d >_ 1, c >_ 0, d+c =3;
each n is independently an integer from 1 to 12;
a, x, and I are integers chosen such that the moiety of Formula 1 represented by -(Z')a[C(X')]X (Z2),- further represents at least one of the following moieties:
i) a first moiety wherein a=1, x=1, and 1=1; and
INORGANIC PARTICLES HYDROPHOBIZED WITH
FLUOROALKYL SILANES
BACKGROUND OF THE INVENTION
Inorganic particles hydrophobized with fluorosilanes have been used to impart hydrophobic as well as oleophobic properties as exemplified by U.S. Patent Application, US200610222815, filed by Oles et al. which teaches making such hydrophobized particles by the covalent bonding (i.e. grafting) of fluorosilanes upon the surface of inorganic particles (e.g. silica). The fluorosilanes employed by Oles et al. consist of a silicon atom having four bonds, three of which are direct bonds to hydrolysable groups which can react with the surface of an inorganic particle thereby covalently bonding the fluorosilane to particle. The remaining bond is a direct bond from the silicon atom to a perfluoroalkyl group.
Despite the advances of Oles et al., it would be desirable to discover hydrophobized inorganic particles having improved ability to impart hydrophobic as well as oleophobic properties.
BRIEF DESCRIPTION OF THE DRAWINGS
Figure 1 is a simplified depiction of a hydrophobized particle made from silica particles (AEROSIL 200) obtained in accordance with the invention.
Figure 2 are spectra obtained by solid-state 29Si NMR cross-polarization magic angle spinning analysis (CPMAS) of: 1) hydrophobized particle made from silica particles (AEROSIL 200) obtained in accordance with the invention; and 2) untreated silica particles (AEROSIL 200).
BRIEF SUMMARY OF THE INVENTION
Whereas previously known hydrophobized inorganic particles comprise residues from fluorosilanes wherein the silicon atom is directly bonded to a perfluoroalkyl group, the hydrophobized inorganic particles of the present invention comprise residues from fluorosilanes wherein the silicon atom is first bonded to a divalent organic linking group which in turn is bonded to a perfluoroalkyl group. It has been discovered that incorporation of the aforementioned divalent organic linking group can improve the ability of resulting hydrophobized inorganic particles to impart hydrophobic as well as oleophobic properties.
The present invention relates to surface modified inorganic particles (also known as hydrophobized inorganic particles) made by the method of covalently grafting fluorosilanes to their surface thereby imparting to the particles hydrophobic and/or oleophobic properties. The fluorosilanes used in the present invention have a divalent organic linking group which bonds the silicon atom thereof to a fluorine rich group such as a perfluoroalkyl group. The fluorosilanes useful in the aforementioned method of covalent grafting are described in U.S. Patent Application 12/323,593 filed November 26, 2008 hereby incorporated by reference.
Specifically, the surface modified inorganic oxide particles comprise an oxide of M wherein M is independently selected from the group consisting of Si, Ti, Zn, Zr, Mn, Al, and combinations thereof; at least one of said particles having a surface covalently bonded to at least one fluorosilane group represented by Formula (1):
(L1)d(L2)cSi-(CH2)n (Z1)a[C(X1)]X (Z2)i-Q1-Rf wherein:
L' represents an oxygen covalently bonded to an M; and each L2 independently selected from the group consisting of H, a Cl-C2 alkyl, and OH; d and c are integers such that: d >_ 1, c >_ 0, d+c =3;
each n is independently an integer from 1 to 12;
a, x, and I are integers chosen such that the moiety of Formula 1 represented by -(Z')a[C(X')]X (Z2),- further represents at least one of the following moieties:
i) a first moiety wherein a=1, x=1, and 1=1; and
-2-ii) a second moiety wherein a=1, x=0, and 1=0;
Rf is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl can be optionally replaced by hydrogen, and/or ii) the perfluoroalkyl can be optionally interrupted by at least one oxygen, methylene, or ethylene; Q is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group;
Q1 is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group;
X1 is chosen from 0 or S;
the first moiety further defined wherein Z' and Z2 are chosen such that:
a) Z' is -NH- and Z2 is from the group consisting of -NH-, -0-, -S-, -NH-S(O)2-, -N[C(O)H]-, -[HC(COOH)(R')]CH-S-, and -(R')CH-[HC(COOH)]-S-;
b) alternatively, Z2 is -NH- and Z' is from the group consisting of -0-, and -S-;
c) each R1 is independently chosen from hydrogen, phenyl, or a monovalent Cl-C8 alkyl optionally terminated by -C6H5, preferably H or CH3;
the second moiety further defined wherein:
a) Z' is -N[-Q3-(Rf)]-; and b) Q1 and Q3 are independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one of -C(O)-O- or -0-C(O)-, and optionally further interrupted by at least one divalent organic group.
Unless otherwise stated herein the definitions used herein for L', L2, d, c, n, Z1, X1, Z2, Q1, Q3, R1, and Rf are identical to the definitions set forth above for Formula 1.
Rf is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl can be optionally replaced by hydrogen, and/or ii) the perfluoroalkyl can be optionally interrupted by at least one oxygen, methylene, or ethylene; Q is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group;
Q1 is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group;
X1 is chosen from 0 or S;
the first moiety further defined wherein Z' and Z2 are chosen such that:
a) Z' is -NH- and Z2 is from the group consisting of -NH-, -0-, -S-, -NH-S(O)2-, -N[C(O)H]-, -[HC(COOH)(R')]CH-S-, and -(R')CH-[HC(COOH)]-S-;
b) alternatively, Z2 is -NH- and Z' is from the group consisting of -0-, and -S-;
c) each R1 is independently chosen from hydrogen, phenyl, or a monovalent Cl-C8 alkyl optionally terminated by -C6H5, preferably H or CH3;
the second moiety further defined wherein:
a) Z' is -N[-Q3-(Rf)]-; and b) Q1 and Q3 are independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one of -C(O)-O- or -0-C(O)-, and optionally further interrupted by at least one divalent organic group.
Unless otherwise stated herein the definitions used herein for L', L2, d, c, n, Z1, X1, Z2, Q1, Q3, R1, and Rf are identical to the definitions set forth above for Formula 1.
-3-In one preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a urea or thiourea fluorosilane group such that in Formula (1):
a=1, x=1, and l=1;
Z' is -NH- and Z2 is -NH-;
said urea or thiourea fluorosilane group represented by the formula:
(L)d(L2)cSi-(CH2)n N H-C(X' )-N H-Q'-Rf wherein:
X1 is 0 to form a urea fluorosilane group, or X1 is S to form a thiourea fluorosilane group; and Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(0)2-, and -O-C(O)-NH -.
In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a urea or thiourea fluorosilane group such that Rf is chosen from a C2-C12 perfluoroalkyl and Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, and -O-C(O)-NH -.
In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a urea or thiourea fluorosilane group such that Rf is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl is replaced by hydrogen, and/or ii) the perfluoroalkyl is interrupted by at least one oxygen, methylene, or ethylene; Q is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group.
a=1, x=1, and l=1;
Z' is -NH- and Z2 is -NH-;
said urea or thiourea fluorosilane group represented by the formula:
(L)d(L2)cSi-(CH2)n N H-C(X' )-N H-Q'-Rf wherein:
X1 is 0 to form a urea fluorosilane group, or X1 is S to form a thiourea fluorosilane group; and Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(0)2-, and -O-C(O)-NH -.
In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a urea or thiourea fluorosilane group such that Rf is chosen from a C2-C12 perfluoroalkyl and Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, and -O-C(O)-NH -.
In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a urea or thiourea fluorosilane group such that Rf is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl is replaced by hydrogen, and/or ii) the perfluoroalkyl is interrupted by at least one oxygen, methylene, or ethylene; Q is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group.
-4-In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a carbamate fluorosilane such that in Formula (1):
Z' is -NH- and Z2 is -0-, or Z' is -0- and Z2 is -NH-; and X1 is O;
said particle having a surface covalently bonded to an isocyanate derived a carbamate fluorosilane group represented by the formulae:
(L')d(L2)cSi-(CH2)n-NH-C(O)-O-Q'-Rf, or (L')d(L2)cSi-(CH2)n-O-C(O)-NH-Q'-Rf wherein:
Q1 is a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -NH-C(O)-NH-, -NH-C(S)-N-NH-, -5-, -S(O)-, -S(O)2-, -(R')N-S(O)2-, N=N
In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a carbamate fluorosilane group such that Rf is chosen from a C2-C12 perfluoroalkyl and Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(0)2-, and -O-C(O)-NH -.
In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a carbamate fluorosilane group such that Rf is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl is replaced by hydrogen, and/or ii) the perfluoroalkyl is interrupted by at least one oxygen, methylene, or ethylene; Q is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group.
Z' is -NH- and Z2 is -0-, or Z' is -0- and Z2 is -NH-; and X1 is O;
said particle having a surface covalently bonded to an isocyanate derived a carbamate fluorosilane group represented by the formulae:
(L')d(L2)cSi-(CH2)n-NH-C(O)-O-Q'-Rf, or (L')d(L2)cSi-(CH2)n-O-C(O)-NH-Q'-Rf wherein:
Q1 is a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -NH-C(O)-NH-, -NH-C(S)-N-NH-, -5-, -S(O)-, -S(O)2-, -(R')N-S(O)2-, N=N
In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a carbamate fluorosilane group such that Rf is chosen from a C2-C12 perfluoroalkyl and Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(0)2-, and -O-C(O)-NH -.
In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a carbamate fluorosilane group such that Rf is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl is replaced by hydrogen, and/or ii) the perfluoroalkyl is interrupted by at least one oxygen, methylene, or ethylene; Q is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group.
-5-In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a thiolcarbamate fluorosilane group such that in Formula (1):
Z' is -NH- and Z2 is -S-, or Z' is -S- and Z2 is-NH-; and X1 is 0;
said thiolcarbamate fluorosilane group represented by the formulae:
(L')d(L2)cSi-(CH2)n-NH-C(O)-S-Q'-Rf or (L')d(L2)cSi-(CH2)n-S-C(O)-NH-Q'-Rf wherein:
Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, -N(R')-C(O)-, - N--C(O)-N(R')-, -(R')N-S(O)2-, and N=N
In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a thiolcarbamate fluorosilane group such that Rf is chosen from a C2-C12 perfluoroalkyl and Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(0)2-, and -O-C(O)-NH -.
In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a thiolcarbamate fluorosilane group such that Rf is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl is replaced by hydrogen, and/or ii) the perfluoroalkyl is interrupted by at least one oxygen, methylene, or ethylene; Q is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group.
Z' is -NH- and Z2 is -S-, or Z' is -S- and Z2 is-NH-; and X1 is 0;
said thiolcarbamate fluorosilane group represented by the formulae:
(L')d(L2)cSi-(CH2)n-NH-C(O)-S-Q'-Rf or (L')d(L2)cSi-(CH2)n-S-C(O)-NH-Q'-Rf wherein:
Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, -N(R')-C(O)-, - N--C(O)-N(R')-, -(R')N-S(O)2-, and N=N
In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a thiolcarbamate fluorosilane group such that Rf is chosen from a C2-C12 perfluoroalkyl and Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(0)2-, and -O-C(O)-NH -.
In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a thiolcarbamate fluorosilane group such that Rf is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl is replaced by hydrogen, and/or ii) the perfluoroalkyl is interrupted by at least one oxygen, methylene, or ethylene; Q is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group.
