WO2016145574A1 - 二氧化锆陶瓷外观件及其制造方法 - Google Patents

二氧化锆陶瓷外观件及其制造方法 Download PDF

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WO2016145574A1
WO2016145574A1 PCT/CN2015/074213 CN2015074213W WO2016145574A1 WO 2016145574 A1 WO2016145574 A1 WO 2016145574A1 CN 2015074213 W CN2015074213 W CN 2015074213W WO 2016145574 A1 WO2016145574 A1 WO 2016145574A1
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layer
zirconia ceramic
zirconium dioxide
ceramic substrate
intermediate layer
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PCT/CN2015/074213
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English (en)
French (fr)
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林耿
邓常猛
王河
黄义宏
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华为技术有限公司
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Priority to KR1020177026315A priority Critical patent/KR102025712B1/ko
Priority to PCT/CN2015/074213 priority patent/WO2016145574A1/zh
Priority to JP2017548092A priority patent/JP6514787B2/ja
Priority to CN201580026224.2A priority patent/CN106458766B/zh
Publication of WO2016145574A1 publication Critical patent/WO2016145574A1/zh

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B18/00Layered products essentially comprising ceramics, e.g. refractory products
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/14Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
    • B32B37/24Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00Ancillary operations in connection with laminating processes
    • B32B38/16Drying; Softening; Cleaning
    • B32B38/162Cleaning
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/05Interconnection of layers the layers not being connected over the whole surface, e.g. discontinuous connection or patterned connection
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/10Interconnection of layers at least one layer having inter-reactive properties
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/48Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/14Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
    • B32B37/24Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
    • B32B2037/246Vapour deposition

Definitions

  • the invention relates to the field of field materials, in particular to a zirconia ceramic appearance part and a method of manufacturing the same.
  • Zirconium dioxide ceramics are superior in overall performance and are often used in the manufacture of touch screens, housings, back covers, buttons and the like for mobile terminals.
  • the ceramic appearance member made of zirconium dioxide has excellent mechanical properties as compared with a ceramic appearance member made of a conventional material such as alumina, and has a rounded appearance and a bright color.
  • the ceramic appearance parts made of zirconium dioxide also have the disadvantages of being easily contaminated with oil stains, fingerprints, etc., in order to prevent the appearance of the zirconia ceramic appearance parts from oil stains, fingerprints, etc., in practice, it is usually required on the surface of the ceramic appearance parts.
  • An anti-fingerprint film is disposed on the surface to form a zirconia ceramic appearance member with an anti-fingerprint film.
  • the main component of the existing anti-fingerprint film is a silane-based material having a terminal perfluorochain, and the silane-based material is difficult to chemically bond with zirconium dioxide, the anti-fingerprint film on the zirconia ceramic appearance member is made. Adhesion and wear resistance are relatively poor.
  • the embodiment of the invention provides a zirconia ceramic appearance component and a manufacturing method thereof, so as to solve the problem that the anti-fingerprint film disposed on the zirconia ceramic appearance component has relatively poor adhesion and wear resistance.
  • an embodiment of the present invention provides a zirconia ceramic appearance component, the appearance component comprising: in addition to the zirconia ceramic substrate and the anti-fingerprint film, disposed on the zirconia ceramic substrate and An intermediate layer between the anti-fingerprint films and respectively bonded to the silica ceramic substrate and the anti-fingerprint film, wherein the intermediate layer is made of zirconium dioxide and silicon dioxide.
  • the intermediate layer includes: a transition layer disposed on a surface of the zirconia substrate and having a material of zirconium dioxide, disposed in the transition a mixed layer of a zirconia-silica composite material on the layer, and a material disposed between the mixed layer and the anti-fingerprint film and having a material of a silicon dioxide connection layer.
  • the intermediate layer includes: a transition layer on the surface of the zirconium dioxide substrate and having a material of zirconium dioxide, and a mixed layer provided between the transition layer and the anti-fingerprint film and having a material of a zirconium dioxide-silica composite.
  • the intermediate layer includes: a transition layer disposed on a surface of the zirconia substrate and made of zirconium dioxide, and disposed in the A mixed layer between the transition layer and the anti-fingerprint film and made of a zirconium dioxide-silica composite.
  • the intermediate layer includes: a transition layer disposed on a surface of the zirconia substrate and made of zirconium dioxide, and disposed in the A connecting layer between the transition layer and the anti-fingerprint film and made of silicon dioxide.
  • the intermediate layer includes: disposed between the zirconia substrate and the anti-fingerprint film, and is made of zirconium dioxide-dioxide A mixed layer of silicon composites.
