DE69011166D1 - Herstellungsverfahren einer Dünnschicht aus organischem Material für eine optische Vorrichtung. - Google Patents

Herstellungsverfahren einer Dünnschicht aus organischem Material für eine optische Vorrichtung.

Info

Publication number
DE69011166D1
DE69011166D1 DE69011166T DE69011166T DE69011166D1 DE 69011166 D1 DE69011166 D1 DE 69011166D1 DE 69011166 T DE69011166 T DE 69011166T DE 69011166 T DE69011166 T DE 69011166T DE 69011166 D1 DE69011166 D1 DE 69011166D1
Authority
DE
Germany
Prior art keywords
manufacturing
thin film
optical device
organic material
organic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69011166T
Other languages
English (en)
Other versions
DE69011166T2 (de
Inventor
Atsuhisa Inoue
Mariko Ishino
Yoshiro Akagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Application granted granted Critical
Publication of DE69011166D1 publication Critical patent/DE69011166D1/de
Publication of DE69011166T2 publication Critical patent/DE69011166T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/061—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on electro-optical organic material
    • G02F1/065—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on electro-optical organic material in an optical waveguide structure
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/355—Non-linear optics characterised by the materials used
    • G02F1/361—Organic materials
    • G02F1/3611—Organic materials containing Nitrogen
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/355—Non-linear optics characterised by the materials used
    • G02F1/361—Organic materials
    • G02F1/3611—Organic materials containing Nitrogen
    • G02F1/3612—Heterocycles having N as heteroatom
DE69011166T 1989-03-30 1990-03-28 Herstellungsverfahren einer Dünnschicht aus organischem Material für eine optische Vorrichtung. Expired - Fee Related DE69011166T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1080667A JP2678055B2 (ja) 1989-03-30 1989-03-30 有機化合物薄膜の製法

Publications (2)

Publication Number Publication Date
DE69011166D1 true DE69011166D1 (de) 1994-09-08
DE69011166T2 DE69011166T2 (de) 1994-12-08

Family

ID=13724713

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69011166T Expired - Fee Related DE69011166T2 (de) 1989-03-30 1990-03-28 Herstellungsverfahren einer Dünnschicht aus organischem Material für eine optische Vorrichtung.

Country Status (4)

