WO2003037613A1 - Forming thin films on substrates using a porous carrier - Google Patents
Forming thin films on substrates using a porous carrier Download PDFInfo
- Publication number
- WO2003037613A1 WO2003037613A1 PCT/US2002/034033 US0234033W WO03037613A1 WO 2003037613 A1 WO2003037613 A1 WO 2003037613A1 US 0234033 W US0234033 W US 0234033W WO 03037613 A1 WO03037613 A1 WO 03037613A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- porous carrier
- poly
- chamber
- composite
- substrate
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/60—Deposition of organic layers from vapour phase
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form
- B32B3/26—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
- C03C25/10—Coating
- C03C25/12—General methods of coating; Devices therefor
- C03C25/22—Deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249967—Inorganic matrix in void-containing component
- Y10T428/24997—Of metal-containing material
Definitions
- amphiphilic molecule is represented by Formula I:
- amphiphilic molecule is a disilazane represented by Formula V:
- amphiphilic molecules and compounds that can be hydrolyzed into amphiphilic materials include fluorocarbon compounds and hydrolyzates thereof under the trade designation Optool DSX available from Daikin Industries, Ltd.; silanes under the trade designations KA-1003
- the inorganic framework is in turn covered by a hydrocarbon/fluorocarbon outer layer enabling solubilization and derivatization of these systems, which impart hydrophobic/oleophobic properties to the substrate surface in a manner similar as alkyltrichlorosilanes.
- the POSS polymer contains a compound represented by Formula (VII): [R(SiO) x (OH) y ] n (VII)
- Such a compound can be made by stirring RSiX 3 , such as an alkyl trihalosilane, in water and permitting it to hydrolyze, using an acid or base (such as HCI or ammonium hydroxide, respectively) to further hydrolyze the first hydrolization product.
- RSiX 3 such as an alkyl trihalosilane
- Additional organic materials include polystyrene and its mixed polymers, polyolefins, in particular polyethylene and polypropylene, polyacrylic compounds, polyvinyl compounds, for example polyvinyl chloride and polyvinyl acetate, polyesters and rubber, and also filaments made of viscose and cellulose ethers, cellulose esters, polyamides, polyurethanes, polyesters, for example polyglycol terephthalates, and polyacrylonitrile.
- Glasses specifically include lenses, such as eyewear lenses, microscope slides, binocular lenses, microscope lenses, telescope lenses, camera lenses, video lenses, televison screens, computer screens, LCDs, mirrors, prisms, and the like.
- Substrates may have a primer layer of a material desired to improve adhesion between the substrate surface and the amphiphilic molecules.
- a chamber 20 such as a vacuum chamber is employed for use in the present invention.
- the chamber may be an insulated rectangular metal box having a door which is sealed by a gasket when closed and allows insertion and removal of items.
- the box can have an inside chamber that is optionally attached to a high vacuum pump 22 capable of drawing a vacuum of, for example, 0.0001 torr.
- a high vacuum pump 22 capable of drawing a vacuum of, for example, 0.0001 torr.
- chambers include those under the trade designation Satis, such as MC LAB 260, MC
- the thin film formed on the substrate using the composite of a porous carrier impregnated with the amphiphilic molecules has a uniform thickness over the substrate.
- the thickness of the resultant thin film is from about 1 nm to about 250 nm. In another embodiment, the thickness of the resultant thin film is from about 2 nm to about 200 nm. In yet another embodiment, the thickness of the resultant thin film is from about 5 nm to about 100 nm. In still yet another embodiment, the thickness of the resultant thin film is from about 8 nm to about 20 nm.