  • the zirconium dioxide in the zirconium dioxide-silica composite The molar ratio to silica is between 1:9 and 9:1.
  • the present invention further provides a method for preparing a ceramic component of zirconia, comprising: disposing a zirconia ceramic substrate; depositing a material of zirconium dioxide and dioxide on the zirconia ceramic substrate a silicon intermediate layer to bond the silica ceramic substrate to the intermediate layer; an anti-fingerprint film is deposited on the intermediate layer to bond the anti-fingerprint film to the intermediate layer.
  • the disposing the zirconia ceramic substrate comprises: placing the zirconia ceramic substrate in a cavity; and vacuuming the cavity Thereafter, the zirconia ceramic substrate is washed.
  • the cleaning the zirconia ceramic substrate comprises: cleaning by plasma cleaning or glow discharge cleaning The zirconia ceramic substrate.
  • the depositing the intermediate layer on the zirconia ceramic substrate comprises: depositing a transition layer of zirconium dioxide on the zirconia ceramic substrate; depositing a mixed layer of zirconium dioxide-silicon dioxide composite on the transition layer; A connecting layer of silicon dioxide is deposited to form an intermediate layer composed of the transition layer, the mixed layer, and the connecting layer.
  • the depositing the intermediate layer on the zirconia ceramic substrate comprises: depositing a transition layer of zirconium dioxide on the zirconia ceramic substrate; depositing a mixed layer of zirconium dioxide-silicon dioxide composite on the transition layer, thereby forming a transition layer An intermediate layer composed of a layer and the mixed layer.
  • the depositing the intermediate layer on the zirconia ceramic substrate includes: depositing a transition layer of zirconium dioxide on the zirconia ceramic substrate; depositing a connection layer of silicon dioxide on the transition layer, thereby forming the transition layer and the connection layer The middle layer of the composition.
  • the depositing the intermediate layer on the zirconia ceramic substrate comprises: depositing a mixed layer of a zirconia-silica composite material on the zirconia ceramic substrate; depositing a connection layer of silicon dioxide on the mixed layer, thereby forming a mixture by the An intermediate layer composed of a layer and the connecting layer.
  • the depositing the intermediate layer on the zirconia ceramic substrate comprises: depositing an intermediate layer of a zirconia-silica composite on the zirconia ceramic substrate.
  • the zirconium dioxide in the zirconium dioxide-silica composite The molar ratio to silica is between 1:9 and 9:1.
  • the zirconia ceramic appearance member comprises: disposed between the zirconia ceramic substrate and the anti-fingerprint film and respectively with the silica ceramic substrate and the anti-fingerprint film A bonded intermediate layer, wherein the intermediate layer is made of zirconium dioxide and silicon dioxide.
  • the intermediate layer is made of zirconium dioxide and silicon dioxide on the surface of the zirconium dioxide substrate, and can be formed between the intermediate layer and the zirconia ceramic substrate and between the anti-fingerprint films.
  • Stable chemical bonding allows the anti-fingerprint film to adhere to the zirconia ceramic substrate through the intermediate layer, thereby increasing the adhesion between the zirconia ceramic substrate and the anti-finger film, and improving the resistance of the anti-finger film Grinding.
  • FIG. 1 is a schematic structural view of an embodiment of a zirconia ceramic appearance member according to the present invention
  • FIG. 2 is a schematic structural view of another embodiment of a zirconia ceramic appearance member according to the present invention.
  • Figure 3 is a schematic view showing the structure of another embodiment of the zirconia ceramic appearance member of the present invention.
  • Figure 4 is a schematic view showing the structure of another embodiment of the zirconia ceramic appearance member of the present invention.
  • Figure 5 is a schematic view showing the structure of another embodiment of the zirconia ceramic appearance member of the present invention.
  • Figure 6 is a schematic view showing the structure of another embodiment of the zirconia ceramic appearance member of the present invention.
  • Fig. 7 is a flow chart showing an embodiment of a method for preparing a zirconium dioxide ceramic appearance member according to the present invention.
  • FIG. 1 is a schematic structural view of a zirconia ceramic appearance member according to an embodiment of the present invention.
  • the zirconia ceramic appearance member comprises: a zirconia ceramic substrate 101, an intermediate layer 102 disposed on the zirconia ceramic substrate 101, and an anti-fingerprint film 103 disposed on the intermediate layer 102.
  • the intermediate layer 102 is bonded to the zirconia ceramic substrate 101 and the anti-fingerprint film 103, respectively.
  • the shape of the zirconia ceramic substrate 101 can be set as needed; the anti-fingerprint film 103 is composed of a silane-based material of a terminal perfluorochain, and the thickness can be 5 to 30 nm; the intermediate layer 102 can be Single or multi-layer structure composed of silica and zirconia materials. Depending on the actual needs, when the intermediate layer 102 has a multi-layer structure, the hierarchical structure of the intermediate layer 102 and the materials of the respective layers constituting the intermediate layer may also be different.
  • the intermediate layer 102 may include a transition layer 1021 disposed on a surface of the zirconia ceramic substrate 101, and disposed on the transition layer 1021.
  • the intermediate layer 102 may include a transition layer 1021 disposed on a surface of the zirconia ceramic substrate 101, and a transition layer 1021 disposed on the transition layer 1021.
  • the upper mixed layer 1022; the anti-fingerprint film 103 is disposed on the mixed layer 1022.
  • the intermediate layer 102 may include a transition layer 1021 disposed on a surface of the zirconia ceramic substrate 101, and a transition layer 1021 disposed on the transition layer 1021.
  • the upper connection layer 1023; the anti-fingerprint film 103 is disposed on the connection layer 1023.
  • the intermediate layer 102 may include a mixed layer 1022 disposed on the surface of the zirconia ceramic substrate 101 and disposed on the mixed layer 1022.
  • the upper connection layer 1023; the anti-fingerprint film 103 is disposed on the connection layer 1023.
  • the intermediate layer 102 may include only the mixed layer 1022 disposed on the surface of the zirconia ceramic substrate 101; the anti-fingerprint film 103 is directly disposed on The mixed layer 1022 is on.
  • the material of the transition layer 1021 may be zirconium dioxide
  • the material of the mixed layer 1022 may be a zirconium dioxide-silicon dioxide composite
  • the material of the connection layer 1023 may be silicon dioxide
  • transition The thickness of the layer 1021, the mixed layer 1022, and the connection layer 1023 may each be between 5 and 30 nm.
  • the molar ratio of zirconium dioxide to silica in the zirconium dioxide-silica composite is between 1:9 and 9:1.
  • an intermediate layer made of zirconium dioxide and silicon dioxide is disposed on the surface of the zirconium dioxide substrate, and is stable between the intermediate layer and the zirconia ceramic substrate and between the anti-fingerprint films.
  • the chemical bonding can increase the adhesion between the zirconia ceramic substrate and the anti-fingerprint film, and improve the wear resistance of the anti-finger film.
  • the present invention also provides an embodiment of a method for preparing a zirconia ceramic appearance member.
  • a flow chart of an embodiment of a method for preparing a zirconium dioxide ceramic appearance member of the present invention is shown. As shown in FIG. 7, the method for preparing a zirconia ceramic appearance part of the present invention may include the following steps:
  • step 701 a zirconia ceramic substrate is disposed.
  • the zirconia ceramic substrate After the zirconia ceramic substrate is formed, it is placed in a cavity of the appearance manufacturing apparatus and cleaned. Depending on the process requirements, the manufacturing equipment may first evacuate the chamber through a vacuum system and then clean the surface of the zirconia ceramic substrate through an atmosphere system and an auxiliary system. For zirconia ceramic substrates There are many ways in which the surface can be cleaned, for example, plasma cleaning or glow discharge cleaning.
  • Step 702 depositing an intermediate layer on the zirconia ceramic substrate, the intermediate layer being made of zirconium dioxide and silicon dioxide.
  • the manufacturing apparatus can deposit an intermediate layer on the zirconia ceramic substrate.
  • the manufacturing equipment may deposit an intermediate layer only in a partial region of the surface of the zirconia ceramic substrate, or may deposit an intermediate layer in all regions of the surface of the zirconia ceramic substrate.
  • the manufacturing equipment can deposit the intermediate layer in a different deposition manner.
  • the manufacturing apparatus may first deposit a transition layer on the zirconia ceramic substrate; then deposit a mixed layer on the transition layer; finally in the mixing A tie layer is deposited on the layer to form an intermediate layer composed of the transition layer, the mixed layer, and the tie layer.
  • the manufacturing apparatus may first deposit a transition layer on the zirconia ceramic substrate; then deposit a mixed layer on the transition layer to form the transition layer and The intermediate layer of the mixed layer.
  • the manufacturing apparatus may first deposit a transition layer on the zirconia ceramic substrate; then deposit a connection layer on the transition layer to form the transition layer and The intermediate layer formed by the connecting layer.
  • the manufacturing apparatus may first deposit a mixed layer on the zirconia ceramic substrate; then deposit a connecting layer on the mixed layer to form the mixed layer and The intermediate layer formed by the connecting layer.
  • the manufacturing apparatus may deposit a mixed layer only on the zirconia ceramic substrate to form an intermediate layer.
  • the material of the transition layer may be zirconium dioxide, the material of the mixed layer may be zirconia-silica composite, the material of the connecting layer may be silicon dioxide, and the thickness of the transition layer, the mixed layer and the connecting layer may be Between 5 and 30 nm.
  • a deposition method such as physical vapor deposition (Physical Vapor Deposition) or chemical vapor deposition (Chemical Vapor Deposition) may be employed.
  • the target the deposition system, and the atmosphere system
  • intermediate layers of different structures and different materials can be deposited.
  • the mixed layer may be deposited by magnetron sputtering, multi-arc ion plating, or the like using zirconium silicon alloy or zirconium silicate as a target.
  • zirconium dioxide can be selected as a target
  • Silica can be selected as a target.
  • the molar ratio of zirconium dioxide to silica in the zirconium dioxide-silica composite forming the mixed layer may be 1: Between 9 and 9:1.
  • Step 703 depositing an anti-fingerprint film on the intermediate layer.
  • the manufacturing apparatus may further deposit an anti-fingerprint film on the intermediate layer.
  • the anti-fingerprint film may be deposited on the connection layer; when the intermediate layer includes only a transition layer and a mixed layer or only a mixed layer, The anti-fingerprint film may be deposited on the mixed layer.
  • the material of the anti-fingerprint film may be a silane-based material with a terminal perfluorochain.
  • an intermediate layer made of zirconium dioxide and silicon dioxide is disposed on the surface of the zirconium dioxide substrate, and a stable layer can be formed between the intermediate layer and the zirconia ceramic substrate and between the anti-fingerprint films.
  • the chemical bonding can increase the adhesion between the zirconia ceramic substrate and the anti-fingerprint film, and improve the wear resistance of the anti-finger film.

Abstract

一种二氧化锆陶瓷外观件及其制备方法。该外观件包括二氧化锆陶瓷基材与防指纹膜,以及设置在二者之间且分别与它们键合的中间层,该中间层的材质为二氧化锆与二氧化硅。由于该中间层的存在,二氧化锆基材与防指纹膜之间的附着力增加,从而提升该外观件防指纹膜的耐磨性。

Description

二氧化锆陶瓷外观件及其制造方法 技术领域
本发明涉及领域材料领域,尤其涉及二氧化锆陶瓷外观件及其制造方法。
背景技术
随着移动终端的日益普及,用户对移动终端的外观要求也越来越高。二氧化锆陶瓷的综合性能优越,常被用于制造移动终端的触摸屏、外壳、后盖、按键等外观件。使用二氧化锆制成的陶瓷外观件与使用氧化铝等传统材料制成的陶瓷外观件相比,不但具有优良的机械性能,而且还具有外观圆润、色泽亮丽的特性。
但是,使用二氧化锆制成的陶瓷外观件也具有容易沾染油污、指纹等印迹等缺点,为防止二氧化锆陶瓷外观件沾染油污、指纹等印迹,在实际中通常还需要在陶瓷外观件表面上设置防指纹(Anti-fingerprint)膜,形成带有防指纹膜的二氧化锆陶瓷外观件。然而,由于现有的防指纹膜的主要成分是末端全氟链的硅烷基材料,而硅烷基材料很难与二氧化锆产生化学键合,因此,使得二氧化锆陶瓷外观件上的防指纹膜附着力和耐磨性都比较差。
发明内容
本发明实施例提供了二氧化锆陶瓷外观件及其制造方法,以解决设置在二氧化锆陶瓷外观件上的防指纹膜附着力和耐磨性都比较差的问题。
第一方面,本发明实施例提供了一种二氧化锆陶瓷外观件,该外观件除包括二氧化锆陶瓷基材与防指纹膜之外还包括:设置在所述二氧化锆陶瓷基材与所述防指纹膜之间且分别与所述二氧化硅陶瓷基材及所述防指纹膜键合的中间层,其中所述中间层的材质为二氧化锆与二氧化硅。
结合第一方面,在第一方面第一种可能的实现方式中,所述中间层包括:设置在所述二氧化锆基材表面上且材质为二氧化锆的过渡层、设置在所述过渡层上且材质为二氧化锆-二氧化硅复合物的混合层、以及设置在所述混合层与所述防指纹膜之间的且材质为二氧化硅连接层。
结合第一方面,在第一方面第二种可能的实现方式中,所述中间层包括:置在 所述二氧化锆基材表面上且材质为二氧化锆的过渡层、以及设置在所述过渡层与所述防指纹膜之间且材质为二氧化锆-二氧化硅复合物的混合层。
结合第一方面,在第一方面第三种可能的实现方式中,所述中间层包括:设置在所述二氧化锆基材表面上且材质为二氧化锆的过渡层、以及设置在所述过渡层与所述防指纹膜之间且材质为二氧化锆-二氧化硅复合物的混合层。
结合第一方面,在第一方面第四种可能的实现方式中,所述中间层包括:设置在所述二氧化锆基材表面上且材质为二氧化锆的过渡层、以及设置在所述过渡层与所述防指纹膜之间且材质为二氧化硅的连接层。
结合第一方面,在第一方面第五种可能的实现方式中,所述中间层包括:设置在所述二氧化锆基材与所述防指纹膜之间且材质为二氧化锆-二氧化硅复合物的混合层。
结合第一方面第一、二、四或五种可能的实现方式中任一种,在第一方面第六种可能的实现方式中,所述二氧化锆-二氧化硅复合物中二氧化锆与二氧化硅摩尔比在1:9至9:1之间。
第二方面,本发明实施还提供了一种二氧化锆陶瓷外观件制备方法,包括:设置二氧化锆陶瓷基材;在所述二氧化锆陶瓷基材上沉积材质为二氧化锆与二氧化硅中间层,以使所述二氧化硅陶瓷基材与所述中间层键合;在所述中间层上沉积防指纹膜,以使所述防指纹膜与所述中间层键合。
结合第二方面,在第二方面第一种可能的实现方式中,设置二氧化锆陶瓷基材包括:将所述二氧化锆陶瓷基材放置于腔体内;在对所述腔体进行抽真空后,清洗所述二氧化锆陶瓷基材。
结合第二方面第一种可能的实现方式,在第二方面第二种可能的实现方式中,所述清洗所述二氧化锆陶瓷基材包括:使用等离子体清洗方式或辉光放电清洗方式清洗所述二氧化锆陶瓷基材。
结合第二方面或第二方面第一至二种可能的实现方式其中任一种,在第二方面第三种可能的实现方式中,所述在所述二氧化锆陶瓷基材上沉积中间层包括:在所述二氧化锆陶瓷基材上沉积材质为二氧化锆的过渡层;在所述过渡层上沉积材质为二氧化锆-二氧化硅复合物的混合层;在所述混合层上沉积材质为二氧化硅的连接层,从而形成由所述过渡层、所述混合层及所述连接层构成的中间层。
结合第二方面或第二方面第一至二种可能的实现方式其中任一种,在第二方面第四种可能的实现方式中,所述在所述二氧化锆陶瓷基材上沉积中间层包括:在所述二氧化锆陶瓷基材上沉积材质为二氧化锆的过渡层;在所述过渡层上沉积材质为二氧化锆-二氧化硅复合物的混合层,从而形成由所述过渡层及所述混合层构成的中间层。
结合第二方面或第二方面第一至二种可能的实现方式其中任一种,在第二方面第五种可能的实现方式中,所述在所述二氧化锆陶瓷基材上沉积中间层包括:在所述二氧化锆陶瓷基材上沉积材质为二氧化锆的过渡层;在所述过渡层上沉积材质为二氧化硅的连接层,从而形成由所述过渡层及所述连接层构成的中间层。
结合第二方面或第二方面第一至二种可能的实现方式其中任一种,在第二方面第六种可能的实现方式中,所述在所述二氧化锆陶瓷基材上沉积中间层包括:在所述二氧化锆陶瓷基材上沉积材质为二氧化锆-二氧化硅复合物的混合层;在所述混合层上沉积材质为二氧化硅的连接层,从而形成由所述混合层及所述连接层构成的中间层。
结合第二方面或第二方面第一至二种可能的实现方式其中任一种,在第二方面第七种可能的实现方式中,所述在所述二氧化锆陶瓷基材上沉积中间层包括:在所述二氧化锆陶瓷基材上沉积材质为二氧化锆-二氧化硅复合物的中间层。
结合第二方面第三、四、六或七种可能的实现方式其中任意一种,在第二方面第八种可能的实现方式中,所述二氧化锆-二氧化硅复合物中二氧化锆与二氧化硅摩尔比在1:9至9:1之间。
在本发明实施例中,二氧化锆陶瓷外观件包括:设置在所述二氧化锆陶瓷基材与所述防指纹膜之间且分别与所述二氧化硅陶瓷基材及所述防指纹膜键合的中间层,其中所述中间层的材质为二氧化锆与二氧化硅。采用本发明实施例,在二氧化锆基材表面上设置材料为二氧化锆与二氧化硅的从中间层,由于中间层与二氧化锆陶瓷基材之间及防指纹膜之间均能形成稳定的化学键合,可以使防指纹膜通过中间层附着在二氧化锆陶瓷基材上,从而可以增大二氧化锆陶瓷基材与防指纹膜之间的附着力,并提升防指纹膜的耐磨性。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,对于本领域普通技术 人员而言,在不付出创造性劳动性的前提下,还可以根据这些附图获得其他的附图。
图1为本发明二氧化锆陶瓷外观件一个实施例的结构示意图;
图2为本发明二氧化锆陶瓷外观件另一个实施例的结构示意图;
图3为本发明二氧化锆陶瓷外观件另一个实施例的结构示意图;
图4为本发明二氧化锆陶瓷外观件另一个实施例的结构示意图;
图5为本发明二氧化锆陶瓷外观件另一个实施例的结构示意图;
图6为本发明二氧化锆陶瓷外观件另一个实施例的结构示意图;
图7为本发明二氧化锆陶瓷外观件制备方法一个实施例的流程图。
具体实施方式
为了使本领域技术人员更好地理解本发明方案,下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所述描述的实施例仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
参见图1,为本发明实施例二氧化锆陶瓷外观件的结构示意图。
如图1所示,二氧化锆陶瓷外观件包括:二氧化锆陶瓷基材101、设置在二氧化锆陶瓷基材101上的中间层102、设置在所述中间层102上的防指纹膜103,所述中间层102分别与所述二氧化锆陶瓷基材101及所述防指纹膜103键合。
其中,所述二氧化锆陶瓷基材101的形状可以根据需要进行设置;所述防指纹膜103由末端全氟链的硅烷基材质构成,厚度可以为5至30nm;所述中间层102可以为由于二氧化硅及二氧化锆材质构成的单层或多层结构。根据实际需求的不同,当所述中间层102为多层结构时,所述中间层102的层次结构及构成中间层的各个层次的材质也可以各不相同。
在一种可选的实现方式中,如图2所示,所述中间层102可以包括设置在所述二氧化锆陶瓷基材101表面上的过渡层1021、设置在所述过渡层1021上的混合层1022、以及设置在所述混合层1022上的连接层1023;防指纹膜103设置在所述连接层1023上。
在另一种可选的实现方式中,如图3所示,所述中间层102可以包括设置在所述二氧化锆陶瓷基材101表面上的过渡层1021、以及设置在所述过渡层1021上的混合层1022;防指纹膜103设置在所述混合层1022上。
在另一种可选的实现方式中,如图4所示,所述中间层102可以包括设置在所述二氧化锆陶瓷基材101表面上的过渡层1021、以及设置在所述过渡层1021上的连接层1023;防指纹膜103设置在所述连接层1023上。
在另一种可选的实现方式中,如图5所示,所述中间层102可以包括设置在所述二氧化锆陶瓷基材101表面上的混合层1022、以及设置在所述混合层1022上的连接层1023;防指纹膜103设置在所述连接层1023上。
在另一种可选的实现方式中,如图6所示,所述中间层102可以仅包括设置在所述二氧化锆陶瓷基材101表面上的混合层1022;防指纹膜103直接设置在所述混合层1022上。
其中,在前述各种实现方式中,过渡层1021的材质可以为二氧化锆,混合层1022的材质可以为二氧化锆-二氧化硅复合物,连接层1023的材质可以为二氧化硅,过渡层1021、混合层1022及连接层1023的厚度均可以在5至30nm之间。为满足对外观件硬度及防指纹膜103附着力的不同需求,二氧化锆-二氧化硅复合物中二氧化锆与二氧化硅摩尔比在1:9至9:1之间。
