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Publication numberWO2016145574 A1
Publication typeApplication
Application numberPCT/CN2015/074213
Publication date22 Sep 2016
Filing date13 Mar 2015
Priority date13 Mar 2015
Also published asCN106458766A
Publication numberPCT/2015/74213, PCT/CN/15/074213, PCT/CN/15/74213, PCT/CN/2015/074213, PCT/CN/2015/74213, PCT/CN15/074213, PCT/CN15/74213, PCT/CN15074213, PCT/CN1574213, PCT/CN2015/074213, PCT/CN2015/74213, PCT/CN2015074213, PCT/CN201574213, WO 2016/145574 A1, WO 2016145574 A1, WO 2016145574A1, WO-A1-2016145574, WO2016/145574A1, WO2016145574 A1, WO2016145574A1
Inventors林耿, Geng Lin, 邓常猛, Changmeng DENG, 王河, He Wang, 黄义宏, Yihong HUANG
Applicant华为技术有限公司, Huawei Technologies Co., Ltd.
Export CitationBiBTeX, EndNote, RefMan
External Links: Patentscope, Espacenet
Zirconium dioxide ceramic exterior member and manufacturing method thereof
WO 2016145574 A1
Abstract
A zirconium dioxide ceramic exterior member and manufacturing method thereof. The exterior member comprises a zirconium dioxide ceramic substrate, an anti-fingerprint film, and an intermediate layer provided between the zirconium dioxide ceramic substrate and the anti-fingerprint film and bonding to the zirconium dioxide ceramic substrate and the anti-fingerprint film respectively, wherein the material of the intermediate layer is zirconium dioxide and silicon dioxide. Due to the presence of the intermediate layer, an adhesive force between the zirconium dioxide substrate and the anti-fingerprint film is increased, and thus enhancing abrasion resistance of the anti-fingerprint film of the exterior member.
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Claims(16)  translated from Chinese
  1. 一种二氧化锆陶瓷外观件,包括二氧化锆陶瓷基材与防指纹膜,其特征在于,还包括:设置在所述二氧化锆陶瓷基材与所述防指纹膜之间且分别与所述二氧化硅陶瓷基材及所述防指纹膜键合的中间层,其中所述中间层的材质为二氧化锆与二氧化硅。 One kinds of zirconia ceramic exterior parts, including zirconia ceramic base with anti-fingerprint film, characterized by further comprising: disposed between the substrate and the zirconium dioxide ceramic and anti-fingerprint film, respectively, of the said ceramic substrate and a silica film is bonded to the anti-fingerprint intermediate layer, wherein the material of the intermediate layer is silicon dioxide and zirconium dioxide.
  2. 如权利要求1所述的二氧化锆陶瓷外观件,其特征在于,所述中间层包括: Appearance zirconia ceramic member as claimed in claim 1, wherein said intermediate layer comprises:
    设置在所述二氧化锆基材表面上且材质为二氧化锆的过渡层、设置在所述过渡层上且材质为二氧化锆-二氧化硅复合物的混合层、以及设置在所述混合层与所述防指纹膜之间的且材质为二氧化硅连接层。 Provided on the surface of the substrate and the zirconia material for the zirconia buffer layer disposed on the buffer layer made of zirconium dioxide and - mixed layer of silica composites, as well as the mixing set and a connection layer made of silicon dioxide layer and the anti-fingerprint film.
  3. 如权利要求1所述的二氧化锆陶瓷外观件,其特征在于,所述中间层包括: Appearance zirconia ceramic member as claimed in claim 1, wherein said intermediate layer comprises:
    设置在所述二氧化锆基材表面上且材质为二氧化锆的过渡层、以及设置在所述过渡层与所述防指纹膜之间且材质为二氧化锆-二氧化硅复合物的混合层。 Provided on the surface of the substrate and the zirconia material for the zirconia transition layer disposed between the transition layer and the anti-fingerprint film and made of zirconia - silica composite mix Floor.
  4. 如权利要求1所述的二氧化锆陶瓷外观件,其特征在于,所述中间层包括: Appearance zirconia ceramic member as claimed in claim 1, wherein said intermediate layer comprises:
    设置在所述二氧化锆基材表面上且材质为二氧化锆的过渡层、以及设置在所述过渡层与所述防指纹膜之间且材质为二氧化硅的连接层。 Provided on the surface of the substrate and the zirconia material for the zirconia transition layer disposed between the transition layer and the anti-fingerprint film is made of silicon dioxide and the connection layer.
  5. 如权利要求1所述的二氧化锆陶瓷外观件,其特征在于,所述中间层包括: Appearance zirconia ceramic member as claimed in claim 1, wherein said intermediate layer comprises:
    设置在所述二氧化锆基材表面上且材质为二氧化锆-二氧化硅复合物的混合层、以及设置在所述混合层与所述防指纹膜之间且材质为二氧化硅的连接层。 Provided on the zirconia substrate surface and made of zirconia - silica composite mixed layer and disposed between the mixed layer and the anti-fingerprint film is made of silicon dioxide and connections Floor.
  6. 如权利要求1所述的二氧化锆陶瓷外观件,其特征在于,所述中间层包括: Appearance zirconia ceramic member as claimed in claim 1, wherein said intermediate layer comprises:
    设置在所述二氧化锆基材与所述防指纹膜之间且材质为二氧化锆-二氧化硅复合物的混合层。 Disposed between the substrate and the zirconium dioxide and anti-fingerprint film made of zirconia - silica composite mixed layer.
  7. 如权利要求2、3、5或6中任一项所述的二氧化锆陶瓷外观件,其特征在于, 2,3,5 or zirconia ceramic exterior parts to any one of claims 6 claim, wherein,
