WO2004044025A8 - Anti-reflective coatings for photolithography and methods of preparation thereof - Google Patents

Anti-reflective coatings for photolithography and methods of preparation thereof

Info

Publication number
WO2004044025A8
WO2004044025A8 PCT/US2003/036354 US0336354W WO2004044025A8 WO 2004044025 A8 WO2004044025 A8 WO 2004044025A8 US 0336354 W US0336354 W US 0336354W WO 2004044025 A8 WO2004044025 A8 WO 2004044025A8
Authority
WO
WIPO (PCT)
Prior art keywords
agent
photolithography
preparation
methods
reflective coatings
Prior art date
Application number
PCT/US2003/036354
Other languages
French (fr)
Other versions
WO2004044025A3 (en
WO2004044025A2 (en
Inventor
Teresa Baldwin
Joseph Kennedy
Nancy Iwamoto
Tadashi Nakano
William Bedwell
Jason Stuck
Arlene Suedemeyer
Mello Hebert
Bo Li
Original Assignee
Honeywell Int Inc
Teresa Baldwin
Joseph Kennedy
Nancy Iwamoto
Tadashi Nakano
William Bedwell
Jason Stuck
Arlene Suedemeyer
Mello Hebert
Bo Li
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/US2002/036327 external-priority patent/WO2003044078A1/en
Application filed by Honeywell Int Inc, Teresa Baldwin, Joseph Kennedy, Nancy Iwamoto, Tadashi Nakano, William Bedwell, Jason Stuck, Arlene Suedemeyer, Mello Hebert, Bo Li filed Critical Honeywell Int Inc
Priority to AU2003295517A priority Critical patent/AU2003295517A1/en
Publication of WO2004044025A2 publication Critical patent/WO2004044025A2/en
Publication of WO2004044025A3 publication Critical patent/WO2004044025A3/en
Publication of WO2004044025A8 publication Critical patent/WO2004044025A8/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Abstract

Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one densifying agent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.
PCT/US2003/036354 2002-11-12 2003-11-12 Anti-reflective coatings for photolithography and methods of preparation thereof WO2004044025A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2003295517A AU2003295517A1 (en) 2002-11-12 2003-11-12 Anti-reflective coatings for photolithography and methods of preparation thereof

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US44469702P 2002-11-12 2002-11-12
USPCT/US02/36327 2002-11-12
US60/444,697 2002-11-12
PCT/US2002/036327 WO2003044078A1 (en) 2001-11-15 2002-11-12 Anti-reflective coatings for photolithography and methods of preparation thereof
US50919903P 2003-10-07 2003-10-07
US60/509,199 2003-10-07

Publications (3)

Publication Number Publication Date
WO2004044025A2 WO2004044025A2 (en) 2004-05-27
WO2004044025A3 WO2004044025A3 (en) 2004-07-15
WO2004044025A8 true WO2004044025A8 (en) 2004-10-07

Family

ID=32685877

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2003/036354 WO2004044025A2 (en) 2002-11-12 2003-11-12 Anti-reflective coatings for photolithography and methods of preparation thereof

Country Status (2)

Country Link
AU (1) AU2003295517A1 (en)
WO (1) WO2004044025A2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8809482B2 (en) 2008-12-10 2014-08-19 Dow Corning Corporation Silsesquioxane resins
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000077575A1 (en) 1999-06-10 2000-12-21 Alliedsignal Inc. Spin-on-glass anti-reflective coatings for photolithography
JP4796498B2 (en) 2003-05-23 2011-10-19 ダウ コーニング コーポレーション Siloxane resin anti-reflective coating composition with high wet etch rate
WO2006065321A1 (en) 2004-12-17 2006-06-22 Dow Corning Corporation Method for forming anti-reflective coating
US7838615B2 (en) 2004-12-17 2010-11-23 Dow Corning Corporation Siloxane resin coating
NO325797B1 (en) * 2005-10-14 2008-07-21 Nor X Ind As Light preservative based on organic / inorganic hybrid polymer, process for preparation and use of same
US8263312B2 (en) 2006-02-13 2012-09-11 Dow Corning Corporation Antireflective coating material
US7550249B2 (en) 2006-03-10 2009-06-23 Az Electronic Materials Usa Corp. Base soluble polymers for photoresist compositions
WO2007144452A1 (en) * 2006-06-13 2007-12-21 Braggone Oy Hybrid inorganic-organic polymer compositions for anti-reflective coatings
US7704670B2 (en) * 2006-06-22 2010-04-27 Az Electronic Materials Usa Corp. High silicon-content thin film thermosets
US7759046B2 (en) 2006-12-20 2010-07-20 Az Electronic Materials Usa Corp. Antireflective coating compositions
US8026040B2 (en) 2007-02-20 2011-09-27 Az Electronic Materials Usa Corp. Silicone coating composition
KR101523393B1 (en) 2007-02-27 2015-05-27 이엠디 퍼포먼스 머티리얼스 코프. Silicon-based antireflective coating compositions
TWI439494B (en) * 2007-02-27 2014-06-01 Braggone Oy Process for producing an organosiloxane polymer
US8987039B2 (en) 2007-10-12 2015-03-24 Air Products And Chemicals, Inc. Antireflective coatings for photovoltaic applications
US8318258B2 (en) 2008-01-08 2012-11-27 Dow Corning Toray Co., Ltd. Silsesquioxane resins
US9023433B2 (en) 2008-01-15 2015-05-05 Dow Corning Corporation Silsesquioxane resins and method of using them to form an antireflective coating
JP5581225B2 (en) 2008-03-04 2014-08-27 ダウ・コーニング・コーポレイション Silsesquioxane resin
JP5581224B2 (en) 2008-03-05 2014-08-27 ダウ・コーニング・コーポレイション Silsesquioxane resin
WO2014035468A1 (en) * 2012-08-31 2014-03-06 Honeywell International Inc. Highly durable anti-reflective coatings
EP3194502A4 (en) 2015-04-13 2018-05-16 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6368400B1 (en) * 2000-07-17 2002-04-09 Honeywell International Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8809482B2 (en) 2008-12-10 2014-08-19 Dow Corning Corporation Silsesquioxane resins
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements

Also Published As

Publication number Publication date
AU2003295517A8 (en) 2004-06-03
AU2003295517A1 (en) 2004-06-03
WO2004044025A3 (en) 2004-07-15
WO2004044025A2 (en) 2004-05-27

Similar Documents

Publication Publication Date Title
WO2004044025A3 (en) Anti-reflective coatings for photolithography and methods of preparation thereof
TW200833799A (en) Spin-on-glass anti-reflective coatings for photolithography
WO2005088397A3 (en) A process of imaging a deep ultraviolet photoresist with a top coating and materials thereof
EP0834770A3 (en) Dyed photoresists and methods and articles of manufacture comprising same
AU2001280558A1 (en) Absorbing compounds for spin-on glass anti-reflective coatings for photolithography
EP1734032A4 (en) Calixresorcinarene compounds, photoresist base materials, and compositions thereof
MY145561A (en) A process for imaging a deep ultraviolet photoresist with a top coating and materials thereof
DE60022411T2 (en) Sunscreen compositions containing a Bisresorcinyltriazinderivat and a compound with benzoazolyl or benzodiazolyl
AU3877000A (en) Allyl compounds, compositions containing allyl compounds and processes for forming and curing polymer compositions
EP1184426A3 (en) Composite particles, process for producing the same, and pigment, paint and resin composition using the same
WO2002021216A3 (en) Polymers and photoresist compositions comprising electronegative groups
EP1112780A3 (en) Method for producing fast drying multi-component waterborne coating compositions
WO2003087094A3 (en) Pyrrolidinium derivatives as antagonists of m3 muscarinic receptors
HK1043630A1 (en) Antireflective composition for a deep ultraviolet photoresist
CA2306217A1 (en) Cationic electrodeposition coating composition
WO2004050039A3 (en) Spirocyclic ureas, compositions containing such compounds and methods of use
WO2001044379A3 (en) Uv curable paint compositions and method of making and applying same
WO2002094020A8 (en) Use of triazolopyrimidine derivatives as microbicides in the protection of materials
WO2005033233A3 (en) Clearcoat composition having both windshield sealant and recoat adhesion
WO2005079464A3 (en) Vitamin d receptor antagonists and their use in treating asthma
WO2002069043A8 (en) Low absorbing resists for 157 nm lithography
WO2001027198A3 (en) Thermally hardenable polymer binding agent in the form of a powder
EP1055669A4 (en) Bisbenzotriazolylphenol compounds, ultraviolet absorber, ultraviolet-absorbing polymer, and resin composition and coating material both containing these
EP1112687A3 (en) Insect repellent composition and insect repellent paint composition containing the same
WO2001094478A3 (en) Coating agents which can be hardened by means of uv radiation, method for producing coatings from said coating agents and use thereof

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NI NO NZ OM PH PL PT RO RU SC SD SE SG SK SL TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): BW GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
CFP Corrected version of a pamphlet front page
CR1 Correction of entry in section i

Free format text: IN PCT GAZETTE 22/2004 UNDER (30) REPLACE "06 OCTOBER 2003 (06.10.2003)" BY "07 OCTOBER 2003 (07.10.2003)"

122 Ep: pct application non-entry in european phase
NENP Non-entry into the national phase in:

Ref country code: JP

WWW Wipo information: withdrawn in national office

Country of ref document: JP