DE69329536T2 - Chemisch adsorbierter Film und Verfahren zur Herstellung desselben - Google Patents
Chemisch adsorbierter Film und Verfahren zur Herstellung desselbenInfo
- Publication number
- DE69329536T2 DE69329536T2 DE69329536T DE69329536T DE69329536T2 DE 69329536 T2 DE69329536 T2 DE 69329536T2 DE 69329536 T DE69329536 T DE 69329536T DE 69329536 T DE69329536 T DE 69329536T DE 69329536 T2 DE69329536 T2 DE 69329536T2
- Authority
- DE
- Germany
- Prior art keywords
- producing
- same
- chemically adsorbed
- adsorbed film
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
- B05D1/185—Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/261—In terms of molecular thickness or light wave length
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4428992 | 1992-03-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69329536D1 DE69329536D1 (de) | 2000-11-16 |
DE69329536T2 true DE69329536T2 (de) | 2001-06-07 |
Family
ID=12687350
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69329536T Expired - Fee Related DE69329536T2 (de) | 1992-03-02 | 1993-03-01 | Chemisch adsorbierter Film und Verfahren zur Herstellung desselben |
Country Status (3)
Country | Link |
---|---|
US (3) | US6277444B1 (de) |
EP (1) | EP0559119B1 (de) |
DE (1) | DE69329536T2 (de) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7268179B2 (en) * | 1997-02-03 | 2007-09-11 | Cytonix Corporation | Hydrophobic coating compositions, articles coated with said compositions, and processes for manufacturing same |
US6485785B1 (en) * | 1999-08-31 | 2002-11-26 | Matsushita Electric Industrial Co., Ltd. | Coating film, and method and apparatus for producing the same |
WO2004003062A1 (de) * | 2002-06-28 | 2004-01-08 | Lofo High Tech Film Gmbh | Membranen aus polyarylat-giessfolien |
KR101156311B1 (ko) * | 2003-05-06 | 2012-06-13 | 아스펜 에어로겔, 인코포레이티드 | 단열 파이프 라인 및 파이프 라인 단열 방법 |
AT412094B (de) * | 2003-05-13 | 2004-09-27 | Austria Tech & System Tech | Verfahren zur beschichtung von rohlingen zur herstellung von gedruckten leiterplatten (pcb) |
US20060264133A1 (en) * | 2005-04-15 | 2006-11-23 | Aspen Aerogels,Inc. | Coated Aerogel Composites |
WO2006127182A2 (en) * | 2005-04-15 | 2006-11-30 | Aspen Aerogels Inc. | Coated insulation articles and their manufacture |
US20070089604A1 (en) * | 2005-10-20 | 2007-04-26 | Wu Chen | Novel chromatographic stationary phase |
US7989069B2 (en) * | 2005-10-24 | 2011-08-02 | Aculon, Inc. | Polymeric organometallic films |
US8048487B2 (en) * | 2006-11-15 | 2011-11-01 | Aculon, Inc. | Organometallic films, methods for applying organometallic films to substrates and substrates coated with such films |
US20080230592A1 (en) * | 2007-03-19 | 2008-09-25 | National Envelope Corporation | Flexible Media Packaging |
CA3009048A1 (en) | 2013-09-20 | 2015-03-26 | Baker Hughes, A Ge Company, Llc | Composites for use in stimulation and sand control operations |
AU2014321306B2 (en) | 2013-09-20 | 2017-12-14 | Baker Hughes, A Ge Company, Llc | Organophosphorus containing composites for use in well treatment operations |
PL3046989T3 (pl) | 2013-09-20 | 2020-03-31 | Baker Hughes, A Ge Company, Llc | Sposób wykorzystania metalicznych środków do obróbki modyfikującej powierzchnię do obróbki formacji podziemnych |
US9701892B2 (en) | 2014-04-17 | 2017-07-11 | Baker Hughes Incorporated | Method of pumping aqueous fluid containing surface modifying treatment agent into a well |
CN105555903B (zh) | 2013-09-20 | 2019-02-19 | 贝克休斯公司 | 使用表面改性处理剂抑制金属表面上结垢的方法 |
WO2015042477A1 (en) | 2013-09-20 | 2015-03-26 | Baker Hughes Incorporated | Method of using surface modifying treatment agents to treat subterranean formations |