-6-In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a N-sulfone urea fluorosilane group such that in Formula (1):
Z' is -NH-, and Z2 is -NH-S(O)2-; and X1 is O;
said N-sulfone urea fluorosilane group represented by the formula:
(L)d(L2)cSi-(CH2)n NH-C(O)-NH-S(0)2-Q'-Rf wherein:
Q1 is independently chosen from the group consisting of an uninterrupted C2-C12 hydrocarbylene.
In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a N-formyl urea fluorosilane group such that in Formula (1):
a=1, x=1, and 1=1; and Z' is -NH-, and Z2 is -N[C(O)H]-;
said N-formyl urea group represented by the formula:
(L)d(L2)cSi-(CH2)n N H-C(X' )-N [C(O)H]-Q'-Rf wherein:
Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -S- and -NH-.
In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a thioether succinamic acid fluorosilane group such that in Formula (1):
a=1, x=1, and 1=1;
Z' is -NH- and Z2 is -[HC(COOH)(R')]CH-S- or -(R')CH-[HC(COOH)]-S-;
X1 is 0; and Q1 is -(CH2)2-said thioether succinamic acid group represented by the formulae:
Z' is -NH-, and Z2 is -NH-S(O)2-; and X1 is O;
said N-sulfone urea fluorosilane group represented by the formula:
(L)d(L2)cSi-(CH2)n NH-C(O)-NH-S(0)2-Q'-Rf wherein:
Q1 is independently chosen from the group consisting of an uninterrupted C2-C12 hydrocarbylene.
In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a N-formyl urea fluorosilane group such that in Formula (1):
a=1, x=1, and 1=1; and Z' is -NH-, and Z2 is -N[C(O)H]-;
said N-formyl urea group represented by the formula:
(L)d(L2)cSi-(CH2)n N H-C(X' )-N [C(O)H]-Q'-Rf wherein:
Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -S- and -NH-.
In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a thioether succinamic acid fluorosilane group such that in Formula (1):
a=1, x=1, and 1=1;
Z' is -NH- and Z2 is -[HC(COOH)(R')]CH-S- or -(R')CH-[HC(COOH)]-S-;
X1 is 0; and Q1 is -(CH2)2-said thioether succinamic acid group represented by the formulae:
-7-(L)3Si-(CH2)n-NH-C(O)-[H C(COOH)(R1)]CR'-(CH2)m S-(CH2)2-Rf, or (L)3Si-(CH2)n-NH-C(O)-(R' )CH-[CR' (COOH)]-(CH2)mS-(CH2)2-Rf wherein m is 1 or 0; wherein each R1 is independently chosen from methyl or hydrogen preferably H.
In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a tertiary amine fluorosilane group such that in Formula (1):
a=1, x=0, and 1=0; and Z' is -N[-Q3-(Rf)]-;
said tertiary amine fluorosilane group represented by the formula:
Rf I
(L)3Si (CH2)n N-Q1 Rf wherein Q1 and Q3 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one -C(O)-O- and optionally further interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, -N(R')-C(O)-, -C(O)-N(R')-, -- N-(R')N-S(O)2-, and N=N
DETAILED DESCRIPTION OF THE INVENTION
The hydrophobized inorganic particles of the present invention can be made by covalently grafting fluorosilanes to their surface in order to impart to them both hydrophobic and oleophobic properties. The fluorosilanes used in the present invention have a divalent organic linking group which connects the silicon atom to a fluorine rich group such as a perfluoroalkyl group. Fluorosilanes useful for the invention have at least one hydrolysable group which reacts with the surface of an inorganic particle thereby creating a covalent bond between the fluorosilane and the inorganic particle. Fluorosilanes that are useful in the present invention
In another preferable embodiment, the surface modified inorganic oxide particles comprise at least one particle having a surface covalently bonded to a tertiary amine fluorosilane group such that in Formula (1):
a=1, x=0, and 1=0; and Z' is -N[-Q3-(Rf)]-;
said tertiary amine fluorosilane group represented by the formula:
Rf I
(L)3Si (CH2)n N-Q1 Rf wherein Q1 and Q3 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one -C(O)-O- and optionally further interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, -N(R')-C(O)-, -C(O)-N(R')-, -- N-(R')N-S(O)2-, and N=N
DETAILED DESCRIPTION OF THE INVENTION
The hydrophobized inorganic particles of the present invention can be made by covalently grafting fluorosilanes to their surface in order to impart to them both hydrophobic and oleophobic properties. The fluorosilanes used in the present invention have a divalent organic linking group which connects the silicon atom to a fluorine rich group such as a perfluoroalkyl group. Fluorosilanes useful for the invention have at least one hydrolysable group which reacts with the surface of an inorganic particle thereby creating a covalent bond between the fluorosilane and the inorganic particle. Fluorosilanes that are useful in the present invention
-8-
9 PCT/US2008/085612 are also known as fluoroalkyl silanes which are further described in U.S.
Patent Application 12/323,593 filed November 26, 2008 hereby incorporated by reference.
The hydrophobized inorganic particles of the present invention can be made by dispersing inorganic particles in a non-polar solvent (e.g.
toluene) and adding to this dispersion the desired fluorosilane. The dispersion is then heated to an elevated temperature (e.g. 80-100 C) for about 8-10 hours. The dispersion is then allowed to cool to ambient temperature (about 20 C). The dispersion is then placed in a centrifuge, the solvent is decanted, and the resulting inorganic particles are washed with fresh solvent. Washing is preferably done at least twice. The washed inorganic particles are then dried in an oven at elevated temperature (about 100-110 C). The resulting dried inorganic particles are the final product of the invention. However, the resulting dried inorganic particles can be re-dispersed in a non-polar solvent (e.g. toluene) and additional fluorosilane can be added to this dispersion by repeating the entire procedure described in this paragraph.
The procedure for making hydrophobized inorganic particles in the preceding paragraph is preferable and is known as the "convergent"
approach. Alternatively, some of the hydrophobized inorganic particles of the present invention can also be made via a "divergent" approach wherein "functionalized inorganic particles" are made by reacting untreated inorganic particles with a first precursor wherein the first precursor comprises a silicon atom bonded to at least one terminal hydrolysable group which reacts with the surface of the inorganic particle thereby creating a covalent bond between the first precursor and the inorganic particle. The first precursor further comprises a terminal reactive group (e.g. an amine or an isocyante derived from an amine or an isothiocyanate derived an amine) thereby creating functionalized inorganic particles having "anchors" which comprise the terminal reactive group.
These functionalized inorganic particles are then reacted with a second precursor wherein the second precursor comprises a corresponding reactive group (e.g. a terminal amine, an isocyante, an isothiocyanate, vinyl, sulfonyl chloride, or sulfonamide) capable of reacting with the terminal reactive group of the "anchors." The second precursor is also known herein by the term "capping agent." An example of a useful first precursor and second precursor combination is wherein the first precursor comprises a terminal amine group and the second precursor comprises a terminal isocyante, isothiocyanate, vinyl, sulfonyl chloride, or sulfonamide.
Inorganic particles useful to the invention include any inorganic particles that have reactive groups on the surface thereof wherein such groups are capable of reacting with the hydrolysable groups of the fluorosilanes (or precursors thereof) of the invention thereby creating a covalent bond between the inorganic particle and the fluorosilane (or precursor thereof). Particularly useful inorganic particles are oxides, such as oxides of silicon, titanium, zinc, zirconium, manganese, and aluminum.
As stated earlier, the "convergent" approach is preferable for making the hydrophobized inorganic particles of the invention.
Fluorosilanes useful in the convergent approach are represented by (L)3-Si-(CH2)n (Z1 )a [C(X1)]X (Z2),-Q'-Rf Formula 2 wherein:
each n is independently an integer from 1 to 12;
a, x, and I are integers chosen such that the moiety of Formula 2 represented by -(Z')a[C(X')]X (Z2),- further represents at least one of the following moieties:
i) a first moiety wherein a=1, x=1, and 1=1; and ii) a second moiety wherein a=1, x=0, and 1=0;
L is independently chosen from a hydrolysable or non-hydrolysable monovalent group Rf is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl can be optionally replaced by hydrogen,
Patent Application 12/323,593 filed November 26, 2008 hereby incorporated by reference.
The hydrophobized inorganic particles of the present invention can be made by dispersing inorganic particles in a non-polar solvent (e.g.
toluene) and adding to this dispersion the desired fluorosilane. The dispersion is then heated to an elevated temperature (e.g. 80-100 C) for about 8-10 hours. The dispersion is then allowed to cool to ambient temperature (about 20 C). The dispersion is then placed in a centrifuge, the solvent is decanted, and the resulting inorganic particles are washed with fresh solvent. Washing is preferably done at least twice. The washed inorganic particles are then dried in an oven at elevated temperature (about 100-110 C). The resulting dried inorganic particles are the final product of the invention. However, the resulting dried inorganic particles can be re-dispersed in a non-polar solvent (e.g. toluene) and additional fluorosilane can be added to this dispersion by repeating the entire procedure described in this paragraph.
The procedure for making hydrophobized inorganic particles in the preceding paragraph is preferable and is known as the "convergent"
approach. Alternatively, some of the hydrophobized inorganic particles of the present invention can also be made via a "divergent" approach wherein "functionalized inorganic particles" are made by reacting untreated inorganic particles with a first precursor wherein the first precursor comprises a silicon atom bonded to at least one terminal hydrolysable group which reacts with the surface of the inorganic particle thereby creating a covalent bond between the first precursor and the inorganic particle. The first precursor further comprises a terminal reactive group (e.g. an amine or an isocyante derived from an amine or an isothiocyanate derived an amine) thereby creating functionalized inorganic particles having "anchors" which comprise the terminal reactive group.
These functionalized inorganic particles are then reacted with a second precursor wherein the second precursor comprises a corresponding reactive group (e.g. a terminal amine, an isocyante, an isothiocyanate, vinyl, sulfonyl chloride, or sulfonamide) capable of reacting with the terminal reactive group of the "anchors." The second precursor is also known herein by the term "capping agent." An example of a useful first precursor and second precursor combination is wherein the first precursor comprises a terminal amine group and the second precursor comprises a terminal isocyante, isothiocyanate, vinyl, sulfonyl chloride, or sulfonamide.
Inorganic particles useful to the invention include any inorganic particles that have reactive groups on the surface thereof wherein such groups are capable of reacting with the hydrolysable groups of the fluorosilanes (or precursors thereof) of the invention thereby creating a covalent bond between the inorganic particle and the fluorosilane (or precursor thereof). Particularly useful inorganic particles are oxides, such as oxides of silicon, titanium, zinc, zirconium, manganese, and aluminum.
As stated earlier, the "convergent" approach is preferable for making the hydrophobized inorganic particles of the invention.
Fluorosilanes useful in the convergent approach are represented by (L)3-Si-(CH2)n (Z1 )a [C(X1)]X (Z2),-Q'-Rf Formula 2 wherein:
each n is independently an integer from 1 to 12;
a, x, and I are integers chosen such that the moiety of Formula 2 represented by -(Z')a[C(X')]X (Z2),- further represents at least one of the following moieties:
i) a first moiety wherein a=1, x=1, and 1=1; and ii) a second moiety wherein a=1, x=0, and 1=0;
L is independently chosen from a hydrolysable or non-hydrolysable monovalent group Rf is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl can be optionally replaced by hydrogen,
-10-and/or ii) the perfluoroalk can be optionally interrupted by at least one oxygen, methylene, or ethylene; Q is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group;
Q1 is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group;
X1 is chosen from 0 or S;
the first moiety further defined wherein Z1 and Z2 are chosen such that:
a) Z1 is -NH- and Z2 is from the group consisting of -NH-, -0-, -S-, -NH-S(O)2-, -N[C(O)H]-, -[HC(000H)(R1)]CH-S-, and -(RI)CH-[HC(COOH)]-S-;
b) alternatively, Z2 is -NH- and Z1 is from the group consisting of -0-, and -S-;
c) when Z1 or Z2 is 0, Q1 is interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, - N--NR1-S(O)2-, -N(CH)3S(O)2-, and N=N
d) each R1 is independently chosen from hydrogen, phenyl, or a monovalent C1-C8 alkyl optionally terminated by -C6H5, preferably H or CH3;
the second moiety further defined wherein:
a) Z1 is-N(-Q3-Rf; and b) Q1 and Q3 are independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one of -C(O)-O- or -0-C(O)-, and optionally further interrupted by at least one divalent organic group.
