WO2012143334A1 - Procédé pour augmenter la résistance à l'essuyage ou la résistance à la rayure de surfaces en plastique - Google Patents
Procédé pour augmenter la résistance à l'essuyage ou la résistance à la rayure de surfaces en plastique Download PDFInfo
- Publication number
- WO2012143334A1 WO2012143334A1 PCT/EP2012/056934 EP2012056934W WO2012143334A1 WO 2012143334 A1 WO2012143334 A1 WO 2012143334A1 EP 2012056934 W EP2012056934 W EP 2012056934W WO 2012143334 A1 WO2012143334 A1 WO 2012143334A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- plasma
- plastic surfaces
- resistance
- oxide layer
- plastic
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/584—Non-reactive treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
- C23C16/0281—Deposition of sub-layers, e.g. to promote the adhesion of the main coating of metallic sub-layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
Definitions
- the invention relates to a method for increasing the wipe resistance or
- Silicon oxide layer is understood here as a layer consisting essentially of Si0 2 , but may have deviations in the oxygen content and otherwise may have a residual content of hydrocarbons.
- a typical formula is: Si0 1; 8 b i s
- covers or frames of screens for complacent design can be made in high gloss.
- High-gloss decorative surfaces are also in high demand in the passenger car sector and can also be found here as plastics that are galvanically coated with metals. These surfaces can also be very sensitive to wiping or scratching.
- High-gloss paints are not resistant to this, but are also rubbed off with light rubbing or wiping with a cloth, even scratching them, which disturbs the original gloss of the surface in the sense of a uniform reflection pattern. With permanent rubbing stress, the surface can be rubbed off in such a way that it becomes dull there. Very disadvantageous are such abrasion and scratching on plastic surfaces with optical function, for example. Of lenses or transparent panes such as the covers of electronic displays. Not only the decorative, but also the technical function is at stake here. State of the art:
- hydrophobic Under hydrophobic is understood here the property of a surface to repel water. This property shows, for example, that such a surface opposite to an attached drop of water forms a contact angle of about 90 ° and higher. Water and aqueous solutions or mixtures do not wet such a surface. At a contact angle of 100 ° and higher is often spoken of superhydrophobia or oleophobia. Such a surface is not wetted by hydrocarbons such as paraffins or mineral oils and also rejects skin oils and fats. However, it is also known that the mentioned care substances can not be used on plastics. Because on the latter they can not bind chemically and thus be wiped off, whereby the hydrophobing and the friction-reducing effect is not permanent.
- the invention has the object to eliminate the disadvantages of the prior art.
- Plastic surfaces can increase decisively if they were coated by means of a plasma with a very thin oxide layer and then covered with a care substance.
- the surfaces of sensitive plastics or high-gloss coatings can be inventively with little effort from damage such as scratches,
- Frictional stress for example with a wipe result.
- the oxide layer can according to the invention with PECVD, sputtering
- Silica is particularly suitable as oxides, but it is also possible to use titanium oxide or aluminum oxide and other oxides which can be applied as a layer by a plasma technique.
- textiles commercially available for this purpose materials such as “Optool DSX” (Daikin Industries Ltd.), “Duralon” or “Duralon Ultratec” (each of the Cotec GmbH, Karl Stein, Germany), “Everclean” (Umicore , Balzers, Liechtenstein) or “Satin” (by Satisloh, Baar, Switzerland).
- known easy care material is used in the context of the invention, a commercially available easy care material consisting of an oligomer or
- Si is a silicon atom
- X is a substituent from the group Cl, alkoxy or acetoxy
- RH is a hydrogen atom or an alkyl radical.
- the oligomer or polymer chain may be a substantially perfluorinated alkyl or alkyl ether chain or an unsubstituted alkyl or alkyl ether chain.
- the substituted silyl group may preferably be a halosilane or an alkoxysilane or an acetoxy silane.
- Plastic surfaces are easy to care for. In this respect, they even hold oily or greasy soiling such as skin marks far less firm and dry
- Wiping will provide less friction than the unprotected surface. As a result, the surfaces are much less damaged by cleaning procedures.
- the plate was loaded with a Abriebprüfmix the Karl-Fischer Maschinenbau GmbH by moving back and forth a wool felt disc of 10 mm diameter with increasing weight load and increasing stroke rate.
- a load of 8N showed the first scratches during visual inspection under daylight (D65) and standard light A. This was the case on an untreated plate after only 1000 strokes with IN load.
- a PC-plate from Makroion 2407 (Bayer) was coated as described in Example 1 with a 50 nm thick SiOx layer and 3 days later in a
- Vacuum drying cabinet with a volume of 50 dm 3 with a care substance ETC1 from Surface Chemistry, Niddatal evaporated from the supplied, porous support material.
- the plate was tested with the Stroke tester as described in Example 1. After 1000 strokes with a load of 8 N, the first 3 scratches were visible during visual inspection under daylight (standard light D65) and standard light A.
