US20100259909A1 - Widebody Coil Isolators - Google Patents

Widebody Coil Isolators Download PDF

Info

Publication number
US20100259909A1
US20100259909A1 US12/752,019 US75201910A US2010259909A1 US 20100259909 A1 US20100259909 A1 US 20100259909A1 US 75201910 A US75201910 A US 75201910A US 2010259909 A1 US2010259909 A1 US 2010259909A1
Authority
US
United States
Prior art keywords
coil
lead frame
isolator
portions
coils
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
US12/752,019
Other versions
US8427844B2 (en
Inventor
Dominique Ho
Julie Fouquet
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Avago Technologies International Sales Pte Ltd
Original Assignee
Avago Technologies ECBU IP Singapore Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/512,034 external-priority patent/US7791900B2/en
Priority claimed from US12/059,747 external-priority patent/US7852186B2/en
Priority claimed from US12/059,979 external-priority patent/US9019057B2/en
Priority claimed from US12/370,208 external-priority patent/US9105391B2/en
Priority claimed from US12/392,978 external-priority patent/US7741943B2/en
Priority claimed from US12/393,596 external-priority patent/US8061017B2/en
Priority claimed from US12/477,078 external-priority patent/US8385043B2/en
Priority claimed from US12/495,733 external-priority patent/US7948067B2/en
Application filed by Avago Technologies ECBU IP Singapore Pte Ltd filed Critical Avago Technologies ECBU IP Singapore Pte Ltd
Priority to US12/752,019 priority Critical patent/US8427844B2/en
Assigned to AVAGO TECHNOLOGIES ECBU IP (SINGAPORE) PTE. LTD. reassignment AVAGO TECHNOLOGIES ECBU IP (SINGAPORE) PTE. LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: FOUQUET, JULIE, HO, DOMINIQUE
Publication of US20100259909A1 publication Critical patent/US20100259909A1/en
Priority to US12/957,446 priority patent/US8258911B2/en
Priority to GB1104609A priority patent/GB2479239A/en
Publication of US8427844B2 publication Critical patent/US8427844B2/en
Application granted granted Critical
Assigned to AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD. reassignment AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD. MERGER (SEE DOCUMENT FOR DETAILS). Assignors: AVAGO TECHNOLOGIES ECBU IP (SINGAPORE) PTE. LTD.
Assigned to DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT reassignment DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT PATENT SECURITY AGREEMENT Assignors: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Assigned to AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD. reassignment AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD. TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENT RIGHTS (RELEASES RF 032851-0001) Assignors: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Assigned to BANK OF AMERICA, N.A., AS COLLATERAL AGENT reassignment BANK OF AMERICA, N.A., AS COLLATERAL AGENT PATENT SECURITY AGREEMENT Assignors: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Assigned to AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD. reassignment AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD. TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENTS Assignors: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
Assigned to AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED reassignment AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED MERGER (SEE DOCUMENT FOR DETAILS). Assignors: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Assigned to AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED reassignment AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED CORRECTIVE ASSIGNMENT TO CORRECT THE EFFECTIVE DATE OF MERGER TO 09/05/2018 PREVIOUSLY RECORDED AT REEL: 047230 FRAME: 0133. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER. Assignors: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Active legal-status Critical Current
Adjusted expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00Details of transformers or inductances, in general
    • H01F27/28Coils; Windings; Conductive connections
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F19/00Fixed transformers or mutual inductances of the signal type
    • H01F19/04Transformers or mutual inductances suitable for handling frequencies considerably beyond the audio range
    • H01F19/08Transformers having magnetic bias, e.g. for handling pulses
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00Details of transformers or inductances, in general
    • H01F27/28Coils; Windings; Conductive connections
    • H01F27/2804Printed windings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00Details of transformers or inductances, in general
    • H01F27/34Special means for preventing or reducing unwanted electric or magnetic effects, e.g. no-load losses, reactive currents, harmonics, oscillations, leakage fields
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/482Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
    • H01L23/4821Bridge structure with air gap
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49537Plurality of lead frames mounted in one device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49575Assemblies of semiconductor devices on lead frames
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/5227Inductive arrangements or effects of, or between, wiring layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/46Networks for connecting several sources or loads, working on different frequencies or frequency bands, to a common load or source
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/52One-way transmission networks, i.e. unilines
    • H04B5/266
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04LTRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L25/00Baseband systems
    • H04L25/02Details ; arrangements for supplying electrical power along data transmission lines
    • H04L25/0264Arrangements for coupling to transmission lines
    • H04L25/0266Arrangements for providing Galvanic isolation, e.g. by means of magnetic or capacitive coupling
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F17/00Fixed inductances of the signal type 
    • H01F17/0006Printed inductances
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F17/00Fixed inductances of the signal type 
    • H01F17/0006Printed inductances
    • H01F17/0013Printed inductances with stacked layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F19/00Fixed transformers or mutual inductances of the signal type
    • H01F19/04Transformers or mutual inductances suitable for handling frequencies considerably beyond the audio range
    • H01F19/08Transformers having magnetic bias, e.g. for handling pulses
    • H01F2019/085Transformer for galvanic isolation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00Details of transformers or inductances, in general
    • H01F27/40Structural association with built-in electric component, e.g. fuse
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/48137Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48153Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being arranged next to each other, e.g. on a common substrate
    • H01L2224/48195Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being arranged next to each other, e.g. on a common substrate the item being a discrete passive component
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • H01L2224/48465Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/4847Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
    • H01L2224/48471Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area being a ball bond, i.e. wedge-to-ball, reverse stitch
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/4901Structure
    • H01L2224/4903Connectors having different sizes, e.g. different diameters
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/49105Connecting at different heights
    • H01L2224/49107Connecting at different heights on the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • H01L23/295Organic, e.g. plastic containing a filler
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01005Boron [B]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01006Carbon [C]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01013Aluminum [Al]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01014Silicon [Si]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01018Argon [Ar]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01031Gallium [Ga]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01033Arsenic [As]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/0106Neodymium [Nd]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01064Gadolinium [Gd]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01074Tungsten [W]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01076Osmium [Os]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/095Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
    • H01L2924/097Glass-ceramics, e.g. devitrified glass
    • H01L2924/09701Low temperature co-fired ceramic [LTCC]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/1015Shape
    • H01L2924/10155Shape being other than a cuboid
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/102Material of the semiconductor or solid state bodies
    • H01L2924/1025Semiconducting materials
    • H01L2924/10251Elemental semiconductors, i.e. Group IV
    • H01L2924/10253Silicon [Si]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12043Photo diode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/30107Inductance
    • H04B5/72
    • H04B5/75
    • H04B5/79
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/4902Electromagnet, transformer or inductor

Definitions

  • Various embodiments of the invention described herein relate to the field of data signal and power transformers or galvanic isolators and coil transducers, and more particularly to devices employing inductively coupled coil transducers to transmit and receive data and/or power signals across a dielectric or isolation barrier.
  • High voltage isolation communication devices known in the prior art include optical devices, magnetic devices and capacitive devices.
  • Prior art optical devices typically achieve high voltage isolation by employing LEDs and corresponding photodiodes to transmit and receive light signals, usually require high power levels, and suffer from operational and design constraints when multiple communication channels are required.
  • Prior art magnetic devices typically achieve high voltage isolation by employing opposing inductively-coupled coils, usually require high power levels to (especially when high data rates are required), typically require the use of at least three separate integrated circuits or chips, and often are susceptible to electromagnetic interference (“EMI”).
  • EMI electromagnetic interference
  • Prior art capacitive devices achieve voltage isolation by employing multiple pairs of transmitting and receiving electrodes, where for example a first pair of electrodes is employed to transmit and receive data, and a second pair of electrodes is employed to refresh or maintain the transmitted signals. Such capacitive devices typically exhibit poor high voltage hold-off or breakdown characteristics
  • a coil isolator comprising a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils, a first lead frame comprising a first IC die pad, and a second lead frame comprising a second IC die pad, wherein the first and second lead frames are separated by a gap, the first IC pad has a first IC attached thereto, the second IC pad has a second IC attached thereto, the coil transducer extends horizontally across the
  • a coil isolator comprising a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils, a substrate having at least one aperture disposed therethrough, the at least one aperture having at least one periphery, a first lead frame comprising an integrated circuit (IC) die pad, the first lead frame being located near the substrate but separated therefrom by a first gap, the first IC pad having a first IC attached thereto, a second lead frame comprising a second
  • a coil isolator comprising a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils, a first lead frame comprising an integrated circuit (IC) die pad, the first IC pad having a first IC attached thereto, a second lead frame comprising a second IC die pad, the second lead frame being located near the first lead frame and separated therefrom by a gap, the second IC pad having a second IC attached thereto, the second lead frame having
  • a method of making a coil isolator comprising providing a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils, providing a first integrated circuit (IC), a second IC, and first and second lead frames, the first lead frame including a first IC die pad, the second lead frame including a second IC pad, placing the first and second lead frames near one another such that the first and second lead frames are separated by a gap, attaching the first and second IC
  • IC integrated circuit
  • a method of making a coil isolator comprising providing a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils, providing a substrate having at least one aperture disposed therethrough, the aperture having at least one periphery, providing a first integrated circuit (IC) and a first lead frame comprising a first IC die pad, providing a second IC and a second lead frame comprising a second IC die pad, attaching the first IC
  • IC integrated circuit
  • a method of making a coil isolator comprising providing a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or op the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first in and second coils, providing a first integrated circuit (IC) and a first lead frame comprising a first IC die pad, providing a second IC and a second lead frame comprising a second IC die pad having at least one aperture disposed therethrough, the aperture having at least one periphery, attaching the first IC to the first
  • IC integrated circuit
  • FIG. 1 shows a cross-sectional view according to one embodiment of a coil isolator
  • FIG. 2 shows a top plan view of the coil isolator of FIG. 1 ;
  • FIG. 3 shows a cross-sectional view according to another embodiment of a coil isolator
  • FIG. 4 shows a top plan view of the coil isolator of FIG. 3 ;
  • FIG. 5 shows a cross-sectional view according to yet another embodiment of a coil isolator
  • FIG. 6 shows a top plan view of the coil isolator of FIG. 5 .
  • horizontal means a plane substantially parallel to the conventional plane or surface of the dielectric barrier disclosed herein, regardless of its actual orientation in space.
  • vertical refers to a direction substantially perpendicular to the horizontal as defined above. Terms such as “on”, “above,” “below,” “bottom,” “top,” “side,” “sidewall,” “higher,” “lower,” “upper,” “over” and “under” are defined in respect of the horizontal plane discussed above.
  • part of a metal lead frame typically the ground lead
  • a widebody package that can accommodate four full coil transducer isolators in a configuration that does not require stacking aside from the lead frame.
  • the various embodiments of quad widebody packages disclosed herein can operate with low enough crosstalk between adjacent channels that data streams are not corrupted.
  • the coil transducers are bidirectional, and therefore transmitter/receiver pairs may be spatially arranged and configured within the isolator or package as required.
  • the coil transducers in the isolator may be configured such that data travel from left to right in all four channels, or from left to right in two channels and right to left in the other two channels.
  • the transmitter and receiver sides of the various embodiments of coil isolator 5 disclosed herein may be reversed, the elements in any transmitter/receiver pair may be reversed, and that each metal pad or lead frame may be held at its local supply voltage rather than at ground potential,
  • a signal isolator typically includes a transmitter, a coil transducer and a receiver.
  • the transmitter conditions the incoming signal so that it will drive the transducer effectively.
  • the coil transducer transmits the signal from one side of an isolation barrier to the other side.
  • the receiver turns the signal from the far side of the isolation barrier into a (usually digital) signal replicating the input signal.
  • the coil transducer For the isolator to consume the smallest amount of power, it is desirable for the coil transducer to transmit the signal from one side of the isolation barrier to the other side with high efficiency.
  • the mutual inductance between two similar coils generally decreases with decreasing coil diameter. Careful attention must therefore be paid to the design of the coil transducer to obtain high efficiency in a widebody package.
  • the isolator must also hold off large DC and transient voltages between the circuits on the two sides. See, for example, the foregoing '034, '747, '979, '208, '978, '596, '078, '733 and Fouquet patent applications.
  • a widebody package is not large, and much of the space available within the package must be used for parts and purposes other than the coil transducers contained therein.
  • the silicon transmitter and receiver consume a large fraction of the available “footprint”, even if two channels are combined per chip (so that, for example, one chip may contain the transmitters for both channels and another chip may contain the receivers for both channels), as illustrated in some examples described and disclosed below. Allowances must be made for imprecise placement of parts within the package. Allowances must also be made for “squishout” of epoxy, if epoxy is used to attach the die within the package. Allowances must further be made for the Molding material surrounding the other elements within the package, so that the molding material will cover the elements within the package and prevent high voltage breakdown or other problems associated with interaction with the external environment.
  • the portion of the “footprint” remaining in the package for the coil transducers may be rather small.
  • High-accuracy die placement techniques can reduce allowances for imprecise placement.
  • Using an adhesive tape rather than epoxy to fix elements within the package can be advantageous because the tape eliminates the need for epoxy “squishout” allowances, therefore enlarging the space available for coil transducers within the package.
  • An adhesive tape approach may also be employed to attach silicon chips to a lead frame as well, so long as requirements for heatsinking and possible electrical conduction from the bottom of the chip to the lead frames can be met.
  • a traditional optical isolator package in which an LED sits on an input lead frame face-to-face with a receiver chip mounted on an output lead frame, light from an LED is generally directed to a photodiode integrated in a receiver chip.
  • Transparent dielectric material separates the LED from the receiver chip.
  • coils in a magnetic coil transformer must be very accurately located with respect to one another. In some embodiments, the coils are formed photolithographically on a common insulating substrate or dielectric barrier.
  • FIGS. 1 and 2 there are shown cross-sectional and top plan views, respectively, of one embodiment of a coil isolator 5 according to a so-called “side-by-side lead frame” or “bridge” packaging approach characterized by lead frames 56 and 58 being located near one another (but not touching), with coil transducers 10 a - 10 d extending across an intervening gap 63 disposed therebetween.
  • a typical spacing of gap 63 is about 8 mils, although other suitable widths of gap 63 are certainly contemplated.
  • Coil transducers 10 a through 10 d have opposing first and second ends 15 a - 15 d and 17 a - 17 d, respectively, each coil transducer comprising a dielectric barrier 22 a - 22 d, such barriers have opposing first and second sides 24 a - 24 d and 26 a - 26 d, respectively (see FIG. 1 ).
  • Dielectric barriers 22 a - 22 d comprise an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material. In each of coil transducers 10 a - 10 d.
  • first electrically conductive transmitter coils 28 a - 28 d are disposed near or on first sides 24 a - 24 d, where first leads 30 a - 30 d and 32 a - 32 d extend between first coils 28 a - 28 d and corresponding wire bond pads disposed at ends thereof (see 40 a - 40 d and 42 a - 42 d, respectively, in FIG. 2 ).
  • second electrically conductive receiver coils 34 a - 34 d are disposed near or on second sides 26 a - 26 d, where second leads 36 a - 36 d and 38 a - 38 d extend between second coils 34 a - 34 d and corresponding wire bond pads disposed at ends thereof (see 44 a - 44 d and 46 a - 46 d, respectively, in FIG. 2 ).
  • Dielectric barriers 22 a - 22 d are disposed between and separate the first and second coils 28 a - 28 d and 34 a - 34 d
  • Adhesive tape 23 a, 25 a, 27 a and 29 a is preferably employed to attach ICs 60 a - 60 d, coil transducers 10 a - 10 d, and ICs 64 a - 64 d to lead frames 56 and 58 , although epoxy may also be used in a manner well known in the art.
  • adhesive tape has the advantages of not resulting in “squishout” zones having potentially large space-consuming diameters, and not flowing to any appreciable degree.
  • the adhesive tape is preferably a tape that is sticky on both sides.
  • an adhesive or adhesive coating such as epoxy may be employed. If epoxy is used, allowances must be made for “squishout” so that the adjacent parts may be positioned closely to one another.
  • Wafer backside coating techniques for die attach may also be used to reduce or eliminate squishout allowances.
  • Wafer backside coating is a technique used widely in “stacked die” applications, where a silicon wafer is coated with a layer of B-stage epoxy before sawing, and then picked up and placed on a substrate. To avoid high power consumption, it is important to keep silicon chip sizes and allowances for packaging small so that coil transducers 10 a - 10 d can be large enough to perform reasonably efficiently. High-accuracy die placement techniques can help reduce allowances for imprecise placement. Using adhesive tape or wafer backside coating techniques rather than epoxy to attach elements within coil isolator 5 can be advantageous because they essentially eliminate the need for space-robbing epoxy “squishout” allowances.
  • Lead frames 56 and 58 are preferably formed of metal, and may therefore be formed quickly and inexpensively by, for example, stamping. Note further that the outline of encapsulating material 80 shown in FIG. 2 (as well as in FIGS. 4 and 6 ) delineates the approximate perimeter of electrically insulating overmolding material 80 that is emplaced around lead frames 56 , 58 , substrate 55 , ICs 60 a - 60 d, ICs 64 a - 64 d. coil transducers 10 a - 10 d, input leads 92 , and output leads 94 .
  • Encapsulating material 80 is shown in cross-section in FIGS. 1 , 3 and 7 in further detail, and in one embodiment is a silica-bead-loaded epoxy or other suitable electrically insulating material such as an appropriate plastic or polymer.
  • the silica beads in the epoxy have been discovered to help control undesired thermal expansion.
  • those portions of leads 92 and 94 , and first and second lead frames 56 and 58 which form pins for package 5 are sawn off or otherwise removed after overmolding material 80 has encapsulated therein the various components and portions of package 5 .
  • first and second lead frames 56 and 58 cannot touch one another, and must be electrically isolated from one another, to prevent shorting therebetween. The same is true with respect to first lead frame 56 and substrate 55 , and second lead frame 58 and substrate 55 , where touching is not permitted so as to prevent shorting.
  • first and second lead frames 56 and 58 of coil isolator 5 are bridged by coil transducers 10 a - 10 d, which extend horizontally between first and second lead frames 56 and 58 , where at least portions of first and second ends 15 a - 15 d and 17 a - 17 d extend onto first and second lead frames 56 and 58 .
  • First and second lead frames 56 and 58 are separated from one another by gap 63 , which in conjunction with the molding material selected to fill gap 63 is preferably selected to have a width sufficient to prevent high voltage breakdown from occurring between first lead frame 56 and second lead frame 58 .
  • ICs 60 a - 60 d and 64 a - 64 d are not shown in FIGS. 2 , 4 and 6 , but are shown in the cross-sectional views of FIGS. 1 , 3 and 5 .
  • wire bonds 48 a - 48 d, 50 a - 50 d, 52 a - 54 d and 54 a - 54 d (which operably connect ICs 60 a - 60 d and 64 a - 64 d to coil transducers 10 a - 10 d ) are not shown in FIGS. 2 , 4 and 6 , but wire bonds 48 a and 54 a are shown in FIGS. 1 , 3 and 5 .
  • first lead frame 56 includes first integrated circuit (IC) die pads upon which are mounted transmitter ICs 60 a - 60 d.
  • second lead frame 58 includes second IC die pads upon which are mounted receiver ICs 64 a - 64 d.
  • first and second transmitter and receiver circuits 60 a - 60 d and 64 a - 64 d are integrated circuits, but may also assume other forms of transmitter and receiver circuitry known to those skilled in the art. Reference to FIGS.
  • first lead frame 56 also shows that edge portions 57 of first lead frame 56 are not disposed vertically beneath portions of first and second coils 28 a - 28 d and 34 a - 34 d, and that coil wirebond pads 40 a - 40 d, 42 a - 42 d, 44 a - 44 d, and 46 a - 46 d are disposed vertically over or beneath first and second lead frames 56 and 58 , respectively.
  • coil transducers 10 a - 10 d with respect to first and second lead frames 56 and 58 shown in FIGS. 1 and 2 has been discovered to improve the performance of coil isolator 5 by decreasing electromagnetic interaction between coil transducers 10 a - 10 d and first lead frame 56 and second lead frame 58 .
  • Such an improvement in performance is due at least partially to coils 28 a - 28 d and 34 a - 34 d not overlapping vertically edge 57 of first lead frame 56 or second edge 59 of second frame 58 .
  • Lead frames 56 and 58 shown in FIGS. 1 and 2 provide firm, stable and robust underpinnings and structural supports for wire bonding operations undertaken with respect to wire bond pads 40 a through 46 d.
  • high voltage breakdown may also occur along paths 11 and 19 .
  • path 11 along the top side of coil transducers 10 a - 10 d
  • high voltage shorting or arcing may occur along or near bonding wires 54 a - 54 d and 48 a - 48 d, or along or near any air gaps that might remain after molding material 80 has been disposed around the top surfaces of coil transducers 10 a - 10 d.
  • high voltage shorting or arcing may also occur between inner edges 57 and 59 of first and second lead frames 56 and 58 , respectively, or along or near any air gaps that might remain after molding material 80 has been disposed around the bottom surfaces of coil transducers 10 a - 10 d.
  • coil isolator 5 provides solutions to the problems of electromagnetic interference and high voltage shorting or arcing described above.
  • coil isolator 5 shown in FIGS. 1 and 2 may be modified such that no portions of first and second lead frames 56 and 58 , including inner edges 57 and 59 , are disposed vertically over or beneath any portions of first and second coils 28 a - 28 d and 34 a - 34 d, and such that coil wirebond pads 40 a - 46 d are disposed vertically over or beneath portions of first and second lead frames 56 and 58 , respectively.
  • the first gap may also be filled substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS.
  • the first gap and the electrically non-conductive material disposed therein improve the performance of coil isolator 5 due to an increase in electromagnetic resistance occurring between lead frames 56 and 58 , which also results in the elimination or reduction of shorting, arcing or high voltage breakdown paths between such components.
  • FIGS. 3 and 4 there are shown cross-sectional and top plan views, respectively, according to another embodiment of coil isolator 5 , a so-called “floating island” packaging approach characterized by centrally located substrate 55 being disposed between, but separated from, first lead frame 56 and second lead frame 58 by first gap 70 and second gap 74 , respectively.
  • lead frames 56 and 58 are disposed to either side of centrally disposed substrate 55 such that inner edge 57 of first lead frame 56 , and inner edge 59 of second lead frame 58 , face towards substrate 55 , but are separated therefrom by first gap 70 and first gap filling material 72 , and second gap 74 and second gap filling material 76 , respectively.
  • substrate 55 comprises a plurality of apertures 78 a - 78 d, one for each of coil transducers 10 a - 10 d, each of which coil transducers extends horizontally across its corresponding aperture such that the first and second ends 15 a - 15 d and 17 a - 17 d extend at least partially beyond the periphery of each aperture and onto or beneath non-aperture portions of substrate 55 .
  • apertures 78 a - 78 d one for each of coil transducers 10 a - 10 d, each of which coil transducers extends horizontally across its corresponding aperture such that the first and second ends 15 a - 15 d and 17 a - 17 d extend at least partially beyond the periphery of each aperture and onto or beneath non-aperture portions of substrate 55 .
  • first and second gaps 70 and 74 are filled substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS, which according to one embodiment is the same material employed to encapsulate the various components of coil isolator 5 . Note that the regions of package 5 located beneath the centers of coil transducers 10 a - 10 d intentionally contain no metal so as to minimize electromagnetic interference and reduce the probability of shorting, arcing or high voltage breakdown.
  • coil transducers 10 a - 10 d with respect to first and second lead frames 56 and 58 and substrate 55 shown in FIGS. 3 and 4 increases the performance of coil isolator 5 by increasing electromagnetic resistance between coil transducers 10 a - 10 d and first and second lead frames 56 and 58 , and by providing a firm, stable and robust underpinning and structural support for wire bonding operations undertaken with respect to wire bond pads 40 a through 46 d.
  • High voltage shorting and arcing path 19 shown in FIG. 1 is essentially eliminated in the embodiment of coil isolator 5 shown in FIGS. 3 and 4 .
  • Vertically-oriented gaps 70 and 74 are filled with electrically insulating materials 72 and 76 , which prevent high voltage breakdown, shorting and arcing between substrate 55 and first and second lead frames 56 and 58 .
  • FIGS. 5 and 6 there are shown cross-sectional and top plan views, respectively, according to yet another embodiment of coil isolator 5 , a so-called “extended lead frame” packaging approach characterized by apertures 78 a - 78 d being located in second frame 58 , where second lead frame is separated from first lead frame 56 by gap 70 and gap filling material 72 .
  • lead frames 56 and 58 are positioned near one another such that inner edges 57 of first lead frame 56 , and inner edge 59 of second lead frame 58 , face towards one another across vertically-oriented gap 70 .
  • second lead frame 58 comprises a plurality of apertures 78 a - 78 d, one for each of coil transducers 10 a - 10 d, each of which extends horizontally across its corresponding aperture such that the first and second ends 15 a - 15 d and 17 a - 17 d extend at least partially beyond the periphery of each aperture and onto or beneath non-aperture portions of second lead frame 58 .
  • apertures 78 a - 78 d one for each of coil transducers 10 a - 10 d, each of which extends horizontally across its corresponding aperture such that the first and second ends 15 a - 15 d and 17 a - 17 d extend at least partially beyond the periphery of each aperture and onto or beneath non-aperture portions of second lead frame 58 .
  • the non-aperture portions of second lead frame 58 are not disposed vertically over or beneath any portions of first and second coils 28 a and 34 a, and coil wirebond pads 40 a - 46 a are disposed vertically over or beneath non-aperture portions of second lead frame 58 .
  • Vertically-oriented gap 70 is filled substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS, which according to one embodiment is the same material employed to encapsulate the various components of coil isolator 5 . Note that according to one embodiment, the regions of package 5 located beneath the centers of coil transducers 10 a - 10 d intentionally contain no metal.
  • coil transducers 10 a - 10 d with respect to first and second lead frames 56 and 58 shown in FIGS. 5 and 6 increases the performance of system 5 by increasing electromagnetic resistance between coil transducers 10 a - 10 d and first and second lead frames 56 and 58 , and by providing a firm, stable and robust underpinning and structural support for wire bonding operations undertaken with respect to wire bond pads 40 a through 46 d.
  • High voltage shorting and arcing path 19 shown in FIG. 1 is essentially eliminated in the embodiment of coil transducer 5 shown in FIGS. 5 and 6 .
  • Vertically-oriented gap 70 is filled with electrically insulating material 72 , which prevents high voltage breakdown, shorting and arcing between first lead frame 56 and second lead frames 58 .
  • first lead frame 56 instead of second lead frame 58 may be configured to extend beneath coil transducer 10 a. Doing so limits the extent of lead frame 58 that is employed to support IC 64 a, which in turn can result in reducing the voltage holdoff demands on the insulating layer at the bottom of coil transducer 10 a when lead frame 56 supporting coil transducer 10 a is at a voltage close to that of the coil located nearest thereto it (e.g., coil 34 a in FIG. 1 ).
  • first ICs 60 a - 60 d comprising transmitter circuits and having transmitter output terminals, the transmitter output terminals being operably connected to first coils 28 a - 28 d through the wire bond pads corresponding thereto:
  • Such transmitter circuits may be configured to provide differential output signals.
  • Second ICs 64 a - 64 d may comprise receiver circuits and have receiver input terminals, the receiver input terminals being operably connected to second coils 34 a - 34 d through the wire bond pads corresponding thereto.
  • Such receiver circuits may be configured to receive differential input signals.
  • First and second coils 28 a - 28 d and 34 a - 34 d are preferably spatially arranged and configured respecting one another such that at least one, of power and data signals may be transmitted by the first coils to the second coils across dielectric barriers 22 a - 22 d.
  • each pair of transmitting and receiving coils 28 a / 34 a, 28 b / 34 b , 28 c / 34 c and 28 d / 34 d has, in combination, at least five turns, at least eight turns, at least ten turns, at least twenty turns, or more than twenty turns. In some signaling embodiments, fewer coils turns (such as less than twenty turns) may be employed in conjunction with coil trace widths ranging between about 20 microns and about 40 microns. In some power embodiments, more than twenty coil turns may be employed in conjunction with coil trace widths ranging between about 40 microns and about 100 microns.
  • Dielectric barriers 22 a - 22 d may comprise one or more of fiberglass, glass, ceramic, polyimide, polyimide film, a polymer, an organic material, a flex circuit material, epoxy, epoxy resin, a printed circuit board material, PTFE and glass, PTFE and ceramic, glass and ceramic, thermoset plastic, plastic, a polymer or combination of polymers containing ceramic beads or particles, ceramic/polymer blends, mixes and combinations, KAPTONTM material manufactured by DuPont CorporationTM, and THERMAL CLADTM dielectric materials manufactured the Bergquist CompanyTM (such as those having layers containing “High Power Lighting” or HPL dielectric material).
  • a breakdown voltage between coil transducers 10 a - 10 d and first ICs 60 a - 60 d across gap 70 , or between coil transducers 10 a - 10 d and second ICs 64 a - 64 d across gap 74 may exceed about 2,000 volts RMS when applied over a time period of about one minute, exceed about 2,000 volts RMS when applied over a time period of about six minutes, or exceed about 2,000 volts RMS when applied over a time period of 24 hours.
  • a breakdown voltage between coil transducers 10 a - 10 d and first ICs 60 a - 60 d across gap 70 , or between coil transducers 10 a - 10 d and second ICs 64 a - 64 d across the gap 74 may exceed about 5,000 volts RMS when applied over a time period of about one minute, exceed about 5,000 volts RMS when applied over a time period of about six minutes, or exceed about 5,000 volts RMS when applied over a time period of 24 hours.
  • coil transducers 10 a - 10 d and at least portions of the first and second lead frames 56 and 58 are encapsulated with a molding material 80 , which in a preferred embodiment is a silica-bead-loaded epoxy.
  • a molding material 80 which in a preferred embodiment is a silica-bead-loaded epoxy.
  • wire bond pads 40 a - 46 d for coils 28 a - 34 d of coil transducers 10 a - 10 d are located on both sides of major axis 12 of such coil transducers.
  • a length L of each coil transducer 10 between first and second ends 15 and 17 may be less than about 2 mm.
  • a width W of each coil transducer 10 may be less than about 1.5 mm.
  • coil isolator 5 forms a package including four coil transducers 10 a - 10 d, first and second lead frames 56 and 58 and optionally substrate 55 , and transmitter and receiver circuits 60 a - 60 d and 64 a - 64 d, where the package has a length less than about 12 mm, less than about 20 mm, or less than about 30 mm, and has a width less than about 6 mm, less than about 10 mm, or less than about 20 mm.
  • a method of making a coil isolator comprising providing a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils, providing a first integrated circuit (IC), a second IC, and first and second lead frames, the first lead frame including a first IC die pad, the second lead frame including a second IC pad, placing the first and second lead frames near one another such that the first and second lead frames are separated by a gap, attaching the first and second IC
  • a method of making a coil isolator comprising providing a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils, providing a substrate having at least one aperture disposed therethrough, the aperture having at least one periphery, providing a first integrated circuit (IC) and a first lead frame comprising a first IC die pad, providing a second IC and a second lead frame comprising a second IC die pad, attaching the first IC to the
  • a method of making a colt isolator comprising providing a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils, providing a first integrated circuit (IC) and a first lead frame comprising a first IC die pad, providing a second IC and a second lead frame comprising a second IC die pad having at least one aperture disposed therethrough, the aperture having at least one periphery, attaching the first IC to the first
  • IC integrated circuit

Abstract

Disclosed herein are various embodiments of widebody coil isolators containing multiple coil transducers, where integrated circuits are not stacked vertically over the coil transducers. The disclosed coil isolators provide high voltage isolation and high voltage breakdown performance characteristics in small packages that provide a high degree of functionality at a low price.

Description

    RELATED APPLICATIONS
  • This application claims priority and other benefits from, and is a continuation-in-part of each of the following patent applications: (a) U.S. patent application Ser. No. 11/512,034 filed Aug. 28, 2006 entitled “Galvanic Isolator” to Fouquet et al. (hereafter “the '034 patent application”); (b) U.S. patent application Ser. No. 12/059,747 filed Mar. 31, 2008 entitled “Coil Transducer with Reduced Arcing and Improved High Voltage Breakdown Performance Characteristics” to Fouquet et al. (hereafter “the '747 patent application”); (c) U.S. patent application Ser. No. 12/059,979 filed Mar. 31, 2008 entitled “Galvanic Isolators and Coil Transducers” to Fouquet et al. (hereafter “the '979 patent application”); (d) U.S. patent application Ser. No. 12/370,208 filed Feb. 12, 2009 entitled “High Voltage Hold-off Coil Transducer” to Fouquet et al. (hereafter “the '208 patent application”); (e) U.S. patent application Ser. No. 12/392,978 filed Feb. 25, 2009 entitled “Miniature Transformers Adapted for Use in Galvanic Isolators and the Like” to Fouquet et al. (hereafter “the '978 patent application”); (f) U.S. patent application Ser. No. 12/393,596 filed Feb. 26, 2009 entitled “Minimizing Electromagnetic Interference in Coil Transducers” to Fouquet et al. (hereafter “the '596 patent application”); (g) U.S. patent application Ser. No. 12/477,078 filed Jun. 2, 2009 entitled “Galvanic Isolator” to Gek Yong Ng. et al, (hereafter “the '078 patent application”); and U.S. patent application Ser. No. 12/495,733 filed Jun. 30, 2009 entitled “Coil Transducer Isolator Packages” (hereafter “the '733 patent application”). This application also hereby incorporates by reference herein in their respective entireties the foregoing '034, '747, '979, '208, '978, '596, '078 and '733 patent applications.
  • This application also hereby incorporates by reference herein U.S. patent application Ser. No. ______ filed on even date herewith entitled “Narrowbody Coil isolators” to Fouquet et al. (hereafter “the Fouquet patent application”).
  • FIELD OF THE INVENTION
  • Various embodiments of the invention described herein relate to the field of data signal and power transformers or galvanic isolators and coil transducers, and more particularly to devices employing inductively coupled coil transducers to transmit and receive data and/or power signals across a dielectric or isolation barrier.
  • BACKGROUND
  • High voltage isolation communication devices known in the prior art include optical devices, magnetic devices and capacitive devices. Prior art optical devices typically achieve high voltage isolation by employing LEDs and corresponding photodiodes to transmit and receive light signals, usually require high power levels, and suffer from operational and design constraints when multiple communication channels are required.
  • Prior art magnetic devices typically achieve high voltage isolation by employing opposing inductively-coupled coils, usually require high power levels to (especially when high data rates are required), typically require the use of at least three separate integrated circuits or chips, and often are susceptible to electromagnetic interference (“EMI”).
  • Prior art capacitive devices achieve voltage isolation by employing multiple pairs of transmitting and receiving electrodes, where for example a first pair of electrodes is employed to transmit and receive data, and a second pair of electrodes is employed to refresh or maintain the transmitted signals. Such capacitive devices typically exhibit poor high voltage hold-off or breakdown characteristics
  • The design of small high speed galvanic isolators or coil transducers presents several formidable technical challenges, such difficulty in miniaturizing such devices while keeping manufacturing costs low, maintaining high voltage breakdown characteristics, and providing acceptable data or power transfer rates.
  • SUMMARY
  • In one embodiment, there is provided a coil isolator comprising a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils, a first lead frame comprising a first IC die pad, and a second lead frame comprising a second IC die pad, wherein the first and second lead frames are separated by a gap, the first IC pad has a first IC attached thereto, the second IC pad has a second IC attached thereto, the coil transducer extends horizontally across the gap between the first and second lead frames and the first and second ends extend onto the first and second lead frames, no portions of the first and second lead frames are disposed vertically over or beneath any portions of the first and second coils, the coil wirebond pads are disposed vertically over or beneath the first and second lead frames, respectively, and the gap is filled substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS.
  • In another embodiment, there is provided a coil isolator comprising a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils, a substrate having at least one aperture disposed therethrough, the at least one aperture having at least one periphery, a first lead frame comprising an integrated circuit (IC) die pad, the first lead frame being located near the substrate but separated therefrom by a first gap, the first IC pad having a first IC attached thereto, a second lead frame comprising a second IC die pad, the second lead frame being located near the substrate but separated therefrom by a second gap, the second IC pad having a second IC attached thereto, wherein the coil transducer extends horizontally across the aperture and the first and second ends extend at least partially beyond the periphery and onto or beneath non-aperture portions of the substrate, the non-aperture portions of the substrate are not disposed vertically over or beneath any portions of the first and second coils, the coil wirebond pads are disposed vertically over or beneath non-aperture portions of the substrate, and the first and second gaps are filled substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS.
  • In yet another embodiment, there is provided a coil isolator comprising a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils, a first lead frame comprising an integrated circuit (IC) die pad, the first IC pad having a first IC attached thereto, a second lead frame comprising a second IC die pad, the second lead frame being located near the first lead frame and separated therefrom by a gap, the second IC pad having a second IC attached thereto, the second lead frame having at least one aperture disposed therethrough, the aperture having at least one periphery, wherein the coil transducer extends horizontally across the aperture and the first and second ends extend at least partially beyond the periphery and onto or beneath non-aperture portions of the second lead frame, the non-aperture portions of the second lead frame are not disposed vertically over or beneath any portions of the first and second coils, the coil wirebond pads are disposed vertically over or beneath non-aperture portions of the second lead frame, and the gap is filled substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS.
  • In still another embodiment, there is provided a method of making a coil isolator comprising providing a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils, providing a first integrated circuit (IC), a second IC, and first and second lead frames, the first lead frame including a first IC die pad, the second lead frame including a second IC pad, placing the first and second lead frames near one another such that the first and second lead frames are separated by a gap, attaching the first and second ICs to the first and second IC pads, respectively, attaching the coil transducer to the first and second lead frames such that the coil transducer extends horizontally between the first and second lead frames and the first and second ends extend onto or beneath at least portions of the first and second lead frames, no portions of the first and second lead frames are disposed vertically over or beneath any portions of the first and second coils, and the wire bond pads of the first and, second coils are disposed vertically over or beneath the first and second lead frames, respectively, and filling the gap substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS.
  • In yet a further embodiment, there is provided a method of making a coil isolator comprising providing a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils, providing a substrate having at least one aperture disposed therethrough, the aperture having at least one periphery, providing a first integrated circuit (IC) and a first lead frame comprising a first IC die pad, providing a second IC and a second lead frame comprising a second IC die pad, attaching the first IC to the first IC pad and the second IC to the second IC pad, attaching the coil transducer to the substrate such that the coil transducer extends horizontally across the aperture and at least portions of the first and second ends extend beyond the periphery and onto or beneath non-aperture portions of the substrate, non-aperture portions of the substrate are not disposed vertically over or beneath any portions of the first and second coils, and the wire bond pads of the first and second coils are disposed vertically over or beneath non-aperture portions of the substrate, placing the first lead frame near the substrate such that the first lead frame and the substrate are separated by a first gap, placing the second lead frame near the substrate such that the second lead frame and the substrate are separated by a second gap, and filling the first and second gaps substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS.
  • In yet still another embodiment, there is provided a method of making a coil isolator comprising providing a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or op the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first in and second coils, providing a first integrated circuit (IC) and a first lead frame comprising a first IC die pad, providing a second IC and a second lead frame comprising a second IC die pad having at least one aperture disposed therethrough, the aperture having at least one periphery, attaching the first IC to the first IC pad and the second IC to the second IC die pad, attaching the coil transducer to the second lead frame such that the coil transducer extends horizontally across the aperture and at least portions of the first and second ends extend beyond the periphery and onto or beneath non-aperture portions of the second lead frame, non-aperture portions of the second lead frame are not disposed vertically over or beneath any portions of the first and second coils, and the wire bond pads of the first and second coils are disposed vertically over or beneath non-aperture portions of the second lead frame, placing the first lead frame near the second lead frame such that the first lead frame and the second lead frame are separated by a gap, and filling the gap substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS.
  • Further embodiments are disclosed herein or will become apparent to those skilled in the art after having read and understood the specification and drawings hereof.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • Different aspects of the various embodiments of the invention will become apparent from the following specification, drawings and claims in which:
  • FIG. 1 shows a cross-sectional view according to one embodiment of a coil isolator;
  • FIG. 2 shows a top plan view of the coil isolator of FIG. 1;
  • FIG. 3 shows a cross-sectional view according to another embodiment of a coil isolator;
  • FIG. 4 shows a top plan view of the coil isolator of FIG. 3;
  • FIG. 5 shows a cross-sectional view according to yet another embodiment of a coil isolator, and
  • FIG. 6 shows a top plan view of the coil isolator of FIG. 5.
  • The drawings are not necessarily to scale. Like numbers refer to like parts or steps throughout the drawings, unless otherwise noted.
  • DETAILED DESCRIPTION OF SOME PREFERRED EMBODIMENTS
  • In the following description, specific details are provided to impart a thorough understanding of the various embodiments of the invention. Upon having read and understood the specification, claims and drawings hereof, however, those skilled in the art will understand that some embodiments of the invention may be practiced without hewing to some of the specific details set forth herein. Moreover, to avoid obscuring the invention, some well known circuits, materials and methods finding application in the various, embodiments of the invention are not disclosed in detail herein.
  • In the drawings, some, but not all, possible embodiments of the invention are illustrated, and further may not be shown to scale.
  • The term “horizontal” as used herein means a plane substantially parallel to the conventional plane or surface of the dielectric barrier disclosed herein, regardless of its actual orientation in space. The term “vertical refers to a direction substantially perpendicular to the horizontal as defined above. Terms such as “on”, “above,” “below,” “bottom,” “top,” “side,” “sidewall,” “higher,” “lower,” “upper,” “over” and “under” are defined in respect of the horizontal plane discussed above.
  • In many semiconductor chip packages, part of a metal lead frame (typically the ground lead) widens within the package to provide a plane upon which other elements, such as silicon chips, may sit. Described and disclosed herein are various embodiments of a widebody package that can accommodate four full coil transducer isolators in a configuration that does not require stacking aside from the lead frame. The various embodiments of quad widebody packages disclosed herein can operate with low enough crosstalk between adjacent channels that data streams are not corrupted. According to some embodiments, the coil transducers are bidirectional, and therefore transmitter/receiver pairs may be spatially arranged and configured within the isolator or package as required. For example, the coil transducers in the isolator may be configured such that data travel from left to right in all four channels, or from left to right in two channels and right to left in the other two channels. Note that the transmitter and receiver sides of the various embodiments of coil isolator 5 disclosed herein may be reversed, the elements in any transmitter/receiver pair may be reversed, and that each metal pad or lead frame may be held at its local supply voltage rather than at ground potential,
  • A signal isolator typically includes a transmitter, a coil transducer and a receiver. The transmitter conditions the incoming signal so that it will drive the transducer effectively. The coil transducer transmits the signal from one side of an isolation barrier to the other side. The receiver turns the signal from the far side of the isolation barrier into a (usually digital) signal replicating the input signal. For the isolator to consume the smallest amount of power, it is desirable for the coil transducer to transmit the signal from one side of the isolation barrier to the other side with high efficiency. However, the mutual inductance between two similar coils generally decreases with decreasing coil diameter. Careful attention must therefore be paid to the design of the coil transducer to obtain high efficiency in a widebody package. The isolator must also hold off large DC and transient voltages between the circuits on the two sides. See, for example, the foregoing '034, '747, '979, '208, '978, '596, '078, '733 and Fouquet patent applications.
  • A widebody package is not large, and much of the space available within the package must be used for parts and purposes other than the coil transducers contained therein. For example, the silicon transmitter and receiver consume a large fraction of the available “footprint”, even if two channels are combined per chip (so that, for example, one chip may contain the transmitters for both channels and another chip may contain the receivers for both channels), as illustrated in some examples described and disclosed below. Allowances must be made for imprecise placement of parts within the package. Allowances must also be made for “squishout” of epoxy, if epoxy is used to attach the die within the package. Allowances must further be made for the Molding material surrounding the other elements within the package, so that the molding material will cover the elements within the package and prevent high voltage breakdown or other problems associated with interaction with the external environment.
  • As a result, the portion of the “footprint” remaining in the package for the coil transducers may be rather small. To avoid low efficiency from a too-small coil transducer, it is important to keep both the silicon chip sizes and the allowances for packaging small. High-accuracy die placement techniques can reduce allowances for imprecise placement. Using an adhesive tape rather than epoxy to fix elements within the package can be advantageous because the tape eliminates the need for epoxy “squishout” allowances, therefore enlarging the space available for coil transducers within the package. Such an approach is relatively straightforward to employ for coil transducers. An adhesive tape approach may also be employed to attach silicon chips to a lead frame as well, so long as requirements for heatsinking and possible electrical conduction from the bottom of the chip to the lead frames can be met.
  • In a traditional optical isolator package, in which an LED sits on an input lead frame face-to-face with a receiver chip mounted on an output lead frame, light from an LED is generally directed to a photodiode integrated in a receiver chip. Transparent dielectric material separates the LED from the receiver chip. While many optical isolator packages are capable of tolerating some variation in the thickness of the transparent dielectric material disposed between the LED and the receiver chip, coils in a magnetic coil transformer must be very accurately located with respect to one another. In some embodiments, the coils are formed photolithographically on a common insulating substrate or dielectric barrier. Even when the various components of a galvanic isolator are arranged and function optimally, they must be encapsulated by and surrounded with an electrically insulative molding material to prevent high voltage breakdown, which by way of example can occur around the outside of a coil transducer because air is a poor electrical insulator. If adhesion between the molding material and the various components of the galvanic isolator is not sufficiently good, the resulting air gaps can lead to high voltage breakdown.
  • When adhesion between an insulating molding material and the various components disposed within the package is less than ideal, some embodiments disclosed herein nevertheless will prevent high voltage breakdown.
  • Referring now to FIGS. 1 and 2, there are shown cross-sectional and top plan views, respectively, of one embodiment of a coil isolator 5 according to a so-called “side-by-side lead frame” or “bridge” packaging approach characterized by lead frames 56 and 58 being located near one another (but not touching), with coil transducers 10 a-10 d extending across an intervening gap 63 disposed therebetween. According to one embodiment, a typical spacing of gap 63 is about 8 mils, although other suitable widths of gap 63 are certainly contemplated. Coil transducers 10 a through 10 d have opposing first and second ends 15 a-15 d and 17 a-17 d, respectively, each coil transducer comprising a dielectric barrier 22 a-22 d, such barriers have opposing first and second sides 24 a-24 d and 26 a-26 d, respectively (see FIG. 1). Dielectric barriers 22 a-22 d comprise an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material. In each of coil transducers 10 a-10 d. first electrically conductive transmitter coils 28 a-28 d are disposed near or on first sides 24 a-24 d, where first leads 30 a-30 d and 32 a-32 d extend between first coils 28 a-28 d and corresponding wire bond pads disposed at ends thereof (see 40 a-40 d and 42 a-42 d, respectively, in FIG. 2). Also in each of coil transducers 10 a-10 d, second electrically conductive receiver coils 34 a-34 d are disposed near or on second sides 26 a-26 d, where second leads 36 a-36 d and 38 a-38 d extend between second coils 34 a-34 d and corresponding wire bond pads disposed at ends thereof (see 44 a-44 d and 46 a-46 d, respectively, in FIG. 2). Dielectric barriers 22 a-22 d are disposed between and separate the first and second coils 28 a-28 d and 34 a-34 d