Abstract
Description
Claims
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE60234857T DE60234857D1 (en) | 2001-10-29 | 2002-10-24 | TRAINING OF THIN FILMS ON SUBSTRATES USING A POROUS CARRIER |
EP20020780524 EP1448366B1 (en) | 2001-10-29 | 2002-10-24 | Forming thin films on substrates using a porous carrier |
MXPA04004060A MXPA04004060A (en) | 2001-10-29 | 2002-10-24 | Forming thin films on substrates using a porous carrier. |
AT02780524T ATE452751T1 (en) | 2001-10-29 | 2002-10-24 | FORMATION OF THIN FILM ON SUBSTRATES USING A POROUS SUPPORT |
KR10-2004-7006370A KR20040064696A (en) | 2001-10-29 | 2002-10-24 | Forming thin films on substrates using a porous carrier |
JP2003539929A JP2005507770A (en) | 2001-10-29 | 2002-10-24 | Method for forming a thin film on a substrate using a porous carrier |
CA 2464733 CA2464733A1 (en) | 2001-10-29 | 2002-10-24 | Forming thin films on substrates using a porous carrier |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US35009601P | 2001-10-29 | 2001-10-29 | |
US60/350,096 | 2001-10-29 | ||
US10/082,712 US6881445B1 (en) | 2001-10-29 | 2002-02-25 | Forming thin films on substrates using a porous carrier |
US10/082,712 | 2002-02-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2003037613A1 true WO2003037613A1 (en) | 2003-05-08 |
Family
ID=26767762
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2002/034033 WO2003037613A1 (en) | 2001-10-29 | 2002-10-24 | Forming thin films on substrates using a porous carrier |
Country Status (11)
Country | Link |
---|---|
US (2) | US6881445B1 (en) |
EP (1) | EP1448366B1 (en) |
JP (1) | JP2005507770A (en) |
KR (1) | KR20040064696A (en) |
CN (1) | CN1578725A (en) |
AT (1) | ATE452751T1 (en) |
CA (1) | CA2464733A1 (en) |
DE (1) | DE60234857D1 (en) |
ES (1) | ES2341610T3 (en) |
MX (1) | MXPA04004060A (en) |
WO (1) | WO2003037613A1 (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1683569A1 (en) * | 2003-10-03 | 2006-07-26 | Daikin Industries, Ltd. | Method of controlling contact angle of water |
JP2006289355A (en) * | 2005-03-18 | 2006-10-26 | Ran Technical Service Kk | Apparatus and method for forming thin film |
EP1961449A2 (en) * | 2007-02-26 | 2008-08-27 | Evonik Degussa GmbH | Shiny and scratch-proof nail varnish through addition of sol gel systems |
EP2057008A2 (en) * | 2006-08-09 | 2009-05-13 | Innovation Chemical Technologies, Ltd. | Nano structured phased hydrophobic layers on substrates |
EP2592172A1 (en) * | 2011-11-09 | 2013-05-15 | Essilor International (Compagnie Générale D'Optique) | Support for a liquid composition. |
US10308541B2 (en) | 2014-11-13 | 2019-06-04 | Gerresheimer Glas Gmbh | Glass forming machine particle filter, a plunger unit, a blow head, a blow head support and a glass forming machine adapted to or comprising said filter |
CN112802927A (en) * | 2021-04-14 | 2021-05-14 | 浙江陶特容器科技股份有限公司 | Application of high-purity nitrous oxide in preparation of solar cell |
JP2023120103A (en) * | 2022-02-17 | 2023-08-29 | エムジーファーマ株式会社 | Lipolysis promoter |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6890987B2 (en) * | 2000-10-18 | 2005-05-10 | Nanofilm, Ltd. | Product for vapor deposition of films of amphiphilic molecules or polymers |
US6881445B1 (en) * | 2001-10-29 | 2005-04-19 | Innovation Chemical Technologies, Ltd. | Forming thin films on substrates using a porous carrier |
US7695767B2 (en) * | 2005-01-06 | 2010-04-13 | The Boeing Company | Self-cleaning superhydrophobic surface |
US20060181266A1 (en) * | 2005-02-14 | 2006-08-17 | Panelvision Technology, A California Corporation | Flat panel display inspection system |
JP5431724B2 (en) * | 2005-05-23 | 2014-03-05 | イノベーション ケミカル テクノロジーズ リミテッド | Fluorinated organosilicon coating material |
US20080221263A1 (en) * | 2006-08-31 | 2008-09-11 | Subbareddy Kanagasabapathy | Coating compositions for producing transparent super-hydrophobic surfaces |
WO2007108364A1 (en) * | 2006-03-16 | 2007-09-27 | Lan Technical Service Co., Ltd. | Thin film forming device and thin film forming method |
US8067103B2 (en) * | 2006-08-24 | 2011-11-29 | Aculon, Inc. | Optical articles with thin hydrophobic layers |
JP2008061120A (en) * | 2006-09-01 | 2008-03-13 | Sony Corp | Reproducing apparatus, retrieving method and program |
US7955649B2 (en) * | 2007-01-17 | 2011-06-07 | Visichem Technology, Ltd. | Forming thin films using a resealable vial carrier of amphiphilic molecules |
EP2138271B1 (en) | 2008-06-26 | 2011-08-03 | Satisloh AG | Method for manufacturing spectacle lenses according to a prescription |
US8163357B2 (en) * | 2009-03-26 | 2012-04-24 | Signet Armorlite, Inc. | Scratch-resistant coatings with improved adhesion to inorganic thin film coatings |