在本实施例中,在二氧化锆基材表面上设置材质为二氧化锆与二氧化硅的中间层,由于中间层与二氧化锆陶瓷基材之间及防指纹膜之间均能形成稳定的化学键合,因此可以增大二氧化锆陶瓷基材与防指纹膜之间的附着力,并提升防指纹膜的耐磨性。
与本发明二氧化锆陶瓷外观件的实施例相对应,本发明还提供了二氧化锆陶瓷外观件制备方法的实施例。
参见图7,为本发明二氧化锆陶瓷外观件制备方法一个实施例的流程图。如图7所示,本发明二氧化锆陶瓷外观件制备方法可以包括如下步骤:
步骤701,设置二氧化锆陶瓷基材。
在二氧化锆陶瓷基材成型后,先将其放置于外观件制造设备的腔体内,并对其进行清洗。根据工艺要求的不同,制造设备可先通过真空系统对腔体进行抽真空,然后通过气氛系统和辅助系统对氧化锆陶瓷基材表面进行清洗。对二氧化锆陶瓷基材的 表面进行清洗的方式有很多,例如,可以包括等离子体清洗或辉光放电清洗等方式。
步骤702,在所述二氧化锆陶瓷基材上沉积中间层,所述中间层的材质为二氧化锆与二氧化硅。
在清洗完毕后,制造设备可在二氧化锆陶瓷基材上沉积中间层。根据实际需求不同,制造设备可以仅在二氧化锆陶瓷基材表面的部分区域沉积中间层,也可以在二氧化锆陶瓷基材表面的全部区域沉积中间层。
根据中间层的结构不同,制造设备可以采用比不同的沉积方式沉积中间层。
在所述中间层包括过渡层、混合层及连接层时,制造设备可以首先在所述二氧化锆陶瓷基材上沉积过渡层;然后在所述过渡层上沉积混合层;最后在所述混合层上沉积连接层,从而形成由所述过渡层、所述混合层及所述连接层构成的中间层。
在所述中间层包括过渡层及混合层时,制造设备可以首先在所述二氧化锆陶瓷基材上沉积过渡层;然后在所述过渡层上沉积混合层,从而形成由所述过渡层及所述混合层构成的中间层。
在所述中间层包括过渡层及连接层时,制造设备可以首先在所述二氧化锆陶瓷基材上沉积过渡层;然后在所述过渡层上沉积连接层,从而形成由所述过渡层及所述连接层构成的中间层。
在所述中间层包括混合层及连接层时,制造设备可以首先在所述二氧化锆陶瓷基材上沉积混合层;然后在所述混合层上沉积连接层,从而形成由所述混合层及所述连接层构成的中间层。
在所述中间层仅包括混合层时,制造设备可以仅在所述二氧化锆陶瓷基材上沉积混合层,从而形成中间层。
其中,过渡层的材质可以为二氧化锆,混合层的材质可以为二氧化锆-二氧化硅复合物,连接层的材质可以为二氧化硅,过渡层、混合层及连接层的厚度均可以在5至30nm之间。
在沉积所述中间层时,可以采用物理气相沉积(Physical Vapor Deposition)或者化学气相沉积(Chemical Vapor Deposition)等沉积方式。通过控制靶材、沉积系统和气氛系统,从而可以沉积不同结构及不同材质的中间层。例如,在沉积所述混合层时,可以以锆硅合金或硅酸锆作为靶材,通过磁控溅射、多弧离子镀或其他方式沉积混合层。在沉积所述过渡层时,则可以选择二氧化锆作为靶材;在沉积所述连接层时,则 可以选择二氧化硅作为靶材。其中,根据对二氧化锆陶瓷外观件硬度及防指纹膜附着力的不同要求,形成所述混合层的二氧化锆-二氧化硅复合物中二氧化锆与二氧化硅摩尔比可以在1:9至9:1之间。
步骤703,在所述中间层上沉积防指纹膜。
在所述中间层沉积完成后,制造设备可以在所述中间层上进一步沉积防指纹膜。具体来说,在所述中间层包括连接层和其他层次时,所述防指纹膜可以沉积在所述连接层上;在所述中间层仅包括过渡层及混合层或仅包括混合层时,所述防指纹膜可以沉积在所混合层上。其中,所述防指纹膜的材质可以是末端全氟链的硅烷基材质。
采用本实施例,在二氧化锆基材表面上设置材质为二氧化锆与二氧化硅的中间层,由于中间层与二氧化锆陶瓷基材之间及防指纹膜之间均能形成稳定的化学键合,因此可以增大二氧化锆陶瓷基材与防指纹膜之间的附着力,并提升防指纹膜的耐磨性。
本说明书中的各个实施例均采用递进的方式描述,各个实施例之间相同相似的部分互相参见即可,每个实施例重点说明的都是与其他实施例的不同之处。尤其,对于方法实施例而言,由于其与结构实施例相对应,所以描述的比较简单,相关之处参见结构实施例的部分说明即可。
以上所述的本发明实施方式,并不构成对本发明保护范围的限定。任何在本发明的精神和原则之内所作的修改、等同替换和改进等,均应包含在本发明的保护范围之内。

Claims (16)

  1. 一种二氧化锆陶瓷外观件,包括二氧化锆陶瓷基材与防指纹膜,其特征在于,还包括:设置在所述二氧化锆陶瓷基材与所述防指纹膜之间且分别与所述二氧化硅陶瓷基材及所述防指纹膜键合的中间层,其中所述中间层的材质为二氧化锆与二氧化硅。
