DE69329536D1 - Chemisch adsorbierter Film und Verfahren zur Herstellung desselben - Google Patents

Chemisch adsorbierter Film und Verfahren zur Herstellung desselben

Info

Publication number
DE69329536D1
DE69329536D1 DE69329536T DE69329536T DE69329536D1 DE 69329536 D1 DE69329536 D1 DE 69329536D1 DE 69329536 T DE69329536 T DE 69329536T DE 69329536 T DE69329536 T DE 69329536T DE 69329536 D1 DE69329536 D1 DE 69329536D1
Authority
DE
Germany
Prior art keywords
producing
same
chemically adsorbed
adsorbed film
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69329536T
Other languages
English (en)
Other versions
DE69329536T2 (de
Inventor
Tadashi Ohtake
Norihisa Mino
Kazufumi Ogawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of DE69329536D1 publication Critical patent/DE69329536D1/de
Publication of DE69329536T2 publication Critical patent/DE69329536T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/18Processes for applying liquids or other fluent materials performed by dipping
    • B05D1/185Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/26Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/261In terms of molecular thickness or light wave length
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31652Of asbestos
    • Y10T428/31663As siloxane, silicone or silane
DE69329536T 1992-03-02 1993-03-01 Chemisch adsorbierter Film und Verfahren zur Herstellung desselben Expired - Fee Related DE69329536T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4428992 1992-03-02

Publications (2)

Publication Number Publication Date
DE69329536D1 true DE69329536D1 (de) 2000-11-16
DE69329536T2 DE69329536T2 (de) 2001-06-07

Family

ID=12687350

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69329536T Expired - Fee Related DE69329536T2 (de) 1992-03-02 1993-03-01 Chemisch adsorbierter Film und Verfahren zur Herstellung desselben

Country Status (3)

Country Link
US (3) US6277444B1 (de)
EP (1) EP0559119B1 (de)
DE (1) DE69329536T2 (de)

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US7268179B2 (en) * 1997-02-03 2007-09-11 Cytonix Corporation Hydrophobic coating compositions, articles coated with said compositions, and processes for manufacturing same
US6485785B1 (en) * 1999-08-31 2002-11-26 Matsushita Electric Industrial Co., Ltd. Coating film, and method and apparatus for producing the same
KR100971638B1 (ko) * 2002-06-28 2010-07-22 로포 하이 테크 필름 게엠베하 주조 폴리아릴레이트 필름으로 제조된 격막
JP2006525483A (ja) 2003-05-06 2006-11-09 アスペン・エアロジエルズ・インコーポレーテツド 荷重負担性の軽量コンパクトな断熱システム
AT412094B (de) * 2003-05-13 2004-09-27 Austria Tech & System Tech Verfahren zur beschichtung von rohlingen zur herstellung von gedruckten leiterplatten (pcb)
WO2006127182A2 (en) * 2005-04-15 2006-11-30 Aspen Aerogels Inc. Coated insulation articles and their manufacture
US20060264133A1 (en) * 2005-04-15 2006-11-23 Aspen Aerogels,Inc. Coated Aerogel Composites
US20070089604A1 (en) * 2005-10-20 2007-04-26 Wu Chen Novel chromatographic stationary phase
CA2626990A1 (en) * 2005-10-24 2007-05-03 Aculon, Inc. Polymeric organometallic films
WO2008060583A2 (en) * 2006-11-15 2008-05-22 Aculon, Inc. Organometallic films, methods for applying organometallic films to substrates and substrates coated with such films
US20080230592A1 (en) * 2007-03-19 2008-09-25 National Envelope Corporation Flexible Media Packaging
RU2676341C2 (ru) 2013-09-20 2018-12-28 Бейкер Хьюз Инкорпорейтед Композитные материалы на основе фосфорорганических соединений для применения в операциях по обработке скважин
US9822621B2 (en) 2013-09-20 2017-11-21 Baker Hughes, A Ge Company, Llc Method of using surface modifying treatment agents to treat subterranean formations
US9683431B2 (en) 2013-09-20 2017-06-20 Baker Hughes Incorporated Method of using surface modifying metallic treatment agents to treat subterranean formations
CA2922688C (en) 2013-09-20 2018-10-30 Baker Hughes Incorporated Composites for use in stimulation and sand control operations
US9701892B2 (en) 2014-04-17 2017-07-11 Baker Hughes Incorporated Method of pumping aqueous fluid containing surface modifying treatment agent into a well
EP3046986B1 (de) 2013-09-20 2020-07-22 Baker Hughes Holdings LLC Verfahren zur verhinderung von bewuchs auf einer metallischen oberfläche mit einem oberflächenverändernden behandlungsmittel
US10176984B2 (en) 2017-02-14 2019-01-08 Lam Research Corporation Selective deposition of silicon oxide
US10242866B2 (en) 2017-03-08 2019-03-26 Lam Research Corporation Selective deposition of silicon nitride on silicon oxide using catalytic control
US10043656B1 (en) 2017-03-10 2018-08-07 Lam Research Corporation Selective growth of silicon oxide or silicon nitride on silicon surfaces in the presence of silicon oxide
US9911595B1 (en) * 2017-03-17 2018-03-06 Lam Research Corporation Selective growth of silicon nitride
US10559461B2 (en) 2017-04-19 2020-02-11 Lam Research Corporation Selective deposition with atomic layer etch reset
US10460930B2 (en) 2017-11-22 2019-10-29 Lam Research Corporation Selective growth of SiO2 on dielectric surfaces in the presence of copper
US11404275B2 (en) 2018-03-02 2022-08-02 Lam Research Corporation Selective deposition using hydrolysis

