WO2005049681A2 - Antireflective coatings for via fill and photolithography applications and methods of preparation thereof - Google Patents
Antireflective coatings for via fill and photolithography applications and methods of preparation thereof Download PDFInfo
- Publication number
- WO2005049681A2 WO2005049681A2 PCT/US2004/038517 US2004038517W WO2005049681A2 WO 2005049681 A2 WO2005049681 A2 WO 2005049681A2 US 2004038517 W US2004038517 W US 2004038517W WO 2005049681 A2 WO2005049681 A2 WO 2005049681A2
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- WIPO (PCT)
- Prior art keywords
- composition
- absorbing
- compound
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04811280.9A EP1695142B1 (en) | 2003-11-18 | 2004-11-17 | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
KR1020127022626A KR101324022B1 (en) | 2003-11-18 | 2004-11-17 | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
TW093135250A TWI374914B (en) | 2003-11-18 | 2004-11-17 | Anti-reflective coatings for via fill and photolithography applications and methods of preparation thereof |
JP2006541340A JP4857119B2 (en) | 2003-11-18 | 2004-11-17 | Anti-reflective coatings for viafill and photolithography applications and methods for their preparation |
CN2004800401815A CN1902546B (en) | 2003-11-18 | 2004-11-17 | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/717,028 US8053159B2 (en) | 2003-11-18 | 2003-11-18 | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
US10/717,028 | 2003-11-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2005049681A2 true WO2005049681A2 (en) | 2005-06-02 |
WO2005049681A3 WO2005049681A3 (en) | 2006-04-20 |
Family
ID=34619917
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2004/038517 WO2005049681A2 (en) | 2003-11-18 | 2004-11-17 | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
Country Status (7)
Country | Link |
---|---|
US (2) | US8053159B2 (en) |
EP (1) | EP1695142B1 (en) |
JP (2) | JP4857119B2 (en) |
KR (2) | KR101324022B1 (en) |
CN (2) | CN103627316B (en) |
TW (1) | TWI374914B (en) |
WO (1) | WO2005049681A2 (en) |
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WO2007144453A1 (en) * | 2006-06-13 | 2007-12-21 | Braggone Oy | Carbosilane polymer compositions for anti-reflective coatings |
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US7550249B2 (en) | 2006-03-10 | 2009-06-23 | Az Electronic Materials Usa Corp. | Base soluble polymers for photoresist compositions |
US7759046B2 (en) | 2006-12-20 | 2010-07-20 | Az Electronic Materials Usa Corp. | Antireflective coating compositions |
US7955782B2 (en) | 2008-09-22 | 2011-06-07 | Honeywell International Inc. | Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same |
US8026040B2 (en) | 2007-02-20 | 2011-09-27 | Az Electronic Materials Usa Corp. | Silicone coating composition |
US9624356B2 (en) | 2014-08-19 | 2017-04-18 | Shin-Etsu Chemial Co., Ltd | Ultraviolet absorber, composition for forming a resist under layer film, and patterning process |
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US20080157065A1 (en) * | 2004-08-03 | 2008-07-03 | Ahila Krishnamoorthy | Compositions, layers and films for optoelectronic devices, methods of production and uses thereof |
US8901268B2 (en) | 2004-08-03 | 2014-12-02 | Ahila Krishnamoorthy | Compositions, layers and films for optoelectronic devices, methods of production and uses thereof |
US20060105567A1 (en) * | 2004-11-12 | 2006-05-18 | Intel Corporation | Method for forming a dual-damascene structure |
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US8642246B2 (en) | 2007-02-26 | 2014-02-04 | Honeywell International Inc. | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof |
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US20140116505A1 (en) * | 2011-05-27 | 2014-05-01 | Nissan Chemical Industries, Ltd. | Resin composition |
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US9624356B2 (en) | 2014-08-19 | 2017-04-18 | Shin-Etsu Chemial Co., Ltd | Ultraviolet absorber, composition for forming a resist under layer film, and patterning process |
Also Published As
Publication number | Publication date |
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JP5467082B2 (en) | 2014-04-09 |
KR101324022B1 (en) | 2013-11-01 |
US8992806B2 (en) | 2015-03-31 |
WO2005049681A3 (en) | 2006-04-20 |
TW200538511A (en) | 2005-12-01 |
CN103627316B (en) | 2016-08-03 |
TWI374914B (en) | 2012-10-21 |
JP2012025957A (en) | 2012-02-09 |
CN103627316A (en) | 2014-03-12 |
EP1695142A2 (en) | 2006-08-30 |
US20120001135A1 (en) | 2012-01-05 |
EP1695142A4 (en) | 2007-05-30 |
CN1902546B (en) | 2012-11-14 |
US8053159B2 (en) | 2011-11-08 |
EP1695142B1 (en) | 2019-07-31 |
JP4857119B2 (en) | 2012-01-18 |
KR20060099532A (en) | 2006-09-19 |
JP2007520737A (en) | 2007-07-26 |
KR20120115432A (en) | 2012-10-17 |
CN1902546A (en) | 2007-01-24 |
US20050171277A1 (en) | 2005-08-04 |
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