    所述二氧化锆-二氧化硅复合物中二氧化锆与二氧化硅摩尔比在1:9至9:1之间。 The zirconia - silica composite zirconium dioxide and silicon dioxide in a molar ratio of between 1: 1: 9-9.
  8. 一种二氧化锆陶瓷外观件制备方法,其特征在于,包括: One kinds of zirconia ceramic exterior parts preparation method comprising:
    设置二氧化锆陶瓷基材; Set zirconia ceramic substrate;
    在所述二氧化锆陶瓷基材上沉积材质为二氧化锆与二氧化硅中间层,以使所述二氧化硅陶瓷基材与所述中间层键合; On the substrate is deposited zirconia ceramic material for the intermediate layer of silicon dioxide and zirconium dioxide, so that the silica ceramic substrate and the intermediate layer is bonded;
    在所述中间层上沉积防指纹膜,以使所述防指纹膜与所述中间层键合。 The intermediate layer is deposited on the anti-fingerprint film, so that the anti-fingerprint film and the intermediate layer is bonded.
  9. 如权利要求8所述的方法,其特征在于,设置二氧化锆陶瓷基材包括: The method according to claim 8, characterized in that a zirconium dioxide ceramic substrate comprising:
    将所述二氧化锆陶瓷基材放置于腔体内; The zirconia ceramic substrate is placed in the cavity;
    在对所述腔体进行抽真空后,清洗所述二氧化锆陶瓷基材。 In said cavity after vacuuming, washing the zirconium dioxide ceramic substrate.
  10. 如权利要求9所述的方法,其特征在于,所述清洗所述二氧化锆陶瓷基材包括: The method as claimed in claim 9, characterized in that said washing of said zirconia ceramic substrate comprising:
    使用等离子体清洗方式或辉光放电清洗方式清洗所述二氧化锆陶瓷基材。 Cleaning method using plasma or glow discharge cleaning method to clean the zirconia ceramic substrate.
  11. 如权利要求8至10任一项所述的方法,其特征在于,所述在所述二氧化锆陶瓷基材上沉积中间层包括: The method according to any one of 8-10 claims, characterized in that said zirconia is deposited on the ceramic base material of the intermediate layer comprises:
    在所述二氧化锆陶瓷基材上沉积材质为二氧化锆的过渡层; Made of zirconium dioxide is deposited on the buffer layer of zirconium dioxide ceramic substrate;
    在所述过渡层上沉积材质为二氧化锆-二氧化硅复合物的混合层; In the buffer layer material is deposited on zirconia - silica mixed layer composite;
    在所述混合层上沉积材质为二氧化硅的连接层,从而形成由所述过渡层、所述混合层及所述连接层构成的中间层。 On the mixed layer of silicon dioxide is deposited as tie layer material, whereby said transition layer is formed of a mixed layer and an intermediate layer connecting the layers.
  12. 如权利要求8至10任一项所述的方法,其特征在于,所述在所述二氧化锆陶瓷基材上沉积中间层包括: The method according to any one of 8-10 claims, characterized in that said zirconia is deposited on the ceramic base material of the intermediate layer comprises:
    在所述二氧化锆陶瓷基材上沉积材质为二氧化锆的过渡层; Made of zirconium dioxide is deposited on the buffer layer of zirconium dioxide ceramic substrate;
    在所述过渡层上沉积材质为二氧化锆-二氧化硅复合物的混合层,从而形成由所述过渡层及所述混合层构成的中间层。 Material is deposited on the buffer layer of the zirconia - silica composite mixed layer, thereby forming the buffer layer and the intermediate layer is made of the mixed layer.
  13. 如权利要求8至10任一项所述的方法,其特征在于,所述在所述二氧化锆陶瓷基材上沉积中间层包括: The method according to any one of 8-10 claims, characterized in that said zirconia is deposited on the ceramic base material of the intermediate layer comprises:
    在所述二氧化锆陶瓷基材上沉积材质为二氧化锆的过渡层; Made of zirconium dioxide is deposited on the buffer layer of zirconium dioxide ceramic substrate;
    在所述过渡层上沉积材质为二氧化硅的连接层,从而形成由所述过渡层及所述连接层构成的中间层。 In the buffer layer material is deposited on the silicon dioxide layer is connected so as to form the transition layer and the intermediate layer connecting the layers.
  14. 如权利要求8至10任一项所述的方法,其特征在于,所述在所述二氧化锆陶瓷基材上沉积中间层包括: The method according to any one of 8-10 claims, characterized in that said zirconia is deposited on the ceramic base material of the intermediate layer comprises:
    在所述二氧化锆陶瓷基材上沉积材质为二氧化锆-二氧化硅复合物的混合层; On the zirconia ceramic base material is deposited zirconia - silica mixed layer composite;
    在所述混合层上沉积材质为二氧化硅的连接层,从而形成由所述混合层及所述连接层构成的中间层。 On the mixed layer made of silicon dioxide is deposited tie layer, thereby forming the mixed layer and the intermediate layer of the connection layer.
  15. 如权利要求8至10任一项所述的方法,其特征在于,所述在所述二氧化锆陶瓷基材上沉积中间层包括: The method according to any one of 8-10 claims, characterized in that said zirconia is deposited on the ceramic base material of the intermediate layer comprises:
    在所述二氧化锆陶瓷基材上沉积材质为二氧化锆-二氧化硅复合物的中间层。 On the zirconia ceramic base material is deposited zirconia - silica composite intermediate layer.
  16. 如权利要求11、12、14、或15任一项所述的方法,其特征在于, , 15 or method according to any one of claims 11, 12, characterized in that,
    所述二氧化锆-二氧化硅复合物中二氧化锆与二氧化硅摩尔比在1:9至9:1之间。 The zirconia - silica composite zirconium dioxide and silicon dioxide in a molar ratio of between 1: 1: 9-9.
Description  translated from Chinese
二氧化锆陶瓷外观件及其制造方法 Zirconia ceramic appearance and manufacturing method thereof 技术领域 TECHNICAL FIELD