  • Adhesive tape 23 a, 25 a, 27 a and 29 a is preferably employed to attach ICs 60 a-60 d, coil transducers 10 a-10 d, and ICs 64 a-64 d to lead frames 56 and 58, although epoxy may also be used in a manner well known in the art. As discussed above, adhesive tape has the advantages of not resulting in “squishout” zones having potentially large space-consuming diameters, and not flowing to any appreciable degree. The adhesive tape is preferably a tape that is sticky on both sides. Alternatively, an adhesive or adhesive coating such as epoxy may be employed. If epoxy is used, allowances must be made for “squishout” so that the adjacent parts may be positioned closely to one another. Wafer backside coating techniques for die attach may also be used to reduce or eliminate squishout allowances. Wafer backside coating is a technique used widely in “stacked die” applications, where a silicon wafer is coated with a layer of B-stage epoxy before sawing, and then picked up and placed on a substrate. To avoid high power consumption, it is important to keep silicon chip sizes and allowances for packaging small so that coil transducers 10 a-10 d can be large enough to perform reasonably efficiently. High-accuracy die placement techniques can help reduce allowances for imprecise placement. Using adhesive tape or wafer backside coating techniques rather than epoxy to attach elements within coil isolator 5 can be advantageous because they essentially eliminate the need for space-robbing epoxy “squishout” allowances.
  • Lead frames 56 and 58 (and substrate 55 discussed below) are preferably formed of metal, and may therefore be formed quickly and inexpensively by, for example, stamping. Note further that the outline of encapsulating material 80 shown in FIG. 2 (as well as in FIGS. 4 and 6) delineates the approximate perimeter of electrically insulating overmolding material 80 that is emplaced around lead frames 56, 58, substrate 55, ICs 60 a-60 d, ICs 64 a-64 d. coil transducers 10 a-10 d, input leads 92, and output leads 94.
  • Encapsulating material 80 is shown in cross-section in FIGS. 1, 3 and 7 in further detail, and in one embodiment is a silica-bead-loaded epoxy or other suitable electrically insulating material such as an appropriate plastic or polymer. The silica beads in the epoxy have been discovered to help control undesired thermal expansion. Note further that those portions of leads 92 and 94, and first and second lead frames 56 and 58 which form pins for package 5, and which extend beyond the perimeter of material 80 shown in FIGS. 2, 4 and 6, are sawn off or otherwise removed after overmolding material 80 has encapsulated therein the various components and portions of package 5.
  • In whichever configuration they are employed, first and second lead frames 56 and 58 cannot touch one another, and must be electrically isolated from one another, to prevent shorting therebetween. The same is true with respect to first lead frame 56 and substrate 55, and second lead frame 58 and substrate 55, where touching is not permitted so as to prevent shorting.
  • As further shown in FIGS. 1 and 2, first and second lead frames 56 and 58 of coil isolator 5 are bridged by coil transducers 10 a-10 d, which extend horizontally between first and second lead frames 56 and 58, where at least portions of first and second ends 15 a-15 d and 17 a-17 d extend onto first and second lead frames 56 and 58. First and second lead frames 56 and 58 are separated from one another by gap 63, which in conjunction with the molding material selected to fill gap 63 is preferably selected to have a width sufficient to prevent high voltage breakdown from occurring between first lead frame 56 and second lead frame 58. To avoid clutter in the Figures, ICs 60 a-60 d and 64 a-64 d are not shown in FIGS. 2, 4 and 6, but are shown in the cross-sectional views of FIGS. 1, 3 and 5. For the same reason wire bonds 48 a-48 d, 50 a-50 d, 52 a-54 d and 54 a-54 d (which operably connect ICs 60 a-60 d and 64 a-64 d to coil transducers 10 a-10 d) are not shown in FIGS. 2, 4 and 6, but wire bonds 48 a and 54 a are shown in FIGS. 1, 3 and 5.
  • As further shown in FIGS. 1 and 2, first lead frame 56 includes first integrated circuit (IC) die pads upon which are mounted transmitter ICs 60 a-60 d. while second lead frame 58 includes second IC die pads upon which are mounted receiver ICs 64 a-64 d. According to one embodiment, first and second transmitter and receiver circuits 60 a-60 d and 64 a-64 d are integrated circuits, but may also assume other forms of transmitter and receiver circuitry known to those skilled in the art. Reference to FIGS. 1 and 2 also shows that edge portions 57 of first lead frame 56 are not disposed vertically beneath portions of first and second coils 28 a-28 d and 34 a-34 d, and that coil wirebond pads 40 a-40 d, 42 a-42 d, 44 a-44 d, and 46 a-46 d are disposed vertically over or beneath first and second lead frames 56 and 58, respectively.
  • The arrangement of coil transducers 10 a-10 d with respect to first and second lead frames 56 and 58 shown in FIGS. 1 and 2 has been discovered to improve the performance of coil isolator 5 by decreasing electromagnetic interaction between coil transducers 10 a-10 d and first lead frame 56 and second lead frame 58. Such an improvement in performance is due at least partially to coils 28 a-28 d and 34 a-34 d not overlapping vertically edge 57 of first lead frame 56 or second edge 59 of second frame 58. Lead frames 56 and 58 shown in FIGS. 1 and 2 provide firm, stable and robust underpinnings and structural supports for wire bonding operations undertaken with respect to wire bond pads 40 a through 46 d.
  • In the embodiment of coil isolator 5 shown in FIGS. 1 and 2, high voltage breakdown may also occur along paths 11 and 19. With respect to path 11 along the top side of coil transducers 10 a-10 d, high voltage shorting or arcing may occur along or near bonding wires 54 a-54 d and 48 a-48 d, or along or near any air gaps that might remain after molding material 80 has been disposed around the top surfaces of coil transducers 10 a-10 d. With respect to path 19 along the bottom side of coil transducers 10 a-10 d, high voltage shorting or arcing may also occur between inner edges 57 and 59 of first and second lead frames 56 and 58, respectively, or along or near any air gaps that might remain after molding material 80 has been disposed around the bottom surfaces of coil transducers 10 a-10 d.
  • Various embodiments of coil isolator 5 disclosed below provide solutions to the problems of electromagnetic interference and high voltage shorting or arcing described above.
  • Note that the embodiment of coil isolator 5 shown in FIGS. 1 and 2 may be modified such that no portions of first and second lead frames 56 and 58, including inner edges 57 and 59, are disposed vertically over or beneath any portions of first and second coils 28 a-28 d and 34 a-34 d, and such that coil wirebond pads 40 a-46 d are disposed vertically over or beneath portions of first and second lead frames 56 and 58, respectively. The first gap may also be filled substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS. The first gap and the electrically non-conductive material disposed therein improve the performance of coil isolator 5 due to an increase in electromagnetic resistance occurring between lead frames 56 and 58, which also results in the elimination or reduction of shorting, arcing or high voltage breakdown paths between such components.
  • Referring now to FIGS. 3 and 4, there are shown cross-sectional and top plan views, respectively, according to another embodiment of coil isolator 5, a so-called “floating island” packaging approach characterized by centrally located substrate 55 being disposed between, but separated from, first lead frame 56 and second lead frame 58 by first gap 70 and second gap 74, respectively. As further shown in FIGS. 3 and 4, lead frames 56 and 58 are disposed to either side of centrally disposed substrate 55 such that inner edge 57 of first lead frame 56, and inner edge 59 of second lead frame 58, face towards substrate 55, but are separated therefrom by first gap 70 and first gap filling material 72, and second gap 74 and second gap filling material 76, respectively.
  • As further shown in FIGS. 3 and 4, substrate 55 comprises a plurality of apertures 78 a-78 d, one for each of coil transducers 10 a-10 d, each of which coil transducers extends horizontally across its corresponding aperture such that the first and second ends 15 a-15 d and 17 a-17 d extend at least partially beyond the periphery of each aperture and onto or beneath non-aperture portions of substrate 55. As further shown in FIG. 3, the non-aperture portions of substrate 55 are not disposed vertically over or beneath any portions of first and second coils 28 a and 34 a, and coil wirebond pads 40 a-46 a are disposed vertically over or beneath non-aperture portions of substrate 55. First and second gaps 70 and 74 are filled substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS, which according to one embodiment is the same material employed to encapsulate the various components of coil isolator 5. Note that the regions of package 5 located beneath the centers of coil transducers 10 a-10 d intentionally contain no metal so as to minimize electromagnetic interference and reduce the probability of shorting, arcing or high voltage breakdown.
  • The arrangement of coil transducers 10 a-10 d with respect to first and second lead frames 56 and 58 and substrate 55 shown in FIGS. 3 and 4 increases the performance of coil isolator 5 by increasing electromagnetic resistance between coil transducers 10 a-10 d and first and second lead frames 56 and 58, and by providing a firm, stable and robust underpinning and structural support for wire bonding operations undertaken with respect to wire bond pads 40 a through 46 d. High voltage shorting and arcing path 19 shown in FIG. 1 is essentially eliminated in the embodiment of coil isolator 5 shown in FIGS. 3 and 4. Vertically-oriented gaps 70 and 74 are filled with electrically insulating materials 72 and 76, which prevent high voltage breakdown, shorting and arcing between substrate 55 and first and second lead frames 56 and 58.
  • Referring now to FIGS. 5 and 6, there are shown cross-sectional and top plan views, respectively, according to yet another embodiment of coil isolator 5, a so-called “extended lead frame” packaging approach characterized by apertures 78 a-78 d being located in second frame 58, where second lead frame is separated from first lead frame 56 by gap 70 and gap filling material 72. As further shown in FIGS. 5 and 6, lead frames 56 and 58 are positioned near one another such that inner edges 57 of first lead frame 56, and inner edge 59 of second lead frame 58, face towards one another across vertically-oriented gap 70.
  • As shown in FIGS. 5 and 6, second lead frame 58 comprises a plurality of apertures 78 a-78 d, one for each of coil transducers 10 a-10 d, each of which extends horizontally across its corresponding aperture such that the first and second ends 15 a-15 d and 17 a-17 d extend at least partially beyond the periphery of each aperture and onto or beneath non-aperture portions of second lead frame 58. As further shown in FIG. 5, the non-aperture portions of second lead frame 58 are not disposed vertically over or beneath any portions of first and second coils 28 a and 34 a, and coil wirebond pads 40 a-46 a are disposed vertically over or beneath non-aperture portions of second lead frame 58. Vertically-oriented gap 70 is filled substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS, which according to one embodiment is the same material employed to encapsulate the various components of coil isolator 5. Note that according to one embodiment, the regions of package 5 located beneath the centers of coil transducers 10 a-10 d intentionally contain no metal.
  • The arrangement of coil transducers 10 a-10 d with respect to first and second lead frames 56 and 58 shown in FIGS. 5 and 6 increases the performance of system 5 by increasing electromagnetic resistance between coil transducers 10 a-10 d and first and second lead frames 56 and 58, and by providing a firm, stable and robust underpinning and structural support for wire bonding operations undertaken with respect to wire bond pads 40 a through 46 d. High voltage shorting and arcing path 19 shown in FIG. 1 is essentially eliminated in the embodiment of coil transducer 5 shown in FIGS. 5 and 6. Vertically-oriented gap 70 is filled with electrically insulating material 72, which prevents high voltage breakdown, shorting and arcing between first lead frame 56 and second lead frames 58.
  • Note that first lead frame 56 instead of second lead frame 58 may be configured to extend beneath coil transducer 10 a. Doing so limits the extent of lead frame 58 that is employed to support IC 64 a, which in turn can result in reducing the voltage holdoff demands on the insulating layer at the bottom of coil transducer 10 a when lead frame 56 supporting coil transducer 10 a is at a voltage close to that of the coil located nearest thereto it (e.g., coil 34 a in FIG. 1).
  • Note that the various embodiments of coil isolator 5 shown in FIGS. 1, 2, 3, 4, 5 and 6 may comprise one or more of first ICs 60 a-60 d comprising transmitter circuits and having transmitter output terminals, the transmitter output terminals being operably connected to first coils 28 a-28 d through the wire bond pads corresponding thereto: Such transmitter circuits may be configured to provide differential output signals. Second ICs 64 a-64 d may comprise receiver circuits and have receiver input terminals, the receiver input terminals being operably connected to second coils 34 a-34 d through the wire bond pads corresponding thereto. Such receiver circuits may be configured to receive differential input signals. First and second coils 28 a-28 d and 34 a-34 d are preferably spatially arranged and configured respecting one another such that at least one, of power and data signals may be transmitted by the first coils to the second coils across dielectric barriers 22 a-22 d.
  • Note further that in some embodiments each pair of transmitting and receiving coils 28 a/34 a, 28 b/34 b , 28 c/34 c and 28 d/34 d has, in combination, at least five turns, at least eight turns, at least ten turns, at least twenty turns, or more than twenty turns. In some signaling embodiments, fewer coils turns (such as less than twenty turns) may be employed in conjunction with coil trace widths ranging between about 20 microns and about 40 microns. In some power embodiments, more than twenty coil turns may be employed in conjunction with coil trace widths ranging between about 40 microns and about 100 microns.
  • Dielectric barriers 22 a-22 d may comprise one or more of fiberglass, glass, ceramic, polyimide, polyimide film, a polymer, an organic material, a flex circuit material, epoxy, epoxy resin, a printed circuit board material, PTFE and glass, PTFE and ceramic, glass and ceramic, thermoset plastic, plastic, a polymer or combination of polymers containing ceramic beads or particles, ceramic/polymer blends, mixes and combinations, KAPTON™ material manufactured by DuPont Corporation™, and THERMAL CLAD™ dielectric materials manufactured the Bergquist Company™ (such as those having layers containing “High Power Lighting” or HPL dielectric material).
  • According to some embodiments of coil isolator 5, a breakdown voltage between coil transducers 10 a-10 d and first ICs 60 a-60 d across gap 70, or between coil transducers 10 a-10 d and second ICs 64 a-64 d across gap 74, may exceed about 2,000 volts RMS when applied over a time period of about one minute, exceed about 2,000 volts RMS when applied over a time period of about six minutes, or exceed about 2,000 volts RMS when applied over a time period of 24 hours. Alternatively, a breakdown voltage between coil transducers 10 a-10 d and first ICs 60 a-60 d across gap 70, or between coil transducers 10 a-10 d and second ICs 64 a-64 d across the gap 74, may exceed about 5,000 volts RMS when applied over a time period of about one minute, exceed about 5,000 volts RMS when applied over a time period of about six minutes, or exceed about 5,000 volts RMS when applied over a time period of 24 hours.
  • As shown in FIGS. 1, 3 and 5, coil transducers 10 a-10 d and at least portions of the first and second lead frames 56 and 58 are encapsulated with a molding material 80, which in a preferred embodiment is a silica-bead-loaded epoxy. Note further, and as shown in FIGS. 2, 4 and 6, in some embodiments wire bond pads 40 a-46 d for coils 28 a-34 d of coil transducers 10 a-10 d are located on both sides of major axis 12 of such coil transducers.
  • A length L of each coil transducer 10 between first and second ends 15 and 17 may be less than about 2 mm. A width W of each coil transducer 10 may be less than about 1.5 mm. According to some embodiments, coil isolator 5 forms a package including four coil transducers 10 a-10 d, first and second lead frames 56 and 58 and optionally substrate 55, and transmitter and receiver circuits 60 a-60 d and 64 a-64 d, where the package has a length less than about 12 mm, less than about 20 mm, or less than about 30 mm, and has a width less than about 6 mm, less than about 10 mm, or less than about 20 mm.
  • Included within the scope of the present invention are methods of making and having made, and using, the various components, devices and systems described herein.
  • For example, in one embodiment there is provided a method of making a coil isolator comprising providing a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils, providing a first integrated circuit (IC), a second IC, and first and second lead frames, the first lead frame including a first IC die pad, the second lead frame including a second IC pad, placing the first and second lead frames near one another such that the first and second lead frames are separated by a gap, attaching the first and second ICs to the first and second IC pads, respectively, attaching the coil transducer to the first and second lead frames such that the coil transducer extends horizontally between the first and second lead frames and the first and second ends extend onto or beneath at least portions of the first and second lead frames, no portions of the first and second lead frames are disposed vertically over or beneath any portions of the first and second coils, and the wire bond pads of the first and second coils are disposed vertically over or beneath the first and second lead frames, respectively, and filling the gap substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS.
  • According to another example, there is provided a method of making a coil isolator comprising providing a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils, providing a substrate having at least one aperture disposed therethrough, the aperture having at least one periphery, providing a first integrated circuit (IC) and a first lead frame comprising a first IC die pad, providing a second IC and a second lead frame comprising a second IC die pad, attaching the first IC to the first IC pad and the second IC to the second IC pad, attaching the coil transducer to the substrate such that the coil transducer extends horizontally across the aperture and at least portions of the first and second ends extend beyond the periphery and onto or beneath non-aperture portions of the substrate, non-aperture portions of the substrate are not disposed vertically over or beneath any portions of the first and second coils, and the wire bond pads of the first and second coils are disposed vertically over or beneath non-aperture portions of the substrate, placing the first lead frame near the substrate such that the first lead frame and the substrate are separated by a first gap, placing the second lead frame near the substrate such that the second lead frame and the substrate are separated by a second gap, and filling the first and second gaps substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS.
  • In yet a further example, there is provided a method of making a colt isolator comprising providing a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils, providing a first integrated circuit (IC) and a first lead frame comprising a first IC die pad, providing a second IC and a second lead frame comprising a second IC die pad having at least one aperture disposed therethrough, the aperture having at least one periphery, attaching the first IC to the first IC pad and the second IC to the second IC die pad, attaching the coil transducer to the second lead frame such that the coil transducer extends horizontally across the aperture and at least portions of the first and second ends extend beyond the periphery and onto or beneath non-aperture portions of the second lead frame, non-aperture portions of the second lead frame are not disposed vertically over or beneath any portions of the first and second coils, and the wire bond pads of the first and second coils are disposed vertically over or beneath non-aperture portions of the second lead frame, placing the first lead frame near the second lead frame such that the first lead frame and the second lead frame are separated by a gap, and filling the gap substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS.
  • The above-described embodiments should be considered as examples of the present invention, rather than as limiting the scope of the invention. In addition to the foregoing embodiments of the invention, review of the detailed description and accompanying drawings will show that there are other embodiments of the invention. Accordingly, many combinations, permutations, variations and modifications of the foregoing embodiments of the invention not set forth explicitly herein will nevertheless fall within the scope of the invention.

Claims (36)

1. A coil isolator, comprising:
a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils;
a first lead frame comprising a first IC die pad, and
a second lead frame comprising a second IC die pad;
wherein the first and second lead frames are separated by a gap, the first IC pad has a first IC attached thereto, the second IC pad has a second IC attached thereto, the coil transducer extends horizontally across the gap between the first and second lead frames and the first and second ends extend onto the first and second lead frames, no portions of the first and second lead frames are disposed vertically over or beneath any portions of the first and second coils, the coil wirebond pads are disposed vertically over or beneath the first and second lead frames, respectively, and the gap is filled substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS.
2. The coil isolator of claim 1, wherein the coil transducer is a flex circuit.
3. The coil isolator of claim 1, wherein the first IC comprises a transmitter circuit and has transmitter output terminals, the transmitter output terminals being operably connected to the first coil through the wire bond pads corresponding thereto.
4. The coil isolator of claim 1, wherein the second IC comprises a receiver circuit and has receiver input terminals, the receiver input terminals being operably connected to the second coil through the wire bond pads corresponding thereto.
5. The coil isolator of claim 1, wherein the first and second coils are spatially arranged and configured respecting one another such that at least one of power and data signals may be transmitted by the first coil to the second coil across the dielectric barrier
6. The coil isolator of claim 1, wherein the first and second coils, in combination, have at least five turns, at least eight turns, at least ten turns, or at least twenty turns.
7. The coil isolator of claim 1, wherein the dielectric barrier comprises fiberglass, glass, ceramic, polyimide, polyimide film, a polymer, an organic material, a flex circuit material, epoxy, epoxy resin, a printed circuit board material, PTFE and glass, PTFE and ceramic, glass and ceramic, thermoset plastic, plastic, a polymer or combination of polymers containing ceramic beads or particles, or ceramic/polymer blends, mixes and combinations.
8. The coil isolator of claim 1, wherein a breakdown voltage between the coil transducer and the first IC or second IC across the gap exceeds about 2,000 volts RMS when applied over a time period of about one minute, exceeds about 2,000 volts RMS when applied over a time period of about six minutes, or exceeds about 2,000 volts RMS when applied over a time period of 24 hours.
9. The coil isolator of claim 1, wherein the coil transducer and at least portions of the first and second lead frames are encapsulated with a molding material comprising silica-loaded epoxy.
10. The coil isolator of claim 1, wherein wire bond pads for coils of the coil transducer are located on both sides of a major axis of the coil transducer.
11. A coil isolator, comprising:
a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils;
a substrate having at least one aperture disposed therethrough, the at least one aperture having at least one periphery;
a first lead frame comprising an integrated circuit (IC) die pad, the first lead frame being located near the substrate but separated therefrom by a first gap, the first IC pad having a first IC attached thereto;
a second lead frame comprising a second IC die pad, the second lead frame being located near the substrate but separated therefrom by a second gap, the second IC pad having a second IC attached thereto,
wherein the coil transducer extends horizontally across the aperture and the first and second ends extend at least partially beyond the periphery and onto or beneath non-aperture portions of the substrate, the non-aperture portions of the substrate are not disposed vertically over or beneath any portions of the first and second coils, the coil wirebond pads are disposed vertically over or beneath non-aperture portions of the substrate, and the first and second gaps are filled substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS.
12. The coil isolator of claim 11, wherein the coil transducer is a flex circuit.
13. The coil isolator of claim 11, wherein the first IC comprises a transmitter circuit and has transmitter output terminals, the transmitter output terminals being operably connected to the first coil through the wire bond pads corresponding thereto.
14. The coil isolator of claim 11, wherein the second IC comprises a receiver circuit and has receiver input terminals, the receiver input terminals being operably connected to the second coil through the wire bond pads corresponding thereto.
15. The coil isolator of claim 11, wherein the first and second coils are spatially arranged and configured respecting one another such that at least one of power and data signals may be transmitted by the first coil to the second coil across the dielectric barrier.
16. The coil isolator of claim 11, wherein the first and second coils, in combination, have at least five turns, at least eight turns, at least ten turns, or at least twenty turns.
17. The coil isolator of claim 11, wherein the dielectric barrier comprises fiberglass, glass, ceramic, polyimide, polyimide film, a polymer, an organic material, a flex circuit material, epoxy, epoxy resin, a printed circuit board material, PTFE and glass, PTFE and ceramic, glass and ceramic, thermoset plastic, or plastic.
18. The coil isolator of claim 11, wherein a breakdown voltage between the coil transducer and the first IC or second IC across the gap exceeds about 2,000 volts RMS when applied over a time period of about one minute, exceeds about 2,000 volts RMS when applied over a time period of about six minutes, or exceeds about 2,000 volts RMS when applied over a time period of 24 hours.
19. The coil isolator of claim 14, wherein the coil transducer and at least portions of the first and second lead frames are encapsulated with a molding material comprising silica-loaded epoxy.
20. The coil isolator of claim 14, wherein wire bond pads for coils of the coil transducer are located on both sides of a major axis of the coil transducer.
21. A coil isolator, comprising:
a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils;
a first lead frame comprising an integrated circuit (IC) die pad, the first IC pad having a first IC attached thereto;
a second lead frame comprising a second IC die pad, the second lead frame being located near the first lead frame and separated therefrom by a gap, the second IC pad having a second IC attached thereto, the second lead frame having at least one aperture disposed therethrough, the aperture having at least one periphery;
wherein the coil transducer extends horizontally across the aperture and the first and second ends extend at least partially beyond the periphery and onto or beneath non-aperture portions of the second lead frame, the non-aperture portions of the second lead frame are not disposed vertically over or beneath any portions of the first and second coils, the coil wirebond pads are disposed vertically over or beneath non-aperture portions of the second lead frame, and the gap is filled substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS.
22. The coil isolator of claim 21, wherein the coil transducer is a flex circuit.
23. The coil isolator of claim 21, wherein the first IC comprises a transmitter circuit and has transmitter output terminals, the transmitter output terminals being operably connected to the first coil through the wire bond pads corresponding thereto.
24. The coil isolator of claim 21, wherein the second IC comprises a receiver circuit and has receiver input terminals, the receiver input terminals being operably connected to the second coil through the wire bond pads corresponding thereto.
25. The coil isolator of claim 21, wherein the first and second coils are spatially arranged and configured respecting one another such that at least one of power and data signals may be transmitted by the first coil to the second coil across the dielectric barrier.
26. The coil isolator of claim 21, wherein the first and second coils, in combination, have at least five turns, at least eight turns, at least ten turns, or at least twenty turns.
27. The coil isolator of claim 21, wherein the dielectric barrier comprises fiberglass, glass, ceramic, polyimide, polyimide film, a polymer, an organic material, a flex circuit material, epoxy, epoxy resin, a printed circuit board material, PTFE and glass, PTFE and ceramic, glass and ceramic, thermoset plastic, or plastic.
28. The coil isolator of claim 21, wherein a breakdown voltage between the coil transducer and the first IC across the first gap, or between the coil transducer and the second IC across the second gap, exceeds about 2,000 volts RMS when applied over a time period of about one minute, exceeds about 2,000 volts RMS when applied over a time period of about six minutes, or exceeds about 2,000 volts RMS when applied over a time period of 24 hours.
29. The coil isolator of claim 21, wherein the coil transducer and at least portions of the first and second lead frames are encapsulated with a molding material comprising silica-loaded epoxy.
30. The coil isolator of claim 21, wherein wire bond pads for coils of the coil transducer are located on both sides of a major axis of the coil transducer.
31. A method of making a coil isolator, comprising:
providing a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils;
providing a first integrated circuit (IC), a second IC, and first and second lead frames, the first lead frame including a first IC die pad, the second lead frame including a second IC pad;
placing the first and second lead frames near one another such that the first and second lead frames are separated by a gap;
attaching the first and second ICs to the first and second IC pads, respectively;
attaching the coil transducer to the first and second lead frames such that the coil transducer extends horizontally between the first and second lead frames and the first and second ends extend onto or beneath at least portions of the first and second lead frames, no portions of the first and second lead frames are disposed vertically over or beneath any portions of the first and second coils, and the wire bond pads of the first and second coils are disposed vertically over or beneath the first and second lead frames, respectively, and
filling the gap substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS.
32. The method of claim 31, further comprising encapsulating the coil transducer and at least portions of the first and second lead frames with a molding material comprising silica-loaded epoxy.
33. A method of making a coil isolator, comprising:
providing a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils;
providing a substrate having at least one aperture disposed therethrough, the aperture having at least one periphery;
providing a first integrated circuit (IC) and a first lead frame comprising a first IC die pad;
providing a second IC and a second lead frame comprising a second IC die pad;
attaching the first IC to the first IC pad and the second IC to the second IC pad;
attaching the coil transducer to the substrate such that the coil transducer extends horizontally across the aperture and at least portions of the first and second ends extend beyond the periphery and onto or beneath non-aperture portions of the substrate, non-aperture portions of the substrate are not disposed vertically over or beneath any portions of the first and second coils, and the wire bond pads of the first and second coils are disposed vertically over or beneath non-aperture portions of the substrate;
placing the first lead frame near the substrate such that the first lead frame and the substrate are separated by a first gap;
placing the second lead frame near the substrate such that the second lead frame and the substrate are separated by a second gap, and
filling the first and second gaps substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS.
34. The method of claim 33, further comprising encapsulating the coil transducer, at least portions of the substrate, and at least portions of the first and second lead frames with a molding material comprising silica-loaded epoxy.
35. A method of making a coil isolator, comprising:
providing a coil transducer having opposing first and second ends and comprising a dielectric barrier having opposing first and second sides, the dielectric barrier comprising an electrically insulating, non-metallic, non-semiconductor, low-dielectric-loss material, a first electrically conductive transmitter coil disposed near or on the first side, first leads extending between the first coil and wire bond pads corresponding thereto, and a second electrically conductive receiver coil disposed near or on the second side, second leads extending between the second coil and wire bond pads corresponding thereto, the dielectric barrier being disposed between the first and second coils;
providing a first integrated circuit (IC) and a first lead frame comprising a first IC die pad;
providing a second IC and a second lead frame comprising a second IC die pad having at least one aperture disposed therethrough, the aperture having at least one periphery;
attaching the first IC to the first IC pad and the second IC to the second IC die pad;
attaching the coil transducer to the second lead frame such that the coil transducer extends horizontally across the aperture and at least portions of the first and second ends extend beyond the periphery and onto or beneath non-aperture portions of the second lead frame, non-aperture portions of the second lead frame are not disposed vertically over or beneath any portions of the first and second coils, and the wire bond pads of the first and second coils are disposed vertically over or beneath non-aperture portions of the second lead frame;
placing the first lead frame near the second lead frame such that the first lead frame and the second lead frame are separated by a gap, and
filling the gap substantially with at least one electrically non-conductive material having a voltage breakdown exceeding about 2,000 volts RMS.
36. The method of claim 35, further comprising encapsulating the coil transducer, at least portions of the substrate, and at least portions of the first and second lead frames with a molding material comprising silica-loaded epoxy.
US12/752,019 2006-08-28 2010-03-31 Widebody coil isolators Active 2027-04-27 US8427844B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US12/752,019 US8427844B2 (en) 2006-08-28 2010-03-31 Widebody coil isolators
US12/957,446 US8258911B2 (en) 2008-03-31 2010-12-01 Compact power transformer components, devices, systems and methods
GB1104609A GB2479239A (en) 2010-03-31 2011-03-18 Widebody coil isolators

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US11/512,034 US7791900B2 (en) 2006-08-28 2006-08-28 Galvanic isolator
US12/059,747 US7852186B2 (en) 2006-08-28 2008-03-31 Coil transducer with reduced arcing and improved high voltage breakdown performance characteristics
US12/059,979 US9019057B2 (en) 2006-08-28 2008-03-31 Galvanic isolators and coil transducers
US12/370,208 US9105391B2 (en) 2006-08-28 2009-02-12 High voltage hold-off coil transducer
US12/392,978 US7741943B2 (en) 2007-05-10 2009-02-25 Miniature transformers adapted for use in galvanic isolators and the like
US12/393,596 US8061017B2 (en) 2006-08-28 2009-02-26 Methods of making coil transducers
US12/477,078 US8385043B2 (en) 2006-08-28 2009-06-02 Galvanic isolator
US12/495,733 US7948067B2 (en) 2009-06-30 2009-06-30 Coil transducer isolator packages
US12/752,019 US8427844B2 (en) 2006-08-28 2010-03-31 Widebody coil isolators

Related Parent Applications (3)

Application Number Title Priority Date Filing Date
US11/512,034 Continuation-In-Part US7791900B2 (en) 2006-08-28 2006-08-28 Galvanic isolator
US12/495,733 Continuation-In-Part US7948067B2 (en) 2006-08-28 2009-06-30 Coil transducer isolator packages
US12/751,971 Continuation-In-Part US8093983B2 (en) 2006-08-28 2010-03-31 Narrowbody coil isolator

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/495,733 Continuation-In-Part US7948067B2 (en) 2006-08-28 2009-06-30 Coil transducer isolator packages

Publications (2)

Publication Number Publication Date
US20100259909A1 true US20100259909A1 (en) 2010-10-14
US8427844B2 US8427844B2 (en) 2013-04-23

Family

ID=44012797

Family Applications (1)

Application Number Title Priority Date Filing Date
US12/752,019 Active 2027-04-27 US8427844B2 (en) 2006-08-28 2010-03-31 Widebody coil isolators

Country Status (2)

Country Link
US (1) US8427844B2 (en)
GB (1) GB2479239A (en)

Cited By (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080179963A1 (en) * 2006-08-28 2008-07-31 Avago Technologies Ecbu (Singapore) Pte. Ltd. Galvanic Isolators and Coil Transducers
US20090243783A1 (en) * 2006-08-28 2009-10-01 Avago Technologies Ecbu (Singapore) Pte. Ltd. Minimizing Electromagnetic Interference in Coil Transducers
US20100020448A1 (en) * 2006-08-28 2010-01-28 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Galvanic isolator
US20100176660A1 (en) * 2006-08-28 2010-07-15 Avago Technologies General IP (Singpore) Pte. Ltd. Galvanic isolator
US20100188182A1 (en) * 2006-08-28 2010-07-29 Avago Technologies Ecbu (Singapore) Pte.Ltd. Narrowbody Coil Isolator
US20110075449A1 (en) * 2008-03-31 2011-03-31 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Compact Power Transformer Components, Devices, Systems and Methods
US20110156812A1 (en) * 2009-12-31 2011-06-30 Avago Technologies Wireless Ip (Singapore) Pte. Ltd. Multi-band, multi-mode rf transmit amplifier system with separate signal paths for linear and saturated operation
GB2479239A (en) * 2010-03-31 2011-10-05 Avago Tech Ecbu Ip Widebody coil isolators
US20120181874A1 (en) * 2011-01-18 2012-07-19 Stefan Willkofer Semiconductor Device and Method of Manufacture Thereof
US8237534B2 (en) 2007-05-10 2012-08-07 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Miniature transformers adapted for use in galvanic isolators and the like
US8680656B1 (en) * 2009-01-05 2014-03-25 Amkor Technology, Inc. Leadframe structure for concentrated photovoltaic receiver package
US8841547B1 (en) 2009-10-09 2014-09-23 Amkor Technology, Inc. Concentrated photovoltaic receiver package with built-in connector
US20140355218A1 (en) * 2011-05-11 2014-12-04 Vlt, Inc. Panel-Molded Electronic Assemblies
US9105391B2 (en) 2006-08-28 2015-08-11 Avago Technologies General Ip (Singapore) Pte. Ltd. High voltage hold-off coil transducer
US9439297B2 (en) 2011-05-11 2016-09-06 Vlt, Inc. Method of making a plurality of electronic assemblies
US20170178787A1 (en) * 2015-12-18 2017-06-22 Texas Instruments Incorporated Methods and Apparatus for Isolation Barrier with Integrated Magnetics for High Power Modules
US20170222131A1 (en) * 2016-01-29 2017-08-03 Avago Technologies General Ip (Singapore) Pte. Ltd. Hall-effect sensor isolator
US20170330824A1 (en) * 2016-05-13 2017-11-16 Panasonic Corporation Signal transmission apparatus including semiconductor chips and signal isolator
JP2017220922A (en) * 2016-03-02 2017-12-14 パナソニックIpマネジメント株式会社 Signal transmission device and manufacturing method thereof
US9936580B1 (en) 2015-01-14 2018-04-03 Vlt, Inc. Method of forming an electrical connection to an electronic module
US10264664B1 (en) 2015-06-04 2019-04-16 Vlt, Inc. Method of electrically interconnecting circuit assemblies
US10290608B2 (en) 2016-09-13 2019-05-14 Allegro Microsystems, Llc Signal isolator having bidirectional diagnostic signal exchange
US10541195B2 (en) * 2018-01-29 2020-01-21 Lite-On Singapore Pte. Ltd. Package structure of capacitive coupling isolator
US10594162B2 (en) * 2013-05-24 2020-03-17 Texas Instruments Incorporated Galvanic isolator
US20200411434A1 (en) * 2019-06-25 2020-12-31 Renesas Electronics Corporation Semiconductor device and method of manufacturing the same
US20210043466A1 (en) * 2019-08-06 2021-02-11 Texas Instruments Incorporated Universal semiconductor package molds
US11011297B2 (en) * 2013-11-13 2021-05-18 Rohm Co., Ltd. Semiconductor device and semiconductor module
US11073573B2 (en) * 2017-05-26 2021-07-27 Allegro Microsystems, Llc Packages for coil actuated position sensors
US11115244B2 (en) 2019-09-17 2021-09-07 Allegro Microsystems, Llc Signal isolator with three state data transmission
US11115020B2 (en) * 2009-11-05 2021-09-07 Rohm Co., Ltd. Signal transmission circuit device, semiconductor device, method and apparatus for inspecting semiconductor device, signal transmission device, and motor drive apparatus using signal transmission device
CN113474860A (en) * 2019-02-26 2021-10-01 德克萨斯仪器股份有限公司 Isolation transformer with integrated shielding topology for reduced EMI
WO2022210542A1 (en) * 2021-03-29 2022-10-06 ローム株式会社 Insulation transformer, insulation module, and gate driver
US11476045B2 (en) * 2020-05-29 2022-10-18 Analog Devices International Unlimited Company Electric field grading protection design surrounding a galvanic or capacitive isolator
US11538766B2 (en) * 2019-02-26 2022-12-27 Texas Instruments Incorporated Isolated transformer with integrated shield topology for reduced EMI
US11876058B2 (en) * 2020-03-24 2024-01-16 Kabushiki Kaisha Toshiba Isolator

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9141157B2 (en) * 2011-10-13 2015-09-22 Texas Instruments Incorporated Molded power supply system having a thermally insulated component
US8674486B2 (en) * 2011-12-14 2014-03-18 Samsung Electro-Mechanics Isolation barrier device and methods of use
US9508485B1 (en) * 2012-10-04 2016-11-29 Vlt, Inc. Isolator with integral transformer
US8818296B2 (en) * 2012-11-14 2014-08-26 Power Integrations, Inc. Noise cancellation for a magnetically coupled communication link utilizing a lead frame
US9035435B2 (en) 2012-11-14 2015-05-19 Power Integrations, Inc. Magnetically coupled galvanically isolated communication using lead frame
US9929038B2 (en) * 2013-03-07 2018-03-27 Analog Devices Global Insulating structure, a method of forming an insulating structure, and a chip scale isolator including such an insulating structure
US9466413B2 (en) 2013-06-28 2016-10-11 Freescale Semiconductor, Inc. Die-to-die inductive communication devices and methods
US9160423B2 (en) 2013-12-12 2015-10-13 Freescale Semiconductor, Inc. Die-to-die inductive communication devices and methods
US10992346B2 (en) 2014-03-26 2021-04-27 Nxp Usa, Inc. Systems and devices with common mode noise suppression structures and methods
US9219028B1 (en) * 2014-12-17 2015-12-22 Freescale Semiconductor, Inc. Die-to-die inductive communication devices and methods
US10204732B2 (en) * 2015-10-23 2019-02-12 Analog Devices Global Dielectric stack, an isolator device and method of forming an isolator device
US9941565B2 (en) 2015-10-23 2018-04-10 Analog Devices Global Isolator and method of forming an isolator
US10505258B2 (en) 2016-08-02 2019-12-10 Analog Devices Global Unlimited Company Radio frequency isolator
US10236221B2 (en) 2017-05-19 2019-03-19 Analog Devices Global Forming an isolation barrier in an isolator
US10290532B2 (en) 2017-05-19 2019-05-14 Analog Devices Global Forming an isolation barrier in an isolator

Citations (92)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4027152A (en) * 1975-11-28 1977-05-31 Hewlett-Packard Company Apparatus and method for transmitting binary-coded information
US4494100A (en) * 1982-07-12 1985-01-15 Motorola, Inc. Planar inductors
US4541894A (en) * 1983-05-27 1985-09-17 Rhone-Poulenc Sa Metallizable, essentially isotropic polymeric substrates well adopted for printed circuits
US4931075A (en) * 1989-08-07 1990-06-05 Ppg Industries, Inc. High current multiterminal bushing controller
US5015972A (en) * 1989-08-17 1991-05-14 Motorola, Inc. Broadband RF transformer
US5215377A (en) * 1990-11-29 1993-06-01 Seiko Instruments Inc. Thermogravimetric apparatus
US5312674A (en) * 1992-07-31 1994-05-17 Hughes Aircraft Company Low-temperature-cofired-ceramic (LTCC) tape structures including cofired ferromagnetic elements, drop-in components and multi-layer transformer
US5392463A (en) * 1990-10-16 1995-02-21 Kabushiki Kaisha Toshiba Power amplifier capable of saturation and linear amplification
US5420558A (en) * 1992-05-27 1995-05-30 Fuji Electric Co., Ltd. Thin film transformer
US5504668A (en) * 1993-10-11 1996-04-02 Siemens Aktiengesellschaft Frequency controlled resonant inverter
US5597979A (en) * 1995-05-12 1997-01-28 Schlegel Corporation EMI shielding having flexible condustive sheet and I/O Gasket
US5659462A (en) * 1996-04-12 1997-08-19 Lucent Technologies Inc. Encapsulated, integrated power magnetic device and method of manufacture therefor
US5716713A (en) * 1994-12-16 1998-02-10 Ceramic Packaging, Inc. Stacked planar transformer
US5754088A (en) * 1994-11-17 1998-05-19 International Business Machines Corporation Planar transformer and method of manufacture
US5768111A (en) * 1995-02-27 1998-06-16 Nec Corporation Converter comprising a piezoelectric transformer and a switching stage of a resonant frequency different from that of the transformer
US5952849A (en) * 1997-02-21 1999-09-14 Analog Devices, Inc. Logic isolator with high transient immunity
US6091966A (en) * 1997-09-29 2000-07-18 Ericsson, Inc. Dual-band, dual-mode power amplifier
US6175293B1 (en) * 1988-09-30 2001-01-16 Kabushiki Kaisha Toshiba Planar inductor
US6198374B1 (en) * 1999-04-01 2001-03-06 Midcom, Inc. Multi-layer transformer apparatus and method
US6255714B1 (en) * 1999-06-22 2001-07-03 Agere Systems Guardian Corporation Integrated circuit having a micromagnetic device including a ferromagnetic core and method of manufacture therefor
US6300617B1 (en) * 1998-03-04 2001-10-09 Nonvolatile Electronics, Incorporated Magnetic digital signal coupler having selected/reversal directions of magnetization
US6404317B1 (en) * 1990-05-31 2002-06-11 Kabushiki Kaisha Toshiba Planar magnetic element
US20020075116A1 (en) * 2000-11-21 2002-06-20 Peels Wilhelmus Gerardus Maria System, printed circuit board, charger device, user device, and apparatus
US20020110013A1 (en) * 2001-01-05 2002-08-15 Samsung Electronics Co., Ltd. Coreless superthin PCB transformer and non-contact battery charger using the same
US20020135236A1 (en) * 1997-10-23 2002-09-26 Haigh Geoffrey T. Non-optical signal isolator
US6525566B2 (en) * 2000-02-14 2003-02-25 Analog Devices, Inc. Isolator for transmitting logic signals across an isolation barrier
US20030042571A1 (en) * 1997-10-23 2003-03-06 Baoxing Chen Chip-scale coils and isolators based thereon
US6538313B1 (en) * 2001-11-13 2003-03-25 National Semiconductor Corporation IC package with integral substrate capacitor
US6545059B1 (en) * 1995-01-31 2003-04-08 Omya S.A. Treated mineral fillers suspensions of these fillers in polyols and their uses in polyurethane foams
US6556117B1 (en) * 1999-08-26 2003-04-29 Fdk Corporation Multi-channel uniform output type transformer
US6574091B2 (en) * 2001-03-16 2003-06-03 International Business Machines Corporation Multi-plate capacitor structure
US6686825B2 (en) * 2000-05-09 2004-02-03 Murata Manufacturing Co., Ltd. Chip inductor and manufacturing method therefor
US20040056749A1 (en) * 2002-07-18 2004-03-25 Frank Kahlmann Integrated transformer configuration
US20050003199A1 (en) * 2002-12-27 2005-01-06 Tdk Corporation Resin composition, cured resin, sheet-like cured resin, laminated body, prepreg, electronic parts and multilayer boards
US6856226B2 (en) * 1999-11-23 2005-02-15 Intel Corporation Integrated transformer
US6859130B2 (en) * 2001-10-24 2005-02-22 Matsushita Electric Industrial Co., Ltd. Low-profile transformer and method of manufacturing the transformer
US6867678B2 (en) * 2003-01-28 2005-03-15 Entrust Power Co., Ltd. Transformer structure
US20050057277A1 (en) * 2003-04-30 2005-03-17 Analog Devices, Inc. Signal isolators using micro-transformer
US20050077993A1 (en) * 2003-04-24 2005-04-14 Hiroshi Kanno High-frequency circuit
US6888438B2 (en) * 2001-06-15 2005-05-03 City University Of Hong Kong Planar printed circuit-board transformers with effective electromagnetic interference (EMI) shielding
US20050094302A1 (en) * 2000-01-24 2005-05-05 Fuji Electric Co., Ltd. Magnetic thin film, magnetic component that uses this magnetic thin film, manufacturing methods for the same, and a power conversion device
US6891461B2 (en) * 1999-11-23 2005-05-10 Intel Corporation Integrated transformer
US20050128038A1 (en) * 2003-12-15 2005-06-16 Nokia Corporation Electrically decoupled integrated transformer having at least one grounded electric shield
US20050133249A1 (en) * 2003-12-19 2005-06-23 Mitsui Mining & Smelting Co., Ltd. Printed wiring board and semiconductor device
US6919775B2 (en) * 1999-09-14 2005-07-19 Koninklijke Philips Electronics N.V. Network coupler
US6944009B2 (en) * 2003-02-11 2005-09-13 Oplink Communications, Inc. Ultra broadband capacitor assembly
US6943658B2 (en) * 1999-11-23 2005-09-13 Intel Corporation Integrated transformer
US20060028313A1 (en) * 2004-07-26 2006-02-09 Infineon Technologies Ag Component arrangement with a planar transformer
US7016490B2 (en) * 2001-05-21 2006-03-21 Conexant Systems, Inc. Circuit board capacitor structure for forming a high voltage isolation barrier
US20060095639A1 (en) * 2004-11-02 2006-05-04 Guenin Bruce M Structures and methods for proximity communication using bridge chips
US7064442B1 (en) * 2003-07-02 2006-06-20 Analog Devices, Inc. Integrated circuit package device
US7064662B2 (en) * 2002-12-11 2006-06-20 Oils Wells, Inc. Master signal transmitter with allied servant receiver to receive a directed signal from the transmitter
US20060152322A1 (en) * 2004-12-07 2006-07-13 Whittaker Ronald W Miniature circuitry and inductive components and methods for manufacturing same
US20060170527A1 (en) * 2005-02-02 2006-08-03 Henning Braunisch Integrated transformer structure and method of fabrication
US20060176137A1 (en) * 2005-01-24 2006-08-10 Sanyo Electric Co., Ltd. Semiconductor apparatus
US7170807B2 (en) * 2002-04-18 2007-01-30 Innovative Silicon S.A. Data storage device and refreshing method for use with such device
US7171739B2 (en) * 2002-01-23 2007-02-06 Broadcom Corporation Method of manufacturing an on-chip transformer balun
US7177370B2 (en) * 2003-12-17 2007-02-13 Triquint Semiconductor, Inc. Method and architecture for dual-mode linear and saturated power amplifier operation
US20070080587A1 (en) * 2005-09-29 2007-04-12 Welch Allyn, Inc. Galvanic isolation of a signal using capacitive coupling embeded within a circuit board
US20070086274A1 (en) * 2005-10-18 2007-04-19 Ken Nishimura Acoustically communicating data signals across an electrical isolation barrier
US20070085632A1 (en) * 2005-10-18 2007-04-19 Larson John D Iii Acoustic galvanic isolator
US20070085447A1 (en) * 2005-10-18 2007-04-19 Larson John D Iii Acoustic galvanic isolator incorporating single insulated decoupled stacked bulk acoustic resonator with acoustically-resonant electrical insulator
US20070133933A1 (en) * 2005-12-12 2007-06-14 Yoon Ho G Enhanced coplanar waveguide and optical communication module using the same
US7302247B2 (en) * 2004-06-03 2007-11-27 Silicon Laboratories Inc. Spread spectrum isolator
US20080007382A1 (en) * 2006-07-06 2008-01-10 Harris Corporation Transformer and associated method of making
US20080031286A1 (en) * 2004-06-03 2008-02-07 Silicon Laboratories Inc. Multiplexed rf isolator
US20080051158A1 (en) * 2006-08-22 2008-02-28 Texas Instruments Incorporated Galvanic isolation integrated in a signal channel
US20080061631A1 (en) * 2006-08-28 2008-03-13 Fouquet Julie E Galvanic isolator
US7376116B2 (en) * 2003-02-03 2008-05-20 Skyworks Solutions, Inc. Software defined multiple transmit architecture
US7376212B2 (en) * 2004-06-03 2008-05-20 Silicon Laboratories Inc. RF isolator with differential input/output
US20080174396A1 (en) * 2007-01-24 2008-07-24 Samsung Electronics Co., Ltd. Transformers and baluns
US20080180206A1 (en) * 2006-08-28 2008-07-31 Avago Technologies Ecbu (Singapore) Pte.Ltd. Coil Transducer with Reduced Arcing and Improved High Voltage Breakdown Performance Characteristics
US20080179963A1 (en) * 2006-08-28 2008-07-31 Avago Technologies Ecbu (Singapore) Pte. Ltd. Galvanic Isolators and Coil Transducers
US20080198904A1 (en) * 2007-02-15 2008-08-21 Kwee Chong Chang Multi-Channel Galvanic Isolator Utilizing a Single Transmission Channel
US7421028B2 (en) * 2004-06-03 2008-09-02 Silicon Laboratories Inc. Transformer isolator for digital power supply
US7447492B2 (en) * 2004-06-03 2008-11-04 Silicon Laboratories Inc. On chip transformer isolator
US20090072819A1 (en) * 2006-01-06 2009-03-19 Ntn Corporation Rotation Angle Detector and Bearing with Rotation Angle Detector
US20090180403A1 (en) * 2008-01-11 2009-07-16 Bogdan Tudosoiu Multi-band and multi-mode radio frequency front-end module architecture
US7577223B2 (en) * 2004-06-03 2009-08-18 Silicon Laboratories Inc. Multiplexed RF isolator circuit
US20100020448A1 (en) * 2006-08-28 2010-01-28 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Galvanic isolator
US7719305B2 (en) * 2006-07-06 2010-05-18 Analog Devices, Inc. Signal isolator using micro-transformers
US7737871B2 (en) * 2004-06-03 2010-06-15 Silicon Laboratories Inc. MCU with integrated voltage isolator to provide a galvanic isolation between input and output
US7741943B2 (en) * 2007-05-10 2010-06-22 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Miniature transformers adapted for use in galvanic isolators and the like
US7746943B2 (en) * 2006-04-27 2010-06-29 Sony Corporation Wireless communication system, wireless communication apparatus and wireless communication method
US20100188182A1 (en) * 2006-08-28 2010-07-29 Avago Technologies Ecbu (Singapore) Pte.Ltd. Narrowbody Coil Isolator
US7821428B2 (en) * 2004-06-03 2010-10-26 Silicon Laboratories Inc. MCU with integrated voltage isolator and integrated galvanically isolated asynchronous serial data link
US7863654B2 (en) * 1998-12-21 2011-01-04 Megica Corporation Top layers of metal for high performance IC's
US20110075449A1 (en) * 2008-03-31 2011-03-31 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Compact Power Transformer Components, Devices, Systems and Methods
US7932799B2 (en) * 2004-09-24 2011-04-26 Koninklijke Philips Electronics N.V. Transformer
US7948067B2 (en) * 2009-06-30 2011-05-24 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Coil transducer isolator packages
US8049573B2 (en) * 2004-06-03 2011-11-01 Silicon Laboratories Inc. Bidirectional multiplexed RF isolator
US8061017B2 (en) * 2006-08-28 2011-11-22 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Methods of making coil transducers

Family Cites Families (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2752783C2 (en) 1977-11-25 1979-08-30 Siemens Ag, 1000 Berlin Und 8000 Muenchen Device for acquiring and processing electrical signals
US5070317A (en) 1989-01-17 1991-12-03 Bhagat Jayant K Miniature inductor for integrated circuits and devices
JP2897091B2 (en) 1992-07-09 1999-05-31 株式会社村田製作所 Line transformer
JP3171705B2 (en) 1992-11-11 2001-06-04 株式会社イノアックコーポレーション Method of manufacturing retractable headrest
US5693971A (en) 1994-07-14 1997-12-02 Micron Technology, Inc. Combined trench and field isolation structure for semiconductor devices
CA2196601A1 (en) 1994-08-03 1996-02-15 Lewis Freeth Harpham Electromagnetic interference isolator
JP2000508116A (en) 1995-10-31 2000-06-27 ザ ウィタカー コーポレーション RF transformer using multilayer metal polymer structure
TW388889B (en) 1997-12-17 2000-05-01 Koninkl Philips Electronics Nv Planar transformer
US6215377B1 (en) 1998-05-26 2001-04-10 Microsubstrates Corporation Low cost wideband RF port structure for microwave circuit packages using coplanar waveguide and BGA I/O format
US6167475A (en) 1998-07-06 2000-12-26 International Business Machines Corporation Data transfer method/engine for pipelining shared memory bus accesses
DE19911133C2 (en) 1999-03-12 2001-06-28 Eckhard Mademann Isolation circuit
US6320532B1 (en) 1999-05-27 2001-11-20 Rosemount Inc. Low power radar level transmitter having reduced ground loop errors
US6476704B2 (en) 1999-11-18 2002-11-05 The Raytheon Company MMIC airbridge balun transformer
JP4126519B2 (en) 2000-03-10 2008-07-30 富士フイルム株式会社 Camera system
JP2002260936A (en) 2001-03-06 2002-09-13 Hitachi Ltd Ignition circuit module of internal combustion engine and ignition coil apparatus
US6882239B2 (en) 2001-05-08 2005-04-19 Formfactor, Inc. Electromagnetically coupled interconnect system
US6501364B1 (en) 2001-06-15 2002-12-31 City University Of Hong Kong Planar printed-circuit-board transformers with effective electromagnetic interference (EMI) shielding
US7623859B2 (en) 2001-09-14 2009-11-24 Atc Technologies, Llc Additional aggregate radiated power control for multi-band/multi-mode satellite radiotelephone communications systems and methods
US6819941B2 (en) 2001-10-11 2004-11-16 Rf Micro Devices, Inc. Single output stage power amplification for multimode applications
DE10154906A1 (en) 2001-10-30 2003-05-28 Osram Opto Semiconductors Gmbh Optical coupler has radiation transmitter and receiver coupled together via short optical transmission path, each mounted on substrate and opposite or adjacent to each other in housing
GB2382231B (en) 2001-11-01 2003-12-24 Motorola Inc Isolator devices for current suppression
JP2003151829A (en) 2001-11-14 2003-05-23 Fdk Corp Chip inductor
US6661079B1 (en) 2002-02-20 2003-12-09 National Semiconductor Corporation Semiconductor-based spiral capacitor
CN1180277C (en) 2002-06-20 2004-12-15 钟伟章 Hidden line detection instrument
CN1237081C (en) 2002-11-07 2006-01-18 中国石油天然气股份有限公司 Hydrolysis method in technique for synthesizing polyacrylamide with super molecular weight
GB2403072A (en) 2003-06-12 2004-12-22 Aph Trading Pte Ltd Electrical isolator
US6970040B1 (en) 2003-11-13 2005-11-29 Rf Micro Devices, Inc. Multi-mode/multi-band power amplifier
US7460604B2 (en) 2004-06-03 2008-12-02 Silicon Laboratories Inc. RF isolator for isolating voltage sensing and gate drivers
NO320550B1 (en) 2004-06-07 2005-12-19 Applied Plasma Physics Asa Device by planar high voltage transformer
DE102004034248A1 (en) 2004-07-14 2006-02-02 Endress + Hauser Flowtec Ag, Reinach Electronic circuit with galvanically separated modules
US7436282B2 (en) 2004-12-07 2008-10-14 Multi-Fineline Electronix, Inc. Miniature circuitry and inductive components and methods for manufacturing same
JP4769033B2 (en) 2005-03-23 2011-09-07 スミダコーポレーション株式会社 Inductor
JP2006286805A (en) 2005-03-31 2006-10-19 Fujitsu Ltd Variable inductor
WO2007025548A1 (en) 2005-09-01 2007-03-08 Danmarks Tekniske Universitet A self-oscillating modulator
KR100753818B1 (en) 2005-12-09 2007-08-31 한국전자통신연구원 High power planar lightwave circuit optical Tx module and Tx/Rx module
TWI407870B (en) 2006-04-25 2013-09-01 Ngk Spark Plug Co Method for manufacturing wiring board
US8427844B2 (en) * 2006-08-28 2013-04-23 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Widebody coil isolators
US9105391B2 (en) 2006-08-28 2015-08-11 Avago Technologies General Ip (Singapore) Pte. Ltd. High voltage hold-off coil transducer
US7871865B2 (en) 2007-01-24 2011-01-18 Analog Devices, Inc. Stress free package and laminate-based isolator package
US7468547B2 (en) 2007-05-11 2008-12-23 Intersil Americas Inc. RF-coupled digital isolator
ITTO20070325A1 (en) 2007-05-11 2008-11-12 St Microelectronics Srl INTEGRATED GALVANIC INSULATOR USING WIRELESS TRANSMISSION
US7570144B2 (en) 2007-05-18 2009-08-04 Chartered Semiconductor Manufacturing, Ltd. Integrated transformer and method of fabrication thereof
US7919781B2 (en) 2007-06-12 2011-04-05 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Galvanic isolator having improved high voltage common mode transient immunity
US7902665B2 (en) 2008-09-02 2011-03-08 Linear Technology Corporation Semiconductor device having a suspended isolating interconnect

Patent Citations (108)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4027152A (en) * 1975-11-28 1977-05-31 Hewlett-Packard Company Apparatus and method for transmitting binary-coded information
US4494100A (en) * 1982-07-12 1985-01-15 Motorola, Inc. Planar inductors
US4541894A (en) * 1983-05-27 1985-09-17 Rhone-Poulenc Sa Metallizable, essentially isotropic polymeric substrates well adopted for printed circuits
US6175293B1 (en) * 1988-09-30 2001-01-16 Kabushiki Kaisha Toshiba Planar inductor
US4931075A (en) * 1989-08-07 1990-06-05 Ppg Industries, Inc. High current multiterminal bushing controller
US5015972A (en) * 1989-08-17 1991-05-14 Motorola, Inc. Broadband RF transformer
US6404317B1 (en) * 1990-05-31 2002-06-11 Kabushiki Kaisha Toshiba Planar magnetic element
US5392463A (en) * 1990-10-16 1995-02-21 Kabushiki Kaisha Toshiba Power amplifier capable of saturation and linear amplification
US5215377A (en) * 1990-11-29 1993-06-01 Seiko Instruments Inc. Thermogravimetric apparatus
US5420558A (en) * 1992-05-27 1995-05-30 Fuji Electric Co., Ltd. Thin film transformer
US5312674A (en) * 1992-07-31 1994-05-17 Hughes Aircraft Company Low-temperature-cofired-ceramic (LTCC) tape structures including cofired ferromagnetic elements, drop-in components and multi-layer transformer
US5504668A (en) * 1993-10-11 1996-04-02 Siemens Aktiengesellschaft Frequency controlled resonant inverter
US5754088A (en) * 1994-11-17 1998-05-19 International Business Machines Corporation Planar transformer and method of manufacture
US5716713A (en) * 1994-12-16 1998-02-10 Ceramic Packaging, Inc. Stacked planar transformer
US6545059B1 (en) * 1995-01-31 2003-04-08 Omya S.A. Treated mineral fillers suspensions of these fillers in polyols and their uses in polyurethane foams
US5768111A (en) * 1995-02-27 1998-06-16 Nec Corporation Converter comprising a piezoelectric transformer and a switching stage of a resonant frequency different from that of the transformer
US5597979A (en) * 1995-05-12 1997-01-28 Schlegel Corporation EMI shielding having flexible condustive sheet and I/O Gasket
US5659462A (en) * 1996-04-12 1997-08-19 Lucent Technologies Inc. Encapsulated, integrated power magnetic device and method of manufacture therefor
US5952849A (en) * 1997-02-21 1999-09-14 Analog Devices, Inc. Logic isolator with high transient immunity
US6091966A (en) * 1997-09-29 2000-07-18 Ericsson, Inc. Dual-band, dual-mode power amplifier
US7545059B2 (en) * 1997-10-23 2009-06-09 Analog Devices, Inc. Chip-scale coils and isolators based thereon
US20080030080A1 (en) * 1997-10-23 2008-02-07 Baoxing Chen Chip-scale coils and isolators based thereon
US20020135236A1 (en) * 1997-10-23 2002-09-26 Haigh Geoffrey T. Non-optical signal isolator
US6873065B2 (en) * 1997-10-23 2005-03-29 Analog Devices, Inc. Non-optical signal isolator
US20030042571A1 (en) * 1997-10-23 2003-03-06 Baoxing Chen Chip-scale coils and isolators based thereon
US6300617B1 (en) * 1998-03-04 2001-10-09 Nonvolatile Electronics, Incorporated Magnetic digital signal coupler having selected/reversal directions of magnetization
US7863654B2 (en) * 1998-12-21 2011-01-04 Megica Corporation Top layers of metal for high performance IC's
US6198374B1 (en) * 1999-04-01 2001-03-06 Midcom, Inc. Multi-layer transformer apparatus and method
US6255714B1 (en) * 1999-06-22 2001-07-03 Agere Systems Guardian Corporation Integrated circuit having a micromagnetic device including a ferromagnetic core and method of manufacture therefor
US6556117B1 (en) * 1999-08-26 2003-04-29 Fdk Corporation Multi-channel uniform output type transformer
US6919775B2 (en) * 1999-09-14 2005-07-19 Koninklijke Philips Electronics N.V. Network coupler
US6943658B2 (en) * 1999-11-23 2005-09-13 Intel Corporation Integrated transformer
US6891461B2 (en) * 1999-11-23 2005-05-10 Intel Corporation Integrated transformer
US6856226B2 (en) * 1999-11-23 2005-02-15 Intel Corporation Integrated transformer
US6870456B2 (en) * 1999-11-23 2005-03-22 Intel Corporation Integrated transformer
US20050094302A1 (en) * 2000-01-24 2005-05-05 Fuji Electric Co., Ltd. Magnetic thin film, magnetic component that uses this magnetic thin film, manufacturing methods for the same, and a power conversion device
US6903578B2 (en) * 2000-02-14 2005-06-07 Analog Devices, Inc. Logic isolator
US6525566B2 (en) * 2000-02-14 2003-02-25 Analog Devices, Inc. Isolator for transmitting logic signals across an isolation barrier
US6922080B2 (en) * 2000-02-14 2005-07-26 Analog Devices, Inc. Logic isolator for transmitting periodic signals across an isolation barrier
US6686825B2 (en) * 2000-05-09 2004-02-03 Murata Manufacturing Co., Ltd. Chip inductor and manufacturing method therefor
US20020075116A1 (en) * 2000-11-21 2002-06-20 Peels Wilhelmus Gerardus Maria System, printed circuit board, charger device, user device, and apparatus
US20020110013A1 (en) * 2001-01-05 2002-08-15 Samsung Electronics Co., Ltd. Coreless superthin PCB transformer and non-contact battery charger using the same
US6574091B2 (en) * 2001-03-16 2003-06-03 International Business Machines Corporation Multi-plate capacitor structure
US7016490B2 (en) * 2001-05-21 2006-03-21 Conexant Systems, Inc. Circuit board capacitor structure for forming a high voltage isolation barrier
US6888438B2 (en) * 2001-06-15 2005-05-03 City University Of Hong Kong Planar printed circuit-board transformers with effective electromagnetic interference (EMI) shielding
US6859130B2 (en) * 2001-10-24 2005-02-22 Matsushita Electric Industrial Co., Ltd. Low-profile transformer and method of manufacturing the transformer
US6538313B1 (en) * 2001-11-13 2003-03-25 National Semiconductor Corporation IC package with integral substrate capacitor
US7171739B2 (en) * 2002-01-23 2007-02-06 Broadcom Corporation Method of manufacturing an on-chip transformer balun
US7170807B2 (en) * 2002-04-18 2007-01-30 Innovative Silicon S.A. Data storage device and refreshing method for use with such device
US20040056749A1 (en) * 2002-07-18 2004-03-25 Frank Kahlmann Integrated transformer configuration
US7064662B2 (en) * 2002-12-11 2006-06-20 Oils Wells, Inc. Master signal transmitter with allied servant receiver to receive a directed signal from the transmitter
US20050003199A1 (en) * 2002-12-27 2005-01-06 Tdk Corporation Resin composition, cured resin, sheet-like cured resin, laminated body, prepreg, electronic parts and multilayer boards
US6867678B2 (en) * 2003-01-28 2005-03-15 Entrust Power Co., Ltd. Transformer structure
US7376116B2 (en) * 2003-02-03 2008-05-20 Skyworks Solutions, Inc. Software defined multiple transmit architecture
US6944009B2 (en) * 2003-02-11 2005-09-13 Oplink Communications, Inc. Ultra broadband capacitor assembly
US20050077993A1 (en) * 2003-04-24 2005-04-14 Hiroshi Kanno High-frequency circuit
US7692444B2 (en) * 2003-04-30 2010-04-06 Analog Devices, Inc. Signal isolators using micro-transformers
US7683654B2 (en) * 2003-04-30 2010-03-23 Analog Devices, Inc. Signal isolators using micro-transformers
US20050057277A1 (en) * 2003-04-30 2005-03-17 Analog Devices, Inc. Signal isolators using micro-transformer
US7920010B2 (en) * 2003-04-30 2011-04-05 Analog Devices, Inc. Signal isolators using micro-transformers
US7064442B1 (en) * 2003-07-02 2006-06-20 Analog Devices, Inc. Integrated circuit package device
US20050128038A1 (en) * 2003-12-15 2005-06-16 Nokia Corporation Electrically decoupled integrated transformer having at least one grounded electric shield
US7177370B2 (en) * 2003-12-17 2007-02-13 Triquint Semiconductor, Inc. Method and architecture for dual-mode linear and saturated power amplifier operation
US20050133249A1 (en) * 2003-12-19 2005-06-23 Mitsui Mining & Smelting Co., Ltd. Printed wiring board and semiconductor device
US20080031286A1 (en) * 2004-06-03 2008-02-07 Silicon Laboratories Inc. Multiplexed rf isolator
US7821428B2 (en) * 2004-06-03 2010-10-26 Silicon Laboratories Inc. MCU with integrated voltage isolator and integrated galvanically isolated asynchronous serial data link
US7738568B2 (en) * 2004-06-03 2010-06-15 Silicon Laboratories Inc. Multiplexed RF isolator
US7302247B2 (en) * 2004-06-03 2007-11-27 Silicon Laboratories Inc. Spread spectrum isolator
US7421028B2 (en) * 2004-06-03 2008-09-02 Silicon Laboratories Inc. Transformer isolator for digital power supply
US7737871B2 (en) * 2004-06-03 2010-06-15 Silicon Laboratories Inc. MCU with integrated voltage isolator to provide a galvanic isolation between input and output
US7650130B2 (en) * 2004-06-03 2010-01-19 Silicon Laboratories Inc. Spread spectrum isolator
US7577223B2 (en) * 2004-06-03 2009-08-18 Silicon Laboratories Inc. Multiplexed RF isolator circuit
US8064872B2 (en) * 2004-06-03 2011-11-22 Silicon Laboratories Inc. On chip transformer isolator
US7856219B2 (en) * 2004-06-03 2010-12-21 Silicon Laboratories Inc. Transformer coils for providing voltage isolation
US7376212B2 (en) * 2004-06-03 2008-05-20 Silicon Laboratories Inc. RF isolator with differential input/output
US7447492B2 (en) * 2004-06-03 2008-11-04 Silicon Laboratories Inc. On chip transformer isolator
US8049573B2 (en) * 2004-06-03 2011-11-01 Silicon Laboratories Inc. Bidirectional multiplexed RF isolator
US20060028313A1 (en) * 2004-07-26 2006-02-09 Infineon Technologies Ag Component arrangement with a planar transformer
US7932799B2 (en) * 2004-09-24 2011-04-26 Koninklijke Philips Electronics N.V. Transformer
US20060095639A1 (en) * 2004-11-02 2006-05-04 Guenin Bruce M Structures and methods for proximity communication using bridge chips
US20060152322A1 (en) * 2004-12-07 2006-07-13 Whittaker Ronald W Miniature circuitry and inductive components and methods for manufacturing same
US20060176137A1 (en) * 2005-01-24 2006-08-10 Sanyo Electric Co., Ltd. Semiconductor apparatus
US20060170527A1 (en) * 2005-02-02 2006-08-03 Henning Braunisch Integrated transformer structure and method of fabrication
US20070080587A1 (en) * 2005-09-29 2007-04-12 Welch Allyn, Inc. Galvanic isolation of a signal using capacitive coupling embeded within a circuit board
US20070086274A1 (en) * 2005-10-18 2007-04-19 Ken Nishimura Acoustically communicating data signals across an electrical isolation barrier
US20070085632A1 (en) * 2005-10-18 2007-04-19 Larson John D Iii Acoustic galvanic isolator
US20070085447A1 (en) * 2005-10-18 2007-04-19 Larson John D Iii Acoustic galvanic isolator incorporating single insulated decoupled stacked bulk acoustic resonator with acoustically-resonant electrical insulator
US20070133933A1 (en) * 2005-12-12 2007-06-14 Yoon Ho G Enhanced coplanar waveguide and optical communication module using the same
US20090072819A1 (en) * 2006-01-06 2009-03-19 Ntn Corporation Rotation Angle Detector and Bearing with Rotation Angle Detector
US7746943B2 (en) * 2006-04-27 2010-06-29 Sony Corporation Wireless communication system, wireless communication apparatus and wireless communication method
US7719305B2 (en) * 2006-07-06 2010-05-18 Analog Devices, Inc. Signal isolator using micro-transformers
US20080007382A1 (en) * 2006-07-06 2008-01-10 Harris Corporation Transformer and associated method of making
US20080051158A1 (en) * 2006-08-22 2008-02-28 Texas Instruments Incorporated Galvanic isolation integrated in a signal channel
US20100176660A1 (en) * 2006-08-28 2010-07-15 Avago Technologies General IP (Singpore) Pte. Ltd. Galvanic isolator
US8061017B2 (en) * 2006-08-28 2011-11-22 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Methods of making coil transducers
US20100188182A1 (en) * 2006-08-28 2010-07-29 Avago Technologies Ecbu (Singapore) Pte.Ltd. Narrowbody Coil Isolator
US20100020448A1 (en) * 2006-08-28 2010-01-28 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Galvanic isolator
US8093983B2 (en) * 2006-08-28 2012-01-10 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Narrowbody coil isolator
US20080179963A1 (en) * 2006-08-28 2008-07-31 Avago Technologies Ecbu (Singapore) Pte. Ltd. Galvanic Isolators and Coil Transducers
US20080180206A1 (en) * 2006-08-28 2008-07-31 Avago Technologies Ecbu (Singapore) Pte.Ltd. Coil Transducer with Reduced Arcing and Improved High Voltage Breakdown Performance Characteristics
US20110095620A1 (en) * 2006-08-28 2011-04-28 Avago Technologies Ecbu (Singapore) Pte. Ltd. Galvanic Isolators and Coil Transducers
US20080061631A1 (en) * 2006-08-28 2008-03-13 Fouquet Julie E Galvanic isolator
US20080174396A1 (en) * 2007-01-24 2008-07-24 Samsung Electronics Co., Ltd. Transformers and baluns
US20080198904A1 (en) * 2007-02-15 2008-08-21 Kwee Chong Chang Multi-Channel Galvanic Isolator Utilizing a Single Transmission Channel
US7741943B2 (en) * 2007-05-10 2010-06-22 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Miniature transformers adapted for use in galvanic isolators and the like
US20090180403A1 (en) * 2008-01-11 2009-07-16 Bogdan Tudosoiu Multi-band and multi-mode radio frequency front-end module architecture
US20110075449A1 (en) * 2008-03-31 2011-03-31 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Compact Power Transformer Components, Devices, Systems and Methods
US7948067B2 (en) * 2009-06-30 2011-05-24 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Coil transducer isolator packages

Cited By (70)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8385043B2 (en) 2006-08-28 2013-02-26 Avago Technologies ECBU IP (Singapoare) Pte. Ltd. Galvanic isolator
US8427844B2 (en) * 2006-08-28 2013-04-23 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Widebody coil isolators
US20080179963A1 (en) * 2006-08-28 2008-07-31 Avago Technologies Ecbu (Singapore) Pte. Ltd. Galvanic Isolators and Coil Transducers
US20100176660A1 (en) * 2006-08-28 2010-07-15 Avago Technologies General IP (Singpore) Pte. Ltd. Galvanic isolator
US20100188182A1 (en) * 2006-08-28 2010-07-29 Avago Technologies Ecbu (Singapore) Pte.Ltd. Narrowbody Coil Isolator
US8436709B2 (en) 2006-08-28 2013-05-07 Avago Technologies General Ip (Singapore) Pte. Ltd. Galvanic isolators and coil transducers
US20090243783A1 (en) * 2006-08-28 2009-10-01 Avago Technologies Ecbu (Singapore) Pte. Ltd. Minimizing Electromagnetic Interference in Coil Transducers
US9019057B2 (en) 2006-08-28 2015-04-28 Avago Technologies General Ip (Singapore) Pte. Ltd. Galvanic isolators and coil transducers
US8061017B2 (en) 2006-08-28 2011-11-22 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Methods of making coil transducers
US8385028B2 (en) 2006-08-28 2013-02-26 Avago Technologies General Ip (Singapore) Pte. Ltd. Galvanic isolator
US20100020448A1 (en) * 2006-08-28 2010-01-28 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Galvanic isolator
US9105391B2 (en) 2006-08-28 2015-08-11 Avago Technologies General Ip (Singapore) Pte. Ltd. High voltage hold-off coil transducer
US8093983B2 (en) * 2006-08-28 2012-01-10 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Narrowbody coil isolator
US8237534B2 (en) 2007-05-10 2012-08-07 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Miniature transformers adapted for use in galvanic isolators and the like
US8258911B2 (en) 2008-03-31 2012-09-04 Avago Technologies ECBU IP (Singapor) Pte. Ltd. Compact power transformer components, devices, systems and methods
US20110075449A1 (en) * 2008-03-31 2011-03-31 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Compact Power Transformer Components, Devices, Systems and Methods
US8680656B1 (en) * 2009-01-05 2014-03-25 Amkor Technology, Inc. Leadframe structure for concentrated photovoltaic receiver package
US8841547B1 (en) 2009-10-09 2014-09-23 Amkor Technology, Inc. Concentrated photovoltaic receiver package with built-in connector
US11115020B2 (en) * 2009-11-05 2021-09-07 Rohm Co., Ltd. Signal transmission circuit device, semiconductor device, method and apparatus for inspecting semiconductor device, signal transmission device, and motor drive apparatus using signal transmission device
US11658659B2 (en) 2009-11-05 2023-05-23 Rohm Co., Ltd. Signal transmission circuit device, semiconductor device, method and apparatus for inspecting semiconductor device, signal transmission device, and motor drive apparatus using signal transmission device
US8380146B2 (en) 2009-12-31 2013-02-19 Avago Technologies Wireless Ip (Singapore) Pte. Ltd. Multi-band, multi-mode RF transmit amplifier system with separate signal paths for linear and saturated operation
US20110156812A1 (en) * 2009-12-31 2011-06-30 Avago Technologies Wireless Ip (Singapore) Pte. Ltd. Multi-band, multi-mode rf transmit amplifier system with separate signal paths for linear and saturated operation
GB2479239A (en) * 2010-03-31 2011-10-05 Avago Tech Ecbu Ip Widebody coil isolators
US8614616B2 (en) * 2011-01-18 2013-12-24 Infineon Technologies Ag Semiconductor device and method of manufacture thereof
US9269654B2 (en) 2011-01-18 2016-02-23 Infineon Technologies Ag Semiconductor device and method of manufacture thereof
US8674800B2 (en) * 2011-01-18 2014-03-18 Infineon Technologies Ag Semiconductor device and method of manufacture thereof
US20120181874A1 (en) * 2011-01-18 2012-07-19 Stefan Willkofer Semiconductor Device and Method of Manufacture Thereof
US20140355218A1 (en) * 2011-05-11 2014-12-04 Vlt, Inc. Panel-Molded Electronic Assemblies
US9402319B2 (en) * 2011-05-11 2016-07-26 Vlt, Inc. Panel-molded electronic assemblies
US9439297B2 (en) 2011-05-11 2016-09-06 Vlt, Inc. Method of making a plurality of electronic assemblies
US9516761B2 (en) 2011-05-11 2016-12-06 Vlt, Inc. Encapsulated modular power converter with symmetric heat distribution
US11751338B1 (en) 2011-05-11 2023-09-05 Vicor Corporation Panel-molded electronic assemblies
US10791645B1 (en) * 2011-05-11 2020-09-29 Vlt, Inc. Panel-molded electronic assemblies
US10757816B2 (en) 2011-05-11 2020-08-25 Vlt, Inc. Panel-molded electronic assemblies
US10701828B1 (en) 2011-05-11 2020-06-30 Vlt, Inc. Panel-molded electronic assemblies
US10594162B2 (en) * 2013-05-24 2020-03-17 Texas Instruments Incorporated Galvanic isolator
US20210233700A1 (en) * 2013-11-13 2021-07-29 Rohm Co., Ltd. Semiconductor device and semiconductor module
US11657953B2 (en) * 2013-11-13 2023-05-23 Rohm Co., Ltd. Semiconductor device and semiconductor module
US11011297B2 (en) * 2013-11-13 2021-05-18 Rohm Co., Ltd. Semiconductor device and semiconductor module
US9936580B1 (en) 2015-01-14 2018-04-03 Vlt, Inc. Method of forming an electrical connection to an electronic module
US11266020B1 (en) 2015-01-14 2022-03-01 Vicor Corporation Electronic assemblies having components with edge connectors
US11006523B1 (en) 2015-01-14 2021-05-11 Vicor Corporation Electronic assemblies having components with edge connectors
US11324107B1 (en) 2015-06-04 2022-05-03 Vicor Corporation Panel molded electronic assemblies with multi-surface conductive contacts
US10537015B1 (en) 2015-06-04 2020-01-14 Vlt, Inc. Methods of forming modular assemblies
US10264664B1 (en) 2015-06-04 2019-04-16 Vlt, Inc. Method of electrically interconnecting circuit assemblies
US11094449B2 (en) * 2015-12-18 2021-08-17 Texas Instruments Incorporated Methods and apparatus for isolation barrier with integrated magnetics for high power modules
US20170178787A1 (en) * 2015-12-18 2017-06-22 Texas Instruments Incorporated Methods and Apparatus for Isolation Barrier with Integrated Magnetics for High Power Modules
CN106898483A (en) * 2015-12-18 2017-06-27 德克萨斯仪器股份有限公司 For the method and apparatus of the isolation barrier with Integral magnetic material of high power module
US10497506B2 (en) * 2015-12-18 2019-12-03 Texas Instruments Incorporated Methods and apparatus for isolation barrier with integrated magnetics for high power modules
US10283699B2 (en) * 2016-01-29 2019-05-07 Avago Technologies International Sales Pte. Limited Hall-effect sensor isolator
US20170222131A1 (en) * 2016-01-29 2017-08-03 Avago Technologies General Ip (Singapore) Pte. Ltd. Hall-effect sensor isolator
JP2017220922A (en) * 2016-03-02 2017-12-14 パナソニックIpマネジメント株式会社 Signal transmission device and manufacturing method thereof
US20170330824A1 (en) * 2016-05-13 2017-11-16 Panasonic Corporation Signal transmission apparatus including semiconductor chips and signal isolator
US10297538B2 (en) * 2016-05-13 2019-05-21 Panasonic Corporation Signal transmission apparatus including semiconductor chips and signal isolator
US10651147B2 (en) * 2016-09-13 2020-05-12 Allegro Microsystems, Llc Signal isolator having bidirectional communication between die
US10290608B2 (en) 2016-09-13 2019-05-14 Allegro Microsystems, Llc Signal isolator having bidirectional diagnostic signal exchange
US11073573B2 (en) * 2017-05-26 2021-07-27 Allegro Microsystems, Llc Packages for coil actuated position sensors
US10541195B2 (en) * 2018-01-29 2020-01-21 Lite-On Singapore Pte. Ltd. Package structure of capacitive coupling isolator
US11538766B2 (en) * 2019-02-26 2022-12-27 Texas Instruments Incorporated Isolated transformer with integrated shield topology for reduced EMI
CN113474860A (en) * 2019-02-26 2021-10-01 德克萨斯仪器股份有限公司 Isolation transformer with integrated shielding topology for reduced EMI
US20230207483A1 (en) * 2019-02-26 2023-06-29 Texas Instruments Incorporated Isolated transformer with integrated shield topology for reduced emi
US11710695B2 (en) * 2019-06-25 2023-07-25 Renesas Electronics Corporation Semiconductor device and method of manufacturing the same
US20200411434A1 (en) * 2019-06-25 2020-12-31 Renesas Electronics Corporation Semiconductor device and method of manufacturing the same
US20210043466A1 (en) * 2019-08-06 2021-02-11 Texas Instruments Incorporated Universal semiconductor package molds
US11791170B2 (en) 2019-08-06 2023-10-17 Texas Instruments Incorporated Universal semiconductor package molds
US11115244B2 (en) 2019-09-17 2021-09-07 Allegro Microsystems, Llc Signal isolator with three state data transmission
US11876058B2 (en) * 2020-03-24 2024-01-16 Kabushiki Kaisha Toshiba Isolator
US11476045B2 (en) * 2020-05-29 2022-10-18 Analog Devices International Unlimited Company Electric field grading protection design surrounding a galvanic or capacitive isolator
US11798741B2 (en) 2020-05-29 2023-10-24 Analog Devices International Unlimited Company Electric field grading protection design surrounding a galvanic or capacitive isolator
WO2022210542A1 (en) * 2021-03-29 2022-10-06 ローム株式会社 Insulation transformer, insulation module, and gate driver

Also Published As

Publication number Publication date
GB2479239A (en) 2011-10-05
GB201104609D0 (en) 2011-05-04
US8427844B2 (en) 2013-04-23

Similar Documents

Publication Publication Date Title
US8427844B2 (en) Widebody coil isolators
US8093983B2 (en) Narrowbody coil isolator
US7948067B2 (en) Coil transducer isolator packages
US8061017B2 (en) Methods of making coil transducers
US9105391B2 (en) High voltage hold-off coil transducer
US7064442B1 (en) Integrated circuit package device
EP2589055B1 (en) Galvanic isolation transformer
US8138593B2 (en) Packaged microchip with spacer for mitigating electrical leakage between components
CN107409469B (en) Single layer laminate current isolator assembly
US20080180206A1 (en) Coil Transducer with Reduced Arcing and Improved High Voltage Breakdown Performance Characteristics
US20140055217A1 (en) Die-to-die electrical isolation in a semiconductor package
CN105047634A (en) Isolation between semiconductor components
US10636778B2 (en) Isolator integrated circuits with package structure cavity and fabrication methods
US8264075B2 (en) Stacked-die package including substrate-ground coupling
CN110854104B (en) Current sensor package
US20040113256A1 (en) Stack arrangement of a memory module
US9331046B2 (en) Integrated circuit package with voltage distributor
JP7273701B2 (en) photo relay
KR100632476B1 (en) Multichip Packages and Semiconductor Chips Used in the Package
CN217544608U (en) Semiconductor device with a plurality of semiconductor chips
KR20020075486A (en) Multi chip package for semiconductor

Legal Events

Date Code Title Description
AS Assignment

Owner name: AVAGO TECHNOLOGIES ECBU IP (SINGAPORE) PTE. LTD.,

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:HO, DOMINIQUE;FOUQUET, JULIE;REEL/FRAME:024171/0573

Effective date: 20100331

STCF Information on status: patent grant

Free format text: PATENTED CASE

AS Assignment

Owner name: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD., SINGAPORE

Free format text: MERGER;ASSIGNOR:AVAGO TECHNOLOGIES ECBU IP (SINGAPORE) PTE. LTD.;REEL/FRAME:030369/0496

Effective date: 20121030

Owner name: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD

Free format text: MERGER;ASSIGNOR:AVAGO TECHNOLOGIES ECBU IP (SINGAPORE) PTE. LTD.;REEL/FRAME:030369/0496

Effective date: 20121030

AS Assignment

Owner name: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT, NEW YORK

Free format text: PATENT SECURITY AGREEMENT;ASSIGNOR:AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.;REEL/FRAME:032851/0001

Effective date: 20140506

Owner name: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AG

Free format text: PATENT SECURITY AGREEMENT;ASSIGNOR:AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.;REEL/FRAME:032851/0001

Effective date: 20140506

AS Assignment

Owner name: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD., SINGAPORE

Free format text: TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENT RIGHTS (RELEASES RF 032851-0001);ASSIGNOR:DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT;REEL/FRAME:037689/0001

Effective date: 20160201

Owner name: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD

Free format text: TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENT RIGHTS (RELEASES RF 032851-0001);ASSIGNOR:DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT;REEL/FRAME:037689/0001

Effective date: 20160201

AS Assignment

Owner name: BANK OF AMERICA, N.A., AS COLLATERAL AGENT, NORTH CAROLINA

Free format text: PATENT SECURITY AGREEMENT;ASSIGNOR:AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.;REEL/FRAME:037808/0001

Effective date: 20160201

Owner name: BANK OF AMERICA, N.A., AS COLLATERAL AGENT, NORTH

Free format text: PATENT SECURITY AGREEMENT;ASSIGNOR:AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.;REEL/FRAME:037808/0001

Effective date: 20160201

FPAY Fee payment

Year of fee payment: 4

AS Assignment

Owner name: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD., SINGAPORE

Free format text: TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENTS;ASSIGNOR:BANK OF AMERICA, N.A., AS COLLATERAL AGENT;REEL/FRAME:041710/0001

Effective date: 20170119

Owner name: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD

Free format text: TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENTS;ASSIGNOR:BANK OF AMERICA, N.A., AS COLLATERAL AGENT;REEL/FRAME:041710/0001

Effective date: 20170119

AS Assignment

Owner name: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITE

Free format text: MERGER;ASSIGNOR:AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.;REEL/FRAME:047230/0133

Effective date: 20180509

AS Assignment

Owner name: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITE

Free format text: CORRECTIVE ASSIGNMENT TO CORRECT THE EFFECTIVE DATE OF MERGER TO 09/05/2018 PREVIOUSLY RECORDED AT REEL: 047230 FRAME: 0133. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER;ASSIGNOR:AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.;REEL/FRAME:047630/0456

Effective date: 20180905

MAFP Maintenance fee payment

Free format text: PAYMENT OF MAINTENANCE FEE, 8TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1552); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

Year of fee payment: 8