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Publication number Priority date Publication date Assignee Title
US3127457A (en) * 1960-11-18 1964-03-31 Du Pont Method of molding a polyurethane foam in a mold having an improved release agent
US4539061A (en) * 1983-09-07 1985-09-03 Yeda Research And Development Co., Ltd. Process for the production of built-up films by the stepwise adsorption of individual monolayers
FR2598520B1 (fr) * 1986-01-21 1994-01-28 Seiko Epson Corp Pellicule protectrice minerale
JPH01194124A (ja) * 1988-01-29 1989-08-04 Matsushita Electric Ind Co Ltd 磁気記録媒体保護膜の形成方法
US5011963A (en) * 1988-02-09 1991-04-30 Matsushita Electric Ind., Co., Ltd. Terminal perfluoroalkylsilane compounds
JPH0761428B2 (ja) * 1989-03-09 1995-07-05 松下電器産業株式会社 選択透過性膜およびその製造方法
JPH02258886A (ja) * 1989-03-31 1990-10-19 Showa Denko Kk 含フッ素表面処理剤
US5246740A (en) * 1990-01-12 1993-09-21 Matsushita Electric Industrial Co., Ltd. Process for preparing a lamination of organic monomolecular films, and a chemical adsorbent used for the process
JP2912694B2 (ja) * 1990-09-07 1999-06-28 松下電器産業株式会社 記録再生装置
US5240774A (en) * 1990-10-25 1993-08-31 Matsushita Electric Industrial Co., Ltd. Fluorocarbon-based coating film and method of manufacturing the same
EP0492417B1 (de) * 1990-12-21 1996-11-20 Matsushita Electric Industrial Co., Ltd. Verfahren zur Herstellung einer chemisch adsorbierten Schicht
DE69120788T2 (de) * 1990-12-25 1996-11-07 Matsushita Electric Ind Co Ltd Nichtverunreinigender, absorbierter Film und Verfahren zu seiner Herstellung
JP3021695B2 (ja) * 1991-02-01 2000-03-15 松下電器産業株式会社 撥水撥油性凹版およびその製造方法
EP0499977B1 (de) * 1991-02-19 1995-12-20 Matsushita Electric Industrial Co., Ltd. Verfahren zur Herstellung eines chemisch absorbierten Films

Also Published As

Publication number Publication date
US6277444B1 (en) 2001-08-21
US6410152B2 (en) 2002-06-25
US20010038916A1 (en) 2001-11-08
US20020094436A1 (en) 2002-07-18
EP0559119A1 (de) 1993-09-08
EP0559119B1 (de) 2000-10-11
US6593000B2 (en) 2003-07-15
DE69329536T2 (de) 2001-06-07

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8327 Change in the person/name/address of the patent owner

Owner name: PANASONIC CORP., KADOMA, OSAKA, JP

8339 Ceased/non-payment of the annual fee