本发明涉及领域材料领域,尤其涉及二氧化锆陶瓷外观件及其制造方法。 The present invention relates to the field of art materials, and in particular the appearance of zirconia ceramic and manufacturing method thereof.

背景技术 Background technique

随着移动终端的日益普及,用户对移动终端的外观要求也越来越高。 With the growing popularity of mobile terminals, users of mobile terminals have become more sophisticated appearance. 二氧化锆陶瓷的综合性能优越,常被用于制造移动终端的触摸屏、外壳、后盖、按键等外观件。 Excellent overall performance zirconia ceramics commonly used in the manufacture of touch screen mobile terminal, shell, cover, buttons and other exterior parts. 使用二氧化锆制成的陶瓷外观件与使用氧化铝等传统材料制成的陶瓷外观件相比,不但具有优良的机械性能,而且还具有外观圆润、色泽亮丽的特性。 Ceramic exterior parts made of zirconium dioxide ceramic exterior parts with the use of traditional materials such as alumina, compared not only has excellent mechanical properties, but also has a rounded appearance, bright color characteristics.

但是,使用二氧化锆制成的陶瓷外观件也具有容易沾染油污、指纹等印迹等缺点,为防止二氧化锆陶瓷外观件沾染油污、指纹等印迹,在实际中通常还需要在陶瓷外观件表面上设置防指纹(Anti-fingerprint)膜,形成带有防指纹膜的二氧化锆陶瓷外观件。 However, the use made of zirconia ceramic exterior parts also easily contaminated with oil, fingerprints and other blots and other shortcomings, in order to prevent the appearance of zirconia ceramic pieces contaminated with oil, fingerprints and other blots, in practice often requires the ceramic surface appearance on which anti-fingerprint (anti-fingerprint) film formed zirconia ceramic exterior parts with anti-fingerprint film. 然而,由于现有的防指纹膜的主要成分是末端全氟链的硅烷基材料,而硅烷基材料很难与二氧化锆产生化学键合,因此,使得二氧化锆陶瓷外观件上的防指纹膜附着力和耐磨性都比较差。 However, since the main component of the existing anti-fingerprint film is the end of the chain perfluorinated silane-based material, and silane-based material is difficult to produce chemically bonded with zirconium dioxide, thereby making anti-fingerprint film zirconia ceramic pieces on the exterior adhesion and abrasion resistance than the poor.

发明内容 SUMMARY

本发明实施例提供了二氧化锆陶瓷外观件及其制造方法,以解决设置在二氧化锆陶瓷外观件上的防指纹膜附着力和耐磨性都比较差的问题。 Embodiments provide a zirconia ceramic exterior device and manufacturing method of the present invention to address provided on the zirconia ceramic exterior parts of an anti-fingerprint film adhesion and abrasion resistance than the poor problem.

第一方面,本发明实施例提供了一种二氧化锆陶瓷外观件,该外观件除包括二氧化锆陶瓷基材与防指纹膜之外还包括:设置在所述二氧化锆陶瓷基材与所述防指纹膜之间且分别与所述二氧化硅陶瓷基材及所述防指纹膜键合的中间层,其中所述中间层的材质为二氧化锆与二氧化硅。 A first aspect, embodiments of the present invention there is provided a zirconia ceramic exterior parts, exterior parts in addition to the ceramic substrate comprises zirconium dioxide and anti-fingerprint film than further comprising: providing the zirconium dioxide ceramic substrate and the anti-fingerprint film between the silica and the ceramic substrate, respectively, and the anti-fingerprint film bonded intermediate layer, wherein the material of the intermediate layer is silicon dioxide and zirconium dioxide.

结合第一方面,在第一方面第一种可能的实现方式中,所述中间层包括:设置在所述二氧化锆基材表面上且材质为二氧化锆的过渡层、设置在所述过渡层上且材质为二氧化锆-二氧化硅复合物的混合层、以及设置在所述混合层与所述防指纹膜之间的且材质为二氧化硅连接层。 With the first aspect, in the first aspect of a first possible implementation, the intermediate layer comprises: disposed on the surface of the substrate and the zirconia material for the zirconia buffer layer is provided in the transition and a layer made of zirconia - silica composite mixture layer, the mixture layer and provided with the fingerprint, and the film is made of silicon dioxide between the connection layer.

结合第一方面,在第一方面第二种可能的实现方式中,所述中间层包括:置在 所述二氧化锆基材表面上且材质为二氧化锆的过渡层、以及设置在所述过渡层与所述防指纹膜之间且材质为二氧化锆-二氧化硅复合物的混合层。 With the first aspect, in the first aspect a second possible implementation, the intermediate layer comprising: means on the substrate surface and the zirconia material for the zirconia buffer layer, and provided in the between the transition layer and anti-fingerprint film and made of zirconia - silica composite mixed layer.