Country Link
US (1) US5084302A (de)
EP (1) EP0390540B1 (de)
JP (1) JP2678055B2 (de)
DE (1) DE69011166T2 (de)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04236295A (ja) * 1991-01-18 1992-08-25 Sharp Corp 強誘電性液晶組成物及び液晶素子
US6224948B1 (en) 1997-09-29 2001-05-01 Battelle Memorial Institute Plasma enhanced chemical deposition with low vapor pressure compounds
US6171652B1 (en) 1998-05-26 2001-01-09 Brij P. Singh Method for modifying surfaces with ultra thin films
EP1127381B1 (de) 1998-11-02 2015-09-23 3M Innovative Properties Company Transparente leitfähige oxide für kunststoff-flachbildschirme
US6217947B1 (en) 1998-12-16 2001-04-17 Battelle Memorial Institute Plasma enhanced polymer deposition onto fixtures
US6268695B1 (en) 1998-12-16 2001-07-31 Battelle Memorial Institute Environmental barrier material for organic light emitting device and method of making
US6207239B1 (en) 1998-12-16 2001-03-27 Battelle Memorial Institute Plasma enhanced chemical deposition of conjugated polymer
EP1145338B1 (de) 1998-12-16 2012-12-05 Samsung Display Co., Ltd. Umwelt-sperrmaterial für organische elektrolumineszente vorrichtung und herstellungsverfahren
US6228436B1 (en) 1998-12-16 2001-05-08 Battelle Memorial Institute Method of making light emitting polymer composite material
US6228434B1 (en) 1998-12-16 2001-05-08 Battelle Memorial Institute Method of making a conformal coating of a microtextured surface
US6274204B1 (en) 1998-12-16 2001-08-14 Battelle Memorial Institute Method of making non-linear optical polymer
US6207238B1 (en) 1998-12-16 2001-03-27 Battelle Memorial Institute Plasma enhanced chemical deposition for high and/or low index of refraction polymers
DE19901381A1 (de) * 1999-01-15 2000-07-20 Joerg Enderlein Verfahren und Vorrichtung zur optischen Detektion eines Partikels
US6506461B2 (en) 1999-03-31 2003-01-14 Battelle Memorial Institute Methods for making polyurethanes as thin films
US6358570B1 (en) 1999-03-31 2002-03-19 Battelle Memorial Institute Vacuum deposition and curing of oligomers and resins
US7198832B2 (en) 1999-10-25 2007-04-03 Vitex Systems, Inc. Method for edge sealing barrier films
US6866901B2 (en) 1999-10-25 2005-03-15 Vitex Systems, Inc. Method for edge sealing barrier films
US6413645B1 (en) * 2000-04-20 2002-07-02 Battelle Memorial Institute Ultrabarrier substrates
US6548912B1 (en) 1999-10-25 2003-04-15 Battelle Memorial Institute Semicoductor passivation using barrier coatings
US6623861B2 (en) 2001-04-16 2003-09-23 Battelle Memorial Institute Multilayer plastic substrates
US6573652B1 (en) 1999-10-25 2003-06-03 Battelle Memorial Institute Encapsulated display devices
US6492026B1 (en) 2000-04-20 2002-12-10 Battelle Memorial Institute Smoothing and barrier layers on high Tg substrates
US6577798B2 (en) * 2000-07-18 2003-06-10 Reveo, Inc. Method for producing non-linear optical organic crystal film
US6881445B1 (en) 2001-10-29 2005-04-19 Innovation Chemical Technologies, Ltd. Forming thin films on substrates using a porous carrier
US8808457B2 (en) 2002-04-15 2014-08-19 Samsung Display Co., Ltd. Apparatus for depositing a multilayer coating on discrete sheets
US8900366B2 (en) 2002-04-15 2014-12-02 Samsung Display Co., Ltd. Apparatus for depositing a multilayer coating on discrete sheets
US7048971B2 (en) * 2002-05-01 2006-05-23 Innovation Chemical Technologies, Ltd. Making invisible logos using hydrophobic and hydrophilic coatings
US7648925B2 (en) 2003-04-11 2010-01-19 Vitex Systems, Inc. Multilayer barrier stacks and methods of making multilayer barrier stacks
US7767498B2 (en) 2005-08-25 2010-08-03 Vitex Systems, Inc. Encapsulated devices and method of making
WO2008083308A1 (en) 2006-12-28 2008-07-10 3M Innovative Properties Company Nucleation layer for thin film metal layer formation
US8350451B2 (en) 2008-06-05 2013-01-08 3M Innovative Properties Company Ultrathin transparent EMI shielding film comprising a polymer basecoat and crosslinked polymer transparent dielectric layer
US9184410B2 (en) 2008-12-22 2015-11-10 Samsung Display Co., Ltd. Encapsulated white OLEDs having enhanced optical output
US9337446B2 (en) 2008-12-22 2016-05-10 Samsung Display Co., Ltd. Encapsulated RGB OLEDs having enhanced optical output
US8590338B2 (en) 2009-12-31 2013-11-26 Samsung Mobile Display Co., Ltd. Evaporator with internal restriction
CN104289386B (zh) * 2014-09-16 2016-09-21 宁波大学 一种制备薄膜的高温旋涂装置及方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57134558A (en) * 1981-02-16 1982-08-19 Fuji Photo Film Co Ltd Production of organic vapor deposited thin film
JPS6037225B2 (ja) * 1981-06-24 1985-08-24 東レ株式会社 被覆繊維
US4842893A (en) * 1983-12-19 1989-06-27 Spectrum Control, Inc. High speed process for coating substrates
JPS62160427A (ja) * 1986-01-09 1987-07-16 Toray Ind Inc 有機非線形光学材料およびその製造方法
DE3624467A1 (de) * 1986-07-19 1988-01-28 Leybold Heraeus Gmbh & Co Kg Verfahren zum herstellen transparenter schutzschichten aus siliziumverbindungen
JPH0640614B2 (ja) * 1987-03-16 1994-05-25 キヤノン株式会社 弾性表面波コンボルバ
US4842946A (en) * 1987-09-28 1989-06-27 General Electric Company Method for treating a polyimide surface to improve the adhesion of metal deposited thereon, and articles produced thereby
JPH01102436A (ja) * 1987-10-15 1989-04-20 Hitachi Ltd 光変調素子及びその製造方法
JPH028823A (ja) * 1988-06-28 1990-01-12 Matsushita Electric Ind Co Ltd 非線形光学素子の製造方法