- a test plate made of polycarbonate macroion 2407 from Bayer was coated in a cylindrical plasma reactor R300 (plasma electronic GmbH, Filderstadt, year of construction ca. 1990), volume about 10 dm 3 with a thin SiOx layer (plasma excitation with 50 W at 13, 56 MHz, process gases tetramethyldisiloxane and oxygen in the ratio of 1 to 5 at 50 Pa process pressure, duration: 5 min).
- the sample plate was removed and then in a vacuum oven (wall temperature 70 ° C) with a thermal evaporator (temperature rising from 20 to 380 ° C) at a pressure of 5 mbar with the easy-care material ETC 1 of Surface Chemistry (Niddatal, Germany ) steamed.
- a porous filter body made of brass, soaked with 100 ⁇ of the care substance ETC1 was placed in the thermal evaporator
- the plate After a storage period of 7 days, the plate with a Abriebprüfpractic Karl-Fischer Maschinenbau GmbH by moving herzogen and a Wollfilzin of 10 mm diameter loaded with increasing weight load and increasing number of strokes. After 1000 strokes with a load of 8N, the first scratches were visible under visual examination under daylight (D65).
- a test was carried out using a hardness test of the company Erichsen.
- a test probe with a ball diameter of 1 mm was passed once in a line across the surface.
- the load on the surface is set by the bias of the test probe with a spring between 1 and 20 N.
- the scratches or impressions of the surface were tested under the illumination conditions described above.
- a macroion 2407 PC plate treated according to the present invention showed traces at a spring bias of x 5 N while an untreated plate at 3 N had first traces.
- the test with the hardness test according to Erichsen revealed first injuries from a spring preload of 4 or 5 N.
Abstract
L'invention concerne un procédé pour augmenter la résistance à l'essuyage ou la résistance à la rayure de surfaces en plastique, selon lequel sont appliquées tout d'abord une couche d'oxyde de silicium puis une substance réduisant le frottement. Par couche d'oxyde de silicium, on entend ici une couche sensiblement constituée de SiO2 mais pouvant présenter des écarts en termes de teneur en oxygène et pouvant, par ailleurs, également présenter une teneur résiduelle en hydrocarbures. Une formule typique est : SiO1,8 bis 2,4CxHy.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102011007557.7 | 2011-04-16 | ||
DE102011007557.7A DE102011007557B4 (de) | 2011-04-16 | 2011-04-16 | Verfahren zur Steigerung der Wischfestigkeit bzw. Kratzfestigkeit von Kunststoffoberflächen |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2012143334A1 true WO2012143334A1 (fr) | 2012-10-26 |
Family
ID=46124298
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2012/056934 WO2012143334A1 (fr) | 2011-04-16 | 2012-04-16 | Procédé pour augmenter la résistance à l'essuyage ou la résistance à la rayure de surfaces en plastique |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE102011007557B4 (fr) |
WO (1) | WO2012143334A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI699441B (zh) * | 2019-06-21 | 2020-07-21 | 逢甲大學 | 大氣常壓低溫電漿鍍製抗刮疏水層的方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0963797A2 (fr) | 1998-05-26 | 1999-12-15 | nanoFILM, Ltd. | Procédé pour modifier des surfaces avec couches ultra-minces |
DE19901834A1 (de) * | 1999-01-19 | 2000-07-20 | Leybold Systems Gmbh | Verfahren zum Beschichten von Substraten aus Kunststoff |
US6542302B2 (en) | 1999-12-01 | 2003-04-01 | Bushnell Corporation | Lens coating to reduce external fogging of scope lenses |
EP1816489A2 (fr) * | 2006-02-01 | 2007-08-08 | Seiko Epson Corporation | Élément optique et son procédé de fabrication |
US20100183857A1 (en) * | 2007-06-13 | 2010-07-22 | Essilor International (Compagnie Generale D'optique) | Optical Article Coated with an Antireflection Coating Comprising a Sublayer Partially Formed under Ion Assistance and Manufacturing Process |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB8302165D0 (en) | 1983-01-26 | 1983-03-02 | Spafax Holdings Plc | Producing optical component |
-
2011
- 2011-04-16 DE DE102011007557.7A patent/DE102011007557B4/de active Active
-
2012
- 2012-04-16 WO PCT/EP2012/056934 patent/WO2012143334A1/fr active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0963797A2 (fr) | 1998-05-26 | 1999-12-15 | nanoFILM, Ltd. | Procédé pour modifier des surfaces avec couches ultra-minces |
DE19901834A1 (de) * | 1999-01-19 | 2000-07-20 | Leybold Systems Gmbh | Verfahren zum Beschichten von Substraten aus Kunststoff |