结合第一方面,在第一方面第三种可能的实现方式中,所述中间层包括:设置在所述二氧化锆基材表面上且材质为二氧化锆的过渡层、以及设置在所述过渡层与所述防指纹膜之间且材质为二氧化锆-二氧化硅复合物的混合层。 With the first aspect, in the first aspect of the third possible implementation, the intermediate layer comprises: disposed on the surface of the substrate and the zirconia material for the zirconia buffer layer, and provided in the between the transition layer and anti-fingerprint film and made of zirconia - silica composite mixed layer.

结合第一方面,在第一方面第四种可能的实现方式中,所述中间层包括:设置在所述二氧化锆基材表面上且材质为二氧化锆的过渡层、以及设置在所述过渡层与所述防指纹膜之间且材质为二氧化硅的连接层。 With the first aspect, in the first aspect of the fourth possible implementation, the intermediate layer comprises: disposed on the surface of the substrate and the zirconia material for the zirconia buffer layer, and provided in the and a connecting layer made of silicon dioxide between the transition layer and the anti-fingerprint film.

结合第一方面,在第一方面第五种可能的实现方式中,所述中间层包括:设置在所述二氧化锆基材与所述防指纹膜之间且材质为二氧化锆-二氧化硅复合物的混合层。 Combining a first aspect, the fifth aspect of the first possible implementation, the intermediate layer comprising: a zirconium dioxide disposed between said substrate and said anti-fingerprint film and made of zirconia - silica mixing the silicon composite layer.

结合第一方面第一、二、四或五种可能的实现方式中任一种,在第一方面第六种可能的实现方式中,所述二氧化锆-二氧化硅复合物中二氧化锆与二氧化硅摩尔比在1:9至9:1之间。 With the first aspect of the first, two, four or five possible ways to achieve any one of the first aspect of the possible implementation of the sixth, the zirconia - silica composite zirconia and 1 molar ratio of silica: 9-9: 1 between.

第二方面,本发明实施还提供了一种二氧化锆陶瓷外观件制备方法,包括:设置二氧化锆陶瓷基材;在所述二氧化锆陶瓷基材上沉积材质为二氧化锆与二氧化硅中间层,以使所述二氧化硅陶瓷基材与所述中间层键合;在所述中间层上沉积防指纹膜,以使所述防指纹膜与所述中间层键合。 The second aspect, embodiments of the present invention also provides a zirconia ceramic exterior parts production method, comprising: providing a zirconia ceramic substrate; depositing material on the substrate is zirconia ceramic zirconia dioxide silicon intermediate layer such that the silica ceramic substrate and the intermediate layer is bonded; the intermediate layer is deposited on the anti-fingerprint film, so that the anti-fingerprint film and the intermediate layer is bonded.

结合第二方面,在第二方面第一种可能的实现方式中,设置二氧化锆陶瓷基材包括:将所述二氧化锆陶瓷基材放置于腔体内;在对所述腔体进行抽真空后,清洗所述二氧化锆陶瓷基材。 With the second aspect, in the second aspect of the first possible implementation, the set zirconia ceramic base comprising: said zirconia ceramic substrate is placed in the cavity; in said evacuated chamber after washing the zirconium dioxide ceramic substrate.

结合第二方面第一种可能的实现方式,在第二方面第二种可能的实现方式中,所述清洗所述二氧化锆陶瓷基材包括:使用等离子体清洗方式或辉光放电清洗方式清洗所述二氧化锆陶瓷基材。 With the second aspect of the first possible implementation, in the second aspect of a second possible implementation, the cleaning of said zirconia ceramic substrate comprising: a cleaning method using a plasma or glow discharge cleaning methods Cleaning the zirconia ceramic substrate.

结合第二方面或第二方面第一至二种可能的实现方式其中任一种,在第二方面第三种可能的实现方式中,所述在所述二氧化锆陶瓷基材上沉积中间层包括:在所述二氧化锆陶瓷基材上沉积材质为二氧化锆的过渡层;在所述过渡层上沉积材质为二氧化锆-二氧化硅复合物的混合层;在所述混合层上沉积材质为二氧化硅的连接层,从而形成由所述过渡层、所述混合层及所述连接层构成的中间层。 With the second aspect of the first or second aspect of the twenty possible implementation of any kind, in a second aspect of the third possible implementation, the intermediate layer is deposited on the zirconia ceramic base comprising: depositing material on the substrate is a zirconia ceramic zirconia transition; on the buffer layer material is deposited zirconia - silica mixed layer composite; in the mixed layer depositing a connecting layer made of silicon dioxide, whereby said transition layer is formed of a mixed layer and an intermediate layer connecting the layers.

结合第二方面或第二方面第一至二种可能的实现方式其中任一种,在第二方面第四种可能的实现方式中,所述在所述二氧化锆陶瓷基材上沉积中间层包括:在所述二氧化锆陶瓷基材上沉积材质为二氧化锆的过渡层;在所述过渡层上沉积材质为二氧化锆-二氧化硅复合物的混合层,从而形成由所述过渡层及所述混合层构成的中间层。 With the second aspect of the first or second aspect of the twenty possible implementation of any kind, in a second possible implementation of the fourth aspect, the intermediate layer is deposited on the zirconia ceramic base comprising: depositing material on said ceramic substrate is a zirconia buffer layer of zirconium dioxide; deposited on the buffer layer made of zirconium dioxide - silicon dioxide mixed layer composite thereby formed by the transition layer and the mixed layer constituting the intermediate layer.

结合第二方面或第二方面第一至二种可能的实现方式其中任一种,在第二方面第五种可能的实现方式中,所述在所述二氧化锆陶瓷基材上沉积中间层包括:在所述二氧化锆陶瓷基材上沉积材质为二氧化锆的过渡层;在所述过渡层上沉积材质为二氧化硅的连接层,从而形成由所述过渡层及所述连接层构成的中间层。 With the second aspect of the first or second aspect of the twenty possible implementation of any kind, in a fifth aspect of the second possible implementation, the intermediate layer is deposited on the zirconia ceramic base comprising: depositing material on the substrate is a zirconia ceramic zirconium dioxide buffer layer; depositing material on the buffer layer of silicon dioxide layer connections, which are connected by forming the transition layer and the layer an intermediate layer composed.

结合第二方面或第二方面第一至二种可能的实现方式其中任一种,在第二方面第六种可能的实现方式中,所述在所述二氧化锆陶瓷基材上沉积中间层包括:在所述二氧化锆陶瓷基材上沉积材质为二氧化锆-二氧化硅复合物的混合层;在所述混合层上沉积材质为二氧化硅的连接层,从而形成由所述混合层及所述连接层构成的中间层。 With the second aspect of the first or second or two possible ways to achieve either of these, in a sixth aspect of the second possible implementation, the intermediate layer is deposited on the zirconia ceramic base comprising: depositing material on the substrate is zirconia ceramic zirconia - silica mixed layer composite; mixing layer is deposited on the silicon dioxide material of the connection layer, thereby forming a mixture of the layer and the connection layer constituting the intermediate layer.

结合第二方面或第二方面第一至二种可能的实现方式其中任一种,在第二方面第七种可能的实现方式中,所述在所述二氧化锆陶瓷基材上沉积中间层包括:在所述二氧化锆陶瓷基材上沉积材质为二氧化锆-二氧化硅复合物的中间层。 With the second aspect of the first or second aspect of the twenty possible implementation of any kind, in a second aspect of the seventh possible implementation, the intermediate layer is deposited on the zirconia ceramic base comprising: depositing material on the substrate is zirconia ceramic zirconia - silica composite intermediate layer.

结合第二方面第三、四、六或七种可能的实现方式其中任意一种,在第二方面第八种可能的实现方式中,所述二氧化锆-二氧化硅复合物中二氧化锆与二氧化硅摩尔比在1:9至9:1之间。 Combined third, four, six or seven possible ways in which to achieve any one of the second aspect of the possible implementation of the eighth, the second aspect of zirconia - silica composite zirconia and 1 molar ratio of silica: 9-9: 1 between.

在本发明实施例中,二氧化锆陶瓷外观件包括:设置在所述二氧化锆陶瓷基材与所述防指纹膜之间且分别与所述二氧化硅陶瓷基材及所述防指纹膜键合的中间层,其中所述中间层的材质为二氧化锆与二氧化硅。 In the embodiment of the invention, the zirconia ceramic exterior parts comprising: disposed between the substrate and the zirconium dioxide ceramic and anti-fingerprint film with said silica ceramic substrate and the anti-fingerprint film bonding the intermediate layer, wherein the material of the intermediate layer is silicon dioxide and zirconium dioxide. 采用本发明实施例,在二氧化锆基材表面上设置材料为二氧化锆与二氧化硅的从中间层,由于中间层与二氧化锆陶瓷基材之间及防指纹膜之间均能形成稳定的化学键合,可以使防指纹膜通过中间层附着在二氧化锆陶瓷基材上,从而可以增大二氧化锆陶瓷基材与防指纹膜之间的附着力,并提升防指纹膜的耐磨性。 Due to the use of an intermediate layer between the substrate and the zirconium dioxide ceramic and anti-fingerprint film can form an embodiment of the present invention provided material zirconium dioxide and silicon dioxide from the intermediate layer on the substrate surface of zirconium dioxide, stable chemical bonding can make anti-fingerprint film is deposited on the zirconia ceramic substrate via an intermediate layer, which can increase the adhesion of zirconia ceramic substrate and fingerprint-proof membrane between the resistance and enhance anti-fingerprint film grindability.

附图说明 BRIEF DESCRIPTION

为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,对于本领域普通技术 人员而言,在不付出创造性劳动性的前提下,还可以根据这些附图获得其他的附图。 In order to more clearly illustrate the embodiments or the prior art technical solutions embodiment of the present invention, it will implement the following figures for the cases described in the prior art or the need to use a simple introduction, it is clear, for those of ordinary skill and words, without creative efforts of the premise, you can also obtain other drawings based on these drawings.

图1为本发明二氧化锆陶瓷外观件一个实施例的结构示意图; Figure 1 of the present invention zirconia ceramic exterior parts of a structure schematic of an embodiment;

图2为本发明二氧化锆陶瓷外观件另一个实施例的结构示意图; Figure 2 is a schematic zirconia ceramic exterior parts structural diagram of another embodiment;

图3为本发明二氧化锆陶瓷外观件另一个实施例的结构示意图; 3 is an appearance of zirconia ceramic pieces of structural diagram of another embodiment;

图4为本发明二氧化锆陶瓷外观件另一个实施例的结构示意图; Figure 4 of the present invention zirconia ceramic exterior parts structural diagram of another embodiment;

图5为本发明二氧化锆陶瓷外观件另一个实施例的结构示意图; Figure 5 of the present invention zirconia ceramic pieces of exterior structural diagram of another embodiment;

图6为本发明二氧化锆陶瓷外观件另一个实施例的结构示意图; Figure 6 of the present invention zirconia ceramic pieces of exterior structural diagram of another embodiment;

图7为本发明二氧化锆陶瓷外观件制备方法一个实施例的流程图。 7 of the present invention zirconia ceramic exterior parts preparation process flow diagram of one embodiment.

具体实施方式 detailed description

为了使本领域技术人员更好地理解本发明方案,下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所述描述的实施例仅是本发明一部分实施例,而不是全部的实施例。 In order that those skilled in the art a better understanding of the present invention, the present invention will now be combined with the implementation of the accompanying drawings, were clear examples of technical solutions of the present invention, a complete description of, obviously, the described embodiments are merely It is part of the embodiments of the present invention, but not all embodiments. 基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。 Based on the embodiments of the present invention, all other embodiments of the ordinary skill in the creative work did not make the premise obtained, are within the scope of the present invention is protected.

参见图1,为本发明实施例二氧化锆陶瓷外观件的结构示意图。 Referring to Figure 1, a schematic diagram of the structure of the present invention, the zirconia ceramic exterior member implementation.

如图1所示,二氧化锆陶瓷外观件包括:二氧化锆陶瓷基材101、设置在二氧化锆陶瓷基材101上的中间层102、设置在所述中间层102上的防指纹膜103,所述中间层102分别与所述二氧化锆陶瓷基材101及所述防指纹膜103键合。 1, the zirconia ceramic exterior parts include: anti-fingerprint film zirconia ceramic substrate 101, provided on the zirconia ceramic base 101 of intermediate layer 102 is disposed on the intermediate layer 102 of 103 the intermediate layer 102, respectively, of the zirconium dioxide ceramic substrate 101 and the film 103 is bonded fingerprint.

其中,所述二氧化锆陶瓷基材101的形状可以根据需要进行设置;所述防指纹膜103由末端全氟链的硅烷基材质构成,厚度可以为5至30nm;所述中间层102可以为由于二氧化硅及二氧化锆材质构成的单层或多层结构。 Wherein the shape of the zirconium dioxide ceramic substrate 101 can be set as desired; the film 103 by the end of the anti-fingerprint perfluoro chain silyl material composition, thickness of 5 to 30nm; the intermediate layer 102 may be Since the silicon dioxide and a single layer or multi-layer structure consisting of zirconia material. 根据实际需求的不同,当所述中间层102为多层结构时,所述中间层102的层次结构及构成中间层的各个层次的材质也可以各不相同。 Depending on the actual needs, the intermediate layer 102 when the multilayer structure, the hierarchical structure 102 and the various levels of material constituting the intermediate layer, the intermediate layer may also be varied.

在一种可选的实现方式中,如图2所示,所述中间层102可以包括设置在所述二氧化锆陶瓷基材101表面上的过渡层1021、设置在所述过渡层1021上的混合层1022、以及设置在所述混合层1022上的连接层1023;防指纹膜103设置在所述连接层1023上。 In an alternative implementation, shown in Figure 2, the intermediate layer may comprise 102 disposed on a surface of said zirconia ceramic substrate 101 a buffer layer 1021, disposed on the buffer layer 1021 mixed layer 1022, and a mixed layer disposed on the connecting layer 1022 1023; anti-fingerprint film 103 is provided on the connection layer 1023.

在另一种可选的实现方式中,如图3所示,所述中间层102可以包括设置在所述二氧化锆陶瓷基材101表面上的过渡层1021、以及设置在所述过渡层1021上的混合层1022;防指纹膜103设置在所述混合层1022上。 In another alternative implementation, shown in Figure 3, the intermediate layer may comprise 102 disposed on the surface of the zirconia ceramic substrate 101 a buffer layer 1021, and the buffer layer 1021 provided mixed layer 1022; anti-fingerprint film 103 is provided on the mixed layer 1022.

在另一种可选的实现方式中,如图4所示,所述中间层102可以包括设置在所述二氧化锆陶瓷基材101表面上的过渡层1021、以及设置在所述过渡层1021上的连接层1023;防指纹膜103设置在所述连接层1023上。 In another alternative implementation, shown in Figure 4, the intermediate layer may comprise 102 disposed on the surface of the zirconia ceramic substrate 101 a buffer layer 1021, and the buffer layer 1021 provided the connection layer 1023; anti-fingerprint film 103 is provided on the connection layer 1023.

在另一种可选的实现方式中,如图5所示,所述中间层102可以包括设置在所述二氧化锆陶瓷基材101表面上的混合层1022、以及设置在所述混合层1022上的连接层1023;防指纹膜103设置在所述连接层1023上。 In another alternative implementation, shown in Figure 5, the intermediate layer 102 may include a mixed layer 1022 disposed, and disposed on the surface of the zirconia ceramic base material 101 in the mixed layer 1022 the connection layer 1023; anti-fingerprint film 103 is provided on the connection layer 1023.

在另一种可选的实现方式中,如图6所示,所述中间层102可以仅包括设置在所述二氧化锆陶瓷基材101表面上的混合层1022;防指纹膜103直接设置在所述混合层1022上。 In another alternative implementation, shown in Figure 6, the intermediate layer 102 may only comprise a mixed layer 1022 disposed on a substrate 101 of the zirconia ceramic surface; anti-fingerprint film 103 is disposed directly the upper mixed layer 1022.

其中,在前述各种实现方式中,过渡层1021的材质可以为二氧化锆,混合层1022的材质可以为二氧化锆-二氧化硅复合物,连接层1023的材质可以为二氧化硅,过渡层1021、混合层1022及连接层1023的厚度均可以在5至30nm之间。 Wherein, in the above-described various implementations, the buffer layer 1021 may be a zirconia material, the material may be mixed layer 1022 zirconia - silica composite tie layer 1023 may be a silicon dioxide material, transition layer 1021, the thickness of the mixed layer 1022 and the layer 1023 can be connected in between 5 to 30nm. 为满足对外观件硬度及防指纹膜103附着力的不同需求,二氧化锆-二氧化硅复合物中二氧化锆与二氧化硅摩尔比在1:9至9:1之间。 To meet the different needs of exterior parts hardness and anti-fingerprint film 103 adhesion, zirconia - silica composite zirconium dioxide and silicon dioxide in a molar ratio of between 1: 1: 9-9.

在本实施例中,在二氧化锆基材表面上设置材质为二氧化锆与二氧化硅的中间层,由于中间层与二氧化锆陶瓷基材之间及防指纹膜之间均能形成稳定的化学键合,因此可以增大二氧化锆陶瓷基材与防指纹膜之间的附着力,并提升防指纹膜的耐磨性。 In the present embodiment, the material is provided with an intermediate layer of zirconium dioxide on silica zirconia substrate surface, since the intermediate layer between the substrate and the ceramic zirconium dioxide and anti-fingerprint film can form stable chemical bonding, it is possible to increase the adhesion of the zirconia ceramic base with anti-fingerprint film between the wear resistance and enhance anti-fingerprint film.

与本发明二氧化锆陶瓷外观件的实施例相对应,本发明还提供了二氧化锆陶瓷外观件制备方法的实施例。 Example with zirconia ceramic exterior parts of the present invention corresponds to the present invention also provides an embodiment of zirconia ceramic exterior parts preparation methods.

参见图7,为本发明二氧化锆陶瓷外观件制备方法一个实施例的流程图。 Referring to Figure 7, the present invention zirconia ceramic exterior parts preparation process flow diagram of one embodiment. 如图7所示,本发明二氧化锆陶瓷外观件制备方法可以包括如下步骤: 7, zirconia ceramic exterior parts production method of the present invention may comprise the steps of:

步骤701,设置二氧化锆陶瓷基材。 Step 701, set zirconia ceramic substrate.

在二氧化锆陶瓷基材成型后,先将其放置于外观件制造设备的腔体内,并对其进行清洗。 After zirconia ceramic base molding, first place it in the cavity of the appearance of pieces of manufacturing equipment, and its cleaning. 根据工艺要求的不同,制造设备可先通过真空系统对腔体进行抽真空,然后通过气氛系统和辅助系统对氧化锆陶瓷基材表面进行清洗。 Depending on the process requirements, the device can be manufactured by a vacuum system the chamber is evacuated, then the zirconia ceramic substrate surface cleaning by atmosphere and auxiliary systems. 对二氧化锆陶瓷基材的 表面进行清洗的方式有很多,例如,可以包括等离子体清洗或辉光放电清洗等方式。 The surface of the zirconia ceramic substrate cleaning There are many ways, for example, may include a glow discharge plasma cleaning or cleaning mode.

步骤702,在所述二氧化锆陶瓷基材上沉积中间层,所述中间层的材质为二氧化锆与二氧化硅。 Step 702, the intermediate layer is deposited on the zirconia ceramic base material, the material of the intermediate layer is silicon dioxide and zirconium dioxide.

在清洗完毕后,制造设备可在二氧化锆陶瓷基材上沉积中间层。 After the cleaning is completed, manufacturing equipment can be deposited on the intermediate layer of zirconium dioxide ceramic substrate. 根据实际需求不同,制造设备可以仅在二氧化锆陶瓷基材表面的部分区域沉积中间层,也可以在二氧化锆陶瓷基材表面的全部区域沉积中间层。 Depending on the actual needs, the device can be manufactured only in a partial region of the intermediate layer is deposited zirconia ceramic surface of the substrate to be the entire area of the intermediate layer is deposited zirconia ceramic base surface.

根据中间层的结构不同,制造设备可以采用比不同的沉积方式沉积中间层。 Depending on the structure of the intermediate layer, the manufacturing apparatus can be deposited using different deposition layer is thicker than the intermediate mode.

在所述中间层包括过渡层、混合层及连接层时,制造设备可以首先在所述二氧化锆陶瓷基材上沉积过渡层;然后在所述过渡层上沉积混合层;最后在所述混合层上沉积连接层,从而形成由所述过渡层、所述混合层及所述连接层构成的中间层。 In the intermediate layer comprises a transition layer, a mixed layer and connection layer, the manufacturing apparatus can be first deposited on the buffer layer of the zirconia ceramic substrate; hybrid layer is then deposited on the buffer layer; in the final mixing connection layer is deposited on the layer to the buffer layer is formed of a mixed layer and an intermediate layer connecting the layers.

在所述中间层包括过渡层及混合层时,制造设备可以首先在所述二氧化锆陶瓷基材上沉积过渡层;然后在所述过渡层上沉积混合层,从而形成由所述过渡层及所述混合层构成的中间层。 And when the transition layer comprises a mixed layer, can be deposited first in the manufacturing apparatus of the intermediate layer on the buffer layer of the zirconia ceramic substrate; hybrid layer is then deposited on the buffer layer, whereby said transition layer and is formed from the mixed layer constituting the intermediate layer.

在所述中间层包括过渡层及连接层时,制造设备可以首先在所述二氧化锆陶瓷基材上沉积过渡层;然后在所述过渡层上沉积连接层,从而形成由所述过渡层及所述连接层构成的中间层。 And when the transition layer comprises a connection layer, can be deposited first in the manufacturing apparatus of the intermediate layer on the transition layer zirconia ceramic substrate; and then the connection layer is deposited on the buffer layer, whereby said transition layer and is formed from the connection layer of the intermediate layer.