US10176984B2 (en) | 2017-02-14 | 2019-01-08 | Lam Research Corporation | Selective deposition of silicon oxide |
US10242866B2 (en) | 2017-03-08 | 2019-03-26 | Lam Research Corporation | Selective deposition of silicon nitride on silicon oxide using catalytic control |
US10043656B1 (en) | 2017-03-10 | 2018-08-07 | Lam Research Corporation | Selective growth of silicon oxide or silicon nitride on silicon surfaces in the presence of silicon oxide |
US9911595B1 (en) | 2017-03-17 | 2018-03-06 | Lam Research Corporation | Selective growth of silicon nitride |
US10559461B2 (en) | 2017-04-19 | 2020-02-11 | Lam Research Corporation | Selective deposition with atomic layer etch reset |
US10460930B2 (en) | 2017-11-22 | 2019-10-29 | Lam Research Corporation | Selective growth of SiO2 on dielectric surfaces in the presence of copper |
WO2019169335A1 (en) | 2018-03-02 | 2019-09-06 | Lam Research Corporation | Selective deposition using hydrolysis |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3127457A (en) * | 1960-11-18 | 1964-03-31 | Du Pont | Method of molding a polyurethane foam in a mold having an improved release agent |
US4539061A (en) * | 1983-09-07 | 1985-09-03 | Yeda Research And Development Co., Ltd. | Process for the production of built-up films by the stepwise adsorption of individual monolayers |
FR2598520B1 (fr) * | 1986-01-21 | 1994-01-28 | Seiko Epson Corp | Pellicule protectrice minerale |
JPH01194124A (ja) * | 1988-01-29 | 1989-08-04 | Matsushita Electric Ind Co Ltd | 磁気記録媒体保護膜の形成方法 |
US5011963A (en) * | 1988-02-09 | 1991-04-30 | Matsushita Electric Ind., Co., Ltd. | Terminal perfluoroalkylsilane compounds |
JPH0761428B2 (ja) * | 1989-03-09 | 1995-07-05 | 松下電器産業株式会社 | 選択透過性膜およびその製造方法 |
JPH02258886A (ja) * | 1989-03-31 | 1990-10-19 | Showa Denko Kk | 含フッ素表面処理剤 |
US5246740A (en) * | 1990-01-12 | 1993-09-21 | Matsushita Electric Industrial Co., Ltd. | Process for preparing a lamination of organic monomolecular films, and a chemical adsorbent used for the process |
JP2912694B2 (ja) * | 1990-09-07 | 1999-06-28 | 松下電器産業株式会社 | 記録再生装置 |
US5240774A (en) * | 1990-10-25 | 1993-08-31 | Matsushita Electric Industrial Co., Ltd. | Fluorocarbon-based coating film and method of manufacturing the same |
EP0492417B1 (de) * | 1990-12-21 | 1996-11-20 | Matsushita Electric Industrial Co., Ltd. | Verfahren zur Herstellung einer chemisch adsorbierten Schicht |
EP0493747B1 (de) * | 1990-12-25 | 1996-07-10 | Matsushita Electric Industrial Co., Ltd. | Nichtverunreinigender, absorbierter Film und Verfahren zu seiner Herstellung |
JP3021695B2 (ja) * | 1991-02-01 | 2000-03-15 | 松下電器産業株式会社 | 撥水撥油性凹版およびその製造方法 |
DE69206838T2 (de) * | 1991-02-19 | 1996-05-23 | Matsushita Electric Ind Co Ltd | Verfahren zur Herstellung eines chemisch absorbierten Films |
-
1993
- 1993-03-01 EP EP93103232A patent/EP0559119B1/de not_active Expired - Lifetime
- 1993-03-01 DE DE69329536T patent/DE69329536T2/de not_active Expired - Fee Related
-
1994
- 1994-09-15 US US08/306,517 patent/US6277444B1/en not_active Expired - Fee Related
-
2001
- 2001-06-28 US US09/892,530 patent/US6410152B2/en not_active Expired - Fee Related
-
2002
- 2002-01-29 US US10/058,220 patent/US6593000B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US6593000B2 (en) | 2003-07-15 |
DE69329536D1 (de) | 2000-11-16 |
EP0559119B1 (de) | 2000-10-11 |
US6277444B1 (en) | 2001-08-21 |
US6410152B2 (en) | 2002-06-25 |
EP0559119A1 (de) | 1993-09-08 |
US20020094436A1 (en) | 2002-07-18 |
US20010038916A1 (en) | 2001-11-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: PANASONIC CORP., KADOMA, OSAKA, JP |
|
8339 | Ceased/non-payment of the annual fee |