US6542302B2 (en) | 1999-12-01 | 2003-04-01 | Bushnell Corporation | Lens coating to reduce external fogging of scope lenses |
EP1816489A2 (fr) * | 2006-02-01 | 2007-08-08 | Seiko Epson Corporation | Élément optique et son procédé de fabrication |
US20100183857A1 (en) * | 2007-06-13 | 2010-07-22 | Essilor International (Compagnie Generale D'optique) | Optical Article Coated with an Antireflection Coating Comprising a Sublayer Partially Formed under Ion Assistance and Manufacturing Process |
Non-Patent Citations (4)
Title |
---|
J. SCHÄFER; R. FOEST; A. QUADE; A. OHL; K.D. WELTMANN: "Carbon-free SiOx films deposited from octamethylcyclotetrasiloxane (OMCTS) by an Atmospheric Pressure Plasma Jet (APPJ", EUR. PHYS. J. D, vol. 54, 2009, pages 211 - 217, XP019724719, DOI: doi:10.1140/epjd/e2009-00048-2 |
R. BECKMANN, K. D. NAUENBERG, T. NAUMANN, U. PATZ, G. IEHED, AND H. HAGEDARU: "A new high-rate deposition process for scratch- and wipe-resistance coatings for optical and decorative plastic parts", 44TH ANNUAL TECHNICAL CONFERENCE PROCEEDINGS / SOCIETY OF VACUUM COATERS : APRIL 21 - 26, 2001, PHILADELPHIA, PENNSYLVANIA, 1 January 2001 (2001-01-01) - 26 April 2001 (2001-04-26), pages 288 - 294, XP009161714 * |
R. BECKMANN; K.-D. NAUENBURG; T. NAUMANN; U. PATZ; G. ICKES; H. HAGEDORN; J. SNYDER: "New High-Rate Deposition Process for Scratchand Wipe-Resistant Coatings for Optical and Decorative Plastics", SVC, 44TH ANN. TECH. CONF., 21 April 2001 (2001-04-21), pages 288 - 294 |
R. HORA; C. WOHLRAB: "Plasma Polymerization: A New Technology for Functional Coatings on Plastic", SVC, 36 TH ANN. TECH. CONF. PROC., 1993, pages 51 - 55 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI699441B (zh) * | 2019-06-21 | 2020-07-21 | 逢甲大學 | 大氣常壓低溫電漿鍍製抗刮疏水層的方法 |
Also Published As
Publication number | Publication date |
---|---|
DE102011007557B4 (de) | 2023-09-28 |
DE102011007557A1 (de) | 2012-10-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE112016003678B4 (de) | Glasplatte mit Antiverschmutzungsschicht | |
EP1432529B1 (fr) | Article comportant un revetement en polymeres plasma | |
DE10342398B4 (de) | Schutzschicht für einen Körper sowie Verfahren zur Herstellung und Verwendung von Schutzschichten | |
DE112015003283B4 (de) | Abdeckglas | |
EP1475426B1 (fr) | Procédé de fabrication des revêtements amovibles repoussant à salissure et l'eau | |
Shah et al. | A durable superhydrophobic coating for the protection of wood materials | |
DE102006014796B4 (de) | Thermisch hoch belastbares Low-E-Schichtsystem für transparente Substrate | |
DE3390170C2 (de) | Verfahren zur Erzeugung eines abriebfesten ]berzugs auf einem festen Substrat sowie dessen Verwendung | |
DE102009050568A1 (de) | Einrichtung mit verminderten Reibeigenschaften | |
EP2027223B1 (fr) | Revêtements résistant à l'abrasion et aux éraflures sur des surfaces polymères | |
DE102019006762A1 (de) | Glaslaminat, Frontplatte für Anzeigen und Anzeigevorrichtung | |
DE112016002132T5 (de) | Basis mit einem Film mit geringer Reflexion | |
DE102008054139A1 (de) | Glas- oder Glaskeramik-Substrat mit Kratzschutzbeschichtung und Verfahren zu dessen Herstellung | |
DE102010048088A1 (de) | Optische Linse mit kratzfester Entspiegelungsschicht | |
DE102007058927B4 (de) | Substrat mit einer Sol-Gel-Schicht und Verfahren zur Herstellung eines Verbundmaterials sowie dessen Verwendung | |
Rios et al. | Durable ultra‐hydrophobic surfaces for self‐cleaning applications | |
DE102007000611A1 (de) | Kratzfeste und dehnbare Korrosionsschutzschicht für Leichtmetallsubstrate | |
WO2014135353A1 (fr) | Production de nanorevêtements définis | |
CN105859153A (zh) | 一种防雾减反射可见光双功能镀膜玻璃及其制备方法 | |
DE102007058926B4 (de) | Solarglas und Verfahren zur Herstellung eines Solarglases sowie dessen Verwendung | |
DE102005052938A1 (de) | Verfahren zur Beschichtung von Substraten mit Beschichtungssystemen enthaltend reaktive hydrophobe anorganische Füllstoffe | |
WO2012143334A1 (fr) | Procédé pour augmenter la résistance à l'essuyage ou la résistance à la rayure de surfaces en plastique | |
DE102009002780A1 (de) | Metallsubstrate mit kratzfester und dehnbarer Korrosionsschutzschicht und Verfahren zu deren Herstellung | |
EP2807285B1 (fr) | Composant pour appareil électroménager | |
DE102007043650A1 (de) | Verfahren zur Verbesserung der Eigenschaften von Beschichtungen |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 12721780 Country of ref document: EP Kind code of ref document: A1 |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 12721780 Country of ref document: EP Kind code of ref document: A1 |