A preferred fluorosilane of Formula 2 is an isocyanate derived fluorosilane being a urea or thiourea fluorosilane wherein:
Z1 and Z2 are both -NH-;
Q1 is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group;
X1 is chosen from 0 or S;
the first moiety further defined wherein Z1 and Z2 are chosen such that:
a) Z1 is -NH- and Z2 is from the group consisting of -NH-, -0-, -S-, -NH-S(O)2-, -N[C(O)H]-, -[HC(000H)(R1)]CH-S-, and -(RI)CH-[HC(COOH)]-S-;
b) alternatively, Z2 is -NH- and Z1 is from the group consisting of -0-, and -S-;
c) when Z1 or Z2 is 0, Q1 is interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, - N--NR1-S(O)2-, -N(CH)3S(O)2-, and N=N
d) each R1 is independently chosen from hydrogen, phenyl, or a monovalent C1-C8 alkyl optionally terminated by -C6H5, preferably H or CH3;
the second moiety further defined wherein:
a) Z1 is-N(-Q3-Rf; and b) Q1 and Q3 are independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one of -C(O)-O- or -0-C(O)-, and optionally further interrupted by at least one divalent organic group.
A preferred fluorosilane of Formula 2 is an isocyanate derived fluorosilane being a urea or thiourea fluorosilane wherein:
Z1 and Z2 are both -NH-;
-11 -said urea or thiourea represented by the formula:
(L)3Si-(CH2)n-N H-C(X1)-N H-Q1-Rf wherein:
X1 is 0 to form a urea fluorosilane, or X1 is S to form a thiourea fluorosilane; and Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(0)2-, and -0-C(O)-NH -.
A preferred urea or thiourea fluorosilane is one wherein Rf is chosen from a C2-C12 perfluoroalkyl and Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, and -0-C(O)-NH -.
A preferred urea or thiourea fluorosilane is one wherein Rf is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl is replaced by hydrogen, and/or ii) the perfluoroalkyl is interrupted by at least one oxygen, methylene, or ethylene; Q is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group.
Another preferred isocyanate derived fluorosilane of Formula 2 is a carbamate fluorosilane wherein:
Z1 is -NH- and Z2 is -0-, or Z1 is -0- and Z2 is -NH-; and X1 is 0;
said carbamate represented by the formulae:
(L)3Si-(CH2)n NH-C(O)-O-Q1-Rf, or (L)3Si-(CH2)n O-C(O)-NH-Q1-Rf wherein:
(L)3Si-(CH2)n-N H-C(X1)-N H-Q1-Rf wherein:
X1 is 0 to form a urea fluorosilane, or X1 is S to form a thiourea fluorosilane; and Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(0)2-, and -0-C(O)-NH -.
A preferred urea or thiourea fluorosilane is one wherein Rf is chosen from a C2-C12 perfluoroalkyl and Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, and -0-C(O)-NH -.
A preferred urea or thiourea fluorosilane is one wherein Rf is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl is replaced by hydrogen, and/or ii) the perfluoroalkyl is interrupted by at least one oxygen, methylene, or ethylene; Q is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group.
Another preferred isocyanate derived fluorosilane of Formula 2 is a carbamate fluorosilane wherein:
Z1 is -NH- and Z2 is -0-, or Z1 is -0- and Z2 is -NH-; and X1 is 0;
said carbamate represented by the formulae:
(L)3Si-(CH2)n NH-C(O)-O-Q1-Rf, or (L)3Si-(CH2)n O-C(O)-NH-Q1-Rf wherein:
-12-Q1 is a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -NH-C(O)-NH-, -NH-C(S)-N-NH-, -5-, -S(O)-, -S(O)2-, -(R')N-S(O)2-, N=N
A preferred carbamate fluorosilane is one wherein Rf is chosen from a C2-C12 perfluoroalkyl and Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, and -O-C(O)-NH -.
A preferred carbamate fluorosilane is one wherein Rf is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl is replaced by hydrogen, and/or ii) the perfluoroalkyl is interrupted by at least one oxygen, methylene, or ethylene; Q is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group.
Another preferred isocyanate derived fluorosilane of Formula 2 is a thiolcarbamate fluorosilane wherein:
Z' is -NH- and Z2 is -5-, or Z' is -S- and Z2 is-NH-; and X1 is 0;
said carbamate represented by the formulae:
(L)3Si-(CH2)n NH-C(O)-S-Q'-Rf or (L)3Si-(CH2)n S-C(O)-NH-Q'-Rf wherein:
Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, -N(R')-C(O)-, N--C(O)-N(R')-, -(R')N-S(O)2-, and N=N
A preferred carbamate fluorosilane is one wherein Rf is chosen from a C2-C12 perfluoroalkyl and Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, and -O-C(O)-NH -.
A preferred carbamate fluorosilane is one wherein Rf is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl is replaced by hydrogen, and/or ii) the perfluoroalkyl is interrupted by at least one oxygen, methylene, or ethylene; Q is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group.
Another preferred isocyanate derived fluorosilane of Formula 2 is a thiolcarbamate fluorosilane wherein:
Z' is -NH- and Z2 is -5-, or Z' is -S- and Z2 is-NH-; and X1 is 0;
said carbamate represented by the formulae:
(L)3Si-(CH2)n NH-C(O)-S-Q'-Rf or (L)3Si-(CH2)n S-C(O)-NH-Q'-Rf wherein:
Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, -N(R')-C(O)-, N--C(O)-N(R')-, -(R')N-S(O)2-, and N=N
-13-A preferred thiolcarbamate fluorosilane is one wherein Rf is chosen from a C2-C12 perfluoroalkyl and Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, and -O-C(O)-NH -.
A preferred thiolcarbamate fluorosilane is one wherein Rf is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl is replaced by hydrogen, and/or ii) the perfluoroalkyl is interrupted by at least one oxygen, methylene, or ethylene; Q is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group.
Another preferred isocyanate derived fluorosilane of Formula 2 is a N-sulfone urea fluorosilane wherein:
Z1 is -NH-, and Z2 is -NH-S(0)2-; and X1 is 0;
said N-sulfone urea represented by the formula:
(L)3Si-(CH2)n-N H-C(O)-N H-S(O)2-Q1-Rf wherein:
Q1 is independently chosen from the group consisting of an uninterrupted C2-C12 hydrocarbylene.
Another preferred isocyanate derived fluorosilane of Formula 2 is a N-formyl urea fluorosilane wherein:
a=1, x=1, and 1=1; and Z1 is -NH-, and Z2 is -N[C(O)H]-;
said N-formyl urea represented by the formula:
(L)3Si-(CH2)n-NH-C(X1)-N[C(O)H]-Q1-Rf wherein:
A preferred thiolcarbamate fluorosilane is one wherein Rf is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl is replaced by hydrogen, and/or ii) the perfluoroalkyl is interrupted by at least one oxygen, methylene, or ethylene; Q is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group.
Another preferred isocyanate derived fluorosilane of Formula 2 is a N-sulfone urea fluorosilane wherein:
Z1 is -NH-, and Z2 is -NH-S(0)2-; and X1 is 0;
said N-sulfone urea represented by the formula:
(L)3Si-(CH2)n-N H-C(O)-N H-S(O)2-Q1-Rf wherein:
Q1 is independently chosen from the group consisting of an uninterrupted C2-C12 hydrocarbylene.
Another preferred isocyanate derived fluorosilane of Formula 2 is a N-formyl urea fluorosilane wherein:
a=1, x=1, and 1=1; and Z1 is -NH-, and Z2 is -N[C(O)H]-;
said N-formyl urea represented by the formula:
(L)3Si-(CH2)n-NH-C(X1)-N[C(O)H]-Q1-Rf wherein:
-14-Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -S- and -NH-.
Another preferred fluorosilane of Formula 2 is a thioether succinamic acid fluorosilane wherein:
a=1, x=1, and 1=1;
Z' is -NH- and Z2 is -[HC(COOH)(R')]CH-S- or -(R' )CH-[HC(COOH)]-S-;
X1 is 0; and Q1 is -(CH2)2-said thioether succinamic acid represented by the formulae:
(L)3Si-(CH2)n-NH-C(O)-[H C(COOH)(R')]CR'-(CH2)m S-(CH2)2-Rf, or (L)3Si-(CH2)n-NH-C(O)-(R' )CH-[CR' (COO H)]-(CH2)mS-(CH2)2-Rf wherein m is 1 or 0, preferably 0, wherein each R1 is independently chosen from methyl or hydrogen preferably H.
Another preferred fluorosilane of Formula 2 is a tertiary amine fluorosilane wherein:
a=1, x=0, and 1=0; and Z' is -N[-Q3-(Rf)]-;
said tertiary amine represented by the formula:
Rf I
(L)3Si (CH2)n N-Q1 Rf Q1 and Q3 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one -C(O)-O- and optionally further interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(0)2-, -N(R')-C(O)-, -C(O)-N(R')-, -^N-(R')N-S(O)2-, and N=N
Another preferred fluorosilane of Formula 2 is a thioether succinamic acid fluorosilane wherein:
a=1, x=1, and 1=1;
Z' is -NH- and Z2 is -[HC(COOH)(R')]CH-S- or -(R' )CH-[HC(COOH)]-S-;
X1 is 0; and Q1 is -(CH2)2-said thioether succinamic acid represented by the formulae:
(L)3Si-(CH2)n-NH-C(O)-[H C(COOH)(R')]CR'-(CH2)m S-(CH2)2-Rf, or (L)3Si-(CH2)n-NH-C(O)-(R' )CH-[CR' (COO H)]-(CH2)mS-(CH2)2-Rf wherein m is 1 or 0, preferably 0, wherein each R1 is independently chosen from methyl or hydrogen preferably H.
Another preferred fluorosilane of Formula 2 is a tertiary amine fluorosilane wherein:
a=1, x=0, and 1=0; and Z' is -N[-Q3-(Rf)]-;
said tertiary amine represented by the formula:
Rf I
(L)3Si (CH2)n N-Q1 Rf Q1 and Q3 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one -C(O)-O- and optionally further interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(0)2-, -N(R')-C(O)-, -C(O)-N(R')-, -^N-(R')N-S(O)2-, and N=N
-15-EXAMPLES
The following inorganic particles were used as indicated in the examples below.
Table 1 Name of Description of Inorganic Oxide Inorganic Oxide Si02#1 Silica having a primary particle size of about 12 nm obtained as AEROSIL 200 from Degussa AG now Evonik De ussa Industries AG.
ZnO #1 Zinc oxide nanopowder having a primary particle size of about 50-70 nm obtained from Sigma-Aldrich Corporation TiSiO4 #1 Silica coated titanium oxide nanopowder having a primary particle size of about 100 nm from Sigma-Aldrich Corporation.
Si02 #2 Silica having a primary particle size of about 7 nm obtained as AEROSIL 300 from Degussa AG now Evonik De ussa Industries AG.
Si02#3 Silica having a primary particle size of about 20 nm obtained as AEROSIL 90 from Degussa AG now Evonik De ussa Industries AG.
Si02 #4 Silica having a primary particle size of about 40 nm obtained as OX50 from Degussa AG now Evonik Degussa Industries AG.
Si02#5 Silica having an average particle size of about 11000 nm obtained as SPHERICEL 110P8 from Potters Industries Inc.
Si02#6 Silica having an average particle size of about 7000 nm obtained as SPHERIGLASS 5000 from Potters Industries Inc.
The following fluorosilanes were used as indicated in the examples below.
The following inorganic particles were used as indicated in the examples below.
Table 1 Name of Description of Inorganic Oxide Inorganic Oxide Si02#1 Silica having a primary particle size of about 12 nm obtained as AEROSIL 200 from Degussa AG now Evonik De ussa Industries AG.
ZnO #1 Zinc oxide nanopowder having a primary particle size of about 50-70 nm obtained from Sigma-Aldrich Corporation TiSiO4 #1 Silica coated titanium oxide nanopowder having a primary particle size of about 100 nm from Sigma-Aldrich Corporation.
Si02 #2 Silica having a primary particle size of about 7 nm obtained as AEROSIL 300 from Degussa AG now Evonik De ussa Industries AG.
Si02#3 Silica having a primary particle size of about 20 nm obtained as AEROSIL 90 from Degussa AG now Evonik De ussa Industries AG.
Si02 #4 Silica having a primary particle size of about 40 nm obtained as OX50 from Degussa AG now Evonik Degussa Industries AG.
Si02#5 Silica having an average particle size of about 11000 nm obtained as SPHERICEL 110P8 from Potters Industries Inc.
Si02#6 Silica having an average particle size of about 7000 nm obtained as SPHERIGLASS 5000 from Potters Industries Inc.
The following fluorosilanes were used as indicated in the examples below.
-16-Table 2 Name Description of Fluorosilane of Fluoro-silane FS #A (CH3O)3Si-(CH2)2-(CF2)5-CF3 FS #B (CH3O)3Si-(CH2)2-(CF2)7-CF3 FS #C (CH3O)3Si-(CH2)3-C6F5 FS #1 (CH3O)3Si-(CH2)3-NH-C(O)-N H-(CH2)2-S-(CH2)2-(CF2)5-Convergent Fluorosilane Single Grafting The term "convergent fluorosilane single grafting" as used throughout the examples refers to the following procedure. About 125 g of a chosen inorganic oxide was placed in a 3 liter round bottom flask equipped with a mechanical stirrer and under nitrogen atmosphere. The stirred mixture was heated to about 50 C for about 2 hours in order to achieve a homogeneous dispersion. 25 g of a chosen fluorinated silane was then quickly added to the stirred mixture followed by nitrogen sparging for 30 minutes. The reaction mixture temperature was then raised to 75 C and stirred for about 15 hours under a nitrogen atmosphere. After this allotted reaction time period, the reaction mixture was cooled and centrifuged in portions at 3000 rpm for about 2 minutes.
Excess hydrocarbon solvent was decanted and the remaining fluorine grafted fumed inorganic oxide product were washed 3 times with ethanol and centrifuged followed by drying in a vacuum oven at 110 C for about 12 hours.
Convergent Fluorosilane Double Grafting The term "convergent fluorosilane double grafting" as used throughout the examples refers to a procedure identical to "convergent fluorosilane single grafting" with the following additional steps. About 125 g the inorganic oxide product obtained after a convergent fluorosilane double grafting was placed in a 3 liter round bottom flask equipped with a
Excess hydrocarbon solvent was decanted and the remaining fluorine grafted fumed inorganic oxide product were washed 3 times with ethanol and centrifuged followed by drying in a vacuum oven at 110 C for about 12 hours.
Convergent Fluorosilane Double Grafting The term "convergent fluorosilane double grafting" as used throughout the examples refers to a procedure identical to "convergent fluorosilane single grafting" with the following additional steps. About 125 g the inorganic oxide product obtained after a convergent fluorosilane double grafting was placed in a 3 liter round bottom flask equipped with a
-17-mechanical stirrer and under nitrogen atmosphere. The stirred mixture was heated to about 50 C for about 2 hours in order to achieve a homogeneous dispersion. 25 g of the same fluorinated silane used in the convergent fluorosilane single grafting was then quickly added to the stirred mixture followed by nitrogen sparging for 30 minutes. The reaction mixture temperature was then raised to 75 C and stirred for about 15 hours under a nitrogen atmosphere. After the allotted reaction time period, the reaction mixture was cooled and centrifuged in portions at 3000 rpm for about 2 minutes. Excess hydrocarbon solvent was decanted and the remaining fluorine double grafted fumed inorganic oxide product were washed 3 times with ethanol and centrifuged followed by drying in a vacuum oven at 110 C for about 12 hours.
Thin Film Casting The term "thin film casting" as used throughout the examples refers to the following procedure. About 5 wt. % of chosen hydrophobized inorganic particles or untreated inorganic particles were dispersed in isopropanol. A thin film was made by casting three layers of this solution onto a clean glass slides wherein the slide were allowed to dry for about 10 minutes at 60 C after each casting thereby creating a homogenous coating of particles on the glass slides.
Advancing Water Contact Angle Measurement ("H20 Adv.") The terms "advancing water contact angle" or "H20 Adv." refer to the results of a measurement conducted using a Rame-Hart Standard Automated Goniometer Model 200 employing DROP image standard software and equipped with an automated dispensing system with 250 pl syringe, having an illuminated specimen stage assembly. A sample was glued to a glass slide using double-sided tape. The goniometer, which is connected through an interface to a computer with computer screen, had an integral eye piece connected to a camera having both horizontal axis line indicator and an adjustable rotating cross line and angle scale, both
Thin Film Casting The term "thin film casting" as used throughout the examples refers to the following procedure. About 5 wt. % of chosen hydrophobized inorganic particles or untreated inorganic particles were dispersed in isopropanol. A thin film was made by casting three layers of this solution onto a clean glass slides wherein the slide were allowed to dry for about 10 minutes at 60 C after each casting thereby creating a homogenous coating of particles on the glass slides.
Advancing Water Contact Angle Measurement ("H20 Adv.") The terms "advancing water contact angle" or "H20 Adv." refer to the results of a measurement conducted using a Rame-Hart Standard Automated Goniometer Model 200 employing DROP image standard software and equipped with an automated dispensing system with 250 pl syringe, having an illuminated specimen stage assembly. A sample was glued to a glass slide using double-sided tape. The goniometer, which is connected through an interface to a computer with computer screen, had an integral eye piece connected to a camera having both horizontal axis line indicator and an adjustable rotating cross line and angle scale, both
-18-independently adjustable by separate verniers. The syringe used were carefully cleaned with alcohol and allowed to dry completely before use.
Prior to contact angle measurement, the sample on the glass slide was clamped into place and the vertical vernier adjusted to align the horizontal line (axis) of the eye piece coincident to the horizontal plane of the sample, and the horizontal position of the stage relative to the eye piece positioned so as to view one side of the test fluid droplet interface region at the sample interface.
To determine the contact angle of the test fluid on the sample, approximately one drop of test fluid was dispensed onto the sample using a small syringe fitted with a stainless steel needle and a micrometer drive screw to displace a calibrated amount of the test fluid, which was deionized water.
Horizontal and cross lines were adjusted via the software in the Model 200 after leveling the sample via stage adjustment, and the computer calculated the contact angle based upon modeling the drop appearance. Alternatively, immediately upon dispensing the test fluid, the rotatable vernier was adjusted to align the cross line and cross position, that is the intersection of the rotatable cross line and the fixed horizontal line, coincident with the edge of the test fluid droplet and the sample, and the cross line angle (rotation) then positioned coincident with the tangent to the edge of the test droplet surface, as imaged by the eye piece. The contact angle was then read from the angle scale, which was equivalent to the tangent angle.
Contact angle was measured after the droplet has been added to a surface.
Receding Water Contact Angle Measurement ("H20 Rec.") The terms "receding water contact angle" or "H20 Rec." refer to the results of a measurement identical to the advancing water contact angle measurement described above except contact angle was measured after the droplet was partially withdrawn from a surface.
Prior to contact angle measurement, the sample on the glass slide was clamped into place and the vertical vernier adjusted to align the horizontal line (axis) of the eye piece coincident to the horizontal plane of the sample, and the horizontal position of the stage relative to the eye piece positioned so as to view one side of the test fluid droplet interface region at the sample interface.
To determine the contact angle of the test fluid on the sample, approximately one drop of test fluid was dispensed onto the sample using a small syringe fitted with a stainless steel needle and a micrometer drive screw to displace a calibrated amount of the test fluid, which was deionized water.
Horizontal and cross lines were adjusted via the software in the Model 200 after leveling the sample via stage adjustment, and the computer calculated the contact angle based upon modeling the drop appearance. Alternatively, immediately upon dispensing the test fluid, the rotatable vernier was adjusted to align the cross line and cross position, that is the intersection of the rotatable cross line and the fixed horizontal line, coincident with the edge of the test fluid droplet and the sample, and the cross line angle (rotation) then positioned coincident with the tangent to the edge of the test droplet surface, as imaged by the eye piece. The contact angle was then read from the angle scale, which was equivalent to the tangent angle.
Contact angle was measured after the droplet has been added to a surface.
Receding Water Contact Angle Measurement ("H20 Rec.") The terms "receding water contact angle" or "H20 Rec." refer to the results of a measurement identical to the advancing water contact angle measurement described above except contact angle was measured after the droplet was partially withdrawn from a surface.
-19-Advancing Oil Contact Angle Measurement ("C,6 H12 Adv.") The terms "advancing oil contact angle" or "C16H12 Adv." refer to the results of a measurement identical to the advancing water contact angle measurement described above except hexadecane was used as the test liquid instead of water.
Receding Oil Contact Angle Measurement ("C16H12 Rec.") The terms "receding oil contact angle" or "C16H12 Rec." refer to the results of a measurement identical to the advancing oil contact angle measurement described above except contact angle was measured after the droplet was partially withdrawn from a surface.
Evaluation of Contact Angle Higher advancing and/or receding water contact angle measurements indicated higher water repellency while lower water contact angles measurements indicated lower water repellency. Cases where no water contact angle could be measured indicate wetting and very poor water repellency. Higher advancing and/or receding oil contact angle measurements indicated higher oil repellency while lower oil contact angles measurements indicated lower oil repellency. Cases where no oil contact angle could be measured indicate wetting and very poor oil repellency. A surface is said to be "super hydrophobic" in cases where the advancing water contact angle and receding water contact angle was greater than about 150 degrees and the hysteresis (difference between advancing and receding water contact angle) is less than about 10 degrees. A surface is said to be "super oleophobic" in cases where the advancing oil contact angle and receding oil contact angle was greater than about 150 degrees and the hysteresis (difference between advancing and receding oil contact angle) is less than about 10 degrees. A surface that is both super hydrophobic and super oleophobic is said to be "super amphiophobic."
Receding Oil Contact Angle Measurement ("C16H12 Rec.") The terms "receding oil contact angle" or "C16H12 Rec." refer to the results of a measurement identical to the advancing oil contact angle measurement described above except contact angle was measured after the droplet was partially withdrawn from a surface.
Evaluation of Contact Angle Higher advancing and/or receding water contact angle measurements indicated higher water repellency while lower water contact angles measurements indicated lower water repellency. Cases where no water contact angle could be measured indicate wetting and very poor water repellency. Higher advancing and/or receding oil contact angle measurements indicated higher oil repellency while lower oil contact angles measurements indicated lower oil repellency. Cases where no oil contact angle could be measured indicate wetting and very poor oil repellency. A surface is said to be "super hydrophobic" in cases where the advancing water contact angle and receding water contact angle was greater than about 150 degrees and the hysteresis (difference between advancing and receding water contact angle) is less than about 10 degrees. A surface is said to be "super oleophobic" in cases where the advancing oil contact angle and receding oil contact angle was greater than about 150 degrees and the hysteresis (difference between advancing and receding oil contact angle) is less than about 10 degrees. A surface that is both super hydrophobic and super oleophobic is said to be "super amphiophobic."
-20-Weight Percent Fluorine Measurement The percent fluorine in any given hydrophobized particle was determined by the Wickbold Torch method and are shown in the tables below under a column labeled "%F."
Untreated Control Example Using thin film casting, eight films were made respectively from Si02 #1, ZnO #1, TiSiO4 #1, Si02 #2, Si02 #3, Si02 #4, Si02 #5, Si02 #6.
The water and oil contact angles (advancing and receding) were measured for each of these eight films. In all eight cases, no water or oil contact angles could be measured which indicated wetting and very poor water and oil repellency.
Comparative Example A
Convergent fluorosilane single grafting was conducted wherein the chosen inorganic oxide was Si02 #1 and the chosen fluorosilane was FS
#A resulting in hydrophobized particles. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Comparative Example B
Convergent fluorosilane single grafting was conducted wherein the chosen inorganic oxide was Si02 #1 and the chosen fluorosilane was FS
#B. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Comparative Example C
Convergent fluorosilane single grafting was conducted wherein the chosen inorganic oxide was Si02 #1 and the chosen fluorosilane was FS
Untreated Control Example Using thin film casting, eight films were made respectively from Si02 #1, ZnO #1, TiSiO4 #1, Si02 #2, Si02 #3, Si02 #4, Si02 #5, Si02 #6.
The water and oil contact angles (advancing and receding) were measured for each of these eight films. In all eight cases, no water or oil contact angles could be measured which indicated wetting and very poor water and oil repellency.
Comparative Example A
Convergent fluorosilane single grafting was conducted wherein the chosen inorganic oxide was Si02 #1 and the chosen fluorosilane was FS
#A resulting in hydrophobized particles. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Comparative Example B
Convergent fluorosilane single grafting was conducted wherein the chosen inorganic oxide was Si02 #1 and the chosen fluorosilane was FS
#B. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Comparative Example C
Convergent fluorosilane single grafting was conducted wherein the chosen inorganic oxide was Si02 #1 and the chosen fluorosilane was FS
-21 -#C. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Example 1 Convergent fluorosilane single grafting was conducted wherein the chosen inorganic oxide was Si02 #1 and the chosen fluorosilane was FS
#1. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Example 2 Convergent fluorosilane single grafting was conducted wherein the chosen inorganic oxide was ZnO #1 and the chosen fluorosilane was FS
#1. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Example 3 Convergent fluorosilane single grafting was conducted wherein the chosen inorganic oxide was TiSiO4 #1 and the chosen fluorosilane was FS
#1. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Comparative Example D
Convergent fluorosilane double grafting was conducted wherein the chosen inorganic oxide was Si02 #1 and the chosen fluorosilane was FS
#A resulting in hydrophobized particles. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Example 1 Convergent fluorosilane single grafting was conducted wherein the chosen inorganic oxide was Si02 #1 and the chosen fluorosilane was FS
#1. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Example 2 Convergent fluorosilane single grafting was conducted wherein the chosen inorganic oxide was ZnO #1 and the chosen fluorosilane was FS
#1. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Example 3 Convergent fluorosilane single grafting was conducted wherein the chosen inorganic oxide was TiSiO4 #1 and the chosen fluorosilane was FS
#1. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Comparative Example D
Convergent fluorosilane double grafting was conducted wherein the chosen inorganic oxide was Si02 #1 and the chosen fluorosilane was FS
#A resulting in hydrophobized particles. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
-22-Comparative Example E
Convergent fluorosilane double grafting was conducted wherein the chosen inorganic oxide was Si02 #1 and the chosen fluorosilane was FS
#B. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Comparative Example F
Convergent fluorosilane double grafting was conducted wherein the chosen inorganic oxide was Si02 #1 and the chosen fluorosilane was FS
#C. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Example 4 Convergent fluorosilane double grafting was conducted wherein the chosen inorganic oxide was Si02 #1 and the chosen fluorosilane was FS
#1. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Example 5 Convergent fluorosilane double grafting was conducted wherein the chosen inorganic oxide was ZnO #1 and the chosen fluorosilane was FS
#1. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Example 6 Convergent fluorosilane double grafting was conducted wherein the chosen inorganic oxide was TiSiO4 #1 and the chosen fluorosilane was FS
Convergent fluorosilane double grafting was conducted wherein the chosen inorganic oxide was Si02 #1 and the chosen fluorosilane was FS
#B. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Comparative Example F
Convergent fluorosilane double grafting was conducted wherein the chosen inorganic oxide was Si02 #1 and the chosen fluorosilane was FS
#C. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Example 4 Convergent fluorosilane double grafting was conducted wherein the chosen inorganic oxide was Si02 #1 and the chosen fluorosilane was FS
#1. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Example 5 Convergent fluorosilane double grafting was conducted wherein the chosen inorganic oxide was ZnO #1 and the chosen fluorosilane was FS
#1. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Example 6 Convergent fluorosilane double grafting was conducted wherein the chosen inorganic oxide was TiSiO4 #1 and the chosen fluorosilane was FS
-23-#1. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 3.
Table 3 Inorganic Contact Angle Measurements Example Oxide %F Fluorosilane Particle H2O H2O C16H12 C16H12 Adv. Rec. Adv. Rec.
A Si02#1 4.49 FS #A 145 126 * *
B Si02#1 6.71 FS #B 159 156 * *
0) E- C Si02#1 2.87 FS #C 149 129 * *
0)$
1 Si02 #1 13.6 FS #1 81 80 105 92 2 ZnO #1 3.09 FS #1 124 107 80 62 3 TiSiO4 #1 18.0 FS #1 160 157 D Si02#1 5.51 FS #A 153 149 * *
0) E Si02#1 12.8 FS #13 158 155 * *
Z 4 Si02 #1 22.1 FS #1 160 158 155 150 o Co -0 0) 5 ZnO #1 5.75 FS #1 161 161 98 72 6 TiSiO4 #1 11.2 FS #1 161 161 154 149 * indicates contact angle could not be measure because of wetting In reference to Table 3 above, the fluorosilane used in Comparative Examples A-E is a fluorosilane wherein the silicon atom is directly bonded to a perfluoroalkyl group. In contrast, that the fluorosilane used in Examples 1-6 is a fluorosilane wherein the silicon atom is first bonded to a divalent organic linking group, represented by -NH-C(O)-NH-(CH2)2-S-(CH2)2-, which in turn is bonded to a perfluoroalkyl group. As shown by comparing the contact angle measurements of Example 1 to Comparative Examples A-C, without the incorporation of a divalent organic linking group it was only possible to achieve adequate water repellency but impossible to also achieve adequate oil repellency. The incorporation of a divalent organic linking group in Example 1 results in adequate water repellency as well as adequate oil repellency. Even when double grafting is performed such as in Comparative Examples D-E, without the incorporation of a
Table 3 Inorganic Contact Angle Measurements Example Oxide %F Fluorosilane Particle H2O H2O C16H12 C16H12 Adv. Rec. Adv. Rec.
A Si02#1 4.49 FS #A 145 126 * *
B Si02#1 6.71 FS #B 159 156 * *
0) E- C Si02#1 2.87 FS #C 149 129 * *
0)$
1 Si02 #1 13.6 FS #1 81 80 105 92 2 ZnO #1 3.09 FS #1 124 107 80 62 3 TiSiO4 #1 18.0 FS #1 160 157 D Si02#1 5.51 FS #A 153 149 * *
0) E Si02#1 12.8 FS #13 158 155 * *
Z 4 Si02 #1 22.1 FS #1 160 158 155 150 o Co -0 0) 5 ZnO #1 5.75 FS #1 161 161 98 72 6 TiSiO4 #1 11.2 FS #1 161 161 154 149 * indicates contact angle could not be measure because of wetting In reference to Table 3 above, the fluorosilane used in Comparative Examples A-E is a fluorosilane wherein the silicon atom is directly bonded to a perfluoroalkyl group. In contrast, that the fluorosilane used in Examples 1-6 is a fluorosilane wherein the silicon atom is first bonded to a divalent organic linking group, represented by -NH-C(O)-NH-(CH2)2-S-(CH2)2-, which in turn is bonded to a perfluoroalkyl group. As shown by comparing the contact angle measurements of Example 1 to Comparative Examples A-C, without the incorporation of a divalent organic linking group it was only possible to achieve adequate water repellency but impossible to also achieve adequate oil repellency. The incorporation of a divalent organic linking group in Example 1 results in adequate water repellency as well as adequate oil repellency. Even when double grafting is performed such as in Comparative Examples D-E, without the incorporation of a
-24-divalent organic linking group it was only possible to achieve adequate water repellency but impossible to also achieve adequate oil repellency.
Table 3 also shows that double grafting improves oil repellency over single grafting as evidenced by comparing: Example 1 to Example 4; Example 2 to Example 5; and Example 3 to Example 6.
Divergent Synthesis - Single Functionalization The term "single functionalization" as used throughout the examples refers to the following procedure. About 125 g of a chosen inorganic oxide was placed in a 3 liter round bottom flask equipped with a mechanical stirrer and under nitrogen atmosphere. The stirred mixture was heated to about 50 C for about 2 hours in order to achieve a homogeneous dispersion. 25 g of a first precursor, (CH3O)35i-(CH2)3-NH2 (commercially available as AMMO from Degussa AG), was then quickly added to the stirred mixture followed by nitrogen sparging for 30 minutes. The reaction mixture temperature was then raised to 75 C and stirred for about 15 hours. After the allotted reaction time period, the reaction mixture was cooled and centrifuged in portions at 3000 rpm for about 2 minutes. Excess hydrocarbon solvent was decanted and the remaining fluorine grafted fumed inorganic oxide product were washed 3 times with ethanol and centrifuged followed by drying in a vacuum oven at 110 C for about 12 hours. All of the above steps were preformed in a nitrogen atmosphere.
Divergent Synthesis - Double Functionalization The term "double functionalization" as used throughout the examples refers to a procedure identical to "single functionalization" with the following additional steps. About 125 g of the inorganic oxide product obtained after single functionalization was placed in a 3 liter round bottom flask equipped with a mechanical stirrer and under nitrogen atmosphere.
The stirred mixture was heated to about 50 C for about 2 hours in order to achieve a homogeneous dispersion. 25 g of the first precursor,
Table 3 also shows that double grafting improves oil repellency over single grafting as evidenced by comparing: Example 1 to Example 4; Example 2 to Example 5; and Example 3 to Example 6.
