WO2009135686A3 - Self-assembled monolayers and method of production - Google Patents

Self-assembled monolayers and method of production Download PDF

Info

Publication number
WO2009135686A3
WO2009135686A3 PCT/EP2009/003318 EP2009003318W WO2009135686A3 WO 2009135686 A3 WO2009135686 A3 WO 2009135686A3 EP 2009003318 W EP2009003318 W EP 2009003318W WO 2009135686 A3 WO2009135686 A3 WO 2009135686A3
Authority
WO
WIPO (PCT)
Prior art keywords
self
production
fluoroalkyl
assembled monolayers
chains
Prior art date
Application number
PCT/EP2009/003318
Other languages
French (fr)
Other versions
WO2009135686A2 (en
Inventor
Karsten Reihs
Original Assignee
Amf Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Amf Gmbh filed Critical Amf Gmbh
Priority to EP20090741904 priority Critical patent/EP2285500A2/en
Priority to US12/991,875 priority patent/US8697234B2/en
Publication of WO2009135686A2 publication Critical patent/WO2009135686A2/en
Publication of WO2009135686A3 publication Critical patent/WO2009135686A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
    • B05D1/185—Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/261—In terms of molecular thickness or light wave length
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

Abstract

The invention relates to a self-assembled monolayer comprising fluoroalkyl chains F3C-(CF2)m-(CH2)n- of differing length, wherein m is an integer of from 3 to 36, n is an integer of from 0 to 40, and m in the longer fluoroalkyl chain is larger than m in the shorter fluoroalkyl chain by at least 2, preferably by at least 8. The molar ratio of the longer fluoroalkyl chains to the shorter fluoroalkyl chains is from 1:9 to 9:1.
PCT/EP2009/003318 2008-05-09 2009-05-11 Self-assembled monolayers and method of production WO2009135686A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP20090741904 EP2285500A2 (en) 2008-05-09 2009-05-11 Self-assembled monolayers and method of production
US12/991,875 US8697234B2 (en) 2008-05-09 2009-05-11 Self-assembled monolayers and method of production

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP08008740.6 2008-05-09
EP08008740 2008-05-09

Publications (2)

Publication Number Publication Date
WO2009135686A2 WO2009135686A2 (en) 2009-11-12
WO2009135686A3 true WO2009135686A3 (en) 2010-03-04

Family

ID=39937867

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2009/003318 WO2009135686A2 (en) 2008-05-09 2009-05-11 Self-assembled monolayers and method of production

Country Status (3)

Country Link
US (1) US8697234B2 (en)
EP (1) EP2285500A2 (en)
WO (1) WO2009135686A2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5889998B1 (en) * 2014-11-19 2016-03-22 株式会社東芝 Organic thin film solar cell
US10428421B2 (en) 2015-08-03 2019-10-01 Asm Ip Holding B.V. Selective deposition on metal or metallic surfaces relative to dielectric surfaces
US10900120B2 (en) 2017-07-14 2021-01-26 Asm Ip Holding B.V. Passivation against vapor deposition
TWI810141B (en) 2017-07-14 2023-07-21 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 Apparatus for depositing self-assembled monolayer on substrate and method of self-assembled monolayer formation and selective deposition

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0491251A1 (en) * 1990-12-10 1992-06-24 Matsushita Electric Industrial Co., Ltd. Adsorbed monomolecular film and method of manufacturing the same

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5308705A (en) 1990-04-03 1994-05-03 Ppg Industries, Inc. Water repellent surface treatment
EP0484746B1 (en) 1990-10-25 1996-09-18 Matsushita Electric Industrial Co., Ltd. Chemically adsorbed monomolecular lamination film and method of manufacturing the same
EP0492417B1 (en) 1990-12-21 1996-11-20 Matsushita Electric Industrial Co., Ltd. Method of manufacturing chemically adsorbed film
EP0492545B1 (en) 1990-12-25 1998-03-25 Matsushita Electric Industrial Co., Ltd. Transparent substrate with monomolecular film thereon and method of manufacturing the same
DE69227806T2 (en) 1991-07-26 1999-04-29 Matsushita Electric Ind Co Ltd Oil and water repellent clothing material
FR2756276B1 (en) * 1996-11-26 1998-12-24 Saint Gobain Vitrage SUBSTRATE WITH IMPROVED HYDROPHILIC OR HYDROPHOBIC PROPERTIES, CONTAINING IRREGULARITIES
FR2769318B1 (en) * 1997-10-06 1999-12-10 Saint Gobain Vitrage HYDROPHOBIC COATING, ESPECIALLY FOR GLAZING

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0491251A1 (en) * 1990-12-10 1992-06-24 Matsushita Electric Industrial Co., Ltd. Adsorbed monomolecular film and method of manufacturing the same

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
CHECHIK V ET AL: "REACTIONS AND REACTIVITY IN SELF-ASSEMBLED MONOLAYERS", ADVANCED MATERIALS, WILEY VCH, WEINHEIM, DE, vol. 12, no. 16, 16 August 2000 (2000-08-16), pages 1161 - 1171, XP000963580, ISSN: 0935-9648 *

Also Published As

Publication number Publication date
US8697234B2 (en) 2014-04-15
EP2285500A2 (en) 2011-02-23
WO2009135686A2 (en) 2009-11-12
US20110123812A1 (en) 2011-05-26

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