CN103073994A - Method for preparing homogeneous mixed self-assembled monomolecular film through steric hindrance - Google Patents
Method for preparing homogeneous mixed self-assembled monomolecular film through steric hindrance Download PDFInfo
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Abstract
The invention discloses a method for preparing a homogeneous mixed self-assembled monomolecular film through steric hindrance. The method for preparing the homogeneous mixed self-assembled monomolecular film through the steric hindrance comprises the following steps of: firstly, preparing an alkyl ethoxy silane self-assembled monomolecular film on a hydroxylated substrate; secondly, putting the prepared substrate into a drying box, and preserving the substrate for 2-5 hours at 100-120DEG C; thirdly, preserving the substrate for 5-60 minutes in an ethanol/ water mixed solution in a volume ratio of 1-8: 1, and taking out and drying the substrate by blowing; fourthly, putting the substrate into an alkyl trichlorosilane or alkyl phosphonic acid organic solution with a relatively small molecular head group, and reacting for 20-60 minutes; fifthly, after reaction, putting the substrate into the drying box, preserving the substrate for 2-5 hours at 100-120DEG C, and taking out the substrate; and finally, ultrasonically cleaning the substrate with propanol, chloroform and isopropanol to obtain the homogeneous mixed self-assembled monomolecular film. The method is easy to operate; and the prepared mixed self-assembled monomolecular film is smooth in surface and uniform in property.
Description
Technical field
The invention belongs to field of nanometer technology, relate in particular to a kind of sterically hindered method for preparing homogeneous phase mixing self-assembled monolayer of utilizing.
Background technology
Self-assembled monolayer has functional group and ratio of component is controlled owing to mixing, the ability that has simultaneously preparation exhibiting high surface nanostructure, mix the preparation that self-assembling technique is widely used in nano-device, such as chemical sensor, biosensor, molecular device, and for the preparation of the model surface of the fundamental researchs such as wettability, adhesion and frictional force.Mixing self-assembled monolayer has become a kind of indispensable model of molecular level upper surface engineering research.
At present, co-adsorption method is to prepare to mix self-assembled monolayer method the most commonly used.So-called blend is legal, is exactly solid-based is immersed by two kinds of reactants by certain concentration than in the mixing solutions that forms, thereby at solid-based formation mixing self-assembled monolayer.Yet, the adsorptive power of differential responses thing is different, the concentration ratio of reactant is not linear in the composition of mixing SAM surface functional end-group and the size in nanoscale molecular zone and distribution and the mixing solutions, and need to do the preferentially adsorbed that a large amount of trial and errors tests to regulate different components, to obtain the mixing SAM of required ratio of component.So for preparation homogeneous phase mixing self-assembled monolayer, this method is inapplicable.
(the Colloids and Surfaces A such as Xu Guohua, 2008. 316 (1 – 3): p. 194-201) proposed a kind of imagination of utilizing sterically hindered preparation mixing self-assembled monolayer, but the preparation method who mentions in the literary composition has its limitation, only can prepare alkyl ethoxy silane/alkyl trichlorosilane homogeneous phase mixing self-assembled monolayer.This is because alkyl ethoxy silane facile hydrolysis not in dry toluene, if but sour existence is arranged, will speed up the hydrolysis of oxyethyl group, alkyl trichlorosilane facile hydrolysis, and hydrolysis discharges hydrochloric acid, thereby has facilitated the generation of abovementioned alkyl Ethoxysilane/alkyl trichlorosilane homogeneous phase mixing self-assembled monolayer.If but changed the alkyl trichlorosilane into coupling agent that other can not discharge acid, this method would be just inapplicable.Oxyethyl group is in the presence of acid or more water, and hydrolysis rate can significantly be accelerated, and utilizes this point, can utilize the sterically hindered method of mixing self-assembled monolayer for preparing to extend to more polycomponent with this.
Summary of the invention
The object of the invention is for the deficiencies in the prior art, and a kind of sterically hindered method for preparing homogeneous phase mixing self-assembled monolayer of utilizing is provided.The method has solved the differential responses thing is difficult to prepare homogeneous phase mixing self-assembled monolayer because of the adsorptive power difference problem.
The objective of the invention is to be achieved through the following technical solutions: a kind ofly utilize the sterically hindered method for preparing homogeneous phase mixing self-assembled monolayer, the method is specially:
(1) (5-25 ℃) under the room temperature puts into reactor with hydroxylated substrate, preparation 0.05-4 * 10
-3Mol/L alkyl ethoxy silane organic solution is also poured in the reactor, reaction solution will flood substrate at least, take out after sealed reaction 20-120 minute, slowly wash to remove the coupling agent polymkeric substance of physical adsorption with the reaction solution solvent for use, nitrogen dries up and namely gets surperficial substrate with uniform unimolecular film.
(2) baking oven is put in substrate, taken out after 2-5 hour 100-120 ℃ of lower preservation, put into ethanol and water mixed liquid that volume ratio is 1-8:1 again, ethanol and water mixed liquid flood substrate at least, preserve after 5-60 minute and take out, and nitrogen dries up.
(3) (5-25 ℃) under the room temperature puts into reactor with substrate, and compound concentration is 0.05-4 * 10
-3The alkyl trichlorosilane organic solution of mol/L or alkylphosphonic acid carboxylic acid organic solution,, reaction solution to be poured in the reactor, reaction solution floods substrate at least, take out after sealed reaction 20-120 minute, slowly wash with the reaction solution solvent for use, dry up after the flushing, put into again baking oven, take out after 2-5 hour 100-120 ℃ of lower preservation, successively with propyl alcohol, chloroform, Virahol is ultrasonic washes, and removes the connection idol agent polymkeric substance of physical adsorption, namely gets homogeneous phase mixing self-assembled monolayer after nitrogen dries up.
Further, the trichlorosilane organic solution in the alkyl ethoxy silane organic solution in the described step (1) and the described step (3), solvent is toluene or normal heptane.
Further, the alkylphosphonic acid carboxylic acid organic solution in the described step (3), solvent is tetrahydrofuran (THF).
Further, the alkyl ethoxy silane in the described step (1) comprises the hydrocarbon chain triethoxyl silane of 1-18 carbon, and its end group can be a kind of in methyl, amino, the phenyl.
Further, the trichlorosilane in the described step (3) and alkylphosphonic acid carboxylic acid comprise hydrocarbon chain trichlorosilane and the alkylphosphonic acid carboxylic acid of 1-30 carbon, and the end group of trichlorosilane and alkylphosphonic acid carboxylic acid can be a kind of in methyl, vinyl, the phenyl.
The invention has the beneficial effects as follows: preparation method of the present invention is simple, and controllability is strong, can prepare the homogeneous phase mixing self-assembled monolayer of different coupling agents.Prepared mixing self-assembled monolayer smooth surface, the character homogeneous.
Embodiment
The invention provides a kind of sterically hindered method for preparing homogeneous phase mixing self-assembled monolayer of utilizing, may further comprise the steps:
1, (5-25 ℃) under the room temperature puts into reactor with hydroxylated substrate (such as silicon single crystal, polysilicon, mica), preparation 0.05-4 * 10
-3Mol/L alkyl ethoxy silane organic solution is also poured in the reactor, reaction solution will flood substrate at least, take out after sealed reaction 20-120 minute, slowly wash to remove the coupling agent polymkeric substance of physical adsorption with the reaction solution solvent for use, nitrogen dries up the unimolecular film that namely gets surface uniform.
2, baking oven is put in the unimolecular film substrate that the first step is made, take out after 2-5 hour 100-120 ℃ of lower preservation, putting into volume ratio is the ethanol/water mixed solution of 1-8:1 again, and the ethanol/water mixed solution floods substrate at least, preserve after 5-60 minute and take out, nitrogen dries up.
3, (5-25 ℃) under the room temperature puts into reactor with the substrate of front ground drying, preparation alkyl trichlorosilane or alkylphosphonic acid carboxylic acid organic solution, and its concentration is 0.05-4 * 10
-3Mol/L, reaction solution is poured in the reactor, reaction solution floods substrate at least, take out after sealed reaction 20-120 minute, take out after 2-5 hour 100-120 ℃ of lower preservation, use successively propyl alcohol, chloroform, Virahol ultrasonic cleaning, to remove the connection idol agent polymkeric substance of physical adsorption, namely get homogeneous phase mixing self-assembled monolayer after nitrogen dries up.
Among the present invention, in related alkyl ethoxy silane organic solution and the described step 3 in the related alkyl trichlorosilane organic solution, solvent can be toluene or normal heptane in the step 1.
Among the present invention, related alkyl ethoxy silane comprises the hydrocarbon chain triethoxyl silane of 1-18 carbon in the step 1, and its end group can be a kind of in methyl, amino, the phenyl.
Among the present invention, related trichlorosilane and alkylphosphonic acid carboxylic acid comprise 1-30 carbon in the step 3 hydrocarbon chain trichlorosilane and alkylphosphonic acid carboxylic acid, the end group of trichlorosilane and alkylphosphonic acid carboxylic acid can be a kind of in methyl, vinyl, the phenyl.
Embodiment 1: the preparation of octadecyltriethoxy silane and triacontyl trichlorosilane mixing self-assembled monolayer
(1) take monocrystalline silicon piece as substrate, successively in acetone, chloroform, Virahol, water ultrasonic cleaning 5 minutes, after nitrogen dries up, put into the hydrofluoric acid etching 5 minutes, after the etching, with drying up after the ultrapure water flushing, the volume ratio of putting into 90 ℃ is that the vitriol oil and the oxidation of hydrogen peroxide mixed solution of 2:1 taken out after 15 minutes, with the ultrapure water flushing, dry up with nitrogen again, namely get hydroxylated substrate.
(2) preparation 0.05 * 10
-3Mol/L octadecyltriethoxy silane toluene solution, used toluene water content＜0.03% is put into reactor with hydroxylated substrate, again reactor is placed 25 ℃ of thermostat water baths, reaction solution is poured in the reactor, the reaction beginning, reaction solution floods substrate at least.React and take out substrate after 120 minutes, slowly wash with dry toluene, after the flushing, dry up with nitrogen, be the octadecyltriethoxy silane self-assembled monolayer.
(3) baking oven is put in the octadecyltriethoxy silane self-assembled monolayer substrate that makes, take out after 2 hours 120 ℃ of lower preservations, putting into volume ratio is the ethanol/water mixed solution of 1:1 again, and the ethanol/water mixed solution floods substrate at least, preserve after 5 minutes and take out, nitrogen dries up.
(4) preparation 4 * 10
-3Mol/L triacontyl trichlorosilane toluene solution, used toluene water content＜0.03% is put into reactor with the substrate after drying up in the previous step, again reactor is placed 25 ℃ of thermostat water baths, reaction solution is poured in the reactor, the reaction beginning, reaction solution floods substrate at least.React and take out substrate after 20 minutes, slowly wash with toluene, after the flushing, dry up with nitrogen.
(5) baking oven is put in the substrate that makes, taken out after 2 hours 120 ℃ of lower preservations, successively with toluene, chloroform, Virahol is ultrasonic washes, after the cleaning, dry up with nitrogen, be octadecyltriethoxy silane and triacontyl trichlorosilane homogeneous phase mixing self-assembled monolayer.
The advancing contact angle test result: hydroxylated substrate is 2 °, and the octadecyltriethoxy silane self-assembled monolayer is 40 °, and mixing the self-assembly contact angle is 106 °.
Atomic power, electrostatic force microscope test result show: prepared mixing self-assembled monolayer smooth surface, character homogeneous.
Embodiment 2:The preparation of aminopropyl triethoxysilane and styroyl trichlorosilane mixing self-assembled monolayer
(1) take mica as substrate, hydroxylacion method such as embodiment 1.
(2) preparation 4 * 10
-3Mol/L aminopropyl triethoxysilane n-heptane solution is put into reactor with hydroxylated substrate, reactor is placed 5 ℃ of thermostat water baths again, reaction solution is poured in the reactor into the reaction beginning.React and take out substrate after 20 minutes, slowly wash with heptane, after the flushing, dry up with nitrogen, be the aminopropyl triethoxysilane self-assembled monolayer.
(3) baking oven is put in the aminopropyl triethoxysilane self-assembled monolayer substrate that makes, take out after 5 hours 100 ℃ of lower preservations, putting into volume ratio is the ethanol/water mixed solution of 8:1 again, and the ethanol/water mixed solution floods substrate at least, preserve after 60 minutes and take out, nitrogen dries up.
(4) preparation 4 * 10
-3Mol/L styroyl trichlorosilane n-heptane solution is put into reactor with substrate, reactor is placed 5 ℃ of thermostat water baths again, reaction solution is poured in the reactor into the reaction beginning.React and take out substrate after 120 minutes, slowly wash with heptane, after the flushing, dry up with nitrogen.
(5) baking oven is put in the substrate after drying up in the previous step, taken out after 5 hours 100 ℃ of lower preservations, successively with toluene, chloroform, Virahol is ultrasonic washes, after the cleaning, nitrogen dries up, and is aminopropyl triethoxysilane and styroyl trichlorosilane homogeneous phase mixing self-assembled monolayer.
The advancing contact angle test result: hydroxylated substrate is 2 °, and the aminopropyl triethoxysilane self-assembled monolayer is 45 °, and aminopropyl triethoxysilane and styroyl trichlorosilane mixing self-assembled monolayer are 74 °.
Atomic power, electrostatic force microscope test result show: prepared mixing self-assembled monolayer smooth surface, character homogeneous.
Embodiment 3: the preparation of eight alkyl triethoxyl silanes and Octadecane base phosphoric acid mixing self-assembled monolayer
(1) take polysilicon as substrate, hydroxylacion method such as embodiment 1.
(2) preparation 1 * 10
-3Mol/L eight alkyl triethoxyl silane toluene solutions, used toluene water content＜0.03% is put into reactor with hydroxylated substrate, again reactor is placed 18 ℃ of thermostat water baths, reaction solution is poured in the reactor, the reaction beginning, reaction solution floods substrate at least.React and take out substrate after 30 minutes, slowly wash with toluene, after the flushing, dry up with nitrogen, be eight alkyl triethoxyl silane self-assembled monolayers.
Baking oven is put in the eight alkyl triethoxyl silane self-assembled monolayer substrates that (3) will make, take out after 2 hours 120 ℃ of lower preservations, putting into volume ratio is the ethanol/water mixed solution of 3:1 again, and the ethanol/water mixed solution floods substrate at least, preserve after 10 minutes and take out, nitrogen dries up.
(4) preparation 4 * 10
-3Mol/L octadecyl phosphoric acid tetrahydrofuran solution is put into reactor with substrate, reactor is placed 18 ℃ of thermostat water baths again, reaction solution is poured in the reactor into the reaction beginning.React and take out substrate after 20 minutes, slowly wash with tetrahydrofuran (THF), after the flushing, dry up with nitrogen.
(5) baking oven is put in the substrate after drying up in the previous step, taken out after 2 hours 120 ℃ of lower preservations, successively with toluene, chloroform, Virahol is ultrasonic washes, after the cleaning, nitrogen dries up, and is eight alkyl triethoxyl silanes and Octadecane base phosphoric acid homogeneous phase mixing self-assembled monolayer.
The advancing contact angle test result: hydroxylated substrate is 2 °, and eight alkyl triethoxyl silane self-assembled monolayers are 20 °, and mixing the self-assembly contact angle is 103 °.
Atomic power, electrostatic force microscope test result show: prepared mixing self-assembled monolayer smooth surface, character homogeneous.
Embodiment 4: the preparation of phenyl triethoxysilane and methyl acid phosphate mixing self-assembled monolayer
(1) take silicon single crystal as substrate, hydroxylacion method such as embodiment 1.
(2) preparation 1 * 10
-3Mol/L phenyl triethoxysilane toluene solution, used toluene water content＜0.03% is put into reactor with hydroxylated substrate, again reactor is placed 18 ℃ of thermostat water baths, reaction solution is poured in the reactor, the reaction beginning, reaction solution floods substrate at least.React and take out substrate after 30 minutes, slowly wash with toluene, after the flushing, dry up with nitrogen, be the phenyl triethoxysilane self-assembled monolayer.
(3) baking oven is put in the phenyl triethoxysilane self-assembled monolayer substrate that makes, take out after 2 hours 120 ℃ of lower preservations, putting into volume ratio is the ethanol/water mixed solution of 4:1 again, and the ethanol/water mixed solution floods substrate at least, preserve after 10 minutes and take out, nitrogen dries up.
(4) preparation 0.05 * 10
-3Mol/L methyl acid phosphate tetrahydrofuran solution is put into reactor with substrate, reactor is placed 18 ℃ of thermostat water baths again, reaction solution is poured in the reactor into the reaction beginning.React and take out substrate after 60 minutes, slowly wash with tetrahydrofuran (THF), after the flushing, dry up with nitrogen.
(5) baking oven is put in the substrate after drying up in the previous step, taken out after 2 hours 120 ℃ of lower preservations, successively with toluene, chloroform, Virahol is ultrasonic washes, after the cleaning, nitrogen dries up, and is phenyl triethoxysilane and methyl acid phosphate homogeneous phase mixing self-assembled monolayer.
The advancing contact angle test result: hydroxylated substrate is 2 °, and the phenyl triethoxysilane self-assembled monolayer is 66 °, and mixing the self-assembly contact angle is 93 °.
Atomic power, electrostatic force microscope test result show: prepared mixing self-assembled monolayer smooth surface, character homogeneous.
Claims (5)
1. one kind is utilized the sterically hindered method for preparing homogeneous phase mixing self-assembled monolayer, it is characterized in that, the method is specially:
(1) (5-25 ℃) under the room temperature puts into reactor with hydroxylated substrate, preparation 0.05-4 * 10
-3Mol/L alkyl ethoxy silane organic solution is also poured in the reactor, reaction solution will flood substrate at least, take out after sealed reaction 20-120 minute, slowly wash to remove the coupling agent polymkeric substance of physical adsorption with the reaction solution solvent for use, nitrogen dries up and namely gets surperficial substrate with uniform unimolecular film;
(2) baking oven is put in substrate, taken out after 2-5 hour 100-120 ℃ of lower preservation, put into ethanol and water mixed liquid that volume ratio is 1-8:1 again, ethanol and water mixed liquid flood substrate at least, preserve after 5-60 minute and take out, and nitrogen dries up;
(3) (5-25 ℃) under the room temperature puts into reactor with substrate, and compound concentration is 0.05-4 * 10
-3The alkyl trichlorosilane organic solution of mol/L or alkylphosphonic acid carboxylic acid organic solution, reaction solution is poured in the reactor, reaction solution floods substrate at least, takes out after sealed reaction 20-120 minute, slowly washes with the reaction solution solvent for use, dry up after the flushing, put into again baking oven, lower take out after preserving 2-5 hour at 100-120 ℃, successively with propyl alcohol, chloroform, Virahol is ultrasonic washes, remove the connection idol agent polymkeric substance of physical adsorption, namely get homogeneous phase mixing self-assembled monolayer after nitrogen dries up.
2. describedly according to claim 1 utilize the sterically hindered method for preparing homogeneous phase mixing self-assembled monolayer, it is characterized in that, trichlorosilane organic solution in alkyl ethoxy silane organic solution in the described step (1) and the described step (3), solvent can be toluene or normal heptane.
3. describedly according to claim 1 utilize the sterically hindered method for preparing homogeneous phase mixing self-assembled monolayer, it is characterized in that, the alkylphosphonic acid carboxylic acid organic solution in the described step (3), solvent is tetrahydrofuran (THF).
4. describedly according to claim 1 utilize the sterically hindered method for preparing homogeneous phase mixing self-assembled monolayer, it is characterized in that, alkyl ethoxy silane in the described step (1) comprises the hydrocarbon chain triethoxyl silane of 1-18 carbon, and its end group can be a kind of in methyl, amino, the phenyl.
5. describedly according to claim 1 utilize the sterically hindered method for preparing homogeneous phase mixing self-assembled monolayer, it is characterized in that, trichlorosilane in the described step (3) and alkylphosphonic acid carboxylic acid comprise hydrocarbon chain trichlorosilane and the alkylphosphonic acid carboxylic acid of 1-30 carbon, and the end group of trichlorosilane and alkylphosphonic acid carboxylic acid can be a kind of in methyl, vinyl, the phenyl.
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0484746A2 (en) * | 1990-10-25 | 1992-05-13 | Matsushita Electric Industrial Co., Ltd. | Chemically adsorbed monomolecular lamination film and method of manufacturing the same |
| EP2133394A1 (en) * | 2007-04-05 | 2009-12-16 | Nippon Steel Materials Co., Ltd. | Coating solution for surface flat insulating formation, surface flat insulating film covering base material, and process for producing surface flat insulating film covering base material |
| CN102391531A (en) * | 2011-07-04 | 2012-03-28 | 北京航空航天大学 | Electrostatic self-assembled multilayer film and preparation method thereof |
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2013
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0484746A2 (en) * | 1990-10-25 | 1992-05-13 | Matsushita Electric Industrial Co., Ltd. | Chemically adsorbed monomolecular lamination film and method of manufacturing the same |
| EP2133394A1 (en) * | 2007-04-05 | 2009-12-16 | Nippon Steel Materials Co., Ltd. | Coating solution for surface flat insulating formation, surface flat insulating film covering base material, and process for producing surface flat insulating film covering base material |
| CN102391531A (en) * | 2011-07-04 | 2012-03-28 | 北京航空航天大学 | Electrostatic self-assembled multilayer film and preparation method thereof |
Non-Patent Citations (2)
| Title |
|---|
| FENG JUNYONG ET AL: "Construction of the homogeneously mixed SAM composed of octyltriethoxysilane and octadecyltrichlorosilane by taking advantage of the molecular steric restriction", 《COLLOIDS AND SURFACES A：PHYSICOCHEMICAL AND ENGINEERING ASPECTS》 * |
| RAMAN A ET AL: "Formation of Self-Assembled Monolayers of Alkylphosphonic Acid on the Native Oxide Surface of SS316L", 《LANGMUIR》 * |
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