CN103732786B (en) * | 2011-06-22 | 2016-08-17 | 艾克斯特朗欧洲公司 | Gas-phase deposition system and supply head |
WO2012175124A1 (en) * | 2011-06-22 | 2012-12-27 | Aixtron Se | Vapor deposition material source and method for making same |
KR101310296B1 (en) * | 2011-09-09 | 2013-09-24 | (주)엠엠티 | Thermal Evaporator |
WO2015027147A1 (en) * | 2013-08-22 | 2015-02-26 | Oregon State University | Hydrolysis deposition |
US9931611B2 (en) | 2013-11-04 | 2018-04-03 | The Research Foundation For The State University Of New York | Modified hydrophobic sponges |
JP6909613B2 (en) * | 2017-03-31 | 2021-07-28 | 住友化学株式会社 | Composition |
WO2020244733A1 (en) * | 2019-06-03 | 2020-12-10 | Applied Materials, Inc. | Evaporator arrangement, deposition system, and evaporation method |
CN112194994B (en) * | 2020-10-22 | 2022-06-21 | 衡阳市市场监督检验检测中心 | Bottle label protective adhesive tape for corrosive liquid reagent and manufacturing method thereof |
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US6171652B1 (en) * | 1998-05-26 | 2001-01-09 | Brij P. Singh | Method for modifying surfaces with ultra thin films |
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-
2002
- 2002-02-25 US US10/082,712 patent/US6881445B1/en not_active Expired - Lifetime
- 2002-10-24 ES ES02780524T patent/ES2341610T3/en not_active Expired - Lifetime
- 2002-10-24 CA CA 2464733 patent/CA2464733A1/en not_active Abandoned
- 2002-10-24 EP EP20020780524 patent/EP1448366B1/en not_active Expired - Lifetime
- 2002-10-24 WO PCT/US2002/034033 patent/WO2003037613A1/en active Application Filing
- 2002-10-24 JP JP2003539929A patent/JP2005507770A/en active Pending
- 2002-10-24 CN CNA028216768A patent/CN1578725A/en active Pending
- 2002-10-24 DE DE60234857T patent/DE60234857D1/en not_active Expired - Lifetime
- 2002-10-24 AT AT02780524T patent/ATE452751T1/en not_active IP Right Cessation
- 2002-10-24 MX MXPA04004060A patent/MXPA04004060A/en unknown
- 2002-10-24 KR KR10-2004-7006370A patent/KR20040064696A/en not_active Application Discontinuation
-
2005
- 2005-04-08 US US11/101,760 patent/US20050186412A1/en not_active Abandoned
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Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7803432B2 (en) | 2003-10-03 | 2010-09-28 | Daikin Industries, Ltd. | Method of controlling contact angle of water |
EP1683569A4 (en) * | 2003-10-03 | 2008-08-20 | Daikin Ind Ltd | Method of controlling contact angle of water |
EP1683569A1 (en) * | 2003-10-03 | 2006-07-26 | Daikin Industries, Ltd. | Method of controlling contact angle of water |
JP2006289355A (en) * | 2005-03-18 | 2006-10-26 | Ran Technical Service Kk | Apparatus and method for forming thin film |
EP2057008A2 (en) * | 2006-08-09 | 2009-05-13 | Innovation Chemical Technologies, Ltd. | Nano structured phased hydrophobic layers on substrates |
EP2057008A4 (en) * | 2006-08-09 | 2010-09-08 | Innovation Chemical Technologi | Nano structured phased hydrophobic layers on substrates |
EP1961449A2 (en) * | 2007-02-26 | 2008-08-27 | Evonik Degussa GmbH | Shiny and scratch-proof nail varnish through addition of sol gel systems |
EP2592172A1 (en) * | 2011-11-09 | 2013-05-15 | Essilor International (Compagnie Générale D'Optique) | Support for a liquid composition. |
WO2013068980A1 (en) * | 2011-11-09 | 2013-05-16 | Essilor International (Compagnie Générale d'Optique) | Support for an optical coating liquid composition to deposit by evaporation treatment on an optical article |
US10308541B2 (en) | 2014-11-13 | 2019-06-04 | Gerresheimer Glas Gmbh | Glass forming machine particle filter, a plunger unit, a blow head, a blow head support and a glass forming machine adapted to or comprising said filter |
CN112802927A (en) * | 2021-04-14 | 2021-05-14 | 浙江陶特容器科技股份有限公司 | Application of high-purity nitrous oxide in preparation of solar cell |
CN112802927B (en) * | 2021-04-14 | 2021-08-17 | 浙江陶特容器科技股份有限公司 | Application of high-purity nitrous oxide in preparation of solar cell |
JP2023120103A (en) * | 2022-02-17 | 2023-08-29 | エムジーファーマ株式会社 | Lipolysis promoter |
Also Published As
Publication number | Publication date |
---|---|
US6881445B1 (en) | 2005-04-19 |
CA2464733A1 (en) | 2003-05-08 |
KR20040064696A (en) | 2004-07-19 |
US20050186412A1 (en) | 2005-08-25 |
ATE452751T1 (en) | 2010-01-15 |
EP1448366A1 (en) | 2004-08-25 |
EP1448366B1 (en) | 2009-12-23 |
JP2005507770A (en) | 2005-03-24 |
ES2341610T3 (en) | 2010-06-23 |
CN1578725A (en) | 2005-02-09 |
DE60234857D1 (en) | 2010-02-04 |
MXPA04004060A (en) | 2005-01-25 |
EP1448366A4 (en) | 2005-01-12 |
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