Divergent Synthesis - Single Functionalization The term "single functionalization" as used throughout the examples refers to the following procedure. About 125 g of a chosen inorganic oxide was placed in a 3 liter round bottom flask equipped with a mechanical stirrer and under nitrogen atmosphere. The stirred mixture was heated to about 50 C for about 2 hours in order to achieve a homogeneous dispersion. 25 g of a first precursor, (CH3O)35i-(CH2)3-NH2 (commercially available as AMMO from Degussa AG), was then quickly added to the stirred mixture followed by nitrogen sparging for 30 minutes. The reaction mixture temperature was then raised to 75 C and stirred for about 15 hours. After the allotted reaction time period, the reaction mixture was cooled and centrifuged in portions at 3000 rpm for about 2 minutes. Excess hydrocarbon solvent was decanted and the remaining fluorine grafted fumed inorganic oxide product were washed 3 times with ethanol and centrifuged followed by drying in a vacuum oven at 110 C for about 12 hours. All of the above steps were preformed in a nitrogen atmosphere.
Divergent Synthesis - Double Functionalization The term "double functionalization" as used throughout the examples refers to a procedure identical to "single functionalization" with the following additional steps. About 125 g of the inorganic oxide product obtained after single functionalization was placed in a 3 liter round bottom flask equipped with a mechanical stirrer and under nitrogen atmosphere.
The stirred mixture was heated to about 50 C for about 2 hours in order to achieve a homogeneous dispersion. 25 g of the first precursor,
-25-(CH3O)3Si-(CH2)3-NH2 (commercially available as AMMO from Degussa AG), was then quickly added to the stirred mixture followed by nitrogen sparging for 30 minutes. The reaction mixture temperature was then raised to 75 C and stirred for about 15 hours. After the allotted reaction time period, the reaction mixture was cooled and centrifuged in portions at 3000 rpm for about 2 minutes. Excess hydrocarbon solvent was decanted and the remaining fluorine double grafted fumed inorganic oxide product were washed 3 times with ethanol and centrifuged followed by drying in a vacuum oven at 110 C for about 12 hours. All of the above steps were preformed in a nitrogen atmosphere.
Comparative Example F
Single functionalization was conducted wherein the chosen inorganic oxide was Si02 #2 resulting in treated particles. A film sample was made by thin film casting using these treated particles. Contact angle measurements were conducted on this film sample and are shown in Table 4.
Comparative Example G
Single functionalization was conducted wherein the chosen inorganic oxide was Si02 #1 resulting in treated particles. A film sample was made by thin film casting using these treated particles. Contact angle measurements were conducted on this film sample and are shown in Table 4.
Comparative Example H
Single functionalization was conducted wherein the chosen inorganic oxide was Si02 #3 resulting in treated particles. A film sample was made by thin film casting using these treated particles. Contact angle measurements were conducted on this film sample and are shown in Table 4.
Comparative Example F
Single functionalization was conducted wherein the chosen inorganic oxide was Si02 #2 resulting in treated particles. A film sample was made by thin film casting using these treated particles. Contact angle measurements were conducted on this film sample and are shown in Table 4.
Comparative Example G
Single functionalization was conducted wherein the chosen inorganic oxide was Si02 #1 resulting in treated particles. A film sample was made by thin film casting using these treated particles. Contact angle measurements were conducted on this film sample and are shown in Table 4.
Comparative Example H
Single functionalization was conducted wherein the chosen inorganic oxide was Si02 #3 resulting in treated particles. A film sample was made by thin film casting using these treated particles. Contact angle measurements were conducted on this film sample and are shown in Table 4.
-26-Comparative Example I
Single functionalization was conducted wherein the chosen inorganic oxide was Si02 #4 resulting in treated particles. A film sample was made by thin film casting using these treated particles. Contact angle measurements were conducted on this film sample and are shown in Table 4.
Comparative Example J
Single functionalization was conducted wherein the chosen inorganic oxide was Si02 #5 resulting in treated particles. A film sample was made by thin film casting using these treated particles. Contact angle measurements were conducted on this film sample and are shown in Table 4.
Comparative Example K
Double functionalization was conducted wherein the chosen inorganic oxide was Si02 #6 resulting in treated particles. A film sample was made by thin film casting using these treated particles. Contact angle measurements were conducted on this film sample and are shown in Table 4.
Comparative Example L
Double functionalization was conducted wherein the chosen inorganic oxide was Si02 #1 resulting in treated particles. A film sample was made by thin film casting using these treated particles. Contact angle measurements were conducted on this film sample and are shown in Table 4.
Single functionalization was conducted wherein the chosen inorganic oxide was Si02 #4 resulting in treated particles. A film sample was made by thin film casting using these treated particles. Contact angle measurements were conducted on this film sample and are shown in Table 4.
Comparative Example J
Single functionalization was conducted wherein the chosen inorganic oxide was Si02 #5 resulting in treated particles. A film sample was made by thin film casting using these treated particles. Contact angle measurements were conducted on this film sample and are shown in Table 4.
Comparative Example K
Double functionalization was conducted wherein the chosen inorganic oxide was Si02 #6 resulting in treated particles. A film sample was made by thin film casting using these treated particles. Contact angle measurements were conducted on this film sample and are shown in Table 4.
Comparative Example L
Double functionalization was conducted wherein the chosen inorganic oxide was Si02 #1 resulting in treated particles. A film sample was made by thin film casting using these treated particles. Contact angle measurements were conducted on this film sample and are shown in Table 4.
-27-Table 4 Inorganic Contact Angle Measurements Example Oxide %F H2O H2O C16H12 C16H12 Particle Adv. Rec. Adv. Rec.
F Si02#2 0 26 25 G Si02#1 0 27 23 17 11 H Si02 #3 0 Si02#4 0 J Si02 #5 0 40 14 36 21 K Si02#6 0 L Si02 #1 0 4 indicates contact angle could not be measure because of wetting In reference to Table 4 above, it was shown that single functionalization or double functionalization does not result in adequate water or oil repellency.
Capping Step The term "capping step" as used throughout the examples refers to the following procedure. Inorganic particles obtained after single functionalization or after double functionalization are reacted with a chosen "capping agent" in an inert environment in toluene solvent. When the capping agent was a succinic o.:. .s-( 2)2-( ( CF )7-CF 3 o..
anhydride, , the capping agent was synthesized in toluene and immediately reacted with the inorganic particles obtained after single functionalization or after double functionalization. Synthesis of the succinic anhydride was conducted as taught in US4171282 hereby incorporated by reference.
Example 7 Single functionalization was conducted wherein the chosen inorganic oxide was Si02 #2 resulting in treated particles. These treated particles wherein subjected to the capping step wherein the chosen
F Si02#2 0 26 25 G Si02#1 0 27 23 17 11 H Si02 #3 0 Si02#4 0 J Si02 #5 0 40 14 36 21 K Si02#6 0 L Si02 #1 0 4 indicates contact angle could not be measure because of wetting In reference to Table 4 above, it was shown that single functionalization or double functionalization does not result in adequate water or oil repellency.
Capping Step The term "capping step" as used throughout the examples refers to the following procedure. Inorganic particles obtained after single functionalization or after double functionalization are reacted with a chosen "capping agent" in an inert environment in toluene solvent. When the capping agent was a succinic o.:. .s-( 2)2-( ( CF )7-CF 3 o..
anhydride, , the capping agent was synthesized in toluene and immediately reacted with the inorganic particles obtained after single functionalization or after double functionalization. Synthesis of the succinic anhydride was conducted as taught in US4171282 hereby incorporated by reference.
Example 7 Single functionalization was conducted wherein the chosen inorganic oxide was Si02 #2 resulting in treated particles. These treated particles wherein subjected to the capping step wherein the chosen
-28-O{ -(C H2)2-( F2)7- F3 01, capping agent was thereby making hydrophobized particles. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 5. The resulting fluorosilane residue on these hydrophobized particles was Si HAY S-( H2)2-( F2)7- F3 ~=O
HO
The symbol represents three covalent bonds from silicon, at least one of which is bonded to the particle surface.
Example 8 Example 7 was repeated except the chosen inorganic oxide was Si02 #1.
Example 9 Example 7 was repeated except the chosen inorganic oxide was Si02 #3.
Example 10 Example 7 was repeated except the chosen inorganic oxide was Si02#4.
Example 11 Example 7 was repeated except the chosen inorganic oxide was Si02 #5.
Example 12 Example 7 was repeated except the chosen inorganic oxide was Si02 #6.
HO
The symbol represents three covalent bonds from silicon, at least one of which is bonded to the particle surface.
Example 8 Example 7 was repeated except the chosen inorganic oxide was Si02 #1.
Example 9 Example 7 was repeated except the chosen inorganic oxide was Si02 #3.
Example 10 Example 7 was repeated except the chosen inorganic oxide was Si02#4.
Example 11 Example 7 was repeated except the chosen inorganic oxide was Si02 #5.
Example 12 Example 7 was repeated except the chosen inorganic oxide was Si02 #6.
-29-Example 13 Double functionalization was conducted wherein the chosen inorganic oxide was Si02 #2 resulting in treated particles. These treated particles wherein subjected to the capping step wherein the chosen o -(C H2)2-( F2)7- F3 o,::
capping agent was o thereby making hydrophobized particles. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 5. The resulting fluorosilane residue on these hydrophobized particles was H ~.s-(H2)2-(F2 )7-F3 The symbol represents three covalent bonds from silicon, at least one of which is bonded to the particle surface.
Example 14 Example 13 was repeated except the chosen inorganic oxide was Si02 #1.
Table 5 Exampl Inorganic Oxide Contact An le Measurements Particle %F H2O H2O C16H12 C16H12 e Adv. Rec. Adv. Rec.
7 Si02 #2 10.7 158 155 * *
8 Si02 #1 13.5 159 159 140 126 9 Si02 #3 6.23 159 157 34 16 10 Si02 #4 1.66 148 122 11 Si02 #5 0.72 * * 47 35 12 Si02 #6 0.15 58 52 74 55 13 Si02 #2 13.2 160 160 * *
14 Si02 #1 16.6 156 148 139 121 * indicates contact angle could not be measure because of wetting
capping agent was o thereby making hydrophobized particles. A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 5. The resulting fluorosilane residue on these hydrophobized particles was H ~.s-(H2)2-(F2 )7-F3 The symbol represents three covalent bonds from silicon, at least one of which is bonded to the particle surface.
Example 14 Example 13 was repeated except the chosen inorganic oxide was Si02 #1.
Table 5 Exampl Inorganic Oxide Contact An le Measurements Particle %F H2O H2O C16H12 C16H12 e Adv. Rec. Adv. Rec.
7 Si02 #2 10.7 158 155 * *
8 Si02 #1 13.5 159 159 140 126 9 Si02 #3 6.23 159 157 34 16 10 Si02 #4 1.66 148 122 11 Si02 #5 0.72 * * 47 35 12 Si02 #6 0.15 58 52 74 55 13 Si02 #2 13.2 160 160 * *
14 Si02 #1 16.6 156 148 139 121 * indicates contact angle could not be measure because of wetting
-30-Example 15 Single functionalization was conducted wherein the chosen inorganic oxide was Si02 #2 resulting in treated particles. These treated particles wherein subjected to the capping step wherein the chosen capping agent was CI-S(O)2-(CH2)2-(CF2)5-CF3 thereby making hydrophobized particles having a fluorosilane residue of -Si-(CH2)3-NH-S(O)2-(CH2)2-(CF2)5-CF3. The symbol "-" represents three covalent bonds from silicon, at least one of which is bonded to the particle surface.
A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 6.
Example 16 Example 15 was repeated except the chosen inorganic oxide was Si02 #1.