Also Published As

Publication number Publication date
DE69011166T2 (de) 1994-12-08
US5084302A (en) 1992-01-28
EP0390540B1 (de) 1994-08-03
JP2678055B2 (ja) 1997-11-17
EP0390540A2 (de) 1990-10-03
EP0390540A3 (de) 1991-12-27
JPH02259628A (ja) 1990-10-22

Similar Documents

Publication Publication Date Title
DE69011166D1 (de) Herstellungsverfahren einer Dünnschicht aus organischem Material für eine optische Vorrichtung.
DE3877949T2 (de) Herstellungsverfahren fuer eine optische sonde.
DE69214324T2 (de) Herstellungsverfahren für eine optische integrierte Schaltung
DE68908879T2 (de) Verfahren und vorrichtung für optische messungen.
DE3785737T2 (de) Geraet zur ausbesserung eines gemusterten films.
DE69030261T2 (de) Nichtphotographisches verfahren zur strukturierung organischer polymerfilme
DE3781502T2 (de) Optische registrierkarte mit einem hologramm und verfahren zu deren herstellung.
DE68915602T2 (de) Verfahren zur Herstellung einer optischen Flüssigkristall-Vorrichtung.
DE69025502D1 (de) Optische Vorrichtung zur Bildvergrösserung
DE69632804D1 (de) Positionseinstellvorrichtung für eine optische Quelle
DE69020634D1 (de) Herstellungsverfahren für ein mit einem Film aus flüssigkristallinem Material überzogenes Substrat sowie Verfahren und Gerät zur Herstellung einer optischen Vorrichtung mit einem Flüssigkristall.
DE68924949D1 (de) Nichtlineare optische Vorrichtung.
DE69115654D1 (de) Basislage für eine optische Faserspule
DE3789295D1 (de) Optische Vorrichtung.
DE69032340T2 (de) Verfahren zur Herstellung einer Halbleiterdünnschicht
DE68915523D1 (de) Verfahren zur Herstellung eines Silicium-auf-Isolator-Bauelementes unter Verwendung einer verbesserten Verkapselungsschicht.
DE68900391D1 (de) Verfahren und vorrichtung zur herstellung eines duennen organischen filmes.
DE69013444T2 (de) Vorrichtung zur Bildung einer dünnen Schicht.
DE69200216D1 (de) Herstellungsverfahren für eine optoelektronische Vorrichtung.
DE69024692D1 (de) Herstellungsverfahren für eine Vorrichtung mit Dünnschicht-Filmstruktur
DE69309692D1 (de) Optische vorrichtung zur ringförmigen beleuchtung eines punktes
DE69025169D1 (de) Optische Vorrichtung mit Gitterstruktur
DE69024415D1 (de) Master-Matrix mit Direktmarkierung für optische Aufzeichnungen
DE3884502T2 (de) Polydiacetylen-Dünnschicht-Herstellungsverfahren.
DE3771349D1 (de) Vorrichtung zur nicht zerstoerenden kontrolle eines teiles durch optische holographie.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee