WO2004109750A3 - Wiring for semiconductor device, thin film transistor array panel including wiring, and manufacturing method thereof - Google Patents
Wiring for semiconductor device, thin film transistor array panel including wiring, and manufacturing method thereof Download PDFInfo
- Publication number
- WO2004109750A3 WO2004109750A3 PCT/KR2004/001381 KR2004001381W WO2004109750A3 WO 2004109750 A3 WO2004109750 A3 WO 2004109750A3 KR 2004001381 W KR2004001381 W KR 2004001381W WO 2004109750 A3 WO2004109750 A3 WO 2004109750A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- wiring
- manufacturing
- thin film
- forming
- gate
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2003-0037148 | 2003-06-10 | ||
KR1020030037148A KR20040105975A (en) | 2003-06-10 | 2003-06-10 | Wiring for semiconductor device, method for manufacturing the wiring, thin film transistor array panel including the wiring, and method for manufacturing the panel |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004109750A2 WO2004109750A2 (en) | 2004-12-16 |
WO2004109750A3 true WO2004109750A3 (en) | 2006-01-26 |
Family
ID=33509642
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2004/001381 WO2004109750A2 (en) | 2003-06-10 | 2004-06-10 | Wiring for semiconductor device, thin film transistor array panel including wiring, and manufacturing method thereof |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR20040105975A (en) |
WO (1) | WO2004109750A2 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2016408A2 (en) * | 2006-05-03 | 2009-01-21 | Koninklijke Philips Electronics N.V. | Biosensor device |
KR20100091663A (en) | 2009-02-11 | 2010-08-19 | 삼성전자주식회사 | Surface modifying agent, laminated structure using the same, method of manufacturing the structure, and transistor including the same |
US8415252B2 (en) * | 2010-01-07 | 2013-04-09 | International Business Machines Corporation | Selective copper encapsulation layer deposition |
KR20140107968A (en) | 2013-02-28 | 2014-09-05 | 한국전자통신연구원 | Method for transferring graphene |
KR20210013508A (en) | 2019-07-26 | 2021-02-04 | 삼성디스플레이 주식회사 | Optical sensor, manufacturing method of the optical sensor and display device including the optical sensor |
US11903328B2 (en) * | 2020-02-07 | 2024-02-13 | International Business Machines Corporation | Self assembled monolayer formed on a quantum device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6395454B1 (en) * | 1997-08-04 | 2002-05-28 | Infineon Technologies Ag | Integrated electrical circuit with passivation layer |
US20020084252A1 (en) * | 2000-12-28 | 2002-07-04 | Buchwalter Stephen L. | Self-assembled monolayer etch barrier for indium-tin-oxide useful in manufacturing thin film transistor-liquid crystal displays |
US6433359B1 (en) * | 2001-09-06 | 2002-08-13 | 3M Innovative Properties Company | Surface modifying layers for organic thin film transistors |
-
2003
- 2003-06-10 KR KR1020030037148A patent/KR20040105975A/en not_active Application Discontinuation
-
2004
- 2004-06-10 WO PCT/KR2004/001381 patent/WO2004109750A2/en active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6395454B1 (en) * | 1997-08-04 | 2002-05-28 | Infineon Technologies Ag | Integrated electrical circuit with passivation layer |
US20020084252A1 (en) * | 2000-12-28 | 2002-07-04 | Buchwalter Stephen L. | Self-assembled monolayer etch barrier for indium-tin-oxide useful in manufacturing thin film transistor-liquid crystal displays |
US6433359B1 (en) * | 2001-09-06 | 2002-08-13 | 3M Innovative Properties Company | Surface modifying layers for organic thin film transistors |
Also Published As
Publication number | Publication date |
---|---|
KR20040105975A (en) | 2004-12-17 |
WO2004109750A2 (en) | 2004-12-16 |
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