Example 17 Double functionalization was conducted wherein the chosen inorganic oxide was Si02 #2 resulting in treated particles. These treated particles wherein subjected to the capping step wherein the chosen capping agent was CI-S(O)2-(CH2)2-(CF2)5-CF3 thereby making hydrophobized particles having a fluorosilane residue of -Si-(CH2)3-NH-S(O)2-(CH2)2-(CF2)5-CF3. The symbol "-" represents three covalent bonds from silicon, at least one of which is bonded to the particle surface.
A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 6.
Example 18 Example 17 was repeated except the chosen inorganic oxide was Si02 #1.
A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 6.
Example 16 Example 15 was repeated except the chosen inorganic oxide was Si02 #1.
Example 17 Double functionalization was conducted wherein the chosen inorganic oxide was Si02 #2 resulting in treated particles. These treated particles wherein subjected to the capping step wherein the chosen capping agent was CI-S(O)2-(CH2)2-(CF2)5-CF3 thereby making hydrophobized particles having a fluorosilane residue of -Si-(CH2)3-NH-S(O)2-(CH2)2-(CF2)5-CF3. The symbol "-" represents three covalent bonds from silicon, at least one of which is bonded to the particle surface.
A film sample was made by thin film casting using these hydrophobized particles. Contact angle measurements were conducted on this film sample and are shown in Table 6.
Example 18 Example 17 was repeated except the chosen inorganic oxide was Si02 #1.
-31 -Table 6 Inorganic Contact Angle Example Oxide %F Measurements Particle H2O Adv. H2O C16H1 C16H12 Rec. 2 Adv. Rec.
15 Si02 #2 11.3 149 140 16 Si02 #1 12.9 150 148 132 126 17 Si02 #2 12.4 145 139 18 Si02 #1 10.6 147 146 147 144 * indicates contact angle could not be measure because of wetting Example 19 Double functionalization was conducted wherein the chosen inorganic oxide was Si02 #1 resulting in treated particles. These treated particles wherein subjected to the capping step wherein the chosen capping agent was CH2=CH2-C(O)-O-(CH2)2-(CF2)5-CF3 thereby making hydrophobized particles having a fluorosilane residue of -Si-(CH2)3-N[(CH2)2-C(O)-O-(CH2)2-(CF2)5-CF3]2. The symbol "-" represents three covalent bonds from silicon, at least one of which is bonded to the particle surface. A film sample was made by thin film casting using the hydrophobized particles obtained after second precursor double grafting.
Contact angle measurements were conducted on this film sample and are shown in Table 7.
Table 7 Inorganic Contact An le Measurements Example Oxide %F H2O Adv. H2O C16H12 C16H12 Particle Rec. Adv. Rec.
15 Si02 #1 18.9 154 151 129 116 indicates contact angle could not be measure because of wetting NMR Analysis of Example 14 The hydrophobized particles made from Si02#1 (AEROSIL 200) silica particles obtained in Example 14 were subjected to solid-state 29Si NMR cross-polarization magic angle spinning analysis (CPMAS) resulting
15 Si02 #2 11.3 149 140 16 Si02 #1 12.9 150 148 132 126 17 Si02 #2 12.4 145 139 18 Si02 #1 10.6 147 146 147 144 * indicates contact angle could not be measure because of wetting Example 19 Double functionalization was conducted wherein the chosen inorganic oxide was Si02 #1 resulting in treated particles. These treated particles wherein subjected to the capping step wherein the chosen capping agent was CH2=CH2-C(O)-O-(CH2)2-(CF2)5-CF3 thereby making hydrophobized particles having a fluorosilane residue of -Si-(CH2)3-N[(CH2)2-C(O)-O-(CH2)2-(CF2)5-CF3]2. The symbol "-" represents three covalent bonds from silicon, at least one of which is bonded to the particle surface. A film sample was made by thin film casting using the hydrophobized particles obtained after second precursor double grafting.
Contact angle measurements were conducted on this film sample and are shown in Table 7.
Table 7 Inorganic Contact An le Measurements Example Oxide %F H2O Adv. H2O C16H12 C16H12 Particle Rec. Adv. Rec.
15 Si02 #1 18.9 154 151 129 116 indicates contact angle could not be measure because of wetting NMR Analysis of Example 14 The hydrophobized particles made from Si02#1 (AEROSIL 200) silica particles obtained in Example 14 were subjected to solid-state 29Si NMR cross-polarization magic angle spinning analysis (CPMAS) resulting
-32-in the spectra shown in Figure 2. Also shown in Figure 2 is the spectra using the same 29Si NMR CPMAS analysis of untreated Si02 #1 (AEROSIL 200) silica particles.
Figure 1 is a simplified depiction of a hydrophobized particle made from Si02#1 (AEROSIL 200) silica particles obtained in Example 14.
Referring to Figure 1, the silicon atom of fluorosilane residues is depicted by Al, A2, B1, B2, C1, and C2. In the formula of the fluorosilane residue depicted in Figure 1, L2 represents -OCH3 or -OH. Al and A2 show the silicon atom of fluorosilane residues bonded to the surface of the silica particle through one oxygen atom. 1131 and B2 show the silicon atom of fluorosilane residues bonded to the surface of the silica particle through two oxygen atoms. C1 and C2 show the silicon atom of fluorosilane residues bonded to the surface of the silica particle through three oxygen atoms. D1, D2, D3, and D4 depict silicon atoms at the surface of the silica particle which are not bonded to a fluorosilane residue.
Referring to Figure 2 and the spectra of hydrophobized particles, 1 depicts a signal consistent with the silicon atom of fluorosilane residues depicted as C1 and C2 in Figure 1. Referring to Figure 2 and the spectra of hydrophobized particles, 2 depicts a signal consistent with the silicon atom of fluorosilane residues depicted as 1131 and B2 in Figure 1.
Referring to Figure 2 and the spectra of hydrophobized particles, 3 depicts a signal consistent with the silicon atom of fluorosilane residues depicted as Al and A2 in Figure 1. Referring to Figure 2 and the spectra of hydrophobized particles, 6 depicts a signal consistent silicon atoms at the surface of the silica particle which are not bonded to a fluorosilane residue depicted as D1, D2, D3, and D4 in Figure 1.
Referring to Figure 2 and the spectra of untreated particles, 5 depicts a signal consistent with silicon atoms at the surface of the silica particle which are not bonded to a fluorosilane residue depicted as D1, D2, D3, and D4 in Figure 1. Referring to Figure 2 and the spectra of untreated particles, notably absent are any signals corresponding to those depicted by 1, 2, and 3 in the spectra of hydrophobized particles.
Figure 1 is a simplified depiction of a hydrophobized particle made from Si02#1 (AEROSIL 200) silica particles obtained in Example 14.
Referring to Figure 1, the silicon atom of fluorosilane residues is depicted by Al, A2, B1, B2, C1, and C2. In the formula of the fluorosilane residue depicted in Figure 1, L2 represents -OCH3 or -OH. Al and A2 show the silicon atom of fluorosilane residues bonded to the surface of the silica particle through one oxygen atom. 1131 and B2 show the silicon atom of fluorosilane residues bonded to the surface of the silica particle through two oxygen atoms. C1 and C2 show the silicon atom of fluorosilane residues bonded to the surface of the silica particle through three oxygen atoms. D1, D2, D3, and D4 depict silicon atoms at the surface of the silica particle which are not bonded to a fluorosilane residue.
Referring to Figure 2 and the spectra of hydrophobized particles, 1 depicts a signal consistent with the silicon atom of fluorosilane residues depicted as C1 and C2 in Figure 1. Referring to Figure 2 and the spectra of hydrophobized particles, 2 depicts a signal consistent with the silicon atom of fluorosilane residues depicted as 1131 and B2 in Figure 1.
Referring to Figure 2 and the spectra of hydrophobized particles, 3 depicts a signal consistent with the silicon atom of fluorosilane residues depicted as Al and A2 in Figure 1. Referring to Figure 2 and the spectra of hydrophobized particles, 6 depicts a signal consistent silicon atoms at the surface of the silica particle which are not bonded to a fluorosilane residue depicted as D1, D2, D3, and D4 in Figure 1.
Referring to Figure 2 and the spectra of untreated particles, 5 depicts a signal consistent with silicon atoms at the surface of the silica particle which are not bonded to a fluorosilane residue depicted as D1, D2, D3, and D4 in Figure 1. Referring to Figure 2 and the spectra of untreated particles, notably absent are any signals corresponding to those depicted by 1, 2, and 3 in the spectra of hydrophobized particles.
-33-
Claims (14)
1. Surface modified inorganic oxide particles comprising an oxide of M
wherein M is independently selected from the group consisting of Si, Ti, Zn, Zr, Mn, Al, and combinations thereof; at least one of said particles having a surface covalently bonded to at least one fluorosilane group represented by Formula (1) (L1)d(L2)cSi-(CH2)n-(Z1)a-[C(X1)]x-(Z2)1-Q1 -R f wherein L1 represents an oxygen covalently bonded to an M; and each L2 independently selected from the group consisting of H, a C1-C2 alkyl, and OH; d and c are integers such that: d >= 1, c >= 0, d+c =3;
each n is independently an integer from 1 to 12;
a, x, and I are integers chosen such that the moiety of Formula 1 represented by -(Z1)a [C(X1)]x (Z2)l- further represents at least one of the following moieties:
i) a first moiety wherein a=1, x=1, and 1=1; and ii) a second moiety wherein a=1, x=0, and 1=0;
R f is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl can be optionally replaced by hydrogen, and/or ii) the perfluoroalkyl can be optionally interrupted by at least one oxygen, methylene, or ethylene; Q is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group;
Q1 is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group;
X1 is chosen from O or S;
the first moiety further defined wherein Z1 and Z2 are chosen such that:
a) Z1 is -NH- and Z2 is from the group consisting of -NH-, -O-, -S-, -NH-S(O)2-, -N[C(O)H]-, -[HC(COOH)(R')]CH-S-, and -(R1)CH-[HC(COOH)]-S-;
b) alternatively, Z2 is -NH- and Z1 is from the group consisting of -O-, and -S-;
c) each R1 is independently chosen from hydrogen, phenyl, or a monovalent C1-C8 alkyl optionally terminated by -C6H5, preferably H or CH3;
the second moiety further defined wherein:
a) Z1 is -N[-Q3-(R f)]-; and b) Q1 and Q3 are independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one of -C(O)-O- or -O-C(O)-, and optionally further interrupted by at least one divalent organic group.
wherein M is independently selected from the group consisting of Si, Ti, Zn, Zr, Mn, Al, and combinations thereof; at least one of said particles having a surface covalently bonded to at least one fluorosilane group represented by Formula (1) (L1)d(L2)cSi-(CH2)n-(Z1)a-[C(X1)]x-(Z2)1-Q1 -R f wherein L1 represents an oxygen covalently bonded to an M; and each L2 independently selected from the group consisting of H, a C1-C2 alkyl, and OH; d and c are integers such that: d >= 1, c >= 0, d+c =3;
each n is independently an integer from 1 to 12;
a, x, and I are integers chosen such that the moiety of Formula 1 represented by -(Z1)a [C(X1)]x (Z2)l- further represents at least one of the following moieties:
i) a first moiety wherein a=1, x=1, and 1=1; and ii) a second moiety wherein a=1, x=0, and 1=0;
R f is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl can be optionally replaced by hydrogen, and/or ii) the perfluoroalkyl can be optionally interrupted by at least one oxygen, methylene, or ethylene; Q is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group;
Q1 is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group;
X1 is chosen from O or S;
the first moiety further defined wherein Z1 and Z2 are chosen such that:
a) Z1 is -NH- and Z2 is from the group consisting of -NH-, -O-, -S-, -NH-S(O)2-, -N[C(O)H]-, -[HC(COOH)(R')]CH-S-, and -(R1)CH-[HC(COOH)]-S-;
b) alternatively, Z2 is -NH- and Z1 is from the group consisting of -O-, and -S-;
c) each R1 is independently chosen from hydrogen, phenyl, or a monovalent C1-C8 alkyl optionally terminated by -C6H5, preferably H or CH3;
the second moiety further defined wherein:
a) Z1 is -N[-Q3-(R f)]-; and b) Q1 and Q3 are independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one of -C(O)-O- or -O-C(O)-, and optionally further interrupted by at least one divalent organic group.
2. The particles of claim 1 wherein the fluorosilane group represented by Formula (1) is a urea or thiourea fluorosilane group such that in Formula (1):
a=1, x=1, and 1=1;
Z1 is -NH- and Z2 is -NH-;
said urea or thiourea fluorosilane group further represented by the formula:
(L)d(L2)cSi-(CH2)n-NH-C(X1)-NH-Q1-R f wherein:
X1 is 0 to form a urea fluorosilane group, or X1 is S to form a thiourea fluorosilane group; and Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(0)2-, and -O-C(O)-NH -.
a=1, x=1, and 1=1;
Z1 is -NH- and Z2 is -NH-;
said urea or thiourea fluorosilane group further represented by the formula:
(L)d(L2)cSi-(CH2)n-NH-C(X1)-NH-Q1-R f wherein:
X1 is 0 to form a urea fluorosilane group, or X1 is S to form a thiourea fluorosilane group; and Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(0)2-, and -O-C(O)-NH -.
3. The particles of claim 2 wherein R f is chosen from a C2-C12 perfluoroalkyl and Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, and -O-C(O)-NH -.
4. The particles of claim 2 wherein R f is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl is replaced by hydrogen, and/or ii) the perfluoroalkyl is interrupted by at least one oxygen, methylene, or ethylene; Q is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group.
5. The particles of claim 1 wherein the fluorosilane group represented by Formula (1) is a carbamate fluorosilane group such that in Formula (1):
Z1 is -NH- and Z2 is -O)-, or Z1 is -O- and Z2 is -NH-; and X1 is O;
said carbamate fluorosilane group further represented by the formulae:
(L)d(L2)cSi-CH2)n-NH-C(O)-O-Q1-R f, or (L)d(L2)cSi-(CH2)n O-C(O)-NH-Q1-R f wherein:
Q1 is a C2-C12 hydrocarbylene optionally interrupted by at least one divalent moiety chosen from the group consisting of -NH-C(O)-NH-, -NH-C(S)-NH-, -S-, -S(O)-, -S(O)2-, -(R1)N-S(O)2-,
Z1 is -NH- and Z2 is -O)-, or Z1 is -O- and Z2 is -NH-; and X1 is O;
said carbamate fluorosilane group further represented by the formulae:
(L)d(L2)cSi-CH2)n-NH-C(O)-O-Q1-R f, or (L)d(L2)cSi-(CH2)n O-C(O)-NH-Q1-R f wherein:
Q1 is a C2-C12 hydrocarbylene optionally interrupted by at least one divalent moiety chosen from the group consisting of -NH-C(O)-NH-, -NH-C(S)-NH-, -S-, -S(O)-, -S(O)2-, -(R1)N-S(O)2-,
6. The particles claim 5 wherein R f is chosen from a C2-C12 perfluoroalkyl and Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, and -O-C(O)-NH-.
7. The particles of claim 5 wherein R f is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl is replaced by hydrogen, and/or ii) the perfluoroalkyl is interrupted by at least one oxygen, methylene, or ethylene; Q is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group.
8. The particles of claim 1 wherein the fluorosilane group represented by Formula (1) is a thiolcarbamate fluorosilane group such that in Formula (1):
Z1 is -NH- and Z2 is -S-, or Z1 is -S- and Z2 is-NH-; and X1 is O;
said thiolcarbamate fluorosilane group further represented by the formulae:
(L)d(L2)cSi-CH2)n-NH-C(O)-S-Q1-R f or (L)d(L2)cSi-(CH2)n-S-C(O)-N H-Q1-R f wherein:
Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, -N(R1)-C(O)-, -C(O)-N(R1)-, -(R1)N-S(O)2-, and
Z1 is -NH- and Z2 is -S-, or Z1 is -S- and Z2 is-NH-; and X1 is O;
said thiolcarbamate fluorosilane group further represented by the formulae:
(L)d(L2)cSi-CH2)n-NH-C(O)-S-Q1-R f or (L)d(L2)cSi-(CH2)n-S-C(O)-N H-Q1-R f wherein:
Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, -N(R1)-C(O)-, -C(O)-N(R1)-, -(R1)N-S(O)2-, and
9. The particles of claim 8 wherein R f is chosen from a C2-C12 perfluoroalkyl and Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, and -O-C(O)-NH -.
10. The particles of claim 8 wherein R f is chosen from a C2-C12 perfluoroalkyl provided that: i) one fluorine atom of the perfluoroalkyl is replaced by hydrogen, and/or ii) the perfluoroalkyl is interrupted by at least one oxygen, methylene, or ethylene; Q is chosen from the group consisting of a C2-C12 hydrocarbylene optionally interrupted by at least one divalent organic group.
11. The particles of claim 1 further comprising at least one particle having a surface covalently bonded to a N-sulfone urea fluorosilane group such that in Formula (1):
Z1' is -NH-, and Z2 is -NH-S(O)2-; and X1 is O;
said N-sulfone urea fluorosilane group further represented by the formula:
(L)d(L2)cSi-(CH2)n N H-C(O)-N H-S(O)2-Q1-R f wherein:
Q1 is independently chosen from the group consisting of an uninterrupted C2-C12 hydrocarbylene.
Z1' is -NH-, and Z2 is -NH-S(O)2-; and X1 is O;
said N-sulfone urea fluorosilane group further represented by the formula:
(L)d(L2)cSi-(CH2)n N H-C(O)-N H-S(O)2-Q1-R f wherein:
Q1 is independently chosen from the group consisting of an uninterrupted C2-C12 hydrocarbylene.
12. The particles of claim 1 further comprising at least one particle having a surface covalently bonded to a N-formyl urea fluorosilane group such that in Formula (1):
a=1, x=1, and l=1; and Z1 is -NH-, and Z2 is -N[C(O)H]-;
said N-formyl urea group further represented by the formula:
(L)d(L2)cSi-(CH2)n N H-C(X1)-N [C(O)H]-Q -R f wherein:
Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -S- and -NH-.
a=1, x=1, and l=1; and Z1 is -NH-, and Z2 is -N[C(O)H]-;
said N-formyl urea group further represented by the formula:
(L)d(L2)cSi-(CH2)n N H-C(X1)-N [C(O)H]-Q -R f wherein:
Q1 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one divalent moiety chosen from the group consisting of -S- and -NH-.
13. The particles of claim 1 further comprising at least one particle having a surface covalently bonded to a thioether succinamic acid fluorosilane group such that in Formula (1):
a=1, x=1, and l=1;
Z1 is -NH- and Z2 is -[HC(COOH)(R1)]CH-S- or -(R1)CH-[HC(COOH)]-S-;
X1 is O; and Q1 is -(CH2)2-said thioether succinamic acid group further represented by the formulae:
(L)3Si-(CH2)n-NH-C(O)-[HC(COOH)(R')]CR1-(CH2)m-S-(CH2)2-R f, or (L)3Si-(CH2)n-NH-C(O)-(R1)CH-[CR1(COOH)]-(CH2)m-S-(C H2)2-R f wherein m is 1 or 0; wherein each R1 is independently chosen from methyl or hydrogen preferably H.
a=1, x=1, and l=1;
Z1 is -NH- and Z2 is -[HC(COOH)(R1)]CH-S- or -(R1)CH-[HC(COOH)]-S-;
X1 is O; and Q1 is -(CH2)2-said thioether succinamic acid group further represented by the formulae:
(L)3Si-(CH2)n-NH-C(O)-[HC(COOH)(R')]CR1-(CH2)m-S-(CH2)2-R f, or (L)3Si-(CH2)n-NH-C(O)-(R1)CH-[CR1(COOH)]-(CH2)m-S-(C H2)2-R f wherein m is 1 or 0; wherein each R1 is independently chosen from methyl or hydrogen preferably H.
14. The particles of claim 1 further comprising at least one particle having a surface covalently bonded to a tertiary amine fluorosilane group such that in Formula (1):
a=1, x=0, and 1=0; and Z1 is -N[-Q3-(R f)]-;
said tertiary amine fluorosilane group further represented by the formula:
wherein Q1 and Q3 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one -C(O)-O- and optionally further interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, -N(R1)-C(O)-, -C(O)-N(R1)-, -(R1)N-S(O)2-, and
a=1, x=0, and 1=0; and Z1 is -N[-Q3-(R f)]-;
said tertiary amine fluorosilane group further represented by the formula:
wherein Q1 and Q3 is independently chosen from the group consisting of a C2-C12 hydrocarbylene interrupted by at least one -C(O)-O- and optionally further interrupted by at least one divalent moiety chosen from the group consisting of -S-, -S(O)-, -S(O)2-, -N(R1)-C(O)-, -C(O)-N(R1)-, -(R1)N-S(O)2-, and
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| US12/328,122 | 2008-12-04 | ||
| US12/328,122 US8153834B2 (en) | 2007-12-05 | 2008-12-04 | Surface modified inorganic particles |
| PCT/US2008/085612 WO2009076179A2 (en) | 2007-12-05 | 2008-12-05 | Inorganic particles hydrophobized with fluoroalkyl silanes |
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-
2008
- 2008-12-04 US US12/328,122 patent/US8153834B2/en active Active
- 2008-12-05 EP EP08859173.0A patent/EP2231786B1/en not_active Not-in-force
- 2008-12-05 JP JP2010537095A patent/JP2011506240A/en not_active Withdrawn
- 2008-12-05 CN CN200880126116.2A patent/CN101932661B/en not_active Expired - Fee Related
- 2008-12-05 WO PCT/US2008/085612 patent/WO2009076179A2/en active Application Filing
- 2008-12-05 KR KR1020107014618A patent/KR101544235B1/en active IP Right Grant
- 2008-12-05 NZ NZ585501A patent/NZ585501A/en not_active IP Right Cessation
- 2008-12-05 CA CA2706702A patent/CA2706702C/en not_active Expired - Fee Related
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2011
- 2011-06-22 HK HK11106471.2A patent/HK1152330A1/en not_active IP Right Cessation
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2015
- 2015-01-07 JP JP2015001906A patent/JP5956617B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| HK1152330A1 (en) | 2012-02-24 |
| US20090176097A1 (en) | 2009-07-09 |
| JP2011506240A (en) | 2011-03-03 |
| JP2015131755A (en) | 2015-07-23 |
| CN101932661A (en) | 2010-12-29 |
| KR20100110806A (en) | 2010-10-13 |
| EP2231786B1 (en) | 2018-12-05 |
| NZ585501A (en) | 2011-10-28 |
| EP2231786A2 (en) | 2010-09-29 |
| JP5956617B2 (en) | 2016-07-27 |
| AU2008335413A1 (en) | 2009-06-18 |
| CN101932661B (en) | 2014-05-14 |
| WO2009076179A2 (en) | 2009-06-18 |
| KR101544235B1 (en) | 2015-08-12 |
| US8153834B2 (en) | 2012-04-10 |
| WO2009076179A3 (en) | 2010-03-11 |
| CA2706702C (en) | 2018-01-16 |
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