  2. 如权利要求1所述的二氧化锆陶瓷外观件,其特征在于,所述中间层包括:
    设置在所述二氧化锆基材表面上且材质为二氧化锆的过渡层、设置在所述过渡层上且材质为二氧化锆-二氧化硅复合物的混合层、以及设置在所述混合层与所述防指纹膜之间的且材质为二氧化硅连接层。
  3. 如权利要求1所述的二氧化锆陶瓷外观件,其特征在于,所述中间层包括:
    设置在所述二氧化锆基材表面上且材质为二氧化锆的过渡层、以及设置在所述过渡层与所述防指纹膜之间且材质为二氧化锆-二氧化硅复合物的混合层。
  4. 如权利要求1所述的二氧化锆陶瓷外观件,其特征在于,所述中间层包括:
    设置在所述二氧化锆基材表面上且材质为二氧化锆的过渡层、以及设置在所述过渡层与所述防指纹膜之间且材质为二氧化硅的连接层。
  5. 如权利要求1所述的二氧化锆陶瓷外观件,其特征在于,所述中间层包括:
    设置在所述二氧化锆基材表面上且材质为二氧化锆-二氧化硅复合物的混合层、以及设置在所述混合层与所述防指纹膜之间且材质为二氧化硅的连接层。
  6. 如权利要求1所述的二氧化锆陶瓷外观件,其特征在于,所述中间层包括:
    设置在所述二氧化锆基材与所述防指纹膜之间且材质为二氧化锆-二氧化硅复合物的混合层。
  7. 如权利要求2、3、5或6中任一项所述的二氧化锆陶瓷外观件,其特征在于,
    所述二氧化锆-二氧化硅复合物中二氧化锆与二氧化硅摩尔比在1:9至9:1之间。
  8. 一种二氧化锆陶瓷外观件制备方法,其特征在于,包括:
    设置二氧化锆陶瓷基材;
    在所述二氧化锆陶瓷基材上沉积材质为二氧化锆与二氧化硅中间层,以使所述二氧化硅陶瓷基材与所述中间层键合;
    在所述中间层上沉积防指纹膜,以使所述防指纹膜与所述中间层键合。
  9. 如权利要求8所述的方法,其特征在于,设置二氧化锆陶瓷基材包括:
    将所述二氧化锆陶瓷基材放置于腔体内;
    在对所述腔体进行抽真空后,清洗所述二氧化锆陶瓷基材。
  10. 如权利要求9所述的方法,其特征在于,所述清洗所述二氧化锆陶瓷基材包括:
    使用等离子体清洗方式或辉光放电清洗方式清洗所述二氧化锆陶瓷基材。
  11. 如权利要求8至10任一项所述的方法,其特征在于,所述在所述二氧化锆陶瓷基材上沉积中间层包括:
    在所述二氧化锆陶瓷基材上沉积材质为二氧化锆的过渡层;
    在所述过渡层上沉积材质为二氧化锆-二氧化硅复合物的混合层;
    在所述混合层上沉积材质为二氧化硅的连接层,从而形成由所述过渡层、所述混合层及所述连接层构成的中间层。
  12. 如权利要求8至10任一项所述的方法,其特征在于,所述在所述二氧化锆陶瓷基材上沉积中间层包括:
    在所述二氧化锆陶瓷基材上沉积材质为二氧化锆的过渡层;
    在所述过渡层上沉积材质为二氧化锆-二氧化硅复合物的混合层,从而形成由所述过渡层及所述混合层构成的中间层。
  13. 如权利要求8至10任一项所述的方法,其特征在于,所述在所述二氧化锆陶瓷基材上沉积中间层包括:
    在所述二氧化锆陶瓷基材上沉积材质为二氧化锆的过渡层;
    在所述过渡层上沉积材质为二氧化硅的连接层,从而形成由所述过渡层及所述连接层构成的中间层。
  14. 如权利要求8至10任一项所述的方法,其特征在于,所述在所述二氧化锆陶瓷基材上沉积中间层包括:
    在所述二氧化锆陶瓷基材上沉积材质为二氧化锆-二氧化硅复合物的混合层;
    在所述混合层上沉积材质为二氧化硅的连接层,从而形成由所述混合层及所述连接层构成的中间层。
  15. 如权利要求8至10任一项所述的方法,其特征在于,所述在所述二氧化锆陶瓷基材上沉积中间层包括:
    在所述二氧化锆陶瓷基材上沉积材质为二氧化锆-二氧化硅复合物的中间层。
  16. 如权利要求11、12、14、或15任一项所述的方法,其特征在于,
    所述二氧化锆-二氧化硅复合物中二氧化锆与二氧化硅摩尔比在1:9至9:1之间。
PCT/CN2015/074213 2015-03-13 2015-03-13 二氧化锆陶瓷外观件及其制造方法 WO2016145574A1 (zh)

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KR102025712B1 (ko) 2019-09-26
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CN106458766A (zh) 2017-02-22
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