在所述中间层包括混合层及连接层时,制造设备可以首先在所述二氧化锆陶瓷基材上沉积混合层;然后在所述混合层上沉积连接层,从而形成由所述混合层及所述连接层构成的中间层。 In the mixed layer and the intermediate layer comprises a connection layer, the manufacturing apparatus can be first mixed layer is deposited on the zirconia ceramic substrate; tie layer is then deposited on the mixed layer, thereby forming the mixed layer and the the connection layer of the intermediate layer.

在所述中间层仅包括混合层时,制造设备可以仅在所述二氧化锆陶瓷基材上沉积混合层,从而形成中间层。 When the intermediate layer includes only the mixed layer, may be deposited hybrid layer manufacturing apparatus only on the zirconia ceramic base material, thereby forming an intermediate layer.

其中,过渡层的材质可以为二氧化锆,混合层的材质可以为二氧化锆-二氧化硅复合物,连接层的材质可以为二氧化硅,过渡层、混合层及连接层的厚度均可以在5至30nm之间。 Wherein the transition layer may be a zirconia material, the material layer may be mixed zirconia - silica composite, tie layer material may be silica, transition layer, and the layer thickness of the connection layer can be mixed between 5 and 30nm.

在沉积所述中间层时,可以采用物理气相沉积(Physical Vapor Deposition)或者化学气相沉积(Chemical Vapor Deposition)等沉积方式。 During deposition of the intermediate layer, physical vapor deposition (Physical Vapor Deposition) or CVD (Chemical Vapor Deposition) deposition method and so on. 通过控制靶材、沉积系统和气氛系统,从而可以沉积不同结构及不同材质的中间层。 By controlling the target, deposition systems and atmosphere system, which can be deposited with different structures and intermediate layers of different materials. 例如,在沉积所述混合层时,可以以锆硅合金或硅酸锆作为靶材,通过磁控溅射、多弧离子镀或其他方式沉积混合层。 For example, at the time of deposition of the mixed layer, a silicon alloy of zirconium or zirconium silicate as a target by magnetron sputtering, multi-arc ion plating or otherwise depositing a mixed layer. 在沉积所述过渡层时,则可以选择二氧化锆作为靶材;在沉积所述连接层时,则 可以选择二氧化硅作为靶材。 In the deposition of the buffer layer, the zirconia you can select as a target; depositing the connection layer, you can choose silica as a target. 其中,根据对二氧化锆陶瓷外观件硬度及防指纹膜附着力的不同要求,形成所述混合层的二氧化锆-二氧化硅复合物中二氧化锆与二氧化硅摩尔比可以在1:9至9:1之间。 Which, according to the different requirements of zirconia ceramic exterior parts hardness and anti-fingerprint film adhesion, the formation of the mixed layer of zirconium dioxide - silica compound in a molar ratio of zirconium dioxide and silicon dioxide can be 1: between 1: 9-9.

步骤703,在所述中间层上沉积防指纹膜。 Step 703, the intermediate layer is deposited on the anti-fingerprint film.

在所述中间层沉积完成后,制造设备可以在所述中间层上进一步沉积防指纹膜。 After completion of deposition of the intermediate layer, the manufacturing apparatus may further fingerprint deposited film on the intermediate layer. 具体来说,在所述中间层包括连接层和其他层次时,所述防指纹膜可以沉积在所述连接层上;在所述中间层仅包括过渡层及混合层或仅包括混合层时,所述防指纹膜可以沉积在所混合层上。 Specifically, the intermediate layer comprises a connection layer and other layers, the anti-fingerprint film may be deposited on the connection layer; the intermediate layer comprises a buffer layer and only when the mixed layer or the mixed layer includes only, the anti-fingerprint film can be deposited on the mixed layer. 其中,所述防指纹膜的材质可以是末端全氟链的硅烷基材质。 Wherein said anti-fingerprint film material can be the end of the chain perfluorinated silane-based material.

采用本实施例,在二氧化锆基材表面上设置材质为二氧化锆与二氧化硅的中间层,由于中间层与二氧化锆陶瓷基材之间及防指纹膜之间均能形成稳定的化学键合,因此可以增大二氧化锆陶瓷基材与防指纹膜之间的附着力,并提升防指纹膜的耐磨性。 With this embodiment, the material is provided with an intermediate layer of zirconia zirconia silica on the substrate surface, since the intermediate layer between the substrate and the ceramic zirconium dioxide and anti-fingerprint film can form a stable chemically bonded, it can increase the adhesion of the zirconia ceramic base with anti-fingerprint film between the wear resistance and enhance anti-fingerprint film.

本说明书中的各个实施例均采用递进的方式描述,各个实施例之间相同相似的部分互相参见即可,每个实施例重点说明的都是与其他实施例的不同之处。 This specification are used in the various embodiments described by way of progressive, like parts identical between the various embodiments can see each other, and are different from the other embodiment example highlights of each embodiment. 尤其,对于方法实施例而言,由于其与结构实施例相对应,所以描述的比较简单,相关之处参见结构实施例的部分说明即可。 In particular, for an embodiment, since it corresponds with the structure of this embodiment, the description is relatively simple, relevant, see section describes the structure of the embodiment can be.

以上所述的本发明实施方式,并不构成对本发明保护范围的限定。 Embodiments of the invention described above is not intended to limit the scope of the present invention. 任何在本发明的精神和原则之内所作的修改、等同替换和改进等,均应包含在本发明的保护范围之内。 Any modifications within the spirit and principles of the present invention made, equivalent replacement and improvement, etc., should be included within the scope of the present invention.

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Classifications
International ClassificationC04B35/48, B32B7/04, B32B7/10, B32B18/00
Cooperative ClassificationB32B7/10, B32B7/04, C04B35/